JP2006286254A5 - - Google Patents

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Publication number
JP2006286254A5
JP2006286254A5 JP2005101593A JP2005101593A JP2006286254A5 JP 2006286254 A5 JP2006286254 A5 JP 2006286254A5 JP 2005101593 A JP2005101593 A JP 2005101593A JP 2005101593 A JP2005101593 A JP 2005101593A JP 2006286254 A5 JP2006286254 A5 JP 2006286254A5
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Japan
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reflection coefficient
frequency
output
frequency power
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JP2005101593A
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English (en)
Japanese (ja)
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JP2006286254A (ja
JP4739793B2 (ja
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Priority to JP2005101593A priority Critical patent/JP4739793B2/ja
Priority claimed from JP2005101593A external-priority patent/JP4739793B2/ja
Priority to US11/391,115 priority patent/US7292047B2/en
Publication of JP2006286254A publication Critical patent/JP2006286254A/ja
Publication of JP2006286254A5 publication Critical patent/JP2006286254A5/ja
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Publication of JP4739793B2 publication Critical patent/JP4739793B2/ja
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Expired - Fee Related legal-status Critical Current

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JP2005101593A 2005-03-31 2005-03-31 高周波電源装置 Expired - Fee Related JP4739793B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005101593A JP4739793B2 (ja) 2005-03-31 2005-03-31 高周波電源装置
US11/391,115 US7292047B2 (en) 2005-03-31 2006-03-28 High-frequency power source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005101593A JP4739793B2 (ja) 2005-03-31 2005-03-31 高周波電源装置

Publications (3)

Publication Number Publication Date
JP2006286254A JP2006286254A (ja) 2006-10-19
JP2006286254A5 true JP2006286254A5 (https=) 2008-04-03
JP4739793B2 JP4739793B2 (ja) 2011-08-03

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JP2005101593A Expired - Fee Related JP4739793B2 (ja) 2005-03-31 2005-03-31 高周波電源装置

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US (1) US7292047B2 (https=)
JP (1) JP4739793B2 (https=)

