JP2006294179A - 不揮発性記憶装置 - Google Patents
不揮発性記憶装置 Download PDFInfo
- Publication number
- JP2006294179A JP2006294179A JP2005116572A JP2005116572A JP2006294179A JP 2006294179 A JP2006294179 A JP 2006294179A JP 2005116572 A JP2005116572 A JP 2005116572A JP 2005116572 A JP2005116572 A JP 2005116572A JP 2006294179 A JP2006294179 A JP 2006294179A
- Authority
- JP
- Japan
- Prior art keywords
- data
- memory cell
- read
- write
- line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002184 metal Substances 0.000 claims abstract description 24
- 229910052751 metal Inorganic materials 0.000 claims abstract description 24
- 230000005291 magnetic effect Effects 0.000 claims description 104
- 230000005415 magnetization Effects 0.000 claims description 29
- 238000001208 nuclear magnetic resonance pulse sequence Methods 0.000 claims description 18
- 230000008878 coupling Effects 0.000 claims description 12
- 238000010168 coupling process Methods 0.000 claims description 12
- 238000005859 coupling reaction Methods 0.000 claims description 12
- 230000004044 response Effects 0.000 claims description 12
- 239000011159 matrix material Substances 0.000 claims description 7
- 238000013500 data storage Methods 0.000 claims description 6
- 239000010409 thin film Substances 0.000 abstract description 18
- 230000010354 integration Effects 0.000 abstract description 14
- 239000010408 film Substances 0.000 abstract description 3
- 239000000696 magnetic material Substances 0.000 abstract description 3
- 230000005641 tunneling Effects 0.000 description 51
- 238000010586 diagram Methods 0.000 description 39
- 239000013598 vector Substances 0.000 description 31
- 239000003990 capacitor Substances 0.000 description 24
- 230000005294 ferromagnetic effect Effects 0.000 description 15
- 230000004048 modification Effects 0.000 description 15
- 238000012986 modification Methods 0.000 description 15
- 230000005290 antiferromagnetic effect Effects 0.000 description 8
- 238000000034 method Methods 0.000 description 8
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- 125000006850 spacer group Chemical group 0.000 description 6
- 230000003321 amplification Effects 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- 101100522111 Oryza sativa subsp. japonica PHT1-11 gene Proteins 0.000 description 3
- 230000004913 activation Effects 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 101100522110 Oryza sativa subsp. japonica PHT1-10 gene Proteins 0.000 description 2
- 101100522109 Pinus taeda PT10 gene Proteins 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 101100136626 Oryza sativa subsp. japonica PHT1-6 gene Proteins 0.000 description 1
- 101100408236 Oryza sativa subsp. japonica PHT1-7 gene Proteins 0.000 description 1
- 230000005316 antiferromagnetic exchange Effects 0.000 description 1
- 239000002885 antiferromagnetic material Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/165—Auxiliary circuits
- G11C11/1673—Reading or sensing circuits or methods
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/70—Resistive array aspects
- G11C2213/78—Array wherein the memory cells of a group share an access device, all the memory cells of the group having a common electrode and the access device being not part of a word line or a bit line driver
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Mram Or Spin Memory Techniques (AREA)
- Hall/Mr Elements (AREA)
- Semiconductor Memories (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005116572A JP2006294179A (ja) | 2005-04-14 | 2005-04-14 | 不揮発性記憶装置 |
| US11/400,529 US7369429B2 (en) | 2005-04-14 | 2006-04-10 | Non-volatile memory device having toggle cell |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005116572A JP2006294179A (ja) | 2005-04-14 | 2005-04-14 | 不揮発性記憶装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006294179A true JP2006294179A (ja) | 2006-10-26 |
| JP2006294179A5 JP2006294179A5 (enExample) | 2008-04-24 |
Family
ID=37108318
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005116572A Pending JP2006294179A (ja) | 2005-04-14 | 2005-04-14 | 不揮発性記憶装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7369429B2 (enExample) |
| JP (1) | JP2006294179A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8027188B2 (en) | 2007-11-28 | 2011-09-27 | Kabushiki Kaisha Toshiba | Semiconductor memory device |
| US8139402B2 (en) | 2008-01-08 | 2012-03-20 | Renesas Electronics Corporation | Magnetic memory device |
| KR20150064998A (ko) * | 2013-12-04 | 2015-06-12 | 삼성전자주식회사 | 자기 메모리 장치, 이의 동작 방법 및 이를 포함하는 반도체 시스템 |
| JP2015185201A (ja) * | 2014-03-25 | 2015-10-22 | 三星電子株式会社Samsung Electronics Co.,Ltd. | 不揮発性メモリ装置及びそれを含む格納装置、それの書込み方法及び読出し方法 |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8497538B2 (en) * | 2006-05-31 | 2013-07-30 | Everspin Technologies, Inc. | MRAM synthetic antiferromagnet structure |
