JP4545812B2 - 複数の光源を用いたパイロメータの校正 - Google Patents
複数の光源を用いたパイロメータの校正 Download PDFInfo
- Publication number
- JP4545812B2 JP4545812B2 JP2008288168A JP2008288168A JP4545812B2 JP 4545812 B2 JP4545812 B2 JP 4545812B2 JP 2008288168 A JP2008288168 A JP 2008288168A JP 2008288168 A JP2008288168 A JP 2008288168A JP 4545812 B2 JP4545812 B2 JP 4545812B2
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- Prior art keywords
- light
- light source
- temperature
- calibration
- wavelength
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 239000000523 sample Substances 0.000 claims abstract description 45
- 239000000758 substrate Substances 0.000 claims description 41
- 239000013307 optical fiber Substances 0.000 claims description 19
- 230000005457 Black-body radiation Effects 0.000 claims description 12
- 238000012545 processing Methods 0.000 claims description 7
- 230000007246 mechanism Effects 0.000 claims description 5
- 230000005855 radiation Effects 0.000 description 29
- 230000003287 optical effect Effects 0.000 description 15
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- 239000010980 sapphire Substances 0.000 description 7
- 230000036760 body temperature Effects 0.000 description 6
- 239000010453 quartz Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000001228 spectrum Methods 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000011065 in-situ storage Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000013461 design Methods 0.000 description 4
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
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- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000009529 body temperature measurement Methods 0.000 description 2
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- 238000002834 transmittance Methods 0.000 description 2
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 238000004616 Pyrometry Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
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- 239000003353 gold alloy Substances 0.000 description 1
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Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/52—Radiation pyrometry, e.g. infrared or optical thermometry using comparison with reference sources, e.g. disappearing-filament pyrometer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/52—Radiation pyrometry, e.g. infrared or optical thermometry using comparison with reference sources, e.g. disappearing-filament pyrometer
- G01J5/53—Reference sources, e.g. standard lamps; Black bodies
Description
R(τ)=R1(τ)+K*R2(τ)
ここでR1(τ)及びR2(τ)はそれぞれ、2つの光源の一方のスペクトル応答であり、τは波長であり、Kは強度係数である。Kの値を適切に選ぶことにより、校正機器のスペクトル出力を所定の温度で黒体に疑似させることができる。
Claims (10)
- 基板の温度を測定する温度プローブを校正するための装置であって、
a)第1のバンド幅と第1の波長の強度ピークとを有する光を発する第1の光源と、
b)前記第1のバンド幅と一部がオーバーラップする第2のバンド幅を有すると共に、前記第1の波長の強度ピークとは異なる第2の波長の強度ピークを有する光を発する第2の光源と、
c)前記第1の光源と前記第2の光源とに光学的に結合する発光領域と、
d)前記第1の光源及び前記第2の光源の相対強度を制御するために使用される第1及び第2のドライバと、を備え、
前記第1及び第2のドライバは、前記発光領域からの全放射光が所定の温度における黒体放射に所定の波長範囲で一致するように、前記相対強度を所定の温度における黒体放射として予測される比に少なくとも2つの異なる波長において設定し、前記2つの異なる波長のうち一の波長は、前記第1のバンド幅のほぼ外にあるように選択され、前記2つの異なる波長のうち他の波長は、前記第1及び第2のバンド幅がオーバーラップしている領域内になるように選択される装置。 - 基板の温度を測定する温度プローブを校正するための装置であって、
a)第1のバンド幅と第1の波長の強度ピークとを有する光を発する第1の光源と、
b)前記第1のバンド幅とオーバーラップしない第2のバンド幅を有すると共に、前記第1の波長の強度ピークとは異なる第2の波長の強度ピークを有する光を発する第2の光源と、
c)前記第1の光源と前記第2の光源とに光学的に結合する発光領域と、
d)前記第1の光源及び前記第2の光源の相対強度を制御するために使用される第1及び第2のドライバと、を備え、