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JP5089032B2 (ja) * 2005-10-12 2012-12-05 長野日本無線株式会社 プラズマ処理装置用自動整合器の制御方法
US8203859B2 (en) 2006-12-29 2012-06-19 Daihen Corporation High frequency device with variable frequency and variable load impedance matching
US8040068B2 (en) * 2009-02-05 2011-10-18 Mks Instruments, Inc. Radio frequency power control system
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JP5430437B2 (ja) * 2010-02-17 2014-02-26 三菱電機株式会社 点火装置および点火方法
KR20110110525A (ko) 2010-04-01 2011-10-07 삼성전자주식회사 무선 전력 전송 장치 및 방법
JP5946227B2 (ja) * 2011-01-04 2016-07-05 アドバンスト・エナジー・インダストリーズ・インコーポレイテッドＡｄｖａｎｃｅｄ Ｅｎｅｒｇｙ Ｉｎｄｕｓｔｒｉｅｓ， Ｉｎｃ． 電力送達システム、電力制御システム、および、電力を送達するまたは電力制御する方法
DE102011076404B4 (de) * 2011-05-24 2014-06-26 TRUMPF Hüttinger GmbH + Co. KG Verfahren zur Impedanzanpassung der Ausgangsimpedanz einer Hochfrequenzleistungsversorgungsanordnung an die Impedanz einer Plasmalast und Hochfrequenzleistungsversorgungsanordnung
US8576013B2 (en) * 2011-12-29 2013-11-05 Mks Instruments, Inc. Power distortion-based servo control systems for frequency tuning RF power sources
US9171699B2 (en) 2012-02-22 2015-10-27 Lam Research Corporation Impedance-based adjustment of power and frequency
US8773019B2 (en) 2012-02-23 2014-07-08 Mks Instruments, Inc. Feedback control and coherency of multiple power supplies in radio frequency power delivery systems for pulsed mode schemes in thin film processing
US8952765B2 (en) * 2012-03-23 2015-02-10 Mks Instruments, Inc. System and methods of bimodal automatic power and frequency tuning of RF generators
US9685297B2 (en) 2012-08-28 2017-06-20 Advanced Energy Industries, Inc. Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system
US9210790B2 (en) * 2012-08-28 2015-12-08 Advanced Energy Industries, Inc. Systems and methods for calibrating a switched mode ion energy distribution system
JP6084417B2 (ja) 2012-09-28 2017-02-22 株式会社ダイヘン インピーダンス調整装置
US9294100B2 (en) * 2012-12-04 2016-03-22 Advanced Energy Industries, Inc. Frequency tuning system and method for finding a global optimum
JP6282806B2 (ja) * 2012-12-28 2018-02-21 株式会社ダイヘン 高周波電源装置
US9155182B2 (en) * 2013-01-11 2015-10-06 Lam Research Corporation Tuning a parameter associated with plasma impedance
JP6099995B2 (ja) * 2013-01-24 2017-03-22 東京エレクトロン株式会社 試験装置
DE102014209469A1 (de) * 2014-05-19 2015-11-19 TRUMPF Hüttinger GmbH + Co. KG Regelungsanordnung, Regelsystem und Hochfrequenzleistungserzeugungsvorrichtung
JP2016054041A (ja) * 2014-09-03 2016-04-14 株式会社島津製作所 高周波電源装置
JP6479562B2 (ja) * 2015-05-07 2019-03-06 東京エレクトロン株式会社 プラズマ処理装置の処理条件生成方法及びプラズマ処理装置
KR102553462B1 (ko) * 2015-07-21 2023-07-10 도쿄엘렉트론가부시키가이샤 플라즈마 처리 장치 및 플라즈마 처리 방법
US9748076B1 (en) * 2016-04-20 2017-08-29 Advanced Energy Industries, Inc. Apparatus for frequency tuning in a RF generator
JP6157036B1 (ja) * 2016-07-08 2017-07-05 株式会社京三製作所 高周波電源装置、及び高周波電源装置の制御方法
US10784807B2 (en) * 2017-05-11 2020-09-22 Siemens Aktiengesellschaft Methods and systems for controlling an electrical machine
US11651939B2 (en) 2017-07-07 2023-05-16 Advanced Energy Industries, Inc. Inter-period control system for plasma power delivery system and method of operating same
US11615943B2 (en) 2017-07-07 2023-03-28 Advanced Energy Industries, Inc. Inter-period control for passive power distribution of multiple electrode inductive plasma source
WO2019010312A1 (en) 2017-07-07 2019-01-10 Advanced Energy Industries, Inc. INTER-PERIODIC CONTROL SYSTEM FOR PLASMA POWER SUPPLY SYSTEM AND METHOD OF OPERATION
US12505986B2 (en) 2017-11-17 2025-12-23 Advanced Energy Industries, Inc. Synchronization of plasma processing components
US11437221B2 (en) 2017-11-17 2022-09-06 Advanced Energy Industries, Inc. Spatial monitoring and control of plasma processing environments
US12230476B2 (en) 2017-11-17 2025-02-18 Advanced Energy Industries, Inc. Integrated control of a plasma processing system
WO2019099925A1 (en) 2017-11-17 2019-05-23 Advanced Energy Industries, Inc. Spatial and temporal control of ion bias voltage for plasma processing
JP2020159949A (ja) * 2019-03-27 2020-10-01 東京エレクトロン株式会社 高周波供給装置及び高周波電力の供給方法
US11397204B2 (en) * 2019-11-26 2022-07-26 Achronix Semiconductor Corporation Noise-independent loss characterization of networks
JP7348101B2 (ja) * 2020-02-18 2023-09-20 株式会社京三製作所 高周波電源装置の制御方法及び高周波電源装置
JP2021180070A (ja) * 2020-05-11 2021-11-18 東京エレクトロン株式会社 プラズマ処理装置及びマイクロ波制御方法
TW202336804A (zh) * 2021-11-19 2023-09-16 日商東京威力科創股份有限公司 電漿處理裝置、電源系統、控制方法、程式及記憶媒體
US11942309B2 (en) 2022-01-26 2024-03-26 Advanced Energy Industries, Inc. Bias supply with resonant switching
US11670487B1 (en) 2022-01-26 2023-06-06 Advanced Energy Industries, Inc. Bias supply control and data processing
US12046448B2 (en) 2022-01-26 2024-07-23 Advanced Energy Industries, Inc. Active switch on time control for bias supply
JP2023183584A (ja) * 2022-06-16 2023-12-28 東京エレクトロン株式会社 高周波電源、プラズマ処理装置、及び整合方法
US11978613B2 (en) 2022-09-01 2024-05-07 Advanced Energy Industries, Inc. Transition control in a bias supply
KR20240138176A (ko) * 2023-03-10 2024-09-20 삼성전자주식회사 Rf 전력 제공 장치 및 그것의 동작 방법
US12567572B2 (en) 2023-07-11 2026-03-03 Advanced Energy Industries, Inc. Plasma behaviors predicted by current measurements during asymmetric bias waveform application

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Publication number Priority date Publication date Assignee Title
JP3183914B2 (ja) 1991-08-29 2001-07-09 株式会社ダイヘン インピーダンス自動整合装置
US6020794A (en) * 1998-02-09 2000-02-01 Eni Technologies, Inc. Ratiometric autotuning algorithm for RF plasma generator
US6946847B2 (en) * 2002-02-08 2005-09-20 Daihen Corporation Impedance matching device provided with reactance-impedance table
JP3977114B2 (ja) * 2002-03-25 2007-09-19 株式会社ルネサステクノロジ プラズマ処理装置
JP3822857B2 (ja) * 2002-10-29 2006-09-20 長野日本無線株式会社 プラズマ発生方法、プラズマ装置および半導体製造装置
US6781317B1 (en) * 2003-02-24 2004-08-24 Applied Science And Technology, Inc. Methods and apparatus for calibration and metrology for an integrated RF generator system

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