JP2006231319A - 基板処理方法および基板処理装置 - Google Patents
基板処理方法および基板処理装置 Download PDFInfo
- Publication number
- JP2006231319A JP2006231319A JP2005325739A JP2005325739A JP2006231319A JP 2006231319 A JP2006231319 A JP 2006231319A JP 2005325739 A JP2005325739 A JP 2005325739A JP 2005325739 A JP2005325739 A JP 2005325739A JP 2006231319 A JP2006231319 A JP 2006231319A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- ice
- container
- fine particles
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 254
- 238000000034 method Methods 0.000 title abstract description 26
- 239000007788 liquid Substances 0.000 claims abstract description 177
- 238000004140 cleaning Methods 0.000 claims description 121
- 239000010419 fine particle Substances 0.000 claims description 88
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 62
- 238000003860 storage Methods 0.000 claims description 39
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 31
- 239000001569 carbon dioxide Substances 0.000 claims description 31
- 238000003672 processing method Methods 0.000 claims description 15
- 238000011084 recovery Methods 0.000 claims description 8
- 238000009826 distribution Methods 0.000 claims description 5
- 238000005507 spraying Methods 0.000 claims description 5
- 238000002844 melting Methods 0.000 claims description 4
- 230000008018 melting Effects 0.000 claims description 4
- 230000014759 maintenance of location Effects 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 2
- 238000007599 discharging Methods 0.000 claims description 2
- 238000005406 washing Methods 0.000 abstract description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 54
- 239000002002 slurry Substances 0.000 description 50
- 239000002245 particle Substances 0.000 description 17
- 239000000356 contaminant Substances 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004781 supercooling Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N21/00—Selective content distribution, e.g. interactive television or video on demand [VOD]
- H04N21/40—Client devices specifically adapted for the reception of or interaction with content, e.g. set-top-box [STB]; Operations thereof
- H04N21/41—Structure of client; Structure of client peripherals
- H04N21/426—Internal components of the client ; Characteristics thereof
- H04N21/42661—Internal components of the client ; Characteristics thereof for reading from or writing on a magnetic storage medium, e.g. hard disk drive
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N21/00—Selective content distribution, e.g. interactive television or video on demand [VOD]
- H04N21/40—Client devices specifically adapted for the reception of or interaction with content, e.g. set-top-box [STB]; Operations thereof
- H04N21/41—Structure of client; Structure of client peripherals
- H04N21/4104—Peripherals receiving signals from specially adapted client devices
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N21/00—Selective content distribution, e.g. interactive television or video on demand [VOD]
- H04N21/40—Client devices specifically adapted for the reception of or interaction with content, e.g. set-top-box [STB]; Operations thereof
- H04N21/45—Management operations performed by the client for facilitating the reception of or the interaction with the content or administrating data related to the end-user or to the client device itself, e.g. learning user preferences for recommending movies, resolving scheduling conflicts
- H04N21/462—Content or additional data management, e.g. creating a master electronic program guide from data received from the Internet and a Head-end, controlling the complexity of a video stream by scaling the resolution or bit-rate based on the client capabilities
- H04N21/4621—Controlling the complexity of the content stream or additional data, e.g. lowering the resolution or bit-rate of the video stream for a mobile client with a small screen
