JP2006066904A5 - - Google Patents
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- Publication number
- JP2006066904A5 JP2006066904A5 JP2005219784A JP2005219784A JP2006066904A5 JP 2006066904 A5 JP2006066904 A5 JP 2006066904A5 JP 2005219784 A JP2005219784 A JP 2005219784A JP 2005219784 A JP2005219784 A JP 2005219784A JP 2006066904 A5 JP2006066904 A5 JP 2006066904A5
- Authority
- JP
- Japan
- Prior art keywords
- laser
- laser beam
- oscillator
- irradiation
- irradiation surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005219784A JP4942959B2 (ja) | 2004-07-30 | 2005-07-29 | レーザ照射装置およびレーザ照射方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004224676 | 2004-07-30 | ||
| JP2004224676 | 2004-07-30 | ||
| JP2005219784A JP4942959B2 (ja) | 2004-07-30 | 2005-07-29 | レーザ照射装置およびレーザ照射方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006066904A JP2006066904A (ja) | 2006-03-09 |
| JP2006066904A5 true JP2006066904A5 (cg-RX-API-DMAC10.html) | 2008-09-04 |
| JP4942959B2 JP4942959B2 (ja) | 2012-05-30 |
Family
ID=36113044
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005219784A Expired - Fee Related JP4942959B2 (ja) | 2004-07-30 | 2005-07-29 | レーザ照射装置およびレーザ照射方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4942959B2 (cg-RX-API-DMAC10.html) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007294082A (ja) * | 2006-03-31 | 2007-11-08 | Semiconductor Energy Lab Co Ltd | Ｎａｎｄ型不揮発性メモリのデータ消去方法 |
| KR20090029221A (ko) * | 2006-06-21 | 2009-03-20 | 가부시끼가이샤 하이테크 시스템즈 | 반도체의 열처리방법 |
| US8047442B2 (en) * | 2007-12-03 | 2011-11-01 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| JP5464972B2 (ja) * | 2009-10-29 | 2014-04-09 | 住友重機械工業株式会社 | レーザ加工装置 |
| KR101391695B1 (ko) | 2012-04-24 | 2014-05-07 | 삼성디스플레이 주식회사 | 레이저 결정화 장비 및 이를 이용한 박막 트랜지스터 기판 제조 방법 |
| JP7820804B2 (ja) * | 2022-03-09 | 2026-02-26 | 株式会社ブイ・テクノロジー | レーザアニール装置およびレーザアニール方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3477888B2 (ja) * | 1995-02-07 | 2003-12-10 | ソニー株式会社 | 薄膜半導体装置の製造方法 |
| JPH09270393A (ja) * | 1996-03-29 | 1997-10-14 | Sanyo Electric Co Ltd | レーザー光照射装置 |
| JP4289816B2 (ja) * | 2001-03-22 | 2009-07-01 | シャープ株式会社 | 半導体装置及びその製造方法 |
| JP3903761B2 (ja) * | 2001-10-10 | 2007-04-11 | 株式会社日立製作所 | レ−ザアニ−ル方法およびレ−ザアニ−ル装置 |
| JP2003168645A (ja) * | 2001-12-03 | 2003-06-13 | Hitachi Ltd | 半導体薄膜装置、その製造方法及び画像表示装置 |
| JP4813743B2 (ja) * | 2002-07-24 | 2011-11-09 | 株式会社 日立ディスプレイズ | 画像表示装置の製造方法 |
| JP2004128421A (ja) * | 2002-10-07 | 2004-04-22 | Semiconductor Energy Lab Co Ltd | レーザ照射方法およびレーザ照射装置、並びに半導体装置の作製方法 |
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2005
- 2005-07-29 JP JP2005219784A patent/JP4942959B2/ja not_active Expired - Fee Related