前記第1及び第2のドライバは、前記発光領域からの全放射光が所定の温度における黒体放射に所定の波長範囲で一致するように、前記相対強度を所定の温度における黒体放射として予測される比に少なくとも2つの異なる波長において設定し、前記2つの異なる波長は、前記第1及び第2の光源の規格化強度がほぼ等しくなるように選択される装置。 - 前記発光領域を温度プローブの入力端にアラインメントするためのアラインメント機構を更に備える請求項1又は2に記載の装置。
- 前記アラインメント機構が、アラインメント構造体を更に備え、前記アラインメント構造体は、対応する熱処理チャンバのアラインメント部に係合する請求項3に記載の装置。
- 前記アラインメント機構が、温度プローブの入力端に係合するアラインメント構造体を更に備える請求項3に記載の装置。
- 前記第1の光源と前記第2の光源がそれぞれ、ガウス分布の光強度分布を有する光を発する請求項1又は2に記載の装置。
- 前記第1の光源と前記第2の光源がLEDを備える請求項1又は2に記載の装置。
- 前記所定の波長範囲が赤外域にある請求項1又は2に記載の装置。
- 前記発光領域が、光ファイバの表面である請求項1又は2に記載の装置。
- 前記発光領域が、前記第1の光源と前記第2の光源を囲む構造にあるアパーチャである請求項1又は2に記載の装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/861,519 US6179465B1 (en) | 1996-03-28 | 1997-05-22 | Method and apparatus for infrared pyrometer calibration in a thermal processing system using multiple light sources |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55039798A Division JP4245669B2 (ja) | 1997-05-22 | 1998-05-07 | 複数の光源を用いたパイロメータの校正 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009042248A JP2009042248A (ja) | 2009-02-26 |
JP4545812B2 true JP4545812B2 (ja) | 2010-09-15 |
Family
ID=25336028
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55039798A Expired - Lifetime JP4245669B2 (ja) | 1997-05-22 | 1998-05-07 | 複数の光源を用いたパイロメータの校正 |
JP2008288168A Expired - Lifetime JP4545812B2 (ja) | 1997-05-22 | 2008-11-10 | 複数の光源を用いたパイロメータの校正 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55039798A Expired - Lifetime JP4245669B2 (ja) | 1997-05-22 | 1998-05-07 | 複数の光源を用いたパイロメータの校正 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6179465B1 (ja) |
EP (1) | EP0916078B1 (ja) |
JP (2) | JP4245669B2 (ja) |
KR (1) | KR100523786B1 (ja) |
AT (1) | ATE279717T1 (ja) |
DE (1) | DE69826961T2 (ja) |
WO (1) | WO1998053286A1 (ja) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2987459B1 (ja) * | 1998-12-11 | 1999-12-06 | 工業技術院長 | 温度定点るつぼ、温度定点装置及び温度計校正方法 |
US6852986B1 (en) * | 1999-11-12 | 2005-02-08 | E. I. Du Pont De Nemours And Company | Fluorometer with low heat-generating light source |
US6375350B1 (en) * | 2000-08-08 | 2002-04-23 | Quantum Logic Corp | Range pyrometer |
TW476502U (en) * | 2000-11-07 | 2002-02-11 | Ind Tech Res Inst | Blackbody furnace |
US6849831B2 (en) * | 2002-03-29 | 2005-02-01 | Mattson Technology, Inc. | Pulsed processing semiconductor heating methods using combinations of heating sources |
US6987240B2 (en) * | 2002-04-18 | 2006-01-17 | Applied Materials, Inc. | Thermal flux processing by scanning |
US7223660B2 (en) * | 2002-07-31 | 2007-05-29 | Intel Corporation | Flash assisted annealing |
US6695886B1 (en) * | 2002-08-22 | 2004-02-24 | Axcelis Technologies, Inc. | Optical path improvement, focus length change compensation, and stray light reduction for temperature measurement system of RTP tool |
JP2004205487A (ja) | 2002-11-01 | 2004-07-22 | Tokyo Electron Ltd | プローブカードの固定機構 |
US6835914B2 (en) | 2002-11-05 | 2004-12-28 | Mattson Technology, Inc. | Apparatus and method for reducing stray light in substrate processing chambers |
CN100404343C (zh) * | 2003-05-14 | 2008-07-23 | 通用电气公司 | 用于时相恒定的红外能量差源的方法和装置 |
US8658945B2 (en) * | 2004-02-27 | 2014-02-25 | Applied Materials, Inc. | Backside rapid thermal processing of patterned wafers |
US20050214445A1 (en) * | 2004-03-29 | 2005-09-29 | Tokyo Electron Limited | Method and processing system for determining coating status of a ceramic substrate heater |
