JP2005531028A5 - - Google Patents

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Publication number
JP2005531028A5
JP2005531028A5 JP2004515620A JP2004515620A JP2005531028A5 JP 2005531028 A5 JP2005531028 A5 JP 2005531028A5 JP 2004515620 A JP2004515620 A JP 2004515620A JP 2004515620 A JP2004515620 A JP 2004515620A JP 2005531028 A5 JP2005531028 A5 JP 2005531028A5
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JP
Japan
Prior art keywords
sio
film
unit
silicone
refractive index
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JP2004515620A
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English (en)
Japanese (ja)
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JP2005531028A (ja
JP5064654B2 (ja
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Priority claimed from US10/178,975 external-priority patent/US6907176B2/en
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Publication of JP2005531028A publication Critical patent/JP2005531028A/ja
Publication of JP2005531028A5 publication Critical patent/JP2005531028A5/ja
Application granted granted Critical
Publication of JP5064654B2 publication Critical patent/JP5064654B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004515620A 2002-06-24 2003-03-28 平面光導波路組立品、およびその製造方法 Expired - Fee Related JP5064654B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/178,975 US6907176B2 (en) 2002-06-24 2002-06-24 Planar optical waveguide assembly and method of preparing same
US10/178,975 2002-06-24
PCT/US2003/009598 WO2004000942A1 (en) 2002-06-24 2003-03-28 Planar optical waveguide assembly and method of preparing same

Publications (3)

Publication Number Publication Date
JP2005531028A JP2005531028A (ja) 2005-10-13
JP2005531028A5 true JP2005531028A5 (https=) 2010-11-11
JP5064654B2 JP5064654B2 (ja) 2012-10-31

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ID=29734831

Family Applications (1)

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JP2004515620A Expired - Fee Related JP5064654B2 (ja) 2002-06-24 2003-03-28 平面光導波路組立品、およびその製造方法

Country Status (5)

Country Link
US (2) US6907176B2 (https=)
EP (1) EP1523525B1 (https=)
JP (1) JP5064654B2 (https=)
AU (1) AU2003218445A1 (https=)
WO (1) WO2004000942A1 (https=)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5132027B2 (ja) * 2004-05-12 2013-01-30 株式会社Adeka ケイ素含有硬化性組成物、及びこれを熱硬化させた硬化物
CA2575238C (en) * 2004-08-11 2015-04-21 Dow Corning Corporation Photopolymerizable silicone materials forming semipermeable membranes for sensor applications
JP4660182B2 (ja) * 2004-12-20 2011-03-30 東レ・ダウコーニング株式会社 活性化エネルギー線硬化性シリコーン組成物及びそれを用いたネガ型パターン形成方法
WO2006093639A1 (en) * 2005-03-01 2006-09-08 Dow Corning Corporation Temporary wafer bonding method for semiconductor processing
CN101163748B (zh) * 2005-05-26 2011-04-13 陶氏康宁公司 用于模塑小的型材的方法和有机硅封装剂组合物
KR101325792B1 (ko) * 2006-01-17 2013-11-04 다우 코닝 코포레이션 열 안정성 투명 실리콘 수지 조성물 및 이의 제조 방법 및용도
CN101336383B (zh) * 2006-02-01 2012-05-09 陶氏康宁公司 抗冲击的光波导管及其制造方法
WO2007100445A2 (en) * 2006-02-24 2007-09-07 Dow Corning Corporation Light emitting device encapsulated with silicones and curable silicone compositions for preparing the silicones
JP2007279237A (ja) * 2006-04-04 2007-10-25 Nitto Denko Corp 光導波路の製法
MY147460A (en) * 2006-08-28 2012-12-14 Dow Corning Optical devices and silicone compositions and process fabricating the optical devices
JP4458136B2 (ja) * 2007-09-06 2010-04-28 オムロン株式会社 有機デバイス、及び有機デバイスの製造方法
US7944781B2 (en) * 2007-10-16 2011-05-17 Seagate Technology Llc Flexible waveguide with adjustable index of refraction
JP2009186577A (ja) * 2008-02-04 2009-08-20 Oki Semiconductor Co Ltd 光集積回路、光電子集積回路およびこれらの製造方法
JP5353407B2 (ja) * 2009-04-22 2013-11-27 Jsr株式会社 ネガ型感放射線性組成物、硬化パターン形成方法及び硬化パターン
EP2517052B1 (en) 2009-12-21 2019-06-12 Dow Silicones Corporation Methods for fabricating flexible waveguides using alkyl-functional silsesquioxane resins
KR20120132624A (ko) 2010-02-12 2012-12-06 다우 코닝 코포레이션 반도체 가공을 위한 임시 웨이퍼 접합 방법
US8742009B2 (en) * 2010-06-04 2014-06-03 Shin-Etsu Chemical Co., Ltd. Temporary adhesive composition, and method of producing thin wafer
DE102010043149A1 (de) * 2010-10-29 2012-05-03 Wacker Chemie Ag Hochtransparente durch Licht vernetzbare Siliconmischungen
TW201319170A (zh) 2011-05-25 2013-05-16 Dow Corning 在溶劑顯影期間增強膜保留和黏附之含有環氧官能化矽氧烷寡聚物的環氧官能化的可輻射固化組合物
JP5592330B2 (ja) * 2011-10-07 2014-09-17 信越化学工業株式会社 仮接着剤組成物、及びそれを用いた薄型ウエハの製造方法
WO2015088932A1 (en) * 2013-12-09 2015-06-18 3M Innovative Properties Company Curable silsesquioxane polymers, compositions, articles, and methods
JP2017528577A (ja) 2014-09-22 2017-09-28 スリーエム イノベイティブ プロパティズ カンパニー シルセスキオキサンポリマーコア、シルセスキオキサンポリマー外層、及び反応性基を含む硬化性ポリマー
US9957416B2 (en) * 2014-09-22 2018-05-01 3M Innovative Properties Company Curable end-capped silsesquioxane polymer comprising reactive groups
SG11202001247PA (en) * 2017-08-24 2020-03-30 Dow Global Technologies Llc Method for optical waveguide fabrication
WO2019040582A1 (en) * 2017-08-25 2019-02-28 Arizona Board Of Regents On Behalf Of The University Of Arizona HIGH-EFFICIENCY FABRICATION OF PHOTONIC INTEGRATED CIRCUIT (PIC) WAVEGUIDES USING MULTIPLE EXHIBITIONS

