JP2006186381A5 - - Google Patents

Download PDF

Info

Publication number
JP2006186381A5
JP2006186381A5 JP2006000173A JP2006000173A JP2006186381A5 JP 2006186381 A5 JP2006186381 A5 JP 2006186381A5 JP 2006000173 A JP2006000173 A JP 2006000173A JP 2006000173 A JP2006000173 A JP 2006000173A JP 2006186381 A5 JP2006186381 A5 JP 2006186381A5
Authority
JP
Japan
Prior art keywords
alumina
abrasive
cmp
powder
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006000173A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006186381A (ja
Filing date
Publication date
Priority claimed from US09/413,518 external-priority patent/US6258137B1/en
Application filed filed Critical
Publication of JP2006186381A publication Critical patent/JP2006186381A/ja
Publication of JP2006186381A5 publication Critical patent/JP2006186381A5/ja
Withdrawn legal-status Critical Current

Links

JP2006000173A 1999-10-06 2006-01-04 Ｃｍｐ生成物 Withdrawn JP2006186381A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/413,518 US6258137B1 (en) 1992-02-05 1999-10-06 CMP products

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2001528524A Division JP2003511850A (ja) 1999-10-06 2000-08-30 Ｃｍｐ生成物

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011152232A Division JP2011238952A (ja) 1999-10-06 2011-07-08 Ｃｍｐ生成物

Publications (2)

Publication Number Publication Date
JP2006186381A JP2006186381A (ja) 2006-07-13
JP2006186381A5 true JP2006186381A5 (enExample) 2007-09-20

Family

ID=23637528

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2001528524A Withdrawn JP2003511850A (ja) 1999-10-06 2000-08-30 Ｃｍｐ生成物
JP2006000173A Withdrawn JP2006186381A (ja) 1999-10-06 2006-01-04 Ｃｍｐ生成物
JP2011152232A Pending JP2011238952A (ja) 1999-10-06 2011-07-08 Ｃｍｐ生成物

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2001528524A Withdrawn JP2003511850A (ja) 1999-10-06 2000-08-30 Ｃｍｐ生成物

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2011152232A Pending JP2011238952A (ja) 1999-10-06 2011-07-08 Ｃｍｐ生成物

Country Status (12)

Country Link
US (1) US6258137B1 (enExample)
EP (1) EP1228161A1 (enExample)
JP (3) JP2003511850A (enExample)
KR (1) KR100485205B1 (enExample)
CN (1) CN100396749C (enExample)
AU (1) AU754060B2 (enExample)
BR (1) BR0014533A (enExample)
CA (1) CA2382724C (enExample)
RU (1) RU2235747C2 (enExample)
TW (1) TWI261068B (enExample)
WO (1) WO2001025366A1 (enExample)
ZA (1) ZA200201091B (enExample)

