JP2006194743A5 - - Google Patents

Download PDF

Info

Publication number
JP2006194743A5
JP2006194743A5 JP2005006558A JP2005006558A JP2006194743A5 JP 2006194743 A5 JP2006194743 A5 JP 2006194743A5 JP 2005006558 A JP2005006558 A JP 2005006558A JP 2005006558 A JP2005006558 A JP 2005006558A JP 2006194743 A5 JP2006194743 A5 JP 2006194743A5
Authority
JP
Japan
Prior art keywords
crystal orientation
reference sample
sample
subject
specimen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005006558A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006194743A (ja
JP4938981B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005006558A priority Critical patent/JP4938981B2/ja
Priority claimed from JP2005006558A external-priority patent/JP4938981B2/ja
Publication of JP2006194743A publication Critical patent/JP2006194743A/ja
Publication of JP2006194743A5 publication Critical patent/JP2006194743A5/ja
Application granted granted Critical
Publication of JP4938981B2 publication Critical patent/JP4938981B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2005006558A 2005-01-13 2005-01-13 結晶方位測定方法 Expired - Fee Related JP4938981B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005006558A JP4938981B2 (ja) 2005-01-13 2005-01-13 結晶方位測定方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005006558A JP4938981B2 (ja) 2005-01-13 2005-01-13 結晶方位測定方法

Publications (3)

Publication Number Publication Date
JP2006194743A JP2006194743A (ja) 2006-07-27
JP2006194743A5 true JP2006194743A5 (fr) 2008-03-06
JP4938981B2 JP4938981B2 (ja) 2012-05-23

Family

ID=36800941

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005006558A Expired - Fee Related JP4938981B2 (ja) 2005-01-13 2005-01-13 結晶方位測定方法

Country Status (1)

Country Link
JP (1) JP4938981B2 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4833905B2 (ja) * 2007-04-13 2011-12-07 新日本製鐵株式会社 結晶方位決定装置
JP5166817B2 (ja) * 2007-10-17 2013-03-21 トヨタ自動車株式会社 単結晶試料の結晶方位測定方法
JP5595054B2 (ja) 2010-01-29 2014-09-24 株式会社日立ハイテクサイエンス 電子顕微鏡及び試料分析方法
JP2014240780A (ja) * 2013-06-11 2014-12-25 株式会社東芝 試料構造分析方法、透過電子顕微鏡およびプログラム
JP7188199B2 (ja) * 2019-03-13 2022-12-13 日本製鉄株式会社 誤差処理装置、荷電粒子線装置、誤差処理方法およびプログラム
JP7277765B2 (ja) * 2019-09-11 2023-05-19 日本製鉄株式会社 誤差算出装置、荷電粒子線装置、誤差算出方法およびプログラム

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5776446A (en) * 1980-10-29 1982-05-13 Nippon X Sen Kk X-ray goniometer
JPH02264851A (ja) * 1989-04-06 1990-10-29 Toshiba Corp ゴニオメータ
JPH0395446A (ja) * 1989-09-08 1991-04-19 Hitachi Ltd 格子定数測定装置及び格子定数測定方法
JPH04225152A (ja) * 1990-12-27 1992-08-14 Shimadzu Corp Ｘ線自動結晶方位解析装置
JP2000277044A (ja) * 1999-03-24 2000-10-06 Hitachi Ltd 走査電子顕微鏡
JP4428681B2 (ja) * 2001-02-23 2010-03-10 株式会社アライドマテリアル 単結晶ダイヤモンドバイト
JP2003045370A (ja) * 2001-08-01 2003-02-14 Hitachi Ltd 走査電子顕微鏡

Similar Documents

Publication Publication Date Title
JP2006194743A5 (fr)
JP2013527972A5 (fr)
JP2006257313A5 (fr)
JP2009529135A5 (fr)
Wang et al. Vapor-phase synthesis, growth mechanism and thickness-independent elastic modulus of single-crystal tungsten nanobelts
JP2011145281A5 (fr)
CN105300762B (zh) 一种薄板的组织定位制样方法
JP6071689B2 (ja) 曲げ強度試験装置
JP4261080B2 (ja) 残留応力測定方法
JP2006341873A5 (fr)
KR100994933B1 (ko) 단일 인장시험부를 가지는 미세 압축시험기용 인장시편 및그 제조방법
MY149762A (en) Double side wafer grinder and methods for assessing workpiece nanotopology
CN104297084A (zh) 硅片硬度测试装置
Sahab et al. Effect of double sided process parameters in lapping silicon wafer
CN104280010A (zh) 晶片表面平整度测量装置
CN103335905B (zh) 一种测量曲面显微硬度的方法
CN109373965B (zh) 一种适用于应变测量的三轴60°应变式传感器粘贴装置及粘接方法
WO2010002184A3 (fr) Dispositif de mesure de perméabilité réversible
CN100580909C (zh) 氮化镓衬底以及氮化镓衬底测试及制造方法
RU2005118279A (ru) Способ измерения чистоты поверхности подложек
Horn et al. Detection and quantification of surface nanotopography-induced residual stress fields in wafer-bonded silicon
Horn et al. Detection of interfacial gas bubbles in wafer bonded silicon with different surface treatments
CN208269807U (zh) 一种楔镜检测工装
JP4218916B2 (ja) 被測定体の支持装置の製造方法
CN212031130U (zh) 一种半圆柱型金属试样的轴线平面硬度测量装置