US7628507B2 (en) * | 2004-06-04 | 2009-12-08 | The United States of America as represented by the Secretary of Commerce, the National Institute of Standards and Technology | Radiance output and temperature controlled LED radiance source |
US8452166B2 (en) * | 2008-07-01 | 2013-05-28 | Applied Materials, Inc. | Apparatus and method for measuring radiation energy during thermal processing |
US8282273B2 (en) * | 2009-03-24 | 2012-10-09 | K-Space Associates, Inc. | Blackbody fitting for temperature determination |
DE102009022611B4 (de) * | 2009-05-26 | 2012-03-08 | Instrument Systems Optische Messtechnik Gmbh | Kalibrierstrahlungsquelle |
DE102009053504B3 (de) * | 2009-11-16 | 2011-07-07 | Sunfilm AG, 01900 | Verfahren und Vorrichtung zur Bestimmung der Quanteneffizienz einer Solarzelle |
EP2660574A1 (en) * | 2012-05-04 | 2013-11-06 | LayTec AG | Flat light emitting plate for simulating thermal radiation, method for calibrating a pyrometer and method for determining the temperature of a semiconducting wafer |
KR101389003B1 (ko) * | 2013-02-05 | 2014-04-24 | 에이피시스템 주식회사 | 온도측정 파이로미터의 교정 장치 |
US9410849B2 (en) * | 2014-01-21 | 2016-08-09 | Kidde Technologies, Inc. | Apparatuses, systems, and methods controlling testing optical fire detectors |
EP3023757B1 (en) * | 2014-11-21 | 2019-04-03 | SLM Solutions Group AG | Pyrometric detection device, method for calibrating the same, and apparatus for producing three-dimensional work pieces |
DE102014117388A1 (de) | 2014-11-27 | 2016-06-02 | Aixtron Se | Verfahren zum Kalibrieren einer Pyrometeranordnung eines CVD- oder PVD-Reaktors |
US10564039B2 (en) * | 2017-09-26 | 2020-02-18 | Lawrence Livermore National Security, Llc | System and method for portable multi-band black body simulator |
US11551950B2 (en) * | 2017-11-28 | 2023-01-10 | Evatec Ag | Substrate processing apparatus and method of processing a substrate and of manufacturing a processed workpiece |
US20220228924A1 (en) * | 2019-05-31 | 2022-07-21 | Ebara Corporation | Method of calibrating radiation thermometer and system thereof |
JP7328931B2 (ja) | 2019-05-31 | 2023-08-17 | 株式会社荏原製作所 | 放射温度計を較正する方法、およびシステム |
CN116504685B (zh) * | 2023-06-28 | 2023-09-15 | 盛吉盛半导体科技(北京)有限公司 | 一种红外测温探头校准装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2101306A (en) * | 1981-06-09 | 1983-01-12 | Land Pyrometers Ltd | Output level check means for pyrometers |
US5623149A (en) * | 1995-02-14 | 1997-04-22 | The Aerospace Corporation | High fidelity dual source solar simulator |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5434285A (en) | 1977-08-22 | 1979-03-13 | Jeol Ltd | Black body furnace for temperature calibration |
JPS5599035A (en) | 1979-01-25 | 1980-07-28 | Nippon Steel Corp | Method and apparatus for calibrating radiation thermometer |
GB2056669B (en) | 1979-07-04 | 1984-02-29 | Spectronix Ltd | Calibrating radiation sensors |
US4286327A (en) * | 1979-09-10 | 1981-08-25 | Trebor Industries, Inc. | Apparatus for near infrared quantitative analysis |
JPS5649929A (en) | 1979-09-29 | 1981-05-06 | Yokogawa Hokushin Electric Corp | Inspecting method for precision of radiation rate correcting circuit of radiation thermometer |
JPS57131027A (en) | 1981-02-06 | 1982-08-13 | Shisaka Kenkyusho:Kk | Black body furnace |
JPS60163325U (ja) * | 1984-04-10 | 1985-10-30 | 横河電機株式会社 | 放射温度計用の校正光源装置 |
US4544418A (en) | 1984-04-16 | 1985-10-01 | Gibbons James F | Process for high temperature surface reactions in semiconductor material |
