JP2006261156A - 原版保持装置およびそれを用いた露光装置 - Google Patents

原版保持装置およびそれを用いた露光装置 Download PDF

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Publication number
JP2006261156A
JP2006261156A JP2005072291A JP2005072291A JP2006261156A JP 2006261156 A JP2006261156 A JP 2006261156A JP 2005072291 A JP2005072291 A JP 2005072291A JP 2005072291 A JP2005072291 A JP 2005072291A JP 2006261156 A JP2006261156 A JP 2006261156A
Authority
JP
Japan
Prior art keywords
holding
reticle
original
exposure apparatus
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005072291A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006261156A5 (enExample
Inventor
Yasuhiro Fujiwara
康裕 藤原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005072291A priority Critical patent/JP2006261156A/ja
Priority to US11/371,100 priority patent/US20060209289A1/en
Publication of JP2006261156A publication Critical patent/JP2006261156A/ja
Publication of JP2006261156A5 publication Critical patent/JP2006261156A5/ja
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2005072291A 2005-03-15 2005-03-15 原版保持装置およびそれを用いた露光装置 Withdrawn JP2006261156A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005072291A JP2006261156A (ja) 2005-03-15 2005-03-15 原版保持装置およびそれを用いた露光装置
US11/371,100 US20060209289A1 (en) 2005-03-15 2006-03-09 Exposure apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005072291A JP2006261156A (ja) 2005-03-15 2005-03-15 原版保持装置およびそれを用いた露光装置

Publications (2)

Publication Number Publication Date
JP2006261156A true JP2006261156A (ja) 2006-09-28
JP2006261156A5 JP2006261156A5 (enExample) 2008-05-01

Family

ID=37009943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005072291A Withdrawn JP2006261156A (ja) 2005-03-15 2005-03-15 原版保持装置およびそれを用いた露光装置

Country Status (2)

Country Link
US (1) US20060209289A1 (enExample)
JP (1) JP2006261156A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101013943B1 (ko) * 2007-04-19 2011-02-14 캐논 가부시끼가이샤 스테이지 장치, 노광장치 및 디바이스 제조방법

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130250271A1 (en) * 2012-02-17 2013-09-26 Nikon Corporation Stage assembly with secure device holder

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6809802B1 (en) * 1999-08-19 2004-10-26 Canon Kabushiki Kaisha Substrate attracting and holding system for use in exposure apparatus
KR100855527B1 (ko) * 2001-02-13 2008-09-01 가부시키가이샤 니콘 유지장치, 유지방법, 노광장치 및 디바이스 제조방법
JP2002305138A (ja) * 2001-04-05 2002-10-18 Nikon Corp 露光装置および露光方法
EP1510868A1 (en) * 2003-08-29 2005-03-02 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1530089B1 (en) * 2003-11-05 2011-04-06 ASML Netherlands B.V. Lithographic apparatus and method for clamping an article
JP4411100B2 (ja) * 2004-02-18 2010-02-10 キヤノン株式会社 露光装置
JP4794882B2 (ja) * 2005-03-25 2011-10-19 キヤノン株式会社 走査型露光装置、走査型露光方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101013943B1 (ko) * 2007-04-19 2011-02-14 캐논 가부시끼가이샤 스테이지 장치, 노광장치 및 디바이스 제조방법

Also Published As

Publication number Publication date
US20060209289A1 (en) 2006-09-21

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