JP2005528736A5 - - Google Patents
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- JP2005528736A5 JP2005528736A5 JP2003581278A JP2003581278A JP2005528736A5 JP 2005528736 A5 JP2005528736 A5 JP 2005528736A5 JP 2003581278 A JP2003581278 A JP 2003581278A JP 2003581278 A JP2003581278 A JP 2003581278A JP 2005528736 A5 JP2005528736 A5 JP 2005528736A5
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- metal layer
- tantalum
- copper
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010410 layer Substances 0.000 claims 156
- 229910052751 metal Inorganic materials 0.000 claims 131
- 239000002184 metal Substances 0.000 claims 131
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 60
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims 58
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 50
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 39
- 229910052802 copper Inorganic materials 0.000 claims 39
- 239000010949 copper Substances 0.000 claims 39
- 229910052715 tantalum Inorganic materials 0.000 claims 36
- 229910052759 nickel Inorganic materials 0.000 claims 30
- 229910052703 rhodium Inorganic materials 0.000 claims 30
- 239000010948 rhodium Substances 0.000 claims 30
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims 30
- 229910052779 Neodymium Inorganic materials 0.000 claims 29
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 29
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims 29
- 229910052763 palladium Inorganic materials 0.000 claims 29
- 229910052726 zirconium Inorganic materials 0.000 claims 29
- 229910052741 iridium Inorganic materials 0.000 claims 25
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims 25
- 229910052758 niobium Inorganic materials 0.000 claims 25
- 239000010955 niobium Substances 0.000 claims 25
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims 25
- 229910052697 platinum Inorganic materials 0.000 claims 25
- 239000000758 substrate Substances 0.000 claims 25
- 229910052770 Uranium Inorganic materials 0.000 claims 23
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 23
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 22
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 20
- 229910052750 molybdenum Inorganic materials 0.000 claims 20
- 239000011733 molybdenum Substances 0.000 claims 20
- 229910052719 titanium Inorganic materials 0.000 claims 20
- 239000010936 titanium Substances 0.000 claims 20
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 20
- 229910052721 tungsten Inorganic materials 0.000 claims 20
- 239000010937 tungsten Substances 0.000 claims 20
- DNYWZCXLKNTFFI-UHFFFAOYSA-N uranium Chemical compound [U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U] DNYWZCXLKNTFFI-UHFFFAOYSA-N 0.000 claims 19
- 229910052720 vanadium Inorganic materials 0.000 claims 19
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims 19
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 18
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 18
- 229910052737 gold Inorganic materials 0.000 claims 18
- 239000010931 gold Substances 0.000 claims 18
- 239000000853 adhesive Substances 0.000 claims 17
- 230000001070 adhesive effect Effects 0.000 claims 17
- 239000011248 coating agent Substances 0.000 claims 17
- 238000000576 coating method Methods 0.000 claims 17
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 15
- 229910052709 silver Inorganic materials 0.000 claims 15
- 239000004332 silver Substances 0.000 claims 15
- 229910052702 rhenium Inorganic materials 0.000 claims 13
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims 13
- 229910017052 cobalt Inorganic materials 0.000 claims 12
- 239000010941 cobalt Substances 0.000 claims 12
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 12
- 229910052742 iron Inorganic materials 0.000 claims 11
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 10
- 229910052707 ruthenium Inorganic materials 0.000 claims 10
