JP2006178498A5 - - Google Patents

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Publication number
JP2006178498A5
JP2006178498A5 JP2006071816A JP2006071816A JP2006178498A5 JP 2006178498 A5 JP2006178498 A5 JP 2006178498A5 JP 2006071816 A JP2006071816 A JP 2006071816A JP 2006071816 A JP2006071816 A JP 2006071816A JP 2006178498 A5 JP2006178498 A5 JP 2006178498A5
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JP
Japan
Prior art keywords
mask
integrated circuit
phase shift
layer
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006071816A
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English (en)
Japanese (ja)
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JP4218972B2 (ja
JP2006178498A (ja
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Publication date
Priority claimed from US09/407,447 external-priority patent/US6335128B1/en
Application filed filed Critical
Publication of JP2006178498A publication Critical patent/JP2006178498A/ja
Publication of JP2006178498A5 publication Critical patent/JP2006178498A5/ja
Application granted granted Critical
Publication of JP4218972B2 publication Critical patent/JP4218972B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2006071816A 1999-09-28 2006-03-15 集積回路の位相シフトおよびトリム・マスクを決定する方法および装置 Expired - Fee Related JP4218972B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/407,447 US6335128B1 (en) 1999-09-28 1999-09-28 Method and apparatus for determining phase shifts and trim masks for an integrated circuit

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2001526664A Division JP3916462B2 (ja) 1999-09-28 2000-07-28 集積回路の位相シフトおよびトリム・マスクを決定する方法および装置

Publications (3)

Publication Number Publication Date
JP2006178498A JP2006178498A (ja) 2006-07-06
JP2006178498A5 true JP2006178498A5 (cg-RX-API-DMAC7.html) 2006-09-07
JP4218972B2 JP4218972B2 (ja) 2009-02-04

Family

ID=23612127

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2001526664A Expired - Fee Related JP3916462B2 (ja) 1999-09-28 2000-07-28 集積回路の位相シフトおよびトリム・マスクを決定する方法および装置
JP2006071816A Expired - Fee Related JP4218972B2 (ja) 1999-09-28 2006-03-15 集積回路の位相シフトおよびトリム・マスクを決定する方法および装置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2001526664A Expired - Fee Related JP3916462B2 (ja) 1999-09-28 2000-07-28 集積回路の位相シフトおよびトリム・マスクを決定する方法および装置

Country Status (8)

Country Link
US (2) US6335128B1 (cg-RX-API-DMAC7.html)
EP (1) EP1218798B1 (cg-RX-API-DMAC7.html)
JP (2) JP3916462B2 (cg-RX-API-DMAC7.html)
KR (1) KR100473197B1 (cg-RX-API-DMAC7.html)
AT (1) ATE343157T1 (cg-RX-API-DMAC7.html)
AU (1) AU6388700A (cg-RX-API-DMAC7.html)
DE (1) DE60031429T2 (cg-RX-API-DMAC7.html)
WO (1) WO2001023961A1 (cg-RX-API-DMAC7.html)

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US6553560B2 (en) * 2001-04-03 2003-04-22 Numerical Technologies, Inc. Alleviating line end shortening in transistor endcaps by extending phase shifters
US6566019B2 (en) 2001-04-03 2003-05-20 Numerical Technologies, Inc. Using double exposure effects during phase shifting to control line end shortening
US6593038B2 (en) 2001-05-04 2003-07-15 Numerical Technologies, Inc. Method and apparatus for reducing color conflicts during trim generation for phase shifters
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KR100498442B1 (ko) * 2001-05-23 2005-07-01 삼성전자주식회사 광 마스크 세트 및 그의 제조 방법
US6721938B2 (en) 2001-06-08 2004-04-13 Numerical Technologies, Inc. Optical proximity correction for phase shifting photolithographic masks
US6852471B2 (en) * 2001-06-08 2005-02-08 Numerical Technologies, Inc. Exposure control for phase shifting photolithographic masks
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US7178128B2 (en) * 2001-07-13 2007-02-13 Synopsys Inc. Alternating phase shift mask design conflict resolution
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US6738958B2 (en) 2001-09-10 2004-05-18 Numerical Technologies, Inc. Modifying a hierarchical representation of a circuit to process composite gates
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