JP2006013450A5 - - Google Patents

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Publication number
JP2006013450A5
JP2006013450A5 JP2005128171A JP2005128171A JP2006013450A5 JP 2006013450 A5 JP2006013450 A5 JP 2006013450A5 JP 2005128171 A JP2005128171 A JP 2005128171A JP 2005128171 A JP2005128171 A JP 2005128171A JP 2006013450 A5 JP2006013450 A5 JP 2006013450A5
Authority
JP
Japan
Prior art keywords
region
conductivity type
voltage transistor
concentration
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005128171A
Other languages
English (en)
Japanese (ja)
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JP2006013450A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005128171A priority Critical patent/JP2006013450A/ja
Priority claimed from JP2005128171A external-priority patent/JP2006013450A/ja
Priority to TW094116684A priority patent/TW200603405A/zh
Priority to KR1020050043975A priority patent/KR101294115B1/ko
Priority to US11/137,639 priority patent/US20050263843A1/en
Publication of JP2006013450A publication Critical patent/JP2006013450A/ja
Publication of JP2006013450A5 publication Critical patent/JP2006013450A5/ja
Withdrawn legal-status Critical Current

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JP2005128171A 2004-05-27 2005-04-26 半導体装置およびその製造方法 Withdrawn JP2006013450A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005128171A JP2006013450A (ja) 2004-05-27 2005-04-26 半導体装置およびその製造方法
TW094116684A TW200603405A (en) 2004-05-27 2005-05-23 Semiconductor device and fabrication method therefor
KR1020050043975A KR101294115B1 (ko) 2004-05-27 2005-05-25 반도체장치 및 그 제조방법
US11/137,639 US20050263843A1 (en) 2004-05-27 2005-05-26 Semiconductor device and fabrication method therefor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004157909 2004-05-27
JP2005128171A JP2006013450A (ja) 2004-05-27 2005-04-26 半導体装置およびその製造方法

Publications (2)

Publication Number Publication Date
JP2006013450A JP2006013450A (ja) 2006-01-12
JP2006013450A5 true JP2006013450A5 (enExample) 2008-05-29

Family

ID=35424244

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005128171A Withdrawn JP2006013450A (ja) 2004-05-27 2005-04-26 半導体装置およびその製造方法

Country Status (4)

Country Link
US (1) US20050263843A1 (enExample)
JP (1) JP2006013450A (enExample)
KR (1) KR101294115B1 (enExample)
TW (1) TW200603405A (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7511346B2 (en) * 2005-12-27 2009-03-31 Taiwan Semiconductor Manufacturing Company, Ltd. Design of high-frequency substrate noise isolation in BiCMOS technology
JP5008363B2 (ja) * 2006-09-15 2012-08-22 株式会社リコー 半導体装置
JP5634001B2 (ja) * 2007-03-28 2014-12-03 ピーエスフォー ルクスコ エスエイアールエルＰＳ４ Ｌｕｘｃｏ Ｓ．ａ．ｒ．ｌ． 半導体装置の製造方法
JP5367390B2 (ja) * 2009-01-28 2013-12-11 ラピスセミコンダクタ株式会社 半導体装置及びその製造方法
KR101228369B1 (ko) * 2011-10-13 2013-02-01 주식회사 동부하이텍 Ｌｄｍｏｓ 소자와 그 제조 방법
JP5849670B2 (ja) * 2011-12-09 2016-02-03 セイコーエプソン株式会社 半導体装置
JP6326858B2 (ja) 2014-02-24 2018-05-23 セイコーエプソン株式会社 半導体装置およびその製造方法
US9698147B2 (en) * 2015-02-25 2017-07-04 Sii Semiconductor Corporation Semiconductor integrated circuit device having low and high withstanding-voltage MOS transistors

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3643106A (en) * 1970-09-14 1972-02-15 Hughes Aircraft Co Analog shift register
US3955210A (en) * 1974-12-30 1976-05-04 International Business Machines Corporation Elimination of SCR structure
US6278162B1 (en) * 1993-06-30 2001-08-21 Integrated Device Technology, Inc. ESD protection for LDD devices
US5374565A (en) * 1993-10-22 1994-12-20 United Microelectronics Corporation Method for ESD protection improvement
JP3055424B2 (ja) * 1994-04-28 2000-06-26 株式会社デンソー Ｍｉｓ型半導体装置の製造方法
DE69431181D1 (de) * 1994-05-19 2002-09-19 Cons Ric Microelettronica Integrierte Leistungsschaltung ("PIC") und Verfahren zur Herstellung derselben
DE69420565T2 (de) * 1994-10-27 2000-03-30 Co.Ri.M.Me. Consorzio Per La Ricerca Sulla Microelettronica Nel Mezzogiorno, Catania Treiberschaltung für elektronische Halbleiterbauelemente mit wenigstens einem Leistungstransistor
US6417550B1 (en) * 1996-08-30 2002-07-09 Altera Corporation High voltage MOS devices with high gated-diode breakdown voltage and punch-through voltage
US6300182B1 (en) * 2000-12-11 2001-10-09 Advanced Micro Devices, Inc. Field effect transistor having dual gates with asymmetrical doping for reduced threshold voltage
JP3719189B2 (ja) 2001-10-18 2005-11-24 セイコーエプソン株式会社 半導体装置の製造方法
JP4647175B2 (ja) * 2002-04-18 2011-03-09 ルネサスエレクトロニクス株式会社 半導体集積回路装置
US7067877B2 (en) * 2003-03-10 2006-06-27 Fuji Electric Device Technology Co., Ltd. MIS-type semiconductor device

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