US4627008A (en) * | 1984-04-25 | 1986-12-02 | Trebor Industries, Inc. | Optical quantitative analysis using curvilinear interpolation |
JPS61105831U (ja) * | 1984-12-19 | 1986-07-05 | ||
JPS6222036A (ja) | 1985-07-22 | 1987-01-30 | Furukawa Electric Co Ltd:The | 光フアイバ放射温度計の校正方法 |
US5155336A (en) | 1990-01-19 | 1992-10-13 | Applied Materials, Inc. | Rapid thermal heating apparatus and method |
US5134302A (en) * | 1990-09-26 | 1992-07-28 | Futrex, Inc. | Method and means for generating synthetic spectra allowing quantitative measurement in near infrared measuring instruments |
US5324979A (en) * | 1990-09-26 | 1994-06-28 | Futrex, Inc. | Method and means for generating synthetic spectra allowing quantitative measurement in near infrared measuring instruments |
US5217285A (en) | 1991-03-15 | 1993-06-08 | The United States Of America As Represented By United States Department Of Energy | Apparatus for synthesis of a solar spectrum |
US5265957A (en) | 1992-08-11 | 1993-11-30 | Texas Instruments Incorporated | Wireless temperature calibration device and method |
US5324937A (en) | 1993-01-21 | 1994-06-28 | Hughes Aircraft Company | Target for calibrating and testing infrared devices |
US5448082A (en) | 1994-09-27 | 1995-09-05 | Opto Diode Corporation | Light emitting diode for use as an efficient emitter or detector of light at a common wavelength and method for forming the same |
US5660472A (en) | 1994-12-19 | 1997-08-26 | Applied Materials, Inc. | Method and apparatus for measuring substrate temperatures |
US5820261A (en) * | 1995-07-26 | 1998-10-13 | Applied Materials, Inc. | Method and apparatus for infrared pyrometer calibration in a rapid thermal processing system |
US5762419A (en) | 1995-07-26 | 1998-06-09 | Applied Materials, Inc. | Method and apparatus for infrared pyrometer calibration in a thermal processing system |
US5608213A (en) * | 1995-11-03 | 1997-03-04 | The United States Of America As Represented By The Secretary Of The Air Force | Spectral distribution emulation |
-
1997
- 1997-05-22 US US08/861,519 patent/US6179465B1/en not_active Expired - Lifetime
-
1998
- 1998-05-07 DE DE69826961T patent/DE69826961T2/de not_active Expired - Fee Related
- 1998-05-07 AT AT98920959T patent/ATE279717T1/de not_active IP Right Cessation
- 1998-05-07 WO PCT/US1998/009032 patent/WO1998053286A1/en active IP Right Grant
- 1998-05-07 JP JP55039798A patent/JP4245669B2/ja not_active Expired - Lifetime
- 1998-05-07 EP EP98920959A patent/EP0916078B1/en not_active Expired - Lifetime
- 1998-05-07 KR KR10-1999-7000494A patent/KR100523786B1/ko not_active IP Right Cessation
-
2008
- 2008-11-10 JP JP2008288168A patent/JP4545812B2/ja not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2101306A (en) * | 1981-06-09 | 1983-01-12 | Land Pyrometers Ltd | Output level check means for pyrometers |
US5623149A (en) * | 1995-02-14 | 1997-04-22 | The Aerospace Corporation | High fidelity dual source solar simulator |
Also Published As
Publication number | Publication date |
---|---|
KR100523786B1 (ko) | 2005-10-26 |
ATE279717T1 (de) | 2004-10-15 |
JP2009042248A (ja) | 2009-02-26 |
EP0916078B1 (en) | 2004-10-13 |
US6179465B1 (en) | 2001-01-30 |
KR20000029481A (ko) | 2000-05-25 |
DE69826961T2 (de) | 2005-10-13 |
EP0916078A1 (en) | 1999-05-19 |
WO1998053286A1 (en) | 1998-11-26 |
JP4245669B2 (ja) | 2009-03-25 |
DE69826961D1 (de) | 2004-11-18 |
JP2000515638A (ja) | 2000-11-21 |
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