ATE279717T1 - Pyrometer kalibrierung unter verwendung mehrerer lichtquellen - Google Patents

Pyrometer kalibrierung unter verwendung mehrerer lichtquellen

Info

Publication number
ATE279717T1
ATE279717T1 AT98920959T AT98920959T ATE279717T1 AT E279717 T1 ATE279717 T1 AT E279717T1 AT 98920959 T AT98920959 T AT 98920959T AT 98920959 T AT98920959 T AT 98920959T AT E279717 T1 ATE279717 T1 AT E279717T1
Authority
AT
Austria
Prior art keywords
light sources
multiple light
pyrometer calibration
pyrometer
calibration
Prior art date
Application number
AT98920959T
Other languages
English (en)
Inventor
Mark Yam
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of ATE279717T1 publication Critical patent/ATE279717T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/52—Radiation pyrometry, e.g. infrared or optical thermometry using comparison with reference sources, e.g. disappearing-filament pyrometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/52—Radiation pyrometry, e.g. infrared or optical thermometry using comparison with reference sources, e.g. disappearing-filament pyrometer
    • G01J5/53—Reference sources, e.g. standard lamps; Black bodies

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Radiation Pyrometers (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Measuring Temperature Or Quantity Of Heat (AREA)
AT98920959T 1997-05-22 1998-05-07 Pyrometer kalibrierung unter verwendung mehrerer lichtquellen ATE279717T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/861,519 US6179465B1 (en) 1996-03-28 1997-05-22 Method and apparatus for infrared pyrometer calibration in a thermal processing system using multiple light sources
PCT/US1998/009032 WO1998053286A1 (en) 1997-05-22 1998-05-07 Pyrometer calibration using multiple light sources

Publications (1)

Publication Number Publication Date
ATE279717T1 true ATE279717T1 (de) 2004-10-15

Family

ID=25336028

Family Applications (1)

Application Number Title Priority Date Filing Date
AT98920959T ATE279717T1 (de) 1997-05-22 1998-05-07 Pyrometer kalibrierung unter verwendung mehrerer lichtquellen

Country Status (7)

Country Link
US (1) US6179465B1 (de)
EP (1) EP0916078B1 (de)
JP (2) JP4245669B2 (de)
KR (1) KR100523786B1 (de)
AT (1) ATE279717T1 (de)
DE (1) DE69826961T2 (de)
WO (1) WO1998053286A1 (de)

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US6375350B1 (en) * 2000-08-08 2002-04-23 Quantum Logic Corp Range pyrometer
TW476502U (en) * 2000-11-07 2002-02-11 Ind Tech Res Inst Blackbody furnace
US6849831B2 (en) * 2002-03-29 2005-02-01 Mattson Technology, Inc. Pulsed processing semiconductor heating methods using combinations of heating sources
US6987240B2 (en) * 2002-04-18 2006-01-17 Applied Materials, Inc. Thermal flux processing by scanning
US7223660B2 (en) * 2002-07-31 2007-05-29 Intel Corporation Flash assisted annealing
US6695886B1 (en) * 2002-08-22 2004-02-24 Axcelis Technologies, Inc. Optical path improvement, focus length change compensation, and stray light reduction for temperature measurement system of RTP tool
JP2004205487A (ja) * 2002-11-01 2004-07-22 Tokyo Electron Ltd プローブカードの固定機構
US6835914B2 (en) * 2002-11-05 2004-12-28 Mattson Technology, Inc. Apparatus and method for reducing stray light in substrate processing chambers
CN100404343C (zh) * 2003-05-14 2008-07-23 通用电气公司 用于时相恒定的红外能量差源的方法和装置
US8658945B2 (en) * 2004-02-27 2014-02-25 Applied Materials, Inc. Backside rapid thermal processing of patterned wafers
US20050214445A1 (en) * 2004-03-29 2005-09-29 Tokyo Electron Limited Method and processing system for determining coating status of a ceramic substrate heater
US7628507B2 (en) * 2004-06-04 2009-12-08 The United States of America as represented by the Secretary of Commerce, the National Institute of Standards and Technology Radiance output and temperature controlled LED radiance source
US8452166B2 (en) * 2008-07-01 2013-05-28 Applied Materials, Inc. Apparatus and method for measuring radiation energy during thermal processing
US8282273B2 (en) * 2009-03-24 2012-10-09 K-Space Associates, Inc. Blackbody fitting for temperature determination
DE102009022611B4 (de) * 2009-05-26 2012-03-08 Instrument Systems Optische Messtechnik Gmbh Kalibrierstrahlungsquelle
DE102009053504B3 (de) * 2009-11-16 2011-07-07 Sunfilm AG, 01900 Verfahren und Vorrichtung zur Bestimmung der Quanteneffizienz einer Solarzelle
EP2660574A1 (de) * 2012-05-04 2013-11-06 LayTec AG Flache lichtemittierende Platte zur Simulation von Wärmestrahlung, Verfahren zur Kalibrierung eines Pyrometers und Verfahren zur Bestimmung der Temperatur eines Halbleiter-Wafers
KR101389003B1 (ko) * 2013-02-05 2014-04-24 에이피시스템 주식회사 온도측정 파이로미터의 교정 장치
US9410849B2 (en) * 2014-01-21 2016-08-09 Kidde Technologies, Inc. Apparatuses, systems, and methods controlling testing optical fire detectors
EP3023757B1 (de) 2014-11-21 2019-04-03 SLM Solutions Group AG Pyrometrische Nachweisvorrichtung, Verfahren zum Kalibrieren derselben und Vorrichtung zur Herstellung von dreidimensionalen Werkstücken
DE102014117388B4 (de) 2014-11-27 2025-03-27 Aixtron Se Verfahren zum Kalibrieren einer Pyrometeranordnung eines CVD- oder PVD-Reaktors
US10564039B2 (en) * 2017-09-26 2020-02-18 Lawrence Livermore National Security, Llc System and method for portable multi-band black body simulator
US11551950B2 (en) * 2017-11-28 2023-01-10 Evatec Ag Substrate processing apparatus and method of processing a substrate and of manufacturing a processed workpiece
WO2020241850A1 (ja) * 2019-05-31 2020-12-03 株式会社荏原製作所 放射温度計を較正する方法、およびシステム
JP7328931B2 (ja) * 2019-05-31 2023-08-17 株式会社荏原製作所 放射温度計を較正する方法、およびシステム
WO2021188458A1 (en) * 2020-03-17 2021-09-23 Seek Thermal, Inc. Cost effective, mass producible temperature controlled thermal imaging calibration source
US20230131233A1 (en) * 2020-04-01 2023-04-27 Lam Research Corporation Rapid and precise temperature control for thermal etching
US12568781B2 (en) 2021-01-25 2026-03-03 Lam Research Corporation Selective silicon trim by thermal etching
CN116504685B (zh) * 2023-06-28 2023-09-15 盛吉盛半导体科技(北京)有限公司 一种红外测温探头校准装置

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Also Published As

Publication number Publication date
US6179465B1 (en) 2001-01-30
JP4545812B2 (ja) 2010-09-15
JP4245669B2 (ja) 2009-03-25
DE69826961D1 (de) 2004-11-18
EP0916078B1 (de) 2004-10-13
JP2000515638A (ja) 2000-11-21
JP2009042248A (ja) 2009-02-26
KR100523786B1 (ko) 2005-10-26
DE69826961T2 (de) 2005-10-13
EP0916078A1 (de) 1999-05-19
WO1998053286A1 (en) 1998-11-26
KR20000029481A (ko) 2000-05-25

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