JP2006245147A - 投影光学系、露光装置及びデバイスの製造方法 - Google Patents

投影光学系、露光装置及びデバイスの製造方法 Download PDF

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Publication number
JP2006245147A
JP2006245147A JP2005056701A JP2005056701A JP2006245147A JP 2006245147 A JP2006245147 A JP 2006245147A JP 2005056701 A JP2005056701 A JP 2005056701A JP 2005056701 A JP2005056701 A JP 2005056701A JP 2006245147 A JP2006245147 A JP 2006245147A
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JP
Japan
Prior art keywords
reflecting surface
reflecting
optical system
projection optical
optical axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005056701A
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English (en)
Japanese (ja)
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JP2006245147A5 (US20080293856A1-20081127-C00150.png
Inventor
Takahiro Sasaki
隆洋 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005056701A priority Critical patent/JP2006245147A/ja
Priority to US11/365,046 priority patent/US7224441B2/en
Publication of JP2006245147A publication Critical patent/JP2006245147A/ja
Publication of JP2006245147A5 publication Critical patent/JP2006245147A5/ja
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
JP2005056701A 2005-03-01 2005-03-01 投影光学系、露光装置及びデバイスの製造方法 Withdrawn JP2006245147A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005056701A JP2006245147A (ja) 2005-03-01 2005-03-01 投影光学系、露光装置及びデバイスの製造方法
US11/365,046 US7224441B2 (en) 2005-03-01 2006-02-28 Projection optical system, exposure apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005056701A JP2006245147A (ja) 2005-03-01 2005-03-01 投影光学系、露光装置及びデバイスの製造方法

Publications (2)

Publication Number Publication Date
JP2006245147A true JP2006245147A (ja) 2006-09-14
JP2006245147A5 JP2006245147A5 (US20080293856A1-20081127-C00150.png) 2008-04-17

Family

ID=37009953

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005056701A Withdrawn JP2006245147A (ja) 2005-03-01 2005-03-01 投影光学系、露光装置及びデバイスの製造方法

Country Status (2)

Country Link
US (1) US7224441B2 (US20080293856A1-20081127-C00150.png)
JP (1) JP2006245147A (US20080293856A1-20081127-C00150.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010052961A1 (ja) * 2008-11-10 2010-05-14 株式会社ニコン 結像光学系、露光装置、およびデバイス製造方法

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI366004B (en) * 2005-09-13 2012-06-11 Zeiss Carl Smt Gmbh Microlithography projection optical system, microlithographic tool comprising such an optical system, method for microlithographic production of microstructured components using such a microlithographic tool, microstructured component being produced by s
DE502006009171D1 (de) * 2005-10-18 2011-05-05 Zeiss Carl Smt Gmbh Kollektor für beleuchtungssysteme mit einer wellenlänge </= 193 nm
DE102006014380A1 (de) * 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
WO2007115596A1 (en) 2006-04-07 2007-10-18 Carl Zeiss Smt Ag Microlithography projection optical system and method for manufacturing a device
DE102008000800A1 (de) * 2008-03-20 2009-09-24 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie
CN102819196B (zh) * 2008-03-20 2016-03-09 卡尔蔡司Smt有限责任公司 用于微光刻的投射物镜
JP5525550B2 (ja) 2009-03-06 2014-06-18 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ用の照明光学系及び光学系
JP5676856B2 (ja) * 2009-05-08 2015-02-25 キヤノン株式会社 補償光学系を備えた画像取得装置
US9007497B2 (en) * 2010-08-11 2015-04-14 Media Lario S.R.L. Three-mirror anastigmat with at least one non-rotationally symmetric mirror
CN102402135B (zh) 2011-12-07 2013-06-05 北京理工大学 一种极紫外光刻投影物镜设计方法

Family Cites Families (14)

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Publication number Priority date Publication date Assignee Title
US6199991B1 (en) 1997-11-13 2001-03-13 U.S. Philips Corporation Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
US6255661B1 (en) 1998-05-06 2001-07-03 U.S. Philips Corporation Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
US6600552B2 (en) * 1999-02-15 2003-07-29 Carl-Zeiss Smt Ag Microlithography reduction objective and projection exposure apparatus
DE59914179D1 (de) 1999-02-15 2007-03-22 Zeiss Carl Smt Ag Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
US7151592B2 (en) * 1999-02-15 2006-12-19 Carl Zeiss Smt Ag Projection system for EUV lithography
US6033079A (en) 1999-03-15 2000-03-07 Hudyma; Russell High numerical aperture ring field projection system for extreme ultraviolet lithography
EP1093021A3 (en) 1999-10-15 2004-06-30 Nikon Corporation Projection optical system as well as equipment and methods making use of said system
JP2001185480A (ja) 1999-10-15 2001-07-06 Nikon Corp 投影光学系及び該光学系を備える投影露光装置
JP2003015040A (ja) 2001-07-04 2003-01-15 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2004022722A (ja) 2002-06-14 2004-01-22 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2004031808A (ja) 2002-06-27 2004-01-29 Nikon Corp 露光装置の投影光学系、該投影光学系を備えた露光装置及び該露光装置を用いた露光方法
JP2004138926A (ja) 2002-10-21 2004-05-13 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2004170869A (ja) 2002-11-22 2004-06-17 Nikon Corp 結像光学系、露光装置および露光方法
JP2004258178A (ja) 2003-02-25 2004-09-16 Nikon Corp 投影光学系および該投影光学系を備えた露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010052961A1 (ja) * 2008-11-10 2010-05-14 株式会社ニコン 結像光学系、露光装置、およびデバイス製造方法

Also Published As

Publication number Publication date
US20060209302A1 (en) 2006-09-21
US7224441B2 (en) 2007-05-29

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