JP2006222165A - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP2006222165A
JP2006222165A JP2005032357A JP2005032357A JP2006222165A JP 2006222165 A JP2006222165 A JP 2006222165A JP 2005032357 A JP2005032357 A JP 2005032357A JP 2005032357 A JP2005032357 A JP 2005032357A JP 2006222165 A JP2006222165 A JP 2006222165A
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JP
Japan
Prior art keywords
liquid
exposure apparatus
temperature
tank
circulation system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005032357A
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English (en)
Japanese (ja)
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JP2006222165A5 (enExample
Inventor
Makoto Nomoto
誠 野元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005032357A priority Critical patent/JP2006222165A/ja
Priority to US11/275,953 priority patent/US7352437B2/en
Publication of JP2006222165A publication Critical patent/JP2006222165A/ja
Publication of JP2006222165A5 publication Critical patent/JP2006222165A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2005032357A 2005-02-08 2005-02-08 露光装置 Pending JP2006222165A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005032357A JP2006222165A (ja) 2005-02-08 2005-02-08 露光装置
US11/275,953 US7352437B2 (en) 2005-02-08 2006-02-07 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005032357A JP2006222165A (ja) 2005-02-08 2005-02-08 露光装置

Publications (2)

Publication Number Publication Date
JP2006222165A true JP2006222165A (ja) 2006-08-24
JP2006222165A5 JP2006222165A5 (enExample) 2008-04-03

Family

ID=36779567

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005032357A Pending JP2006222165A (ja) 2005-02-08 2005-02-08 露光装置

Country Status (2)

Country Link
US (1) US7352437B2 (enExample)
JP (1) JP2006222165A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006237608A (ja) * 2005-02-22 2006-09-07 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2008124462A (ja) * 2006-11-13 2008-05-29 Asml Netherlands Bv リソグラフィ装置用の導管システム、リソグラフィ装置、ポンプ、及び、導管システム内の振動を実質的に低減する方法
JP2008300702A (ja) * 2007-05-31 2008-12-11 Canon Inc 露光システムおよびデバイス製造方法
JP2009295629A (ja) * 2008-06-02 2009-12-17 Nikon Corp 温度調整装置、温度調整方法、液体供給装置、液体供給方法、露光装置、露光方法、及びデバイス製造方法
CN101807008A (zh) * 2009-02-17 2010-08-18 Asml荷兰有限公司 流体供给系统、光刻设备、流量改变方法及器件制造方法
JP2011029644A (ja) * 2009-07-27 2011-02-10 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2012212081A (ja) * 2011-03-31 2012-11-01 Hoya Corp マスクブランクス用ガラス基板の製造方法、マスクブランクスの製造方法、転写マスクの製造方法、及び半導体装置の製造方法

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4418724B2 (ja) * 2004-09-17 2010-02-24 キヤノン株式会社 露光装置
JP2006222165A (ja) 2005-02-08 2006-08-24 Canon Inc 露光装置
JP2007123295A (ja) * 2005-10-24 2007-05-17 Canon Inc 露光装置
US8068208B2 (en) * 2006-12-01 2011-11-29 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for improving immersion scanner overlay performance
US7426015B2 (en) * 2007-01-17 2008-09-16 Asml Netherlands B.V. Device manufacturing method and lithographic apparatus
JP4490459B2 (ja) 2007-06-29 2010-06-23 キヤノン株式会社 露光装置及びデバイス製造方法
JP2010021370A (ja) * 2008-07-10 2010-01-28 Canon Inc 液浸露光装置およびデバイス製造方法
DE102008050868A1 (de) * 2008-09-30 2010-04-08 M+W Zander Products Gmbh Einrichtung zur Temperaturstabilisierung von Flüssigkeiten, vorzugsweise von ultrareinem Wasser, bei der Herstellung von Chips sowie Verfahren zur Temperaturstabilisierung von Flüssigkeiten zur Anwendung bei der Herstellung von Chips
NL2006648A (en) * 2010-06-01 2011-12-06 Asml Netherlands Bv A fluid supply system, a lithographic apparatus, a method of varying fluid flow rate and a device manufacturing method.
CN102430979A (zh) * 2011-10-13 2012-05-02 清华大学 抛光液温度控制装置和抛光液输送设备
CN103176370B (zh) * 2013-03-13 2015-04-15 华中科技大学 一种用于浸没式光刻的浸液温控系统
CN112445084B (zh) * 2020-12-20 2021-11-30 华中科技大学 一种浸没式光刻机的温度控制方法及装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10303114A (ja) * 1997-04-23 1998-11-13 Nikon Corp 液浸型露光装置
JP2002036488A (ja) * 2000-07-25 2002-02-05 Fuji Photo Film Co Ltd インクジェット式製版方法及び製版装置
WO2003079418A1 (en) * 2002-03-15 2003-09-25 Nikon Corporation Aligner and device manufacuring method
JP2006140410A (ja) * 2004-11-15 2006-06-01 Smc Corp 小流量液体の温調方法及びそのシステム

