JP2006278365A - 液処理装置及びそのプログラム並びにその記録媒体 - Google Patents

液処理装置及びそのプログラム並びにその記録媒体 Download PDF

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JP2006278365A
JP2006278365A JP2005090426A JP2005090426A JP2006278365A JP 2006278365 A JP2006278365 A JP 2006278365A JP 2005090426 A JP2005090426 A JP 2005090426A JP 2005090426 A JP2005090426 A JP 2005090426A JP 2006278365 A JP2006278365 A JP 2006278365A
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liquid
processing
chemical
control computer
treatment
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JP2005090426A
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Japanese (ja)
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JP2006278365A5 (enExample
Inventor
Takafumi Tsuchiya
孝文 土屋
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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JP2005090426A 2005-03-28 2005-03-28 液処理装置及びそのプログラム並びにその記録媒体 Pending JP2006278365A (ja)

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JP2005090426A JP2006278365A (ja) 2005-03-28 2005-03-28 液処理装置及びそのプログラム並びにその記録媒体

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JP2005090426A JP2006278365A (ja) 2005-03-28 2005-03-28 液処理装置及びそのプログラム並びにその記録媒体

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JP2006278365A true JP2006278365A (ja) 2006-10-12
JP2006278365A5 JP2006278365A5 (enExample) 2008-05-08

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011119610A (ja) * 2009-12-07 2011-06-16 Tokyo Electron Ltd 枚葉式の基板液処理装置における循環ラインの液交換方法
JP2017154059A (ja) * 2016-02-29 2017-09-07 株式会社ケーヒン 補助装置及び処理装置
CN110010459A (zh) * 2017-12-28 2019-07-12 东京毅力科创株式会社 基片处理方法和基片处理装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0645308A (ja) * 1992-07-21 1994-02-18 Sony Corp 混合液の薬液補充方法
JPH1083946A (ja) * 1996-09-06 1998-03-31 Fujitsu Ltd レジスト剥離液管理方法及びレジスト剥離装置
JP2000082691A (ja) * 1998-07-07 2000-03-21 Tokyo Electron Ltd 処理装置及び処理方法
JP2001269633A (ja) * 2000-03-28 2001-10-02 Dainippon Screen Mfg Co Ltd 混合流体中の各成分の濃度制御方法および濃度制御装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0645308A (ja) * 1992-07-21 1994-02-18 Sony Corp 混合液の薬液補充方法
JPH1083946A (ja) * 1996-09-06 1998-03-31 Fujitsu Ltd レジスト剥離液管理方法及びレジスト剥離装置
JP2000082691A (ja) * 1998-07-07 2000-03-21 Tokyo Electron Ltd 処理装置及び処理方法
JP2001269633A (ja) * 2000-03-28 2001-10-02 Dainippon Screen Mfg Co Ltd 混合流体中の各成分の濃度制御方法および濃度制御装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011119610A (ja) * 2009-12-07 2011-06-16 Tokyo Electron Ltd 枚葉式の基板液処理装置における循環ラインの液交換方法
KR101404950B1 (ko) * 2009-12-07 2014-06-09 도쿄엘렉트론가부시키가이샤 기판 액 처리 장치, 기판 액 처리 방법 및 컴퓨터 판독 가능한 기록 매체
JP2017154059A (ja) * 2016-02-29 2017-09-07 株式会社ケーヒン 補助装置及び処理装置
CN110010459A (zh) * 2017-12-28 2019-07-12 东京毅力科创株式会社 基片处理方法和基片处理装置
CN110010459B (zh) * 2017-12-28 2024-02-23 东京毅力科创株式会社 基片处理方法和基片处理装置

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