JP2005537549A - より高い正確度の圧力に基づく流れコントローラ - Google Patents
より高い正確度の圧力に基づく流れコントローラ Download PDFInfo
- Publication number
- JP2005537549A JP2005537549A JP2004531988A JP2004531988A JP2005537549A JP 2005537549 A JP2005537549 A JP 2005537549A JP 2004531988 A JP2004531988 A JP 2004531988A JP 2004531988 A JP2004531988 A JP 2004531988A JP 2005537549 A JP2005537549 A JP 2005537549A
- Authority
- JP
- Japan
- Prior art keywords
- flow
- restrictor
- pressure
- internal passage
- flow restrictor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/68—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using thermal effects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/76—Devices for measuring mass flow of a fluid or a fluent solid material
- G01F1/86—Indirect mass flowmeters, e.g. measuring volume flow and density, temperature or pressure
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/76—Devices for measuring mass flow of a fluid or a fluent solid material
- G01F1/86—Indirect mass flowmeters, e.g. measuring volume flow and density, temperature or pressure
- G01F1/88—Indirect mass flowmeters, e.g. measuring volume flow and density, temperature or pressure with differential-pressure measurement to determine the volume flow
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7758—Pilot or servo controlled
- Y10T137/7761—Electrically actuated valve
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Flow Control (AREA)
Abstract
Description
本出願は、2002年8月28日に出願された米国仮特許出願第60/406,511号に対する優先権を主張しており、その内容は、本明細書によって、それらの全体が本明細書中に援用される。
種々の製造プロセスは、流体の速度および流れに対する制御を必要とする。例えば、半導体製作プロセスは、プロセスチャンバ中への非常に正確な量の流体(主にガス)の放出を必要とし得る。1分間あたり20リットル程度の高さから、1分間あたり1立方センチメートル(CCM)の数十分の一の低さまでの範囲の流速が、この製作プロセスの間に必要とされ得る。
本出願は、流れコントローラに基づく圧力に関する。より詳細には、本出願は、現在の流れ制御デバイスより広い動力学的範囲に亘ってより高い正確さを有する圧力ベースの流れコントローラを開示する。
その中に生成される減圧を有する排出ベッセルに連結される。代替の実施形態では、この流れ制限器出口52は、その中に形成されるほぼ真空を有する出口ベッセルに連結され得る。例えば、この出口ベッセルは、約1psia以下であり得る。必要に応じて、この流れ制限器出口52は、その中の形成された圧力低下および/または変動減圧を有する排出ベッセルと連絡され得る。例えば、この出口ベッセルは、約0psia〜約5psiaまで変動する圧力を有し得る。必要に応じて、第2の圧力トランスデューサ54が、流れ制限器30に近接して配置されても良く、そしてMFC10を出る排出物の圧力を測定するように構成される。
Claims (18)
- 質量流れコントローラであって:
その中に形成された、第1の内部通路、および少なくとも第2の内部通路を有する本体部分;
該本体部分に接続され、かつ該第1および第2の内部通路と連絡している流れ制御バルブ;
該本体部分と接続され、かつ該第1の内部通路および該第2の内部通路の少なくとも1つと連絡している少なくとも1つの圧力トランスデューサ;
該第2の内部通路と接続され、それを通じる高圧縮層流を生成するよう構成される非線形流れ制限器;
該第1の内部通路、該第2の内部通路、および該流れ制限器の少なくとも1つと連絡している熱センサ;および
該流れ制限器と連絡している排出ベッセルを備える、コントローラ。 - 前記第2の内部通路が、前記流れ制限器の出口における圧力より大きい圧力で流体を流すように構成される、請求項1に記載のデバイス。
- 排出ベッセルが減圧下にある、請求項1に記載のデバイス。
- 排出ベッセルがほぼ真空下にある、請求項1に記載のデバイス。
- 排出ベッセルが、約0psia〜約5psiaの圧力低下の下にある請求項1に記載のデバイス。
- 前記流れ制限器が、圧縮かつ焼成された材料から製造される、請求項1に記載のデバイス。
- 前記制限器が多孔性である、請求項1に記載のデバイス。
- 前記流れ制限器が、コイル状のキャピラリーチューブを備える、請求項1に記載のデバイス。
- 前記流れ制限器が、前記コントロールバルブの下流に位置する、請求項1に記載のデバイス。