- 229910052782 aluminium Inorganic materials 0.000 claims 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 9
- 229910052762 osmium Inorganic materials 0.000 claims 9
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims 9
- 229910052691 Erbium Inorganic materials 0.000 claims 8
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 claims 8
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 claims 8
- 229910001040 Beta-titanium Inorganic materials 0.000 claims 7
- 229910052692 Dysprosium Inorganic materials 0.000 claims 7
- 229910052688 Gadolinium Inorganic materials 0.000 claims 7
- 229910052772 Samarium Inorganic materials 0.000 claims 7
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 claims 7
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 claims 7
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 claims 7
- 229910052716 thallium Inorganic materials 0.000 claims 7
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 claims 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 6
- 229910052739 hydrogen Inorganic materials 0.000 claims 6
- 239000001257 hydrogen Substances 0.000 claims 6
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims 5
- 150000002500 ions Chemical class 0.000 claims 5
- 229910052749 magnesium Inorganic materials 0.000 claims 5
- 239000011777 magnesium Substances 0.000 claims 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 4
- 229910052804 chromium Inorganic materials 0.000 claims 4
- 239000011651 chromium Substances 0.000 claims 4
- 229910052735 hafnium Inorganic materials 0.000 claims 4
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims 4
- 239000000463 material Substances 0.000 claims 4
- 150000002739 metals Chemical class 0.000 claims 4
- 238000000034 method Methods 0.000 claims 4
- 229910003481 amorphous carbon Inorganic materials 0.000 claims 3
- 229920006395 saturated elastomer Polymers 0.000 claims 3
- 230000004888 barrier function Effects 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 2
- 230000008021 deposition Effects 0.000 claims 2
- 229910001092 metal group alloy Inorganic materials 0.000 claims 2
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 claims 1
- 235000017166 Bambusa arundinacea Nutrition 0.000 claims 1
- 235000017491 Bambusa tulda Nutrition 0.000 claims 1
- 241001330002 Bambuseae Species 0.000 claims 1
- 235000015334 Phyllostachys viridis Nutrition 0.000 claims 1
- 229910052776 Thorium Inorganic materials 0.000 claims 1
- 239000011425 bamboo Substances 0.000 claims 1
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 229910003460 diamond Inorganic materials 0.000 claims 1
- 239000010432 diamond Substances 0.000 claims 1
- 238000006073 displacement reaction Methods 0.000 claims 1
- 238000004070 electrodeposition Methods 0.000 claims 1
- 238000007772 electroless plating Methods 0.000 claims 1
- 230000004807 localization Effects 0.000 claims 1
- 238000001755 magnetron sputter deposition Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 238000005240 physical vapour deposition Methods 0.000 claims 1
- 238000007747 plating Methods 0.000 claims 1
- 239000011241 protective layer Substances 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- 230000008961 swelling Effects 0.000 claims 1
- -1 tantalum nitride compound Chemical class 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/107,747 US6921469B2 (en) | 2002-03-26 | 2002-03-26 | Electrode constructs, and related cells and methods |
| PCT/US2003/009024 WO2003083965A2 (en) | 2002-03-26 | 2003-03-26 | Electrode constructs, and related cells and methods |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005528736A JP2005528736A (ja) | 2005-09-22 |
| JP2005528736A5 true JP2005528736A5 (enExample) | 2006-05-18 |
Family
ID=28673581
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003581278A Pending JP2005528736A (ja) | 2002-03-26 | 2003-03-26 | 電極構造および関連する電池および方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6921469B2 (enExample) |
