JP2005510520A - シリルオルガノメルカプタンの製造方法 - Google Patents
シリルオルガノメルカプタンの製造方法 Download PDFInfo
- Publication number
- JP2005510520A JP2005510520A JP2003542198A JP2003542198A JP2005510520A JP 2005510520 A JP2005510520 A JP 2005510520A JP 2003542198 A JP2003542198 A JP 2003542198A JP 2003542198 A JP2003542198 A JP 2003542198A JP 2005510520 A JP2005510520 A JP 2005510520A
- Authority
- JP
- Japan
- Prior art keywords
- dioxa
- bis
- tetrathia
- group
- propyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 239000003054 catalyst Substances 0.000 claims abstract description 41
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 22
- 239000001257 hydrogen Substances 0.000 claims abstract description 17
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 17
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims abstract description 16
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 14
- 231100000572 poisoning Toxicity 0.000 claims abstract description 14
- 230000000607 poisoning effect Effects 0.000 claims abstract description 14
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000003112 inhibitor Substances 0.000 claims abstract description 11
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910000037 hydrogen sulfide Inorganic materials 0.000 claims abstract description 9
- 238000004517 catalytic hydrocracking Methods 0.000 claims abstract description 8
- 239000000203 mixture Substances 0.000 claims abstract description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims abstract description 4
- 239000002184 metal Substances 0.000 claims abstract description 4
- 229910000077 silane Inorganic materials 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 24
- -1 methoxy, ethoxy, propoxy Chemical group 0.000 claims description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- FBBATURSCRIBHN-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyldisulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSCCC[Si](OCC)(OCC)OCC FBBATURSCRIBHN-UHFFFAOYSA-N 0.000 claims description 8
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 claims description 7
- 125000004122 cyclic group Chemical group 0.000 claims description 7
- 239000007983 Tris buffer Substances 0.000 claims description 6
- 229910052757 nitrogen Chemical group 0.000 claims description 6
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
- 125000005447 octyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 claims description 5
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000002947 alkylene group Chemical group 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- 239000011593 sulfur Chemical group 0.000 claims description 4
