JP2006078501A - 熱処理システムの赤外パイロメータの校正装置 - Google Patents
熱処理システムの赤外パイロメータの校正装置 Download PDFInfo
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- G—PHYSICS
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/52—Radiation pyrometry, e.g. infrared or optical thermometry using comparison with reference sources, e.g. disappearing-filament pyrometer
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/52—Radiation pyrometry, e.g. infrared or optical thermometry using comparison with reference sources, e.g. disappearing-filament pyrometer
- G01J5/53—Reference sources, e.g. standard lamps; Black bodies
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/80—Calibration
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Abstract
【解決手段】 本発明の熱処理チャンバのための温度プローブの校正のための装置は、強度が安定した光源を有し、この光源がファイバ光ガイドの第1の端部に光学的に結合して校正中はファイバ光ガイドの第2の端部を通して光を発することを特徴とする。ファイバ光ガイドを温度プローブの入力端に調心するために、調心機構が用いられる。この調心機構は第1の調心構造体を有し、これはチャンバ内の対応する第1の調心部に係合する。
【選択図】 図1
Description
本発明は、熱処理システムで用いられるパイロメータの校正に関する。
急速熱処理法(RTP:rapid thermal processing)においては、アニール、クリーニング、CVD、酸化や窒化硬化法のような処理ステップの実行のために、基板は高温に、例えば1200℃に加熱される。特に現在のデバイスのサブミクロンの寸法を与えられて、高い歩どまりと処理加工した信頼性を得るために、基板の温度は精密にこれらの熱処理ステップの間、制御されなければならない。例えば、現在のデバイス構造において要求されるように、誘電体層60-80オングストローム厚の誘電層を±2オングストロームの均一性で組み立てるためには、連続処理運転中の温度は、その標的とする温度から数℃を越えて変化してはならない。温度調節のこのレベルをなしとげるために、その基板の温度は、リアルタイムにかつインシチュウに測定される。
しかしながら、この方法は、欠点を有している。基板の実際の温度が熱電対で測定された温度とは異なる場合が実際に生じている。第1に、埋め込み電極及びセラミック材料により、熱伝対を有する領域がウエハ以外の部分とは異なる温度を有することが生じ、すなわちこれにより基板温度プロファイルを妨害する。第2に、高温(例えば、RTPプロセスで一般的に用いられる1000℃)では、ウエハと熱電対の間のジョイントは劣化し易く、そのため、熱電対を4〜5回用いた後には、読み取りの信頼性がなくなってしまう。これらの短所のため、この校正技術では、10〜15℃を越えるパイロメータ精度を真正に保証することは不可能である。
概説的に且つ1つの側面としては、本発明は熱処理チャンバのための温度プローブの校正のための装置である。この装置は、強度が安定した光源を有し、校正中はこの光源がファイバ光ガイドの第1の端部に光学的に結合してファイバ光ガイドの第2の端部を通して光を発することを特徴とする。ファイバ光ガイドを温度プローブの入力端に調心するために、調心機構が用いられる。この調心機構は第1の調心構造体を有し、これはチャンバ内の対応する第1の調心部(alignmentfeature)に係合する。
RTPシステム内のパイロメータを校正するために用いられるパイロメータ校正装置の詳細を記述する前に、校正されるべきパイロメータを有するRTPシステムについて説明する。図1及び2に示されるように、RTPシステムは、ディスク形状の直径8インチ(200mm)シリコン基板10の処理のための処理チャンバ60を有している。基板10は、基板支持構造体62によりチャンバ60の内部に保持され、基板の真上に配置される加熱要素70(例えばタングステンハロゲンランプアレイ)により加熱される。加熱要素70により放射が生じ、これが基板10の上約10インチに配置されるクオーツウインドウ72を介してチャンバ60の中に進入する。ステンレスのベース65の上に設置されている反射板20が、基板10の下にある。反射板20はアルミニウム製であり、反射性の高い表面コーティング24(例えば金合金)を有している。基板10の下側と反射板20の頂部とが、反射キャビティ30を形成し、これにより基板がより理想黒体に近づくようになり、すなわち基板に対する有効放射率を増加させる。
以上詳細に説明したように、本発明により、埋め込み熱電対を有するウエハを用いずとも、パイロメータを正確に校正することができ、また、校正の操作を更に容易に且つエネルギー消費が少なく行うことができる。
Claims (8)
- 熱処理チャンバの温度プローブを校正するための装置であって、
a)安定した強度を有する光源と、
b)ファイバ光ガイドであって、校正中に前記光源が前記ファイバ光ガイドの第1の端部に光学的に結合して前記ファイバ光ガイドの第2の端部を通して光を発する、前記ファイバ光ガイドと、
c)前記ファイバ光ガイドの前記第2の端部を前記温度プローブの入力端に調心するための調心機構であって、前記調心機構は、前記チャンバの対応する第1の調心部に係合する第1の調心構造体を有する、前記調心機構と、
を備える装置。 - 前記ファイバ光ガイドがツイストファイババンドルを有する、請求項1に記載の装置。
- 更にキャビティ内に光装置を備え、前記光源が前記キャビティ内に配置される、請求項1に記載の装置。
- 前記ファイバ光ガイドが前記光装置に接続し、前記光源が前記キャビティ内に配置され前記ファイバ光ガイドの第1の端部を通して光を発する、請求項3に記載の装置。
- 前記調心機構が、前記ファイバ光ガイドの第2の端部に接続する第1の調心具と、前記第1の調心構造体を有する第2の調心具とを有し、前記第1の調心具は、前記第2の調心具の対応する第2の調心部に係合する第2の調心構造体を有する、請求項1に記載の装置。