Families Citing this family (83)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6413156B1 (en) * 1996-05-16 2002-07-02 Ebara Corporation Method and apparatus for polishing workpiece
US6068879A (en) * 1997-08-26 2000-05-30 Lsi Logic Corporation Use of corrosion inhibiting compounds to inhibit corrosion of metal plugs in chemical-mechanical polishing
US6475407B2 (en) * 1998-05-19 2002-11-05 Showa Denko K.K. Composition for polishing metal on semiconductor wafer and method of using same
JP3490038B2 (ja) * 1999-12-28 2004-01-26 Ｎｅｃエレクトロニクス株式会社 金属配線形成方法
EP1234800A1 (de) 2001-02-22 2002-08-28 Degussa Aktiengesellschaft Wässrige Dispersion, Verfahren zu ihrer Herstellung und Verwendung
US6839362B2 (en) * 2001-05-22 2005-01-04 Saint-Gobain Ceramics & Plastics, Inc. Cobalt-doped saturable absorber Q-switches and laser systems
JP2003205462A (ja) * 2002-01-11 2003-07-22 Tokyo Seimitsu Co Ltd Ｃｍｐ研磨装置における研磨剤の調合装置及び調合方法
US7087187B2 (en) * 2002-06-06 2006-08-08 Grumbine Steven K Meta oxide coated carbon black for CMP
US6673132B1 (en) * 2002-08-20 2004-01-06 Everlight Usa, Inc. SiO2/Al2O3 composite abrasive and method for producing the same
US6866793B2 (en) * 2002-09-26 2005-03-15 University Of Florida Research Foundation, Inc. High selectivity and high planarity dielectric polishing
JP2004193495A (ja) 2002-12-13 2004-07-08 Toshiba Corp 化学的機械的研磨用スラリーおよびこれを用いた半導体装置の製造方法
US7422730B2 (en) * 2003-04-02 2008-09-09 Saint-Gobain Ceramics & Plastics, Inc. Nanoporous ultrafine α-alumina powders and sol-gel process of preparing same
US20040198584A1 (en) * 2003-04-02 2004-10-07 Saint-Gobain Ceramics & Plastic, Inc. Nanoporous ultrafine alpha-alumina powders and freeze drying process of preparing same
US20050061230A1 (en) * 2003-09-23 2005-03-24 Saint-Gobain Ceramics & Plastics, Inc. Spinel articles and methods for forming same
US7045223B2 (en) * 2003-09-23 2006-05-16 Saint-Gobain Ceramics & Plastics, Inc. Spinel articles and methods for forming same
US7326477B2 (en) * 2003-09-23 2008-02-05 Saint-Gobain Ceramics & Plastics, Inc. Spinel boules, wafers, and methods for fabricating same
US7166271B2 (en) * 2003-10-28 2007-01-23 J.M. Huber Corporation Silica-coated boehmite composites suitable for dentifrices
US7375733B2 (en) * 2004-01-28 2008-05-20 Canon Kabushiki Kaisha Method for driving image display apparatus
US7279424B2 (en) * 2004-08-27 2007-10-09 Hitachi Global Storage Technologies Netherlands B.V. Method for fabricating thin film magnetic heads using CMP with polishing stop layer
US7919815B1 (en) 2005-02-24 2011-04-05 Saint-Gobain Ceramics & Plastics, Inc. Spinel wafers and methods of preparation
KR100641348B1 (ko) * 2005-06-03 2006-11-03 주식회사 케이씨텍 Ｃｍｐ용 슬러리와 이의 제조 방법 및 기판의 연마 방법
US7998866B2 (en) * 2006-09-05 2011-08-16 Cabot Microelectronics Corporation Silicon carbide polishing method utilizing water-soluble oxidizers
US7678700B2 (en) * 2006-09-05 2010-03-16 Cabot Microelectronics Corporation Silicon carbide polishing method utilizing water-soluble oxidizers
US7497885B2 (en) * 2006-12-22 2009-03-03 3M Innovative Properties Company Abrasive articles with nanoparticulate fillers and method for making and using them
US8083820B2 (en) * 2006-12-22 2011-12-27 3M Innovative Properties Company Structured fixed abrasive articles including surface treated nano-ceria filler, and method for making and using the same
EP2118011B1 (en) * 2007-01-15 2016-08-31 Saint-Gobain Ceramics & Plastics, Inc. Ceramic particulate material and processes for forming same
US8491682B2 (en) * 2007-12-31 2013-07-23 K.C. Tech Co., Ltd. Abrasive particles, method of manufacturing the abrasive particles, and method of manufacturing chemical mechanical polishing slurry
FR2928916B1 (fr) 2008-03-21 2011-11-18 Saint Gobain Ct Recherches Grains fondus et revetus de silice
US7959695B2 (en) * 2008-03-21 2011-06-14 Saint-Gobain Ceramics & Plastics, Inc. Fixed abrasive articles utilizing coated abrasive particles
JP5321594B2 (ja) * 2008-10-17 2013-10-23 コニカミノルタ株式会社 ガラス基板の製造方法、および磁気記録媒体の製造方法
RU2392226C1 (ru) * 2009-01-26 2010-06-20 Закрытое акционерное общество "Центр инновационных керамических нанотехнологий Нанокомпозит" Способ получения нанодисперсного порошка альфа-оксида алюминия
KR101508917B1 (ko) * 2009-03-13 2015-04-07 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 나노다이아몬드를 사용하는 화학기계적 평탄화 공정
RU2579597C2 (ru) * 2009-11-13 2016-04-10 Басф Се Композиция для химико-механической полировки (хмп ), содержащая неорганические частицы и полимерные частицы
EP2658680B1 (en) 2010-12-31 2020-12-09 Saint-Gobain Ceramics & Plastics, Inc. Abrasive articles comprising abrasive particles having particular shapes and methods of forming such articles
US8840694B2 (en) 2011-06-30 2014-09-23 Saint-Gobain Ceramics & Plastics, Inc. Liquid phase sintered silicon carbide abrasive particles
WO2013003830A2 (en) 2011-06-30 2013-01-03 Saint-Gobain Ceramics & Plastics, Inc. Abrasive articles including abrasive particles of silicon nitride
WO2013049239A1 (en) 2011-09-26 2013-04-04 Saint-Gobain Ceramics & Plastics, Inc. Abrasive articles including abrasive particulate materials, coated abrasives using the abrasive particulate materials and methods of forming