- 前記流れ制限器が、高度に圧縮可能な層流流れの、少なくとも50パーセントの流れ制限器入口と流れ制限器出口との間の圧力低下を可能にするように構成される、請求項1に記載のデバイス。
- 前記流れ制限器の出口と連絡している少なくとも1つの圧力トランスデューサをさらに備える、請求項1に記載のデバイス。
- 質量流れコントローラであって:
1つ以上の圧力センサ;
上流バルブ;
該バルブおよび該圧力センサの下流に位置する非線形制限器であって、かつ低い流れにおいて該制限器の入口で1ユニットの流れあたりより多くの増分圧力を有するよう構成される、制限器を備える、コントローラ。 - 前記制限器が、それを通って流れる高度に圧縮可能な層流を生成するように構成される層流流れ要素を備える、請求項13に記載のデバイス。
- 前記制限器が、前記流れ制限器の入口における圧力の少なくとも約50%の制限器入口と制限器出口との間の圧力低下を提供するように構成される、請求項13に記載のデバイス。
- 前記制限器が、小動力学的直径を有する細長いキャピラリー本体を備える、請求項13に記載のデバイス。
- 前記制限器が、焼成された本体を備える、請求項13に記載のデバイス。
- 前記制限器が、その上に形成され平行かつ連続して形成されるポアを有する多孔性本体を備える、請求項13に記載のデバイス。
- 前記制限器が、キャピラリーチューブ、環状ギャップ、環状プレート、平行プレート、溝のあるプレート、積み上げプレート、コイル状キャピラリー本体、およびコイル状シートからなる群から選択される種々の形態で形成される、請求項13に記載のデバイス。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US40651102P | 2002-08-28 | 2002-08-28 | |
PCT/US2003/027232 WO2004020956A2 (en) | 2002-08-28 | 2003-08-28 | Higher accuracy pressure based flow controller |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005537549A true JP2005537549A (ja) | 2005-12-08 |
JP4594728B2 JP4594728B2 (ja) | 2010-12-08 |
Family
ID=31978312
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004531988A Expired - Fee Related JP4594728B2 (ja) | 2002-08-28 | 2003-08-28 | より高い正確度の圧力に基づく流れコントローラ |
Country Status (7)
Country | Link |
---|---|
US (2) | US20040083807A1 (ja) |
EP (1) | EP1552200A4 (ja) |
JP (1) | JP4594728B2 (ja) |
KR (1) | KR20050067388A (ja) |
CN (1) | CN100422616C (ja) |
AU (1) | AU2003268315A1 (ja) |
WO (1) | WO2004020956A2 (ja) |
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2003
- 2003-08-28 US US10/652,506 patent/US20040083807A1/en not_active Abandoned
- 2003-08-28 CN CNB03824330XA patent/CN100422616C/zh not_active Expired - Fee Related
- 2003-08-28 KR KR1020057003570A patent/KR20050067388A/ko not_active Application Discontinuation
- 2003-08-28 EP EP03749272A patent/EP1552200A4/en not_active Withdrawn
- 2003-08-28 JP JP2004531988A patent/JP4594728B2/ja not_active Expired - Fee Related
- 2003-08-28 WO PCT/US2003/027232 patent/WO2004020956A2/en active Search and Examination
- 2003-08-28 AU AU2003268315A patent/AU2003268315A1/en not_active Abandoned
-
2006
- 2006-10-12 US US11/549,084 patent/US20070089789A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
JP4594728B2 (ja) | 2010-12-08 |
US20070089789A1 (en) | 2007-04-26 |
EP1552200A4 (en) | 2010-05-19 |
CN1688839A (zh) | 2005-10-26 |
AU2003268315A1 (en) | 2004-03-19 |
AU2003268315A8 (en) | 2004-03-19 |
WO2004020956A3 (en) | 2005-05-19 |
WO2004020956A9 (en) | 2004-06-17 |
WO2004020956A2 (en) | 2004-03-11 |
CN100422616C (zh) | 2008-10-01 |
KR20050067388A (ko) | 2005-07-01 |
US20040083807A1 (en) | 2004-05-06 |
EP1552200A2 (en) | 2005-07-13 |
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