- 前記第2の調心部が環状リップを有する導管を備え、前記第2の調心構造体が前記環状リップを把持するステップを前記第1の調心部の外面に備える、請求項5に記載の装置。
- 前記第2の調心具がディスクを備え、前記第2の調心具が前記ディスクの中を通る導管を備える、請求項6に記載の装置。
- 前記第1の調心構造体が前記ディスクの底部から複数の突出部を備え、前記突出部は前記チャンバ内で反射板の複数のリフトピン穴にフィットするようになる、請求項7に記載の装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/623,433 US5762419A (en) | 1995-07-26 | 1996-03-28 | Method and apparatus for infrared pyrometer calibration in a thermal processing system |
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Application Number | Title | Priority Date | Filing Date |
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JP9078523A Division JPH1026557A (ja) | 1996-03-28 | 1997-03-28 | 熱処理システムの赤外パイロメータの校正方法及び装置 |
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JP2006078501A true JP2006078501A (ja) | 2006-03-23 |
JP4226593B2 JP4226593B2 (ja) | 2009-02-18 |
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JP9078523A Pending JPH1026557A (ja) | 1996-03-28 | 1997-03-28 | 熱処理システムの赤外パイロメータの校正方法及び装置 |
JP2005353499A Expired - Lifetime JP4226593B2 (ja) | 1996-03-28 | 2005-12-07 | 熱処理システムの赤外パイロメータの校正装置 |
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JP9078523A Pending JPH1026557A (ja) | 1996-03-28 | 1997-03-28 | 熱処理システムの赤外パイロメータの校正方法及び装置 |
Country Status (5)
Country | Link |
---|---|
US (3) | US5762419A (ja) |
EP (1) | EP0798547B1 (ja) |
JP (2) | JPH1026557A (ja) |
KR (1) | KR100512191B1 (ja) |
DE (1) | DE69730639T2 (ja) |
Families Citing this family (73)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5762419A (en) * | 1995-07-26 | 1998-06-09 | Applied Materials, Inc. | Method and apparatus for infrared pyrometer calibration in a thermal processing system |
US6179465B1 (en) * | 1996-03-28 | 2001-01-30 | Applied Materials, Inc. | Method and apparatus for infrared pyrometer calibration in a thermal processing system using multiple light sources |
GB2313189B (en) * | 1996-05-17 | 2000-11-01 | Rotadata Ltd | Pyrometer apparatus and method |
KR100266328B1 (ko) * | 1997-12-23 | 2000-10-02 | 김규현 | 티타늄실리사이드형성방법및이를이용한티타늄실리사이드의형성온도보정방법 |
US20040201988A1 (en) * | 1999-02-12 | 2004-10-14 | Fiber Optic Designs, Inc. | LED light string and arrays with improved harmonics and optimized power utilization |
US7066628B2 (en) * | 2001-03-29 | 2006-06-27 | Fiber Optic Designs, Inc. | Jacketed LED assemblies and light strings containing same |
US6461019B1 (en) | 1998-08-28 | 2002-10-08 | Fiber Optic Designs, Inc. | Preferred embodiment to LED light string |
US6072280A (en) * | 1998-08-28 | 2000-06-06 | Fiber Optic Designs, Inc. | Led light string employing series-parallel block coupling |
US6354733B2 (en) | 1999-01-15 | 2002-03-12 | Ametex, Inc. | System and method for determining combustion temperature using infrared emissions |
WO2000041512A2 (en) * | 1999-01-15 | 2000-07-20 | Ametek Aerospace Products, Inc. | System and method for determining combustion temperature using infrared emissions |
