JP2005517055A5 - - Google Patents

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Publication number
JP2005517055A5
JP2005517055A5 JP2003566058A JP2003566058A JP2005517055A5 JP 2005517055 A5 JP2005517055 A5 JP 2005517055A5 JP 2003566058 A JP2003566058 A JP 2003566058A JP 2003566058 A JP2003566058 A JP 2003566058A JP 2005517055 A5 JP2005517055 A5 JP 2005517055A5
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JP
Japan
Prior art keywords
alkyl
phenyl
substituted
unsubstituted
alkoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003566058A
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English (en)
Japanese (ja)
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JP4222945B2 (ja
JP2005517055A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2003/000820 external-priority patent/WO2003066688A1/en
Publication of JP2005517055A publication Critical patent/JP2005517055A/ja
Publication of JP2005517055A5 publication Critical patent/JP2005517055A5/ja
Application granted granted Critical
Publication of JP4222945B2 publication Critical patent/JP4222945B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003566058A 2002-02-04 2003-01-28 界面活性シロキサン光開始剤 Expired - Fee Related JP4222945B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02405069 2002-02-04
PCT/EP2003/000820 WO2003066688A1 (en) 2002-02-04 2003-01-28 Surface-active siloxane photoinitiators

Publications (3)

Publication Number Publication Date
JP2005517055A JP2005517055A (ja) 2005-06-09
JP2005517055A5 true JP2005517055A5 (https=) 2006-03-09
JP4222945B2 JP4222945B2 (ja) 2009-02-12

Family

ID=27675787

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003566058A Expired - Fee Related JP4222945B2 (ja) 2002-02-04 2003-01-28 界面活性シロキサン光開始剤

Country Status (7)

Country Link
US (1) US7105582B2 (https=)
EP (1) EP1472292B1 (https=)
JP (1) JP4222945B2 (https=)
AT (1) ATE402195T1 (https=)
AU (1) AU2003244439A1 (https=)
DE (1) DE60322345D1 (https=)
WO (1) WO2003066688A1 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10022352A1 (de) * 2000-05-08 2001-11-22 Georg Gros Verfahren zur Beschichtung von elektrolytisch- oder feuerverzinkten Blechen
WO2002024344A2 (de) * 2000-09-25 2002-03-28 Chemetall Gmbh Verfahren zur vorbehandlung und beschichtung von metallischen oberflächen vor der umformung mit einem lackähnlichen überzug und verwendung der derart beschichteten substrate
ATE527304T1 (de) * 2003-06-06 2011-10-15 Basf Se Neue oberflächenaktive polysiloxanphotoinitiatoren
DE602005002656T2 (de) * 2004-04-19 2008-07-17 Ciba Specialty Chemicals Holding Inc. Patent Departement Neue photoinitiatoren
ITVA20050032A1 (it) * 2005-05-13 2006-11-14 Lamberti Spa Esteri fenilgliossilici generanti residui a bassa migrabilita' e odore
WO2006137261A1 (ja) * 2005-06-21 2006-12-28 Konica Minolta Medical & Graphic, Inc. 感光性組成物、感光性平版印刷版材料および平版印刷版材料の画像形成方法
US7838698B2 (en) 2006-09-29 2010-11-23 Johnson & Johnson Vision Care, Inc. Hydrolysis-resistant silicone compounds
US9056880B2 (en) 2006-09-29 2015-06-16 Johnson & Johnson Vision Care, Inc. Process for producing hydrolysis-resistant silicone compounds
JP5594099B2 (ja) * 2010-12-01 2014-09-24 コニカミノルタ株式会社 ガスバリア性フィルムの製造方法
WO2020136522A1 (en) * 2018-12-28 2020-07-02 Igm Resins Italia S.R.L. Photoinitiators
CN109880103B (zh) * 2019-01-08 2021-02-26 广东博兴新材料科技有限公司 一种亚磷酸酯类丙烯酸酯化合物及其制备方法和应用
JP7335217B2 (ja) * 2020-09-24 2023-08-29 信越化学工業株式会社 感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4507187A (en) 1984-04-19 1985-03-26 Loctite Corporation Siloxane photoinitiators with aryoyl formate groups
DK0956280T3 (da) * 1997-01-30 2003-02-24 Ciba Sc Holding Ag Ikke-flygtige phenylglyoxylsyreestere
DE59912389D1 (de) 1999-01-16 2005-09-15 Goldschmidt Gmbh Photoinitiatoren zur kationischen Härtung
DE19913353A1 (de) * 1999-03-24 2000-09-28 Basf Ag Verwendung von Phenylglyoxalsäureestern als Photoinitiatoren
TW557298B (en) * 2000-08-14 2003-10-11 Ciba Sc Holding Ag A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings
TWI244495B (en) 2000-08-14 2005-12-01 Ciba Sc Holding Ag Process for producing coatings siloxane photoinitiators
CN1286984C (zh) * 2002-03-06 2006-11-29 西巴特殊化学品控股有限公司 用于制备含有机硅基团的光敏引发剂的酶促方法

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