- KLFNHRIZTXWZHT-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltrisulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSCCC[Si](OCC)(OCC)OCC KLFNHRIZTXWZHT-UHFFFAOYSA-N 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 125000005842 heteroatom Chemical group 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 230000035484 reaction time Effects 0.000 claims description 3
- NQRACKNXKKOCJY-UHFFFAOYSA-N trimethoxy-[3-(3-trimethoxysilylpropyldisulfanyl)propyl]silane Chemical compound CO[Si](OC)(OC)CCCSSCCC[Si](OC)(OC)OC NQRACKNXKKOCJY-UHFFFAOYSA-N 0.000 claims description 3
- JTTSZDBCLAKKAY-UHFFFAOYSA-N trimethoxy-[3-(3-trimethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CO[Si](OC)(OC)CCCSSSSCCC[Si](OC)(OC)OC JTTSZDBCLAKKAY-UHFFFAOYSA-N 0.000 claims description 3
- KOFGNZOFJYBHIN-UHFFFAOYSA-N trimethoxy-[3-(3-trimethoxysilylpropyltrisulfanyl)propyl]silane Chemical compound CO[Si](OC)(OC)CCCSSSCCC[Si](OC)(OC)OC KOFGNZOFJYBHIN-UHFFFAOYSA-N 0.000 claims description 3
- KPJOTRNNFIYMTC-UHFFFAOYSA-N 3-[3-[diethoxy(methyl)silyl]propyldisulfanyl]propyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)CCCSSCCC[Si](C)(OCC)OCC KPJOTRNNFIYMTC-UHFFFAOYSA-N 0.000 claims description 2
- LGWOBHOCFTZTCS-UHFFFAOYSA-N 5-[3-[3-(4,6,11-trioxa-1-aza-5-silabicyclo[3.3.3]undecan-5-yl)propyltetrasulfanyl]propyl]-4,6,11-trioxa-1-aza-5-silabicyclo[3.3.3]undecane Chemical compound O1CCN(CCO2)CCO[Si]12CCCSSSSCCC[Si]1(OCC2)OCCN2CCO1 LGWOBHOCFTZTCS-UHFFFAOYSA-N 0.000 claims description 2
- RNDUGHLWGDWBEG-UHFFFAOYSA-N butoxy-[3-[3-(butoxy-ethoxy-phenylsilyl)propyltetrasulfanyl]propyl]-ethoxy-phenylsilane Chemical compound C=1C=CC=CC=1[Si](OCCCC)(OCC)CCCSSSSCCC[Si](OCC)(OCCCC)C1=CC=CC=C1 RNDUGHLWGDWBEG-UHFFFAOYSA-N 0.000 claims description 2
- MRSRSZLCKHHNGJ-UHFFFAOYSA-N butoxy-diethoxy-[3-[3-(ethoxy-methoxy-propoxysilyl)propyltetrasulfanyl]propyl]silane Chemical compound CCCCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OC)(OCC)OCCC MRSRSZLCKHHNGJ-UHFFFAOYSA-N 0.000 claims description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- JDBFWRXHZFUGPS-UHFFFAOYSA-N butyl-[3-[3-[butyl(dimethoxy)silyl]propyltrisulfanyl]propyl]-dimethoxysilane Chemical compound CCCC[Si](OC)(OC)CCCSSSCCC[Si](OC)(OC)CCCC JDBFWRXHZFUGPS-UHFFFAOYSA-N 0.000 claims description 2
- LOXHQCGRQKIWOF-UHFFFAOYSA-N cyclohexyloxysilane Chemical compound [SiH3]OC1CCCCC1 LOXHQCGRQKIWOF-UHFFFAOYSA-N 0.000 claims description 2
- DNEIHTQVTRMHCD-UHFFFAOYSA-N cyclopentyloxysilane Chemical compound [SiH3]OC1CCCC1 DNEIHTQVTRMHCD-UHFFFAOYSA-N 0.000 claims description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 2
- ATYIZISYPACGCO-UHFFFAOYSA-N tributoxy-[3-(3-tributoxysilylpropyldisulfanyl)propyl]silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)CCCSSCCC[Si](OCCCC)(OCCCC)OCCCC ATYIZISYPACGCO-UHFFFAOYSA-N 0.000 claims description 2
- VVKKLYJRUIYBJT-UHFFFAOYSA-N tributoxy-[3-(3-tributoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)CCCSSSSCCC[Si](OCCCC)(OCCCC)OCCCC VVKKLYJRUIYBJT-UHFFFAOYSA-N 0.000 claims description 2