US6370486B1 (en) | 1999-01-15 | 2002-04-09 | En'urga Inc. | System and method for determining combustion temperature using infrared emissions |
US7931390B2 (en) * | 1999-02-12 | 2011-04-26 | Fiber Optic Designs, Inc. | Jacketed LED assemblies and light strings containing same |
TW376990U (en) * | 1999-02-25 | 1999-12-11 | Ind Tech Res Inst | Calibrator for contact and non-contact thermoneter |
IL134908A (en) | 1999-03-08 | 2003-12-10 | C I Systems Ltd | Active pyrometry with emissivity extrapolation and compensation |
US6293696B1 (en) * | 1999-05-03 | 2001-09-25 | Steag Rtp Systems, Inc. | System and process for calibrating pyrometers in thermal processing chambers |
US6151446A (en) * | 1999-07-06 | 2000-11-21 | Applied Materials, Inc. | Apparatus and method for thermally processing substrates including a processor using multiple detection signals |
US6353210B1 (en) * | 2000-04-11 | 2002-03-05 | Applied Materials Inc. | Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using and in-situ wafer temperature optical probe |
US6816803B1 (en) * | 2000-06-02 | 2004-11-09 | Exactus, Inc. | Method of optical pyrometry that is independent of emissivity and radiation transmission losses |
US6647350B1 (en) * | 2000-06-02 | 2003-11-11 | Exactus, Inc. | Radiometric temperature measurement system |
US6572265B1 (en) * | 2001-04-20 | 2003-06-03 | Luxtron Corporation | In situ optical surface temperature measuring techniques and devices |
US7080940B2 (en) * | 2001-04-20 | 2006-07-25 | Luxtron Corporation | In situ optical surface temperature measuring techniques and devices |
US6987240B2 (en) * | 2002-04-18 | 2006-01-17 | Applied Materials, Inc. | Thermal flux processing by scanning |
US7084392B2 (en) | 2002-06-04 | 2006-08-01 | Baker Hughes Incorporated | Method and apparatus for a downhole fluorescence spectrometer |
US20030223068A1 (en) * | 2002-06-04 | 2003-12-04 | Baker Hughes Incorporated | Method and apparatus for a high resolution downhole spectrometer |
US6835914B2 (en) | 2002-11-05 | 2004-12-28 | Mattson Technology, Inc. | Apparatus and method for reducing stray light in substrate processing chambers |
CN100404343C (zh) * | 2003-05-14 | 2008-07-23 | 通用电气公司 | 用于时相恒定的红外能量差源的方法和装置 |
US20060098440A1 (en) * | 2004-11-05 | 2006-05-11 | David Allen | Solid state lighting device with improved thermal management, improved power management, adjustable intensity, and interchangable lenses |
US7850361B2 (en) * | 2004-11-10 | 2010-12-14 | 1 Energy Solutions, Inc. | Removable LED lamp holder |
US7850362B2 (en) | 2004-11-10 | 2010-12-14 | 1 Energy Solutions, Inc. | Removable LED lamp holder with socket |
US7275861B2 (en) * | 2005-01-31 | 2007-10-02 | Veeco Instruments Inc. | Calibration wafer and method of calibrating in situ temperatures |
US8016440B2 (en) | 2005-02-14 | 2011-09-13 | 1 Energy Solutions, Inc. | Interchangeable LED bulbs |
