JP2005531481A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2005531481A5 JP2005531481A5 JP2004516824A JP2004516824A JP2005531481A5 JP 2005531481 A5 JP2005531481 A5 JP 2005531481A5 JP 2004516824 A JP2004516824 A JP 2004516824A JP 2004516824 A JP2004516824 A JP 2004516824A JP 2005531481 A5 JP2005531481 A5 JP 2005531481A5
- Authority
- JP
- Japan
- Prior art keywords
- gas stream
- oxide
- reactants
- reactant
- oxide particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007789 gas Substances 0.000 claims 13
- 238000000034 method Methods 0.000 claims 12
- 239000000463 material Substances 0.000 claims 11
- 239000000376 reactant Substances 0.000 claims 11
- 239000011521 glass Substances 0.000 claims 6
- 239000002245 particle Substances 0.000 claims 6
- 230000001590 oxidative effect Effects 0.000 claims 4
- 230000003647 oxidation Effects 0.000 claims 3
- 238000007254 oxidation reaction Methods 0.000 claims 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 238000006243 chemical reaction Methods 0.000 claims 2
- 239000002019 doping agent Substances 0.000 claims 2
- 238000002347 injection Methods 0.000 claims 2
- 239000007924 injection Substances 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 1
- 229910052691 Erbium Inorganic materials 0.000 claims 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 229910052779 Neodymium Inorganic materials 0.000 claims 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 229910052796 boron Inorganic materials 0.000 claims 1
- 229910002092 carbon dioxide Inorganic materials 0.000 claims 1
- 239000001569 carbon dioxide Substances 0.000 claims 1
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 238000009833 condensation Methods 0.000 claims 1
- 230000005494 condensation Effects 0.000 claims 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 229910052732 germanium Inorganic materials 0.000 claims 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 150000002484 inorganic compounds Chemical class 0.000 claims 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims 1
- 150000002894 organic compounds Chemical class 0.000 claims 1
- 239000007800 oxidant agent Substances 0.000 claims 1
- 229910052698 phosphorus Inorganic materials 0.000 claims 1
- 239000011574 phosphorus Substances 0.000 claims 1
- 229910052761 rare earth metal Inorganic materials 0.000 claims 1
- 150000002910 rare earth metals Chemical class 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 239000005049 silicon tetrachloride Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- IEXRMSFAVATTJX-UHFFFAOYSA-N tetrachlorogermane Chemical compound Cl[Ge](Cl)(Cl)Cl IEXRMSFAVATTJX-UHFFFAOYSA-N 0.000 claims 1
- GXMNGLIMQIPFEB-UHFFFAOYSA-N tetraethoxygermane Chemical compound CCO[Ge](OCC)(OCC)OCC GXMNGLIMQIPFEB-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20021269A FI115134B (fi) | 2002-06-28 | 2002-06-28 | Menetelmä seostetun lasimateriaalin valmistamiseksi |
| PCT/FI2003/000522 WO2004002907A1 (en) | 2002-06-28 | 2003-06-27 | A method for the preparation of doped oxide material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005531481A JP2005531481A (ja) | 2005-10-20 |
| JP2005531481A5 true JP2005531481A5 (enExample) | 2006-07-20 |
Family
ID=8564253
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004516824A Pending JP2005531481A (ja) | 2002-06-28 | 2003-06-27 | ドープされた酸化物材料の調製方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7624596B2 (enExample) |
| EP (1) | EP1539648B1 (enExample) |
| JP (1) | JP2005531481A (enExample) |
| CN (1) | CN1301925C (enExample) |
| AT (1) | ATE348079T1 (enExample) |
| AU (1) | AU2003238120A1 (enExample) |
| DE (1) | DE60310420T2 (enExample) |
| FI (1) | FI115134B (enExample) |
| WO (1) | WO2004002907A1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040132101A1 (en) | 2002-09-27 | 2004-07-08 | Xencor | Optimized Fc variants and methods for their generation |
| US20090010920A1 (en) | 2003-03-03 | 2009-01-08 | Xencor, Inc. | Fc Variants Having Decreased Affinity for FcyRIIb |
| FI116619B (fi) * | 2004-07-02 | 2006-01-13 | Liekki Oy | Menetelmä ja laite optisen materiaalin tuottamiseksi sekä optinen aaltojohde |
| US20070116896A1 (en) * | 2005-11-23 | 2007-05-24 | Samsung Electro-Mechanics Co., Ltd. | Method for manufacturing front scattering film having no wavelength dependency |
| FI121336B (fi) * | 2006-03-27 | 2010-10-15 | Beneq Oy | Hydrofobinen lasipinta |
| FR2939246B1 (fr) * | 2008-12-02 | 2010-12-24 | Draka Comteq France | Fibre optique amplificatrice et procede de fabrication |
| GB2478307A (en) | 2010-03-02 | 2011-09-07 | Heraeus Quartz Uk Ltd | Manufacture of silica glass |