- RZQBTSCSAIOITJ-UHFFFAOYSA-N tris(ethoxymethoxy)-[3-[3-[tris(ethoxymethoxy)silyl]propyltetrasulfanyl]propyl]silane Chemical compound CCOCO[Si](OCOCC)(OCOCC)CCCSSSSCCC[Si](OCOCC)(OCOCC)OCOCC RZQBTSCSAIOITJ-UHFFFAOYSA-N 0.000 claims description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 claims 1
- 230000037213 diet Effects 0.000 claims 1
- 235000005911 diet Nutrition 0.000 claims 1
- YDYHPGOBGSOLSY-UHFFFAOYSA-N ethyl-[3-(3-ethylsilylpropyltetrasulfanyl)propyl]silane Chemical compound CC[SiH2]CCCSSSSCCC[SiH2]CC YDYHPGOBGSOLSY-UHFFFAOYSA-N 0.000 claims 1
- 230000002401 inhibitory effect Effects 0.000 claims 1
- VSNLWWLPEJKFEI-UHFFFAOYSA-N trimethoxy-[3-(4-trimethoxysilylbutan-2-yldisulfanyl)butyl]silane Chemical compound CO[Si](OC)(OC)CCC(C)SSC(C)CC[Si](OC)(OC)OC VSNLWWLPEJKFEI-UHFFFAOYSA-N 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 15
- 230000003197 catalytic effect Effects 0.000 abstract description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract 2
- 239000000047 product Substances 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 150000002019 disulfides Chemical class 0.000 description 7
- 150000003568 thioethers Chemical class 0.000 description 6
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 6
- GUUVPOWQJOLRAS-UHFFFAOYSA-N Diphenyl disulfide Chemical compound C=1C=CC=CC=1SSC1=CC=CC=C1 GUUVPOWQJOLRAS-UHFFFAOYSA-N 0.000 description 4
- 239000005909 Kieselgur Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000007327 hydrogenolysis reaction Methods 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- 239000002574 poison Substances 0.000 description 4
- 231100000614 poison Toxicity 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- WAIPAZQMEIHHTJ-UHFFFAOYSA-N [Cr].[Co] Chemical compound [Cr].[Co] WAIPAZQMEIHHTJ-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000004817 gas chromatography Methods 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000010926 purge Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 229910052723 transition metal Inorganic materials 0.000 description 3
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- 238000003776 cleavage reaction Methods 0.000 description 2
- WQOXQRCZOLPYPM-UHFFFAOYSA-N dimethyl disulfide Chemical compound CSSC WQOXQRCZOLPYPM-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 229920001021 polysulfide Polymers 0.000 description 2
- 239000005077 polysulfide Substances 0.000 description 2
- 150000008117 polysulfides Polymers 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 230000007017 scission Effects 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- WBIZYAXYAGDQGK-ZZJOKYKRSA-N (2r)-2-amino-3-[[(2r)-2-amino-2-carboxyethyl]disulfanyl]butanoic acid Chemical compound OC(=O)[C@@H](N)C(C)SSC[C@H](N)C(O)=O WBIZYAXYAGDQGK-ZZJOKYKRSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- CWPFBRQCDRDQEH-UHFFFAOYSA-N 6-methylheptoxysilane Chemical compound C(CCCCC(C)C)O[SiH3] CWPFBRQCDRDQEH-UHFFFAOYSA-N 0.000 description 1