DE102005018124B4 (de) * | 2005-04-20 | 2007-06-28 | Barke, Woldemar, Dipl.-Phys. Ing. | Verfahren und Vorrichtung zur berührungslosen gleichzeitigen Bestimmung von Temperatur und Emissionsgrad eines Meßobjekts |
US20070025109A1 (en) | 2005-07-26 | 2007-02-01 | Yu Jing J | C7, C9 LED bulb and embedded PCB circuit board |
US8107812B2 (en) * | 2005-09-23 | 2012-01-31 | Honeywell International Inc. | Dynamic range measurement and calculation of optical keyless entry sensor |
US7265496B2 (en) * | 2005-09-23 | 2007-09-04 | Fiber Optic Designs, Inc. | Junction circuit for LED lighting chain |
KR100681693B1 (ko) * | 2005-10-21 | 2007-02-09 | 재단법인 포항산업과학연구원 | 방사온도 계측기용 광학적 외란차단 시스템 및 방법 |
US7276858B2 (en) * | 2005-10-28 | 2007-10-02 | Fiber Optic Designs, Inc. | Decorative lighting string with stacked rectification |
US7250730B1 (en) * | 2006-01-17 | 2007-07-31 | Fiber Optic Designs, Inc. | Unique lighting string rectification |
US8083393B2 (en) | 2006-02-09 | 2011-12-27 | 1 Energy Solutions, Inc. | Substantially inseparable LED lamp assembly |
US7963670B2 (en) * | 2006-07-31 | 2011-06-21 | 1 Energy Solutions, Inc. | Bypass components in series wired LED light strings |
US20080025024A1 (en) * | 2006-07-31 | 2008-01-31 | Jingjing Yu | Parallel-series led light string |
US8474468B2 (en) * | 2006-09-30 | 2013-07-02 | Tokyo Electron Limited | Apparatus and method for thermally processing a substrate with a heated liquid |
US8513626B2 (en) * | 2007-01-12 | 2013-08-20 | Applied Materials, Inc. | Method and apparatus for reducing patterning effects on a substrate during radiation-based heating |
US7946759B2 (en) * | 2007-02-16 | 2011-05-24 | Applied Materials, Inc. | Substrate temperature measurement by infrared transmission |
US7665917B2 (en) * | 2007-03-30 | 2010-02-23 | Tokyo Electron Limited | Heat treatment apparatus and methods for thermally processing a substrate using a pressurized gaseous environment |
US9383138B2 (en) * | 2007-03-30 | 2016-07-05 | Tokyo Electron Limited | Methods and heat treatment apparatus for uniformly heating a substrate during a bake process |
US20080241400A1 (en) * | 2007-03-31 | 2008-10-02 | Tokyo Electron Limited | Vacuum assist method and system for reducing intermixing of lithography layers |
US7784993B2 (en) * | 2007-07-13 | 2010-08-31 | 1 Energy Solutions, Inc. | Watertight LED lamp |
DE102007035609B4 (de) * | 2007-07-30 | 2021-09-16 | Ivoclar Vivadent Ag | Verfahren zur optischen Kontrolle des Verlaufs von einem auf einer Oberfläche eines Körpers erfolgenden physikalischen und/oder chemischen Prozesses |
US20090034582A1 (en) * | 2007-08-02 | 2009-02-05 | Tokyo Electron Limited Tbs Broadcast Center | Apparatus for hot plate substrate monitoring and control |
KR100914894B1 (ko) * | 2007-08-27 | 2009-08-31 | 주훈 | 열상 카메라의 자동 온도보정 시스템 및 방법 |
US8376606B2 (en) * | 2008-04-08 | 2013-02-19 | 1 Energy Solutions, Inc. | Water resistant and replaceable LED lamps for light strings |
US7883261B2 (en) | 2008-04-08 | 2011-02-08 | 1 Energy Solutions, Inc. | Water-resistant and replaceable LED lamps |
US8452166B2 (en) * | 2008-07-01 | 2013-05-28 | Applied Materials, Inc. | Apparatus and method for measuring radiation energy during thermal processing |
US8314564B2 (en) * | 2008-11-04 | 2012-11-20 | 1 Energy Solutions, Inc. | Capacitive full-wave circuit for LED light strings |
CN201391793Y (zh) * | 2009-04-20 | 2010-01-27 | 喻北京 | Led灯泡的新型散热结构 |
US8836224B2 (en) | 2009-08-26 | 2014-09-16 | 1 Energy Solutions, Inc. | Compact converter plug for LED light strings |
EP2360291A1 (de) * | 2010-02-24 | 2011-08-24 | Singulus Technologies AG | Verfahren und Vorrichtung zum schnellen Heizen und Kühlen eines Substrates und sofort anschließender Beschichtung desselben unter Vakuum |
CA2740372C (en) * | 2010-06-01 | 2019-07-02 | Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Industry Through The Communications Research Centre Canada | Method and system for measuring a parameter in a high temperature environment using an optical sensor |
CA2802961C (en) * | 2010-06-19 | 2018-06-12 | Perimetrics, Llc | System and method for determining structural characteristics of an object |
US9028135B1 (en) | 2012-01-12 | 2015-05-12 | United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Pyrometer |
CN103076114B (zh) * | 2013-01-05 | 2014-07-16 | 中国计量学院 | 分布式光纤温度传感器的温度校准用光纤环固定机构 |
TWI624903B (zh) | 2013-03-15 | 2018-05-21 | 應用材料股份有限公司 | 在雜訊環境中之現場溫度測量 |
EP3023757B1 (en) * | 2014-11-21 | 2019-04-03 | SLM Solutions Group AG | Pyrometric detection device, method for calibrating the same, and apparatus for producing three-dimensional work pieces |
DE102015100908A1 (de) | 2015-01-22 | 2016-07-28 | Von Ardenne Gmbh | Verfahren und Vorrichtung zur Temperaturmessung eines Substrats |
CN105547502A (zh) * | 2016-02-19 | 2016-05-04 | 河北智康通信技术有限公司 | 光纤高温探测器陶瓷护套 |
SG10201705708YA (en) * | 2017-05-26 | 2018-12-28 | Applied Materials Inc | Detector for low temperature transmission pyrometry |
RU2700338C1 (ru) * | 2018-12-18 | 2019-09-16 | Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт метрологии им. Д.И. Менделеева" | Способ градуировки пирометра излучения и измерения температуры объекта |
WO2020154245A1 (en) * | 2019-01-22 | 2020-07-30 | Georgia Tech Research Corporation | Microscale in-situ imaging of dynamic temperature and deformation fields |
DE102019207663A1 (de) * | 2019-05-24 | 2020-11-26 | Ers Electronic Gmbh | Kalibrierungsanordnung und entsprechendes Kalibrierungsverfahren |
EP3756791A1 (de) * | 2019-06-24 | 2020-12-30 | ThetaScan GmbH | Messgerät und kalibrierverfahren zur qualitätssicherung und standardisierung in additiven fertigungsprozessen |
CN110708786A (zh) * | 2019-09-10 | 2020-01-17 | 柳州钢铁股份有限公司 | 低电压驱动的节能型电子活套测试棒 |
TW202424481A (zh) * | 2022-12-14 | 2024-06-16 | 美商Mks儀器公司 | 氣體濃度感測器及其使用方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5434285A (en) * | 1977-08-22 | 1979-03-13 | Jeol Ltd | Black body furnace for temperature calibration |
