JP2005513478A - Ｘ線スペクトルの放射線量子の背景補正された計数を決定する方法、及び放射線解析装置並びにコンピュータプログラム - Google Patents

Ｘ線スペクトルの放射線量子の背景補正された計数を決定する方法、及び放射線解析装置並びにコンピュータプログラム Download PDF

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JP2005513478A
JP2005513478A JP2003555195A JP2003555195A JP2005513478A JP 2005513478 A JP2005513478 A JP 2005513478A JP 2003555195 A JP2003555195 A JP 2003555195A JP 2003555195 A JP2003555195 A JP 2003555195A JP 2005513478 A JP2005513478 A JP 2005513478A
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measurement window
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sample
radiation
count
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JP2005513478A5 (cg-RX-API-DMAC7.html
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ベスケ クラウス
イェー イェー ボルク ヘンドリック
セー ペー ジールチェンス ゲオルゲス
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Koninklijke Philips NV
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
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  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
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JP2003555195A 2001-12-20 2002-11-14 Ｘ線スペクトルの放射線量子の背景補正された計数を決定する方法、及び放射線解析装置並びにコンピュータプログラム Pending JP2005513478A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP01205042 2001-12-20
PCT/IB2002/004817 WO2003054531A1 (en) 2001-12-20 2002-11-14 A method of determining the background corrected counts of radiation quanta in an x-ray energy spectrum

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JP2008253361A Division JP2008309807A (ja) 2001-12-20 2008-09-30 Ｘ線エネルギースペクトルの放射線量子の背景補正された計数を決定する方法

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JP2005513478A true JP2005513478A (ja) 2005-05-12
JP2005513478A5 JP2005513478A5 (cg-RX-API-DMAC7.html) 2006-01-19

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JP2003555195A Pending JP2005513478A (ja) 2001-12-20 2002-11-14 Ｘ線スペクトルの放射線量子の背景補正された計数を決定する方法、及び放射線解析装置並びにコンピュータプログラム
JP2008253361A Pending JP2008309807A (ja) 2001-12-20 2008-09-30 Ｘ線エネルギースペクトルの放射線量子の背景補正された計数を決定する方法

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US (1) US20050067581A1 (cg-RX-API-DMAC7.html)
EP (1) EP1459056A1 (cg-RX-API-DMAC7.html)
JP (2) JP2005513478A (cg-RX-API-DMAC7.html)
AU (1) AU2002348921A1 (cg-RX-API-DMAC7.html)
WO (1) WO2003054531A1 (cg-RX-API-DMAC7.html)

Cited By (1)

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CN102472750A (zh) * 2009-08-19 2012-05-23 皇家飞利浦电子股份有限公司 通过团簇的形成对不同目标成分进行检测

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US8550738B2 (en) 2008-08-28 2013-10-08 Hct Asia Ltd Flow-through dispenser with helical actuation
US8534948B2 (en) 2009-03-06 2013-09-17 Hct Asia Ltd Dispenser with a cam path
JP5076012B1 (ja) * 2011-05-20 2012-11-21 株式会社リガク 波長分散型蛍光ｘ線分析装置
CN104956211B (zh) * 2012-11-29 2019-01-11 赫尔穆特费希尔有限责任公司电子及测量技术研究所 用于实施x-射线荧光分析的方法和设备
EP3193661A4 (en) 2014-09-18 2018-04-04 HCT Group Holding Limited Container with quick release base and lid assembly
US9341596B1 (en) 2014-12-22 2016-05-17 International Business Machines Corporation Annular gas ionization delta E-E detector
US9993059B2 (en) 2015-07-10 2018-06-12 HCT Group Holdings Limited Roller applicator
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JP2018091691A (ja) * 2016-12-01 2018-06-14 株式会社リガク 蛍光ｘ線分析装置
CN111551579B (zh) * 2020-06-03 2021-02-12 中国地质大学（武汉） 一种利用空白校正确定x射线背景强度的方法
CN115097512B (zh) * 2022-06-20 2025-08-12 上海市计量测试技术研究院 能谱数据处理方法、装置、电子设备及存储介质

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JPS59214743A (ja) * 1983-05-20 1984-12-04 Jeol Ltd Ｘ線分析装置
GB8621983D0 (en) * 1986-09-12 1986-10-22 K X Technology Ltd Ore analysis
JP2564896B2 (ja) * 1988-06-28 1996-12-18 株式会社島津製作所 Ｘ線分光マッピング装置
JP2589638B2 (ja) * 1991-12-04 1997-03-12 理学電機工業株式会社 蛍光ｘ線分析方法および装置
JPH06174663A (ja) * 1992-12-01 1994-06-24 Toshiba Corp 汚染元素分析方法
JP2692538B2 (ja) * 1993-07-31 1997-12-17 株式会社島津製作所 Ｘ線分光分析におけるバックグラウンド補正方法
JP3198763B2 (ja) * 1993-12-01 2001-08-13 富士電機株式会社 波高安定化回路
US5712720A (en) * 1996-12-16 1998-01-27 Umax Data Systems Inc. Lens switching apparatus for dual-lens optical scanner
JP3301729B2 (ja) * 1998-07-31 2002-07-15 理学電機工業株式会社 定量分析による蛍光ｘ線分析方法および装置
JP3367478B2 (ja) * 1999-07-29 2003-01-14 株式会社島津製作所 蛍光ｘ線分析装置
JP4237891B2 (ja) * 1999-09-20 2009-03-11 株式会社堀場製作所 蛍光ｘ線分析装置のバックグラウンド補正方法及びその方法を用いる蛍光ｘ線分析装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102472750A (zh) * 2009-08-19 2012-05-23 皇家飞利浦电子股份有限公司 通过团簇的形成对不同目标成分进行检测

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AU2002348921A1 (en) 2003-07-09
JP2008309807A (ja) 2008-12-25
US20050067581A1 (en) 2005-03-31
EP1459056A1 (en) 2004-09-22
WO2003054531A1 (en) 2003-07-03

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