- GZALFWOLCOJUNU-UHFFFAOYSA-N CC(CC[SiH](OC)OC)SSC(C)CC[Si](OC)(OC)OCOC Chemical compound CC(CC[SiH](OC)OC)SSC(C)CC[Si](OC)(OC)OCOC GZALFWOLCOJUNU-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- IDIDJDIHTAOVLG-VKHMYHEASA-N S-methylcysteine Chemical compound CSC[C@H](N)C(O)=O IDIDJDIHTAOVLG-VKHMYHEASA-N 0.000 description 1
- MOSHWLYQWIVJAZ-UHFFFAOYSA-N [1-ethoxy-3-[(3-ethoxy-3,3-disilylpropyl)disulfanyl]-1-silylpropyl]silane Chemical class CCOC([SiH3])([SiH3])CCSSCCC([SiH3])([SiH3])OCC MOSHWLYQWIVJAZ-UHFFFAOYSA-N 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- 238000006477 desulfuration reaction Methods 0.000 description 1
- 230000023556 desulfurization Effects 0.000 description 1
- GSYVJAOBRKCNOT-UHFFFAOYSA-N diethoxymethyl-[3-[3-(diethoxymethylsilyl)propyltetrasulfanyl]propyl]silane Chemical compound CCOC(OCC)[SiH2]CCCSSSSCCC[SiH2]C(OCC)OCC GSYVJAOBRKCNOT-UHFFFAOYSA-N 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 1
- 125000000654 isopropylidene group Chemical group C(C)(C)=* 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229960001913 mecysteine Drugs 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- JOKPITBUODAHEN-UHFFFAOYSA-N sulfanylideneplatinum Chemical compound [Pt]=S JOKPITBUODAHEN-UHFFFAOYSA-N 0.000 description 1
- 238000005486 sulfidation Methods 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- QSOPZTKRLXFTRB-UHFFFAOYSA-N tri(propan-2-yloxy)-[3-[3-tri(propan-2-yloxy)silylpropyltrisulfanyl]propyl]silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCSSSCCC[Si](OC(C)C)(OC(C)C)OC(C)C QSOPZTKRLXFTRB-UHFFFAOYSA-N 0.000 description 1
- SGDIJHNYXVZJPF-UHFFFAOYSA-N triethoxy-[2-methyl-3-[(2-methyl-3-triethoxysilylpropyl)disulfanyl]propyl]silane Chemical compound CCO[Si](OCC)(OCC)CC(C)CSSCC(C)C[Si](OCC)(OCC)OCC SGDIJHNYXVZJPF-UHFFFAOYSA-N 0.000 description 1
- FRVDURBMKJLZAE-UHFFFAOYSA-N trimethoxy-[4-(3-trimethoxysilylbutyldisulfanyl)butan-2-yl]silane Chemical compound CO[Si](OC)(OC)C(C)CCSSCCC(C)[Si](OC)(OC)OC FRVDURBMKJLZAE-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- AECIBUNSNXXCEL-UHFFFAOYSA-N tris(2-ethylhexoxy)-[3-[3-[tris(2-ethylhexoxy)silyl]propyltrisulfanyl]propyl]silane Chemical compound CCCCC(CC)CO[Si](OCC(CC)CCCC)(OCC(CC)CCCC)CCCSSSCCC[Si](OCC(CC)CCCC)(OCC(CC)CCCC)OCC(CC)CCCC AECIBUNSNXXCEL-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
「メルカプタン」は3−メルカプトプロピルトリエトキシシランであり、
「モノスルフィド」はビス(3−(トリエトキシシリルプロピル)スルフィドであり、
「ジスルフィド」はビス(3−トリエトキシシリルプロピル)ジスルフィドであり、
「ポリスルフィド」は、ビス[3−(トリエトキシシリル)プロピル]トリスルフィドとさらに高次のスルフィドの混合物である。