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Databases & Information Systems (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Liquid Crystal (AREA)
- Cleaning In General (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005325739A JP2006231319A (ja) | 2005-01-28 | 2005-11-10 | 基板処理方法および基板処理装置 |
TW094145251A TW200640586A (en) | 2005-01-28 | 2005-12-20 | Method and device of processing substrate |
CN2006100063152A CN1810389B (zh) | 2005-01-28 | 2006-01-18 | 基板处理方法以及基板处理装置 |
KR1020060005939A KR100670687B1 (ko) | 2005-01-28 | 2006-01-19 | 기판 처리 방법 및 기판 처리 장치 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005020802 | 2005-01-28 | ||
JP2005325739A JP2006231319A (ja) | 2005-01-28 | 2005-11-10 | 基板処理方法および基板処理装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2006231319A true JP2006231319A (ja) | 2006-09-07 |
Family
ID=37039544
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005325739A Abandoned JP2006231319A (ja) | 2005-01-28 | 2005-11-10 | 基板処理方法および基板処理装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2006231319A (enrdf_load_stackoverflow) |
KR (1) | KR100670687B1 (enrdf_load_stackoverflow) |
CN (1) | CN1810389B (enrdf_load_stackoverflow) |
TW (1) | TW200640586A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012230253A (ja) * | 2011-04-26 | 2012-11-22 | Osaka Univ | 基板の洗浄方法 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107695040B (zh) * | 2017-10-20 | 2021-01-15 | 大族激光科技产业集团股份有限公司 | 激光清洗系统及方法 |
CN109226107B (zh) * | 2018-11-08 | 2024-06-21 | 广东交通职业技术学院 | 一种杆件激光清洗系统及清洗方法 |
JP7186095B2 (ja) * | 2019-01-08 | 2022-12-08 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
CN112090821B (zh) * | 2020-07-29 | 2022-08-26 | 苏州晶洲装备科技有限公司 | 一种超高压洗净装置 |
CN116906959A (zh) * | 2023-08-22 | 2023-10-20 | 嵊州市浙江工业大学创新研究院 | 具有辅助电力调峰功能的油烟管道清洁系统及清洁方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000031239A (ja) * | 1998-07-13 | 2000-01-28 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2002141269A (ja) * | 2000-11-01 | 2002-05-17 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
JP2003033733A (ja) * | 2001-07-23 | 2003-02-04 | Taiyo Toyo Sanso Co Ltd | 基板洗浄システム |
JP2003039031A (ja) * | 2001-07-27 | 2003-02-12 | Kakizaki Mamufacuturing Co Ltd | 板材洗浄方法および板材洗浄装置 |
JP3380021B2 (ja) * | 1993-12-28 | 2003-02-24 | 株式会社エフティーエル | 洗浄方法 |
JP2004313827A (ja) * | 2003-04-11 | 2004-11-11 | Tokyo Kakoki Kk | 表面処理装置 |
-
2005
- 2005-11-10 JP JP2005325739A patent/JP2006231319A/ja not_active Abandoned
- 2005-12-20 TW TW094145251A patent/TW200640586A/zh not_active IP Right Cessation
-
2006
- 2006-01-18 CN CN2006100063152A patent/CN1810389B/zh not_active Expired - Fee Related
- 2006-01-19 KR KR1020060005939A patent/KR100670687B1/ko not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3380021B2 (ja) * | 1993-12-28 | 2003-02-24 | 株式会社エフティーエル | 洗浄方法 |
JP2000031239A (ja) * | 1998-07-13 | 2000-01-28 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2002141269A (ja) * | 2000-11-01 | 2002-05-17 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
JP2003033733A (ja) * | 2001-07-23 | 2003-02-04 | Taiyo Toyo Sanso Co Ltd | 基板洗浄システム |
JP2003039031A (ja) * | 2001-07-27 | 2003-02-12 | Kakizaki Mamufacuturing Co Ltd | 板材洗浄方法および板材洗浄装置 |
JP2004313827A (ja) * | 2003-04-11 | 2004-11-11 | Tokyo Kakoki Kk | 表面処理装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012230253A (ja) * | 2011-04-26 | 2012-11-22 | Osaka Univ | 基板の洗浄方法 |
Also Published As
Publication number | Publication date |
---|---|
TW200640586A (en) | 2006-12-01 |
KR100670687B1 (ko) | 2007-01-17 |
CN1810389B (zh) | 2010-07-28 |
CN1810389A (zh) | 2006-08-02 |
KR20060087417A (ko) | 2006-08-02 |
TWI295199B (enrdf_load_stackoverflow) | 2008-04-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20071218 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20100405 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100525 |
|
A762 | Written abandonment of application |
Free format text: JAPANESE INTERMEDIATE CODE: A762 Effective date: 20100602 |