| EP (1) | EP1495159A4 (enExample) |
| JP (1) | JP2005528736A (enExample) |
| CN (1) | CN1650050A (enExample) |
| AU (1) | AU2003237788A1 (enExample) |
| IL (2) | IL164113A0 (enExample) |
| WO (1) | WO2003083965A2 (enExample) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7866342B2 (en) | 2002-12-18 | 2011-01-11 | Vapor Technologies, Inc. | Valve component for faucet |
| US8220489B2 (en) | 2002-12-18 | 2012-07-17 | Vapor Technologies Inc. | Faucet with wear-resistant valve component |
| US7866343B2 (en) | 2002-12-18 | 2011-01-11 | Masco Corporation Of Indiana | Faucet |
| US8555921B2 (en) | 2002-12-18 | 2013-10-15 | Vapor Technologies Inc. | Faucet component with coating |
| WO2004091060A1 (ja) * | 2003-04-10 | 2004-10-21 | Okaya Electric Industries Co., Ltd. | 放電管及びサージ吸収素子 |
| US7189431B2 (en) * | 2004-09-30 | 2007-03-13 | Tokyo Electron Limited | Method for forming a passivated metal layer |
| KR100578976B1 (ko) * | 2004-10-15 | 2006-05-12 | 삼성에스디아이 주식회사 | 접착력이 우수한 다층 박막 및 이의 제조방법 |
| WO2006102224A2 (en) * | 2005-03-18 | 2006-09-28 | Cone Partners, Ltd. | Low temperature fusion |
| JP4728745B2 (ja) * | 2005-08-29 | 2011-07-20 | 株式会社東芝 | 熱電素子デバイス及び熱電モジュール |
| RU2296185C1 (ru) * | 2005-09-16 | 2007-03-27 | Государственное образовательное учреждение высшего профессионального образования "Удмуртский государственный университет" | Способ упрочнения изделий |
| TW200738911A (en) | 2006-01-20 | 2007-10-16 | Toyo Tanso Co | Electrolytic apparatus for producing fluorine or nitrogen trifluoride |
| US8603405B2 (en) | 2007-03-29 | 2013-12-10 | Npl Associates, Inc. | Power units based on dislocation site techniques |
| US8440165B2 (en) * | 2007-03-29 | 2013-05-14 | Npl Associates, Inc. | Dislocation site density techniques |
| US8227020B1 (en) | 2007-03-29 | 2012-07-24 | Npl Associates, Inc. | Dislocation site formation techniques |
| US8970504B2 (en) * | 2008-04-25 | 2015-03-03 | Apple Inc. | Reliability metal traces |
| US8709659B2 (en) * | 2009-02-27 | 2014-04-29 | Toyota Motor Engineering & Manufacturing North America, Inc. | Electrode composition with enhanced performance characteristics |
| US20120172773A1 (en) * | 2009-09-22 | 2012-07-05 | David Combs | Durable electrode construction for an orthotic device |
| US8901433B2 (en) | 2010-09-10 | 2014-12-02 | Hitachi Chemical Co., Ltd. | Individually addressable band electrode arrays and methods to prepare the same |
| WO2012154482A2 (en) * | 2011-05-09 | 2012-11-15 | Sheetak, Inc. | Improved thermoelectric energy converters with reduced interface interface losses and manufacturing method thereof |
| CN102522325B (zh) * | 2011-11-15 | 2015-02-11 | 北京时代民芯科技有限公司 | 一种亚微米多层金属电极的制作方法 |
| US9190592B2 (en) * | 2012-11-06 | 2015-11-17 | Nextreme Thermal Solutions, Inc. | Thin film thermoelectric devices having favorable crystal tilt |
| JP6486600B2 (ja) * | 2014-03-27 | 2019-03-20 | 三菱重工業株式会社 | 核種変換システム及び核種変換方法 |
| WO2017015204A1 (en) * | 2015-07-17 | 2017-01-26 | Cornell University | Copper palladium compositions as oxidation and reduction catalysts |
| EP3472340B1 (en) | 2016-06-15 | 2023-08-16 | Eastman Chemical Company | Physical vapor deposited biosensor components |
| WO2017223348A1 (en) * | 2016-06-22 | 2017-12-28 | Alcoa Usa Corp. | Multilayer electrode |
| US9748173B1 (en) | 2016-07-06 | 2017-08-29 | International Business Machines Corporation | Hybrid interconnects and method of forming the same |
| WO2018052713A1 (en) | 2016-09-16 | 2018-03-22 | Eastman Chemical Company | Biosensor electrodes prepared by physical vapor deposition |
| JP7096816B2 (ja) | 2016-09-16 | 2022-07-06 | イーストマン ケミカル カンパニー | 物理蒸着によって製造されるバイオセンサー電極 |
| CN110291386A (zh) * | 2016-11-30 | 2019-09-27 | 美国圣戈班性能塑料公司 | 电极和用于制造电极的方法 |
| KR102646492B1 (ko) | 2017-06-22 | 2024-03-12 | 이스트만 케미칼 컴파니 | 물리적으로 증착된 전기화학 센서용 전극 |
| US10640874B2 (en) * | 2017-08-14 | 2020-05-05 | Lam Research Corporation | Selective electroless electrochemical atomic layer deposition in an aqueous solution without external voltage bias |