機械的攪拌機、冷却コイル及び熱電対を備えたハステロイC製1リットルオートクレーブ中で、591.4グラムの主としてビス(3−トリエトキシシリルプロピル)ジスルフィドを、ケイ藻土担体に担持した55重量%ニッケル触媒2.0グラムと混合した。オートクレーブを窒素で、次いで水素でパージした後、反応器を水素で620psigに加圧し、1022rpmで攪拌しながら190℃に加熱した。約180分後、反応塊を室温に冷却し、大気に通気した。反応器内容物の試料を採取し、ガスクロマトグラフィーで分析したところ次表の結果が得られた。
比較例1に記載したのとほぼ同じ手順を用い、追加の反応を実施した。その条件と結果を次の表2に示す。
機械的攪拌機、冷却コイル及び熱電対を備えたハステロイC製1リットルオートクレーブ中で、360.2グラムの主としてビス(3−トリエトキシシリルプロピル)ジスルフィドを、40.7グラムのエタノール及びケイ藻土担体に担持した55重量%ニッケル触媒2.0グラムと混合した。このオートクレーブを窒素で、次いで水素でパージした後、反応器を水素で624psigに加圧し、1007rpmで攪拌しながら190℃に加熱した。約180分後、反応塊を室温に冷却し、大気に通気した。反応器内容物の試料を採取し、ガスクロマトグラフィーで分析したところ次表に示す結果を得た。
機械的攪拌機、冷却コイル及び熱電対を備えたハステロイC製1リットルオートクレーブ中で、310.3グラムの主としてビス(3−トリエトキシシリルプロピル)ジスルフィドを、ケイ藻土担体に担持した55重量%ニッケル触媒5.0グラムと混合した。このオートクレーブを窒素で、次いで水素でパージした後、反応器に硫化水素35グラムを仕込み、水素で615psigに加圧し、1087rpmで攪拌しながら190℃に加熱した。約150分後、反応塊を室温に冷却し、大気に通気した。反応器内容物の試料を採取し、ガスクロマトグラフィーで分析して次表の結果を得た。
実施例1〜3に記載したのとほぼ同じ手順を用い、触媒被毒抑制剤としてエタノールを使用して、追加の反応を行った。条件と結果を次の表5に示す。
Claims (10)
- オルガノメルカプタンの製造方法であって、以下に示す一般式(I)のスルフィドを、水素化分解条件下、触媒有効量の第VIII族金属触媒の存在下、かつ水(ただし、メルカプタン生成物が1以上の加水分解性シラン基を含む場合を除く)、炭素原子数1〜6のアルカノール、硫化水素及びこれらの混合物からなる群から選択される触媒被毒抑制量の触媒被毒抑制剤の存在下で、水素と反応させて、以下に示す一般式(II)のオルガノメルカプタン生成物を得ることを含んでなる方法。
- 1以上のR1がメチル、エチル、プロピル及びブチルからなる群から選択されるアルキル基であり、各R2が同一又は異なる炭素原子数12以下の二価アルキレン基である、請求項1記載の方法。
- 1以上のR1がフェニル基であり、各R2が同一又は異なる炭素原子数12以下の二価アルキレン基である、請求項1記載の方法。
- 1以上のR1がメトキシ、エトキシ、プロポキシ又はブトキシからなる群から選択されるアルコキシ基であり、各R2が同一又は異なる炭素原子数12以下の二価アルキレン基である、請求項1記載の方法。
- スルフィド(I)が、ビス[3−(トリエトキシシリル)プロピル]ジスルフィド、ビス[3−(トリメトキシシリル)プロピル]ジスルフィド、4,13−ジエトキシ−4,13−ジメチル−3,14−ジオキサ−8,9−ジチア−4,13−ジシラヘキサデカン、4,4,13,13−テトラエトキシ−3,14−ジオキサ−8,9−ジチア−4,13−ジシラヘキサデカン、8,11−ジメチル−5,5,14,14−テトラプロポキシ−4,15−ジオキサ−9,10−ジチア−5,14−ジシラオクタデカン、3,3,12,12−テトラメトキシ−6,9−ジメチル−2,13−ジオキサ−7,8−ジチア−3,12−ジシラテトラデカン、3,3,12,12−テトラメトキシ−4,11−ジメチル−2,13−ジオキサ−7,8−ジチア−3,12−ジシラテトラデカン、6,13−ジメチル−5,5,14,14−テトラプロポキシ−4,15−ジオキサ−9,10−ジチア−5,14−ジシラオクタデカン、ビス[3−(トリブトキシシリル)プロピル]ジスルフィド、及び5,14−ジエチル−3,16−ジメチル−5,14−ビス(1−メチルプロポキシ)−4,15−ジオキサ−9,10−ジチア−5,14−ジシラオクタデカンからなる群から選択されるジシリルアルキルジスルフィドである、請求項1記載の方法。
- スルフィド(I)が、ビス[3−(トリエトキシシリル)プロピル]トリスルフィド、ビス[3−(トリメトキシシリル)プロピル]トリスルフィド、3,13−ジブチル−3,13−ジメトキシ−2,14−ジオキサ−7,8,9−トリチア−3,13−ジシラペンタデカン、3−(トリブトキシシリル)プロピル3−(トリメトキシシリル)プロピルトリスルフィド、(トリチオジ−3,1−プロパンジイル)ビス[トリス(シクロペンチルオキシ)−シラン、及び5,21−ジエチル−8,8,18,18−テトラキス[(2−エチルヘキシル)オキシ]−7,19−ジオキサ−12,13,14−トリチア−8,18−ジシラペンタコサンからなる群から選択されるジシリルアルキルトリスルフィドである、請求項1記載の方法。
- スルフィド(I)が、ビス[3−(トリメトキシシリル)プロピル]テトラスルフィド、(テトラチオジ−3,1−プロパンジイル)ビス[トリス(イソオクチルオキシ)−シラン、ビス[3−トリエトキシシリル)プロピル]テトラスルフィド、4,4−ジエトキシ−15,15−ビス(エトキシメトキシ)−3,16,18−トリオキサ−8,9,10,11−テトラチア−4,15−ジシラエイコサン、6,6,17,17−テトラキス(エトキシメトキシ)−3,5,18,20−テトラオキサ−10,11,12,13−テトラチア−6,17−ジシラドコサン、1,1′−(テトラチオジ−3,1−プロパンジイル)ビス−2,8,9−トリオキサ−5−アザ−1−シラビシクロ[3.3.3]ウンデカン、ビス[3−(ジエトキシメチルシリル)プロピル]テトラスルフィド、2,17−ジメチル−4,4,15,15−テトラキス(1−メチルエトキシ)−3,16−ジオキサ−8,9,10,11−テトラチア−4,15−ジシラオクタデカン、4,4,15,15−テトラエトキシ−7,12−ジメチル−3,16−ジオキサ−8,9,10,11−テトラチア−4,15−ジシラオクタデカン、5,16、16−トリエトキシ−5−メトキシ−4,17−ジオキサ−9,10,11,12−テトラチア−5,16−ジシラヘンエイコサン、6,6,17,17−テトラブトキシ−5,18−ジオキサ−10,11,12,13−テトラチア−6,17−ジシラドコサン、3,3,14,14−テトラメトキシ−5,12−ジメチル−2,15−ジオキサ−7,8,9,10−テトラチア−3,14−ジシラヘキサデカン、3,14−ビス(1,1−ジメチルエチル)−3,14−ジメトキシ−2,15−ジオキサ−7,8,9,10−テトラチア−3,14−ジシラヘキサデカン、ジシラトリアコンタン、10,10,21,21−テトラキス(オクチルオキシ)−9,22−ジオキサ−14,15,16,17−テトラチア−10,21−ジシラトリアコンタン、10,21−ジエトキシ−10,21−ビス(オクチルオキシ)−9,22−ジオキサ−14,15,16,17−テトラチア−10,21−ジシラトリアコンタン、10,10,21−トリエトキシ−21−(オクチルオキシ)−9,22−ジオキサ−14,15,16,17−テトラチア−10,21−ジシラトリアコンタン、テトラチオジ−3,1−プロパンジイル)ビス[トリス(シクロヘキシルオキシ)−シラン、3,14−ジメトキシ−3,14−ジフェニル−2,15−ジオキサ−7,8,9,10−テトラチア−3,14−ジシラヘキサデカン、6,17−ジエトキシ−6,17−ジフェニル−5,18−ジオキサ−10,11,12,13−テトラチア−6,17−ジシラドコサン、14−エトキシ−3,3,−ジメトキシ−14−フェニル−2,15−ジオキサ−7,8,9,10−テトラチア−3,14−ジシラノナデカン、及び3,3,14,14−テトラメトキシ−6,11−ジフェニル−2,15−ジオキサ−7,8,9,10−テトラチア−3,14−ジシラヘキサデカンからなる群から選択されるジシリルアルキルテトラスルフィドである、請求項1記載の方法。
- 水素化分解条件が、水素圧300〜600psig、温度160〜190℃、及び反応時間2〜5時間を含む、請求項1記載の方法。
- 触媒がスルフィド(1)の1〜10重量%の量で存在する、請求項1記載の方法。
- 触媒被毒抑制剤がスルフィド(I)の5〜50重量%の量で存在する、請求項1記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/012,286 US6433206B1 (en) | 2001-11-05 | 2001-11-05 | Process for preparing silylorganomercaptans |
PCT/US2002/032608 WO2003040153A1 (en) | 2001-11-05 | 2002-10-11 | Process for preparing silylorganomercaptans |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005510520A true JP2005510520A (ja) | 2005-04-21 |
JP4632663B2 JP4632663B2 (ja) | 2011-02-16 |
Family
ID=21754241
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003542198A Expired - Fee Related JP4632663B2 (ja) | 2001-11-05 | 2002-10-11 | シリルオルガノメルカプタンの製造方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US6433206B1 (ja) |
EP (1) | EP1448570B1 (ja) |
JP (1) | JP4632663B2 (ja) |
KR (1) | KR100940408B1 (ja) |
CN (1) | CN1280294C (ja) |
BR (1) | BR0214066B1 (ja) |
DE (1) | DE60219193T2 (ja) |
WO (1) | WO2003040153A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006312633A (ja) * | 2005-05-03 | 2006-11-16 | Degussa Ag | メルカプトオルガニル(アルコキシシラン)の製造方法 |
WO2007060934A1 (ja) * | 2005-11-25 | 2007-05-31 | Bridgestone Corporation | 有機珪素化合物及びそれを用いたゴム組成物 |
JP2008060117A (ja) * | 2006-08-29 | 2008-03-13 | Konica Minolta Holdings Inc | 有機薄膜トランジスタ及びその製造方法 |
JP2008184464A (ja) * | 2007-01-05 | 2008-08-14 | Dow Corning Toray Co Ltd | ビス[トリ(ヒドロキシポリアルキレンオキシ)シリルアルキル]ポリスルフィド、その製造方法、タイヤ用ゴム添加剤およびタイヤ用ゴム組成物 |
JP2009524715A (ja) * | 2006-01-28 | 2009-07-02 | エボニック デグサ ゲーエムベーハー | ゴム混合物 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6433206B1 (en) * | 2001-11-05 | 2002-08-13 | Crompton Corporation | Process for preparing silylorganomercaptans |
DE102004030737A1 (de) * | 2004-06-25 | 2006-01-12 | Degussa Ag | Verfahren und Vorrichtung zur Extraktion von Stoffen aus silanmodifizierten Füllstoffen |
DE102005020534B4 (de) * | 2004-09-07 | 2006-07-06 | Degussa Ag | Verfahren zur Herstellung von Mercaptoorganyl(alkoxysilanen) |