| CN102626614B (zh) * | 2012-03-21 | 2013-12-25 | 陕西科技大学 | 一种光催化型光导材料的制备方法 |
| GB201520548D0 (en) | 2015-11-23 | 2016-01-06 | Immunocore Ltd & Adaptimmune Ltd | Peptides |
| GB201520542D0 (en) | 2015-11-23 | 2016-01-06 | Immunocore Ltd & Adaptimmune Ltd | Peptides |
| GB201520539D0 (en) | 2015-11-23 | 2016-01-06 | Immunocore Ltd & Adaptimmune Ltd | Peptides |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3698936A (en) * | 1969-12-19 | 1972-10-17 | Texas Instruments Inc | Production of very high purity metal oxide articles |
| US3737292A (en) * | 1972-01-03 | 1973-06-05 | Corning Glass Works | Method of forming optical waveguide fibers |
| US4212663A (en) * | 1978-01-26 | 1980-07-15 | Corning Glass Works | Reactants delivery system for optical waveguide manufacturing |
| US4278458A (en) * | 1979-02-07 | 1981-07-14 | Bell Telephone Laboratories, Incorporated | Optical fiber fabrication method and apparatus |
| CA1166527A (en) * | 1979-09-26 | 1984-05-01 | Shiro Takahashi | Method and apparatus for producing multi-component glass fiber preform |
| US4501602A (en) | 1982-09-15 | 1985-02-26 | Corning Glass Works | Process for making sintered glasses and ceramics |
| US5188648A (en) * | 1985-07-20 | 1993-02-23 | U.S. Philips Corp. | Method of manufacturing optical fibres |
| JPS6283324A (ja) | 1985-10-07 | 1987-04-16 | Kogyo Kaihatsu Kenkyusho | 光学ガラスの製造方法 |
| US5059230A (en) * | 1990-01-22 | 1991-10-22 | At&T Bell Laboratories | Fabrication of doped filament optical fibers |
| US5043002A (en) * | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
| JP2669976B2 (ja) * | 1991-09-24 | 1997-10-29 | 国際電信電話株式会社 | 光増幅器用エルビウムド−プファイバ |
| JPH05105471A (ja) | 1991-10-11 | 1993-04-27 | Fujikura Ltd | 光フアイバ母材の製造方法 |
| KR100342189B1 (ko) * | 1995-07-12 | 2002-11-30 | 삼성전자 주식회사 | 휘발성복합체를사용한희토류원소첨가광섬유제조방법 |
| DE19725955C1 (de) * | 1997-06-19 | 1999-01-21 | Heraeus Quarzglas | Verfahren zur Herstellung eines Quarzglasrohlings und dafür geeignete Vorrichtung |
| FI116469B (fi) | 1998-10-05 | 2005-11-30 | Liekki Oy | Liekkiruiskutusmenetelmä ja -laitteisto monikomponenttilasin valmistamiseksi |
| US20020005051A1 (en) * | 2000-04-28 | 2002-01-17 | Brown John T. | Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same |
-
2002
- 2002-06-28 FI FI20021269A patent/FI115134B/fi not_active IP Right Cessation
-
2003
- 2003-06-27 JP JP2004516824A patent/JP2005531481A/ja active Pending
- 2003-06-27 CN CNB03815238XA patent/CN1301925C/zh not_active Expired - Lifetime
- 2003-06-27 AU AU2003238120A patent/AU2003238120A1/en not_active Abandoned
- 2003-06-27 DE DE60310420T patent/DE60310420T2/de not_active Expired - Lifetime
- 2003-06-27 AT AT03735740T patent/ATE348079T1/de not_active IP Right Cessation
- 2003-06-27 EP EP03735740A patent/EP1539648B1/en not_active Expired - Lifetime
- 2003-06-27 WO PCT/FI2003/000522 patent/WO2004002907A1/en not_active Ceased
- 2003-06-27 US US10/518,006 patent/US7624596B2/en not_active Expired - Lifetime
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7033952B2 (en) | Apparatus and method using a remote RF energized plasma for processing semiconductor wafers | |
| US4845054A (en) | Low temperature chemical vapor deposition of silicon dioxide films | |
| US6384292B1 (en) | Method for decomposition of chemical compounds | |
| US7358212B2 (en) | Method for producing multinary metal oxide powders in a pulsed reactor | |
| EP1778597B1 (en) | Method for producing an optical waveguide material | |
| EP0212691A1 (en) | Low temperature chemical vapor deposition of silicon dioxide films | |
| JP2015187059A (ja) | 炭酸化物からの遊離炭素製造方法 | |
| EP1728893A2 (en) | Process for forming zinc oxide film | |
| JPS6112844B2 (enExample) | ||
| JPS5662328A (en) | Manufacturing of insulation membrane and insulation membrane-semiconductor interface | |
| US5663476A (en) | Apparatus and method for decomposition of chemical compounds by increasing residence time of a chemical compound in a reaction chamber | |
| CN1038741C (zh) | N2o等离子化学转化为nox和/或其衍生物的方法 | |
| US6335295B1 (en) | Flame-free wet oxidation | |
| KR102588038B1 (ko) | 이산화규소 및 금속 산화물의 제조를 위한 액체 원료의 분무 증발 | |
| CN1301925C (zh) | 制备掺杂氧化物材料的方法 | |
| SU1170966A3 (ru) | Способ получени высокодисперсной двуокиси кремни | |
| JP2645639B2 (ja) | 高分散性ケイ酸の製造方法および該方法を実施するのための装置 | |
| JP2006077153A (ja) | 蛍光体の製造方法及び製造装置、並びに蛍光体粒子及びその前駆体 | |
| CN112010339B (zh) | 一种高纯无水氯化稀土的制备方法 | |
| JPS63103814A (ja) | SiO微粉末の製造装置 | |
| RU2003105881A (ru) | Способ получения эпоксисоединений путем окисления олефинов | |
| JP3164621B2 (ja) | 窒化ホウ素の製造法 | |
| CN108394876B (zh) | 氮硅烷及其生产方法、氮化硅及其生产方法 | |
| JPS62197317A (ja) | バナジウム低級酸化物の製法 | |
| JP2602813B2 (ja) | シリカガラスの製造法 |