CA2862453A1 (en) 2011-12-30 2013-07-04 Saint-Gobain Ceramics & Plastics, Inc. Forming shaped abrasive particles
EP2797716B1 (en) 2011-12-30 2021-02-17 Saint-Gobain Ceramics & Plastics, Inc. Composite shaped abrasive particles and method of forming same
EP2797715A4 (en) 2011-12-30 2016-04-20 Saint Gobain Ceramics SHAPED ABRASIVE PARTICLE AND METHOD OF FORMING THE SAME
CA3056658C (en) 2012-01-10 2023-07-04 Doruk O. Yener Abrasive particles having complex shapes and methods of forming same
WO2013106602A1 (en) 2012-01-10 2013-07-18 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles having particular shapes and methods of forming such particles
US9701878B2 (en) * 2012-02-16 2017-07-11 Konica Minolta, Inc. Abrasive regeneration method
US9242346B2 (en) 2012-03-30 2016-01-26 Saint-Gobain Abrasives, Inc. Abrasive products having fibrillated fibers
CN104540639B (zh) 2012-05-23 2019-01-29 圣戈本陶瓷及塑料股份有限公司 成形磨粒及其形成方法
US10106714B2 (en) 2012-06-29 2018-10-23 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles having particular shapes and methods of forming such particles
EP4566756A3 (en) 2012-10-15 2025-11-26 Saint-Gobain Abrasives, Inc. Abrasive particles having particular shapes and methods of forming such particles
US9074119B2 (en) 2012-12-31 2015-07-07 Saint-Gobain Ceramics & Plastics, Inc. Particulate materials and methods of forming same
CA2907372C (en) 2013-03-29 2017-12-12 Saint-Gobain Abrasives, Inc. Abrasive particles having particular shapes and methods of forming such particles
TW201502263A (zh) 2013-06-28 2015-01-16 Saint Gobain Ceramics 包含成形研磨粒子之研磨物品
JP2016529700A (ja) * 2013-07-11 2016-09-23 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 腐食防止剤としてベンゾトリアゾール誘導体を含む化学的機械研磨組成物
CA3114978A1 (en) 2013-09-30 2015-04-02 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particles and methods of forming same
US9566689B2 (en) 2013-12-31 2017-02-14 Saint-Gobain Abrasives, Inc. Abrasive article including shaped abrasive particles
US9771507B2 (en) 2014-01-31 2017-09-26 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particle including dopant material and method of forming same
MX394721B (es) 2014-04-14 2025-03-24 Saint Gobain Ceramics Articulo abrasivo que incluye particulas abrasivas conformadas.
CA3123554A1 (en) 2014-04-14 2015-10-22 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
WO2015184355A1 (en) 2014-05-30 2015-12-03 Saint-Gobain Abrasives, Inc. Method of using an abrasive article including shaped abrasive particles
US9914864B2 (en) 2014-12-23 2018-03-13 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particles and method of forming same
US9707529B2 (en) 2014-12-23 2017-07-18 Saint-Gobain Ceramics & Plastics, Inc. Composite shaped abrasive particles and method of forming same
US9676981B2 (en) 2014-12-24 2017-06-13 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particle fractions and method of forming same
TWI634200B (zh) 2015-03-31 2018-09-01 聖高拜磨料有限公司 固定磨料物品及其形成方法
US10196551B2 (en) 2015-03-31 2019-02-05 Saint-Gobain Abrasives, Inc. Fixed abrasive articles and methods of forming same
CA3118262C (en) 2015-06-11 2023-09-19 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
CN107787264B (zh) * 2015-06-25 2020-10-13 3M创新有限公司 玻璃状粘结磨料制品及其制造方法
CN105586005B (zh) * 2016-01-14 2018-02-23 洛阳三睿宝纳米科技有限公司 一种纳米刚玉磨料的制备方法
KR102313436B1 (ko) 2016-05-10 2021-10-19 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 연마 입자들 및 그 형성 방법
CN109415615A (zh) 2016-05-10 2019-03-01 圣戈本陶瓷及塑料股份有限公司 磨料颗粒及其形成方法
CN106271898A (zh) * 2016-08-18 2017-01-04 广西华银铝业有限公司 一种石英片的清洁方法
US10329455B2 (en) 2016-09-23 2019-06-25 Saint-Gobain Ceramics & Plastics, Inc. Chemical mechanical planarization slurry and method for forming same
EP4349896A3 (en) 2016-09-29 2024-06-12 Saint-Gobain Abrasives, Inc. Fixed abrasive articles and methods of forming same
US10759024B2 (en) 2017-01-31 2020-09-01 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
US10563105B2 (en) 2017-01-31 2020-02-18 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
US10865148B2 (en) 2017-06-21 2020-12-15 Saint-Gobain Ceramics & Plastics, Inc. Particulate materials and methods of forming same
US11117239B2 (en) * 2017-09-29 2021-09-14 Taiwan Semiconductor Manufacturing Company, Ltd. Chemical mechanical polishing composition and method
RU2687649C2 (ru) * 2017-10-04 2019-05-15 Общество с ограниченной ответственностью "КРОКУС НАНОЭЛЕКТРОНИКА" Способ химико-механической полировки толстых слоев кобальтсодержащих сплавов
CN108716001B (zh) * 2018-06-16 2019-05-17 宁波明望汽车饰件有限公司 一种汽车配件表面处理工艺
JP7167557B2 (ja) * 2018-08-30 2022-11-09 Jsr株式会社 化学機械研磨用アルミナ砥粒及びその製造方法
JP7167558B2 (ja) * 2018-08-30 2022-11-09 Jsr株式会社 化学機械研磨用水系分散体
BR112022006909A2 (pt) 2019-10-11 2022-06-28 Saint Gobain Abrasives Inc Partícula abrasiva incluindo revestimento, artigo abrasivo incluindo as partículas abrasivas e método de formação
US12129422B2 (en) 2019-12-27 2024-10-29 Saint-Gobain Ceramics & Plastics, Inc. Abrasive articles and methods of forming same
CN119238386A (zh) 2019-12-27 2025-01-03 圣戈本陶瓷及塑料股份有限公司 磨料制品及其形成方法
EP4081370A4 (en) 2019-12-27 2024-04-24 Saint-Gobain Ceramics & Plastics Inc. ABRASIVE ARTICLES AND THEIR FORMATION PROCESSES
JP2025500060A (ja) 2021-12-30 2025-01-07 サンーゴバン アブレイシブズ，インコーポレイティド 研磨物品及びそれを形成する方法

