JP2005532164A5 - - Google Patents
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- JP2005532164A5 JP2005532164A5 JP2004521579A JP2004521579A JP2005532164A5 JP 2005532164 A5 JP2005532164 A5 JP 2005532164A5 JP 2004521579 A JP2004521579 A JP 2004521579A JP 2004521579 A JP2004521579 A JP 2004521579A JP 2005532164 A5 JP2005532164 A5 JP 2005532164A5
- Authority
- JP
- Japan
- Prior art keywords
- membrane
- halopolymer
- film
- liquid
- porous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000012528 membrane Substances 0.000 claims 23
- 239000007788 liquid Substances 0.000 claims 11
- 239000012530 fluid Substances 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 5
- 238000009736 wetting Methods 0.000 claims 5
- 230000001427 coherent Effects 0.000 claims 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 3
- 229910052799 carbon Inorganic materials 0.000 claims 3
- 229910052731 fluorine Inorganic materials 0.000 claims 2
- 239000011737 fluorine Substances 0.000 claims 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- 229920002313 fluoropolymer Polymers 0.000 claims 1
- 239000004811 fluoropolymer Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N oxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 239000004810 polytetrafluoroethylene Substances 0.000 claims 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims 1
- 239000011148 porous material Substances 0.000 claims 1
- 238000003672 processing method Methods 0.000 claims 1
Claims (17)
- 微孔性ハロポリマー膜であって、
第1の表面及び第2の表面と、前記第1及び第2の表面によって画成される厚さとを備え、前記膜の前記厚さ全体において少なくとも40dyn/cm(0.40erg/mm2)の臨界濡れ表面張力(CWST)と、2以上のサイクルにおいて少なくとも約0.7の濡れ/ディウェッティング比とを有し、少なくとも一方の前記表面が約1.2以上のフッ素/炭素(F/C)比を有する、微孔性ハロポリマー膜。 - 微孔性ハロポリマー膜であって、
第1の表面及び第2の表面と、前記第1及び第2の表面によって画成される厚さとを備え、少なくとも一方の前記表面が約1.2以上のF/C比を有し、前記膜が、2以上のサイクルにおいて少なくとも約0.7の濡れ/ディウェッティング比と、低レベルの抽出物とを有する、微孔性ハロポリマー膜。 - 多孔性ハロポリマー膜であって、
第1の表面及び第2の表面と、前記第1及び第2の表面によって画成される厚さとを備え、前記膜の前記厚さ全体において少なくとも約40dyn/cm(0.40erg/mm2)のCWSTと、2以上のサイクルにおいて少なくとも約0.7の濡れ/ディウェッティング比とを有する、多孔性ハロポリマー膜。 - 約0.02〜約0.1μmの範囲の公称孔径を有する、請求項1〜3のいずれか一項に記載のハロポリマー膜。
- 膜厚全体を通して少なくとも約58dyn/cm(0.58erg/mm2)のCWSTを有する、請求項4に記載のハロポリマー膜。
- 少なくとも約45psi(約310kPa)の水バブルポイントを有する、請求項1〜5のいずれか一項に記載のハロポリマー膜。
- PTFEを備える、請求項6に記載のハロポリマー膜。
- 少なくとも1つの表面が約0.15以下の酸素/炭素(O/C)比を有する、請求項1〜7のいずれか一項に記載のハロポリマー膜。
- 約100ppb未満の抽出物を有する、請求項1〜8のいずれか一項に記載のハロポリマー膜。
- 多孔性ハロポリマー膜の製造方法であって、
多孔性ハロポリマー膜を非コヒーレントUV放射線に曝露して、第1の表面及び第2の表面と、前記第1及び第2の表面によって画成される厚さとを備え、前記膜の前記厚さ全体において少なくとも26dyn/cm(0.26erg/mm2)のCWSTと、少なくとも約33psiの水バブルポイントと、2以上のサイクルにおいて少なくとも約0.7の濡れ/ディウェッティング比とを有し、少なくとも一方の前記表面が約1.2以上のフッ素/炭素(F/C)比を有する多孔性ハロポリマー膜を製造するステップを備える、製造方法。 - 多孔性ハロポリマー膜の製造方法であって、
多孔性ハロポリマー膜を液体と接触させて、液体処理された膜を得るステップと、
前記液体処理された膜を非コヒーレントUV放射線に曝露するステップと、
を備える、製造方法。 - 前記多孔性ハロポリマー膜を液体と接触させるステップが、前記膜を第1の液体及び第2の液体、並びに任意的な第3の液体と接触させることを含む、請求項11に記載の方法。
- 前記多孔性ハロポリマー膜を液体と接触させるステップが、前記膜を前記液体中に浸漬することを含み、
前記液体処理された膜を非コヒーレントUV放射線に曝露するステップが、前記膜を前記液体中に浸漬しながら前記膜を放射線に曝露することを含む、請求項11に記載の方法。 - 前記ハロポリマー膜がフルオロポリマーを含む、請求項10〜13のいずれか一項に記載の方法。
- 請求項10〜14のいずれか一項に記載の多孔性ハロポリマー膜を、非コヒーレントUV放射線に曝露するステップによって製造される多孔性ハロポリマー膜。
- 請求項1〜9及び15のいずれか一項に記載の膜を、処理するための流体と接触させるステップと、前記処理された流体を回収するステップとを備える、流体処理方法。
- 前記処理するための流体が脱気する流体である、請求項16に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US39486502P | 2002-07-11 | 2002-07-11 | |
PCT/US2003/021438 WO2004007060A2 (en) | 2002-07-11 | 2003-07-09 | Uv treated membranes |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2005532164A JP2005532164A (ja) | 2005-10-27 |
JP2005532164A5 true JP2005532164A5 (ja) | 2006-08-17 |
JP4398860B2 JP4398860B2 (ja) | 2010-01-13 |
Family
ID=30115782
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004521579A Expired - Lifetime JP4398860B2 (ja) | 2002-07-11 | 2003-07-09 | Uv処理膜 |
Country Status (6)
Country | Link |
---|---|
US (2) | US7611629B2 (ja) |
EP (1) | EP1531925B1 (ja) |
JP (1) | JP4398860B2 (ja) |
KR (1) | KR100998521B1 (ja) |
AU (1) | AU2003253840A1 (ja) |
WO (1) | WO2004007060A2 (ja) |
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-
2003
- 2003-07-09 JP JP2004521579A patent/JP4398860B2/ja not_active Expired - Lifetime
- 2003-07-09 KR KR1020057000562A patent/KR100998521B1/ko active IP Right Grant
- 2003-07-09 WO PCT/US2003/021438 patent/WO2004007060A2/en active Application Filing
- 2003-07-09 EP EP03764401.0A patent/EP1531925B1/en not_active Expired - Lifetime
- 2003-07-09 US US10/520,080 patent/US7611629B2/en not_active Expired - Lifetime
- 2003-07-09 AU AU2003253840A patent/AU2003253840A1/en not_active Abandoned
-
2009
- 2009-10-02 US US12/572,531 patent/US7833419B2/en not_active Expired - Lifetime
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