JPS5599035A (en) * | 1979-01-25 | 1980-07-28 | Nippon Steel Corp | Method and apparatus for calibrating radiation thermometer |
GB2056669B (en) * | 1979-07-04 | 1984-02-29 | Spectronix Ltd | Calibrating radiation sensors |
JPS5649929A (en) * | 1979-09-29 | 1981-05-06 | Yokogawa Hokushin Electric Corp | Inspecting method for precision of radiation rate correcting circuit of radiation thermometer |
JPS57131027A (en) * | 1981-02-06 | 1982-08-13 | Shisaka Kenkyusho:Kk | Black body furnace |
US4387301A (en) * | 1981-04-20 | 1983-06-07 | Hughes Aircraft Company | Target for calibrating and testing infrared detection devices |
GB2101306B (en) * | 1981-06-09 | 1984-08-30 | Land Pyrometers Ltd | Output level check means for pyrometers |
US4544418A (en) * | 1984-04-16 | 1985-10-01 | Gibbons James F | Process for high temperature surface reactions in semiconductor material |
JPS622236A (ja) | 1985-06-27 | 1987-01-08 | Minolta Camera Co Ltd | プレビユ−機構を有するカメラシステム |
JPS6222036A (ja) * | 1985-07-22 | 1987-01-30 | Furukawa Electric Co Ltd:The | 光フアイバ放射温度計の校正方法 |
US4885463A (en) * | 1988-08-29 | 1989-12-05 | Santa Barbara Research Center | Method and apparatus for testing infrared detectors |
US5011296A (en) * | 1989-01-12 | 1991-04-30 | Square D Company | Method of using infrared thermometer with remote fiber optic pickup |
US4919505A (en) * | 1989-01-12 | 1990-04-24 | Square D Company | Infrared thermometer with fiber optic remote pickup |
US5155336A (en) * | 1990-01-19 | 1992-10-13 | Applied Materials, Inc. | Rapid thermal heating apparatus and method |
US5265957A (en) * | 1992-08-11 | 1993-11-30 | Texas Instruments Incorporated | Wireless temperature calibration device and method |
US5324937A (en) * | 1993-01-21 | 1994-06-28 | Hughes Aircraft Company | Target for calibrating and testing infrared devices |
US5660472A (en) * | 1994-12-19 | 1997-08-26 | Applied Materials, Inc. | Method and apparatus for measuring substrate temperatures |
US5820261A (en) * | 1995-07-26 | 1998-10-13 | Applied Materials, Inc. | Method and apparatus for infrared pyrometer calibration in a rapid thermal processing system |
US5762419A (en) * | 1995-07-26 | 1998-06-09 | Applied Materials, Inc. | Method and apparatus for infrared pyrometer calibration in a thermal processing system |
US5806978A (en) * | 1996-11-21 | 1998-09-15 | International Business Machines Corporation | Calibration apparatus and methods for a thermal proximity sensor |
JP6626790B2 (ja) * | 2016-06-28 | 2019-12-25 | 株式会社不二工機 | 可変容量型圧縮機用制御弁 |
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DE69730639D1 (de) | 2004-10-21 |
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EP0798547B1 (en) | 2004-09-15 |
JPH1026557A (ja) | 1998-01-27 |
US5762419A (en) | 1998-06-09 |
US6345909B1 (en) | 2002-02-12 |
EP0798547A3 (en) | 1998-03-04 |
KR970065738A (ko) | 1997-10-13 |
DE69730639T2 (de) | 2005-09-22 |
US6056433A (en) | 2000-05-02 |
KR100512191B1 (ko) | 2005-10-21 |
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