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5037806A (enExample) 1973-06-27 1975-04-08
US4012337A (en) 1974-03-13 1977-03-15 Exxon Research And Engineering Company High surface area alpha aluminas
US4062693A (en) 1976-09-29 1977-12-13 Union Carbide Corporation Dry liquid alumina trihydrate concentrates
FR2398540A1 (fr) 1977-07-29 1979-02-23 Raffinage Cie Francaise Procede de preparation d'alumines a porosite controlee et applications des alumines ainsi preparees
US4786555A (en) 1983-10-27 1988-11-22 E. I. Du Pont De Nemours And Company Support particles coated with or particles of precursors for or of biologically active glass
IT1184114B (it) 1985-01-18 1987-10-22 Montedison Spa Alfa allumina sotto forma di particelle sferiche,non aggregate,a distribuzione granulometrica ristretta e di dimensioni inferiori a 2 micron,e processo per la sua preparazione
US4737411A (en) 1986-11-25 1988-04-12 University Of Dayton Controlled pore size ceramics particularly for orthopaedic and dental applications
DE68927116T2 (de) 1988-01-19 1997-02-06 Fujimi Inc Poliermasse
YU32490A (en) * 1989-03-13 1991-10-31 Lonza Ag Hydrophobic layered grinding particles
US5131923A (en) * 1989-09-11 1992-07-21 Norton Company Vitrified bonded sol gel sintered aluminous abrasive bodies
US4997461A (en) 1989-09-11 1991-03-05 Norton Company Nitrified bonded sol gel sintered aluminous abrasive bodies
US5166093A (en) * 1991-07-31 1992-11-24 Micron Technology, Inc. Method to reduce the reflectivity of a semi-conductor metallic surface
AU650382B2 (en) * 1992-02-05 1994-06-16 Norton Company Nano-sized alpha alumina particles
US5213591A (en) * 1992-07-28 1993-05-25 Ahmet Celikkaya Abrasive grain, method of making same and abrasive products
EP0652918B1 (en) * 1992-07-28 1998-10-21 Minnesota Mining And Manufacturing Company Abrasive grain with metal oxide coating, method of making same and abrasive products
RU2078789C1 (ru) * 1993-06-08 1997-05-10 Борис Лаврентьевич Фисенко Покрытый шлифовальный материал
CA2170989A1 (en) * 1993-09-13 1995-03-23 Timothy L. Hoopman Abrasive article, method of manufacture of same, method of using same for finishing, and a production tool
US5366925A (en) * 1993-09-27 1994-11-22 United Microelectronics Corporation Local oxidation of silicon by using aluminum spiking technology
US5454844A (en) * 1993-10-29 1995-10-03 Minnesota Mining And Manufacturing Company Abrasive article, a process of making same, and a method of using same to finish a workpiece surface
WO1995013251A1 (en) * 1993-11-12 1995-05-18 Minnesota Mining And Manufacturing Company Abrasive grain and method for making the same
US5527423A (en) 1994-10-06 1996-06-18 Cabot Corporation Chemical mechanical polishing slurry for metal layers
US5693239A (en) * 1995-10-10 1997-12-02 Rodel, Inc. Polishing slurries comprising two abrasive components and methods for their use
US5679169A (en) * 1995-12-19 1997-10-21 Micron Technology, Inc. Method for post chemical-mechanical planarization cleaning of semiconductor wafers
US5609657A (en) 1996-02-22 1997-03-11 Showa Denko K.K. Composition for texturing magnetic disk
US5645682A (en) * 1996-05-28 1997-07-08 Micron Technology, Inc. Apparatus and method for conditioning a planarizing substrate used in chemical-mechanical planarization of semiconductor wafers
US5728184A (en) * 1996-06-26 1998-03-17 Minnesota Mining And Manufacturing Company Method for making ceramic materials from boehmite
US5932486A (en) 1996-08-16 1999-08-03 Rodel, Inc. Apparatus and methods for recirculating chemical-mechanical polishing of semiconductor wafers
US5972792A (en) * 1996-10-18 1999-10-26 Micron Technology, Inc. Method for chemical-mechanical planarization of a substrate on a fixed-abrasive polishing pad
US6309560B1 (en) * 1996-12-09 2001-10-30 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper substrates
US5897375A (en) * 1997-10-20 1999-04-27 Motorola, Inc. Chemical mechanical polishing (CMP) slurry for copper and method of use in integrated circuit manufacture