| WO2020093375A1 (zh) * | 2018-11-09 | 2020-05-14 | 深圳市元子科技有限公司 | 膜及制备工艺 |
| EP3973583A1 (en) | 2019-05-22 | 2022-03-30 | Sion Power Corporation | Electrically coupled electrodes, and associated articles and methods |
| CN116162968B (zh) * | 2023-03-17 | 2023-09-22 | 赣州晨光稀土新材料有限公司 | 一种稀土熔盐电解用钨电极及其制备方法 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4414064A (en) | 1979-12-17 | 1983-11-08 | Occidental Chemical Corporation | Method for preparing low voltage hydrogen cathodes |
| JPH01291401A (ja) * | 1988-05-19 | 1989-11-24 | Fuji Elelctrochem Co Ltd | 薄膜抵抗体及びその製造方法 |
| US5200051A (en) * | 1988-11-14 | 1993-04-06 | I-Stat Corporation | Wholly microfabricated biosensors and process for the manufacture and use thereof |
| US4943355A (en) | 1989-05-16 | 1990-07-24 | Patterson James A | Improved process for producing uniformly plated microspheres |
| US5036031A (en) | 1989-05-16 | 1991-07-30 | Patterson James A | Metal plated microsphere catalyst |
| WO1992007968A1 (en) * | 1990-10-26 | 1992-05-14 | International Business Machines Corporation | STRUCTURE AND METHOD OF MAKING ALPHA-Ta IN THIN FILMS |
| US5318675A (en) | 1993-07-20 | 1994-06-07 | Patterson James A | Method for electrolysis of water to form metal hydride |
| US5372688A (en) | 1993-07-20 | 1994-12-13 | Patterson; James A. | System for electrolysis of liquid electrolyte |
| US5494559A (en) | 1995-06-08 | 1996-02-27 | Patterson; James A. | System for electrolysis |
| US5616219A (en) | 1995-06-13 | 1997-04-01 | Patterson; James A. | System and method for electrolysis and heating of water |
| US5607563A (en) | 1995-12-04 | 1997-03-04 | Patterson; James A. | System for electrolysis |
| US5618394A (en) | 1996-01-16 | 1997-04-08 | Patterson; James A. | System and electrolytic cell having inert spherical core catalytic elements for heating a liquid electrolyte |
| US5632871A (en) | 1996-01-25 | 1997-05-27 | Patterson; James A. | System and electrolytic cell having pure metal catalytic elements for heating a liquid electrolyte |
| US5628886A (en) | 1996-02-09 | 1997-05-13 | Patterson; James A. | Electrolytic system for heating a liquid electrolyte |
| US5628887A (en) | 1996-04-15 | 1997-05-13 | Patterson; James A. | Electrolytic system and cell |
| US5672259A (en) | 1996-05-24 | 1997-09-30 | Patterson; James A. | System with electrolytic cell and method for producing heat and reducing radioactivity of a radioactive material by electrolysis |
| US5676816A (en) | 1996-07-12 | 1997-10-14 | Patterson; James A. | Catalytic particles electrolytic cell system and method for producing heat |
| AU4075497A (en) | 1996-08-19 | 1998-03-06 | George H Miley | Flake-resistant multilayer thin-film electrodes and electrolytic cells incorporating same |
| US5755937A (en) | 1996-11-13 | 1998-05-26 | Patterson; James A. | Apparatus for applying layers of metal onto a surface |
| US6057237A (en) * | 1997-04-29 | 2000-05-02 | Applied Materials, Inc. | Tantalum-containing barrier layers for copper |
| US6140234A (en) * | 1998-01-20 | 2000-10-31 | International Business Machines Corporation | Method to selectively fill recesses with conductive metal |
| JP2003524283A (ja) * | 2000-02-25 | 2003-08-12 | ラティス・エナジー・エルエルシー | 電池、部材および方法 |
-
2002
- 2002-03-26 US US10/107,747 patent/US6921469B2/en not_active Expired - Fee Related
-
2003
- 2003-03-26 WO PCT/US2003/009024 patent/WO2003083965A2/en not_active Ceased
- 2003-03-26 IL IL16411303A patent/IL164113A0/xx active IP Right Grant
- 2003-03-26 CN CNA038099551A patent/CN1650050A/zh active Pending
- 2003-03-26 AU AU2003237788A patent/AU2003237788A1/en not_active Abandoned
- 2003-03-26 EP EP03736446A patent/EP1495159A4/en not_active Withdrawn
- 2003-03-26 JP JP2003581278A patent/JP2005528736A/ja active Pending
-
2004
- 2004-09-15 IL IL164113A patent/IL164113A/en not_active IP Right Cessation
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