JP2005535745A5 - - Google Patents

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Publication number
JP2005535745A5
JP2005535745A5 JP2004527574A JP2004527574A JP2005535745A5 JP 2005535745 A5 JP2005535745 A5 JP 2005535745A5 JP 2004527574 A JP2004527574 A JP 2004527574A JP 2004527574 A JP2004527574 A JP 2004527574A JP 2005535745 A5 JP2005535745 A5 JP 2005535745A5
Authority
JP
Japan
Prior art keywords
photocurable composition
substrate
maleimide
formula
organic group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004527574A
Other languages
English (en)
Japanese (ja)
Other versions
JP4272156B2 (ja
JP2005535745A (ja
Filing date
Publication date
Priority claimed from US10/214,619 external-priority patent/US20040029044A1/en
Application filed filed Critical
Publication of JP2005535745A publication Critical patent/JP2005535745A/ja
Publication of JP2005535745A5 publication Critical patent/JP2005535745A5/ja
Application granted granted Critical
Publication of JP4272156B2 publication Critical patent/JP4272156B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004527574A 2002-08-08 2003-06-17 マレイド誘導体を含有する光硬化性組成物 Expired - Fee Related JP4272156B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/214,619 US20040029044A1 (en) 2002-08-08 2002-08-08 Photocurable composition
PCT/US2003/019136 WO2004014970A1 (en) 2002-08-08 2003-06-17 Photocurable composition containing maleide derivatives

Publications (3)

Publication Number Publication Date
JP2005535745A JP2005535745A (ja) 2005-11-24
JP2005535745A5 true JP2005535745A5 (enExample) 2006-07-20
JP4272156B2 JP4272156B2 (ja) 2009-06-03

Family

ID=31494683

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004527574A Expired - Fee Related JP4272156B2 (ja) 2002-08-08 2003-06-17 マレイド誘導体を含有する光硬化性組成物

Country Status (8)

Country Link
US (1) US20040029044A1 (enExample)
JP (1) JP4272156B2 (enExample)
KR (1) KR101009124B1 (enExample)
CN (1) CN1307221C (enExample)
AU (1) AU2003282345A1 (enExample)
DE (1) DE10393025T5 (enExample)
GB (1) GB2406572B (enExample)
WO (1) WO2004014970A1 (enExample)

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US20100055423A1 (en) * 2008-09-04 2010-03-04 Xerox Corporation Machine Readable Code Comprising Ultra-Violet Curable Gellant Inks
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US20130025495A1 (en) * 2010-01-11 2013-01-31 Isp Investments Inc. Compositions comprising a reactive monomer and uses thereof
US8628679B2 (en) * 2010-01-20 2014-01-14 Phoenix Inks And Coatings, Llc High-definition demetalization process
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WO2012172816A1 (ja) * 2011-06-17 2012-12-20 コニカミノルタホールディングス株式会社 光硬化性インクジェットインク
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JP5825089B2 (ja) * 2011-12-21 2015-12-02 コニカミノルタ株式会社 紫外線硬化型非水系インクジェットインク
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WO2018081268A1 (en) 2016-10-25 2018-05-03 Avery Dennison Corporation Block polymers with photoinitiator groups in backbone and their use in adhesive compositions
WO2018212116A1 (ja) * 2017-05-15 2018-11-22 三菱瓦斯化学株式会社 リソグラフィー用膜形成材料、リソグラフィー用膜形成用組成物、リソグラフィー用下層膜及びパターン形成方法
GB2562747B (en) * 2017-05-23 2019-06-26 Henkel IP & Holding GmbH Low-viscosity photocurable adhesive compositions
WO2019126327A1 (en) 2017-12-19 2019-06-27 Avery Dennison Corporation Post-polymerization functionalization of pendant functional groups
EP3842863A4 (en) * 2018-08-20 2021-11-03 Mitsubishi Gas Chemical Company, Inc. FILM EDUCATION MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, LAYER FILM FOR LITHOGRAPHY AND PATTERN GENERATION PROCESS
JP6746106B2 (ja) * 2018-08-30 2020-08-26 三菱瓦斯化学株式会社 樹脂組成物、樹脂シート、多層プリント配線板、及び半導体装置
JP7212301B2 (ja) * 2018-08-30 2023-01-25 三菱瓦斯化学株式会社 樹脂組成物、樹脂シート、多層プリント配線板及び半導体装置
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