Similar Documents

Publication Publication Date Title
JP2006186381A5 (enExample)
JP2011238952A5 (enExample)
CN1082869C (zh) 含助磨剂的磨料制品及其制造方法
KR101323577B1 (ko) 개선된 탄화규소 입자, 그 제조방법 및 그의 이용 방법
CN102585704B (zh) 化学机械抛光浆料组合物及使用其制造半导体器件的方法
TWI261068B (en) Improved CMP products
WO2010060004A3 (en) Slurry composition for gst phase change memory materials polishing
RU2002107429A (ru) Способ химико-механической планаризации и полученные с его помощью изделия
JP2009084398A5 (enExample)
JP2012501252A5 (enExample)
JP2011521867A5 (enExample)
CN108472786A (zh) 磨料制品
DE50311351D1 (de) Schleifmittel mit verbesserten schleifeigenschaften
TW200305638A (en) Anti-loading treatments
CN113579993B (zh) 一种化学机械抛光垫及其制备方法和应用
JP2008115303A (ja) 研磨工具用樹脂材料及びその製造方法
CN104541361A (zh) 制造半导体装置的方法
JP2005262413A5 (enExample)
CN109571296B (zh) 一种高自锐性的研磨垫
JP2004518543A5 (enExample)
CN112917400B (zh) 高性能复合材料精密抛光研磨砂布及其制备方法
CN109778040B (zh) 一种石墨烯增强预合金基金刚石复合材料及其制备方法
JP2015165001A (ja) 研磨用砥粒とその製造方法と研磨方法と研磨装置とスラリー
CN108611057A (zh) 一种超硬度磁性磨粒及其制备方法
JP6054341B2 (ja) 研磨用砥粒とその製造方法と研磨方法と研磨部材とスラリー