| US8116123B2 (en) | 2008-06-27 | 2012-02-14 | Seagate Technology Llc | Spin-transfer torque memory non-destructive self-reference read method |
| US8116122B2 (en) | 2008-06-27 | 2012-02-14 | Seagate Technology Llc | Spin-transfer torque memory self-reference read method |
| US7826260B2 (en) * | 2008-10-27 | 2010-11-02 | Seagate Technology Llc | Spin-transfer torque memory self-reference read and write assist methods |
| US7813168B2 (en) * | 2008-10-27 | 2010-10-12 | Seagate Technology Llc | Spin-transfer torque memory self-reference read and write assist methods |
| US7898838B2 (en) * | 2008-10-31 | 2011-03-01 | Seagate Technology Llc | Resistive sense memory calibration for self-reference read method |
| US7876604B2 (en) * | 2008-11-05 | 2011-01-25 | Seagate Technology Llc | Stram with self-reference read scheme |
| US7944738B2 (en) * | 2008-11-05 | 2011-05-17 | Micron Technology, Inc. | Spin torque transfer cell structure utilizing field-induced antiferromagnetic or ferromagnetic coupling |
| US8159864B2 (en) * | 2008-12-08 | 2012-04-17 | Qualcomm Incorporated | Data integrity preservation in spin transfer torque magnetoresistive random access memory |
| US8816455B2 (en) | 2012-10-22 | 2014-08-26 | Crocus Technology Inc. | Memory devices with magnetic random access memory (MRAM) cells and associated structures for connecting the MRAM cells |
| JP2020047317A (ja) * | 2018-09-14 | 2020-03-26 | キオクシア株式会社 | 不揮発性記憶装置 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002110933A (ja) * | 2000-09-28 | 2002-04-12 | Toshiba Corp | 半導体記憶装置及びその製造方法 |
| WO2004003921A2 (en) * | 2002-06-28 | 2004-01-08 | Freescale Semiconductor, Inc. | Mram architecture with electrically isolated read write circuitry |
| WO2004003924A2 (en) * | 2002-06-28 | 2004-01-08 | Freescale Semiconductor, Inc. | Circuit and method for reading a toggle memory cell |
| JP2004031640A (ja) * | 2002-06-26 | 2004-01-29 | Toshiba Corp | 磁気メモリ装置 |
| WO2004066306A2 (en) * | 2003-01-17 | 2004-08-05 | Freescale Semiconductor, Inc. | Mram architecture with a grounded write bit line and electrically isolated read bit line |
| JP2004530244A (ja) * | 2001-04-11 | 2004-09-30 | インフィネオン テクノロジーズ アクチエンゲゼルシャフト | Mram半導体メモリーシステムの駆動方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4477199B2 (ja) | 2000-06-16 | 2010-06-09 | 株式会社ルネサステクノロジ | 磁気ランダムアクセスメモリ、磁気ランダムアクセスメモリへのアクセス方法および磁気ランダムアクセスメモリの製造方法 |
| US6545906B1 (en) * | 2001-10-16 | 2003-04-08 | Motorola, Inc. | Method of writing to scalable magnetoresistance random access memory element |
| US7158407B2 (en) * | 2005-04-29 | 2007-01-02 | Freescale Semiconductor, Inc. | Triple pulse method for MRAM toggle bit characterization |
-
2005
- 2005-04-14 JP JP2005116572A patent/JP2006294179A/ja active Pending
-
2006
- 2006-04-10 US US11/400,529 patent/US7369429B2/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002110933A (ja) * | 2000-09-28 | 2002-04-12 | Toshiba Corp | 半導体記憶装置及びその製造方法 |
| JP2004530244A (ja) * | 2001-04-11 | 2004-09-30 | インフィネオン テクノロジーズ アクチエンゲゼルシャフト | Mram半導体メモリーシステムの駆動方法 |
| JP2004031640A (ja) * | 2002-06-26 | 2004-01-29 | Toshiba Corp | 磁気メモリ装置 |
| WO2004003921A2 (en) * | 2002-06-28 | 2004-01-08 | Freescale Semiconductor, Inc. | Mram architecture with electrically isolated read write circuitry |
| WO2004003924A2 (en) * | 2002-06-28 | 2004-01-08 | Freescale Semiconductor, Inc. | Circuit and method for reading a toggle memory cell |
| WO2004066306A2 (en) * | 2003-01-17 | 2004-08-05 | Freescale Semiconductor, Inc. | Mram architecture with a grounded write bit line and electrically isolated read bit line |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8027188B2 (en) | 2007-11-28 | 2011-09-27 | Kabushiki Kaisha Toshiba | Semiconductor memory device |
| US8085585B2 (en) | 2007-11-28 | 2011-12-27 | Kabushiki Kaisha Toshiba | Semiconductor memory device |
| US8139402B2 (en) | 2008-01-08 | 2012-03-20 | Renesas Electronics Corporation | Magnetic memory device |
| CN101483176B (zh) * | 2008-01-08 | 2013-02-13 | 瑞萨电子株式会社 | 磁记录装置 |
| KR20150064998A (ko) * | 2013-12-04 | 2015-06-12 | 삼성전자주식회사 | 자기 메모리 장치, 이의 동작 방법 및 이를 포함하는 반도체 시스템 |
| KR102116792B1 (ko) * | 2013-12-04 | 2020-05-29 | 삼성전자 주식회사 | 자기 메모리 장치, 이의 동작 방법 및 이를 포함하는 반도체 시스템 |
| JP2015185201A (ja) * | 2014-03-25 | 2015-10-22 | 三星電子株式会社Samsung Electronics Co.,Ltd. | 不揮発性メモリ装置及びそれを含む格納装置、それの書込み方法及び読出し方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20060233018A1 (en) | 2006-10-19 |
| US7369429B2 (en) | 2008-05-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
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