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06124873A (ja) 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
JP2004128213A (ja) 2002-10-02 2004-04-22 Canon Inc 温調システム及びそれを組み込んだ露光装置
TWI543235B (zh) * 2003-06-19 2016-07-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
SG109000A1 (en) * 2003-07-16 2005-02-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
TWI475596B (zh) * 2003-08-29 2015-03-01 尼康股份有限公司 A liquid recovery device, an exposure device, an exposure method, and an element manufacturing method
EP1524558A1 (en) * 2003-10-15 2005-04-20 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005142382A (ja) 2003-11-07 2005-06-02 Canon Inc 露光装置
JP4323946B2 (ja) * 2003-12-19 2009-09-02 キヤノン株式会社 露光装置
JP2006222165A (ja) 2005-02-08 2006-08-24 Canon Inc 露光装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10303114A (ja) * 1997-04-23 1998-11-13 Nikon Corp 液浸型露光装置
JP2002036488A (ja) * 2000-07-25 2002-02-05 Fuji Photo Film Co Ltd インクジェット式製版方法及び製版装置
WO2003079418A1 (en) * 2002-03-15 2003-09-25 Nikon Corporation Aligner and device manufacuring method
JP2006140410A (ja) * 2004-11-15 2006-06-01 Smc Corp 小流量液体の温調方法及びそのシステム

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012147015A (ja) * 2005-02-22 2012-08-02 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2009246384A (ja) * 2005-02-22 2009-10-22 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
US8902404B2 (en) 2005-02-22 2014-12-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006237608A (ja) * 2005-02-22 2006-09-07 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2008124462A (ja) * 2006-11-13 2008-05-29 Asml Netherlands Bv リソグラフィ装置用の導管システム、リソグラフィ装置、ポンプ、及び、導管システム内の振動を実質的に低減する方法
JP2008300702A (ja) * 2007-05-31 2008-12-11 Canon Inc 露光システムおよびデバイス製造方法
JP2009295629A (ja) * 2008-06-02 2009-12-17 Nikon Corp 温度調整装置、温度調整方法、液体供給装置、液体供給方法、露光装置、露光方法、及びデバイス製造方法
JP2010192896A (ja) * 2009-02-17 2010-09-02 Asml Netherlands Bv 流体供給システム、リソグラフィ装置、流体流量を変動させる方法及びデバイス製造方法
CN101807008A (zh) * 2009-02-17 2010-08-18 Asml荷兰有限公司 流体供给系统、光刻设备、流量改变方法及器件制造方法
JP2011029644A (ja) * 2009-07-27 2011-02-10 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
US8319157B2 (en) 2009-07-27 2012-11-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101620930B1 (ko) 2009-07-27 2016-05-16 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조 방법
JP2012212081A (ja) * 2011-03-31 2012-11-01 Hoya Corp マスクブランクス用ガラス基板の製造方法、マスクブランクスの製造方法、転写マスクの製造方法、及び半導体装置の製造方法

Also Published As

Publication number Publication date
US7352437B2 (en) 2008-04-01
US20060176455A1 (en) 2006-08-10

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