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4530879A (en) * 1983-03-04 1985-07-23 Minnesota Mining And Manufacturing Company Radiation activated addition reaction
ES520422A0 (es) 1983-03-08 1984-03-16 Zottnik Edmund Sistema codificado de validacion y comando.
US4510094A (en) 1983-12-06 1985-04-09 Minnesota Mining And Manufacturing Company Platinum complex
JPS61275706A (ja) 1985-05-30 1986-12-05 Sumitomo Electric Ind Ltd 光導波路
CA2014996A1 (en) 1989-05-19 1990-11-19 Joel D. Oxman Radiation activated hydrosilation reaction
JPH089006B2 (ja) * 1989-11-15 1996-01-31 信越化学工業株式会社 白金触媒組成物及びその製造方法
DE4423195A1 (de) * 1994-07-01 1996-01-04 Wacker Chemie Gmbh Triazenoxid-Übergangsmetall-Komplexe als Hydrosilylierungskatalysatoren
JPH09124793A (ja) 1995-11-02 1997-05-13 Nippon Telegr & Teleph Corp <Ntt> 高分子光学材料及びその製造方法及び高分子光導波路
US5972516A (en) * 1996-02-29 1999-10-26 Kyocera Corporation Method for manufacturing optical waveguide using siloxane polymer, and optoelectronic hybrid substrate using the optical waveguide
JPH10148729A (ja) 1996-11-21 1998-06-02 Nippon Telegr & Teleph Corp <Ntt> 高分子光導波路コア部のリッジ・パターン形成方法
JP2000090643A (ja) 1998-09-08 2000-03-31 Matsushita Electric Ind Co Ltd 記憶装置
US6344520B1 (en) * 1999-06-24 2002-02-05 Wacker Silicones Corporation Addition-crosslinkable epoxy-functional organopolysiloxane polymer and coating compositions
TW581746B (en) 1999-11-12 2004-04-01 Nippon Sheet Glass Co Ltd Photosensitive composition, optical waveguide element and production process therefor
US6415093B1 (en) * 2000-08-17 2002-07-02 Nippon Sheet Glass Co., Ltd. Optical device and adhesive composition used therefor
JP4885351B2 (ja) * 2000-11-10 2012-02-29 東レ・ダウコーニング株式会社 有機樹脂用添加剤および有機樹脂組成物
US6991887B1 (en) 2000-11-01 2006-01-31 Battelle Memorial Institute Photopatternable sorbent and functionalized films
JP4803884B2 (ja) * 2001-01-31 2011-10-26 キヤノン株式会社 薄膜半導体装置の製造方法
JP4708577B2 (ja) * 2001-01-31 2011-06-22 キヤノン株式会社 薄膜半導体装置の製造方法
US6617674B2 (en) 2001-02-20 2003-09-09 Dow Corning Corporation Semiconductor package and method of preparing same
US20030052082A1 (en) * 2001-09-19 2003-03-20 Anisul Khan Method of forming optical waveguides in a semiconductor substrate
JP3952149B2 (ja) * 2002-02-06 2007-08-01 信越化学工業株式会社 光導波路形成用材料及び光導波路の製造方法
US6905904B2 (en) * 2002-06-24 2005-06-14 Dow Corning Corporation Planar optical waveguide assembly and method of preparing same
JP2004186168A (ja) * 2002-11-29 2004-07-02 Shin Etsu Chem Co Ltd 発光ダイオード素子用シリコーン樹脂組成物

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