DE102005020536A1 (de) * | 2004-09-07 | 2006-03-23 | Degussa Ag | Verfahren zur Herstellung von Mercaptoorganyl(alkoxysilan) |
DE102005038791A1 (de) * | 2005-08-17 | 2007-02-22 | Degussa Ag | Organosiliciumverbindungen, ihre Herstellung und ihre Verwendung |
DE102005060122A1 (de) * | 2005-12-16 | 2007-06-21 | Degussa Gmbh | Verfahren zur Herstellung von (Mercaptoorganyl)alkylpolyethersilanen |
DE102006027235A1 (de) * | 2006-06-09 | 2008-01-17 | Evonik Degussa Gmbh | Kautschukmischungen |
DE102008054967A1 (de) | 2008-12-19 | 2010-06-24 | Evonik Degussa Gmbh | Silatranhaltige Partikel |
CN106914146B (zh) * | 2017-03-14 | 2019-05-28 | 常州大学 | 一种巯基化改性tries分离膜及其制备方法和用途 |
JP6908731B2 (ja) * | 2017-05-12 | 2021-07-28 | ランクセス・ドイチュランド・ゲーエムベーハー | 硫黄含有有機ケイ素化合物を含むゴム混合物 |
DE102017221269A1 (de) | 2017-11-28 | 2019-05-29 | Evonik Degussa Gmbh | Silanmischungen und Verfahren zu deren Herstellung |
US11208518B2 (en) | 2018-12-11 | 2021-12-28 | The Goodyear Tire & Rubber Company | Functionalized polymer, rubber composition and pneumatic tire |
US10947380B2 (en) | 2018-12-20 | 2021-03-16 | The Goodyear Tire & Rubber Company | Functionalized polymer, rubber composition and pneumatic tire |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6058959A (ja) * | 1983-08-12 | 1985-04-05 | チバ−ガイギ−アクチエンゲゼルシヤフト | メルカプタン類の製造方法 |
JPH07304730A (ja) * | 1993-10-20 | 1995-11-21 | Elf Aquitaine Prod | 二硫化ジメチルからのメチルメルカプタンの合成 |
JP2000508321A (ja) * | 1996-04-10 | 2000-07-04 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | チオールへの有機チオシアネートおよび有機ジスルフィドの触媒水素化分解 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE634126A (ja) * | 1962-06-30 | 1900-01-01 | ||
NL302825A (ja) * | 1962-12-31 | 1900-01-01 | ||
NL127232C (ja) | 1963-03-12 | 1900-01-01 | ||
CH509993A (de) * | 1968-05-11 | 1971-07-15 | Bayer Ag | Verfahren zur Herstellung von Thiophenolen |
US3957844A (en) * | 1972-08-14 | 1976-05-18 | Union Carbide Corporation | Process for making mercapto substituted silicon compounds |
DE2542534C3 (de) | 1975-09-24 | 1979-08-02 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler, 6000 Frankfurt | Verfahren zur Herstellung von schwefelhaltigen Organosiliciumverbindungen |
DE2856229A1 (de) | 1978-12-27 | 1980-07-03 | Degussa | Bis-(silylaethyl)-oligosulfide und verfahren zur herstellung derselben |
JPS5970692A (ja) * | 1982-10-16 | 1984-04-21 | Sanwa Kagaku Kenkyusho:Kk | 新規の有機珪素化合物、その非毒性塩、その製法及び該化合物を有効成分とする抗腫瘍剤 |
US5466848A (en) | 1994-09-28 | 1995-11-14 | Osi Specialties, Inc. | Process for the preparation of silane polysulfides |
US5489701A (en) | 1994-09-28 | 1996-02-06 | Osi Specialties, Inc. | Process for the preparation of silane polysulfides |
US5596116A (en) | 1995-09-11 | 1997-01-21 | Osi Specialties, Inc. | Process for the preparation of silane polysulfides |
DE19541404A1 (de) | 1995-11-07 | 1997-05-15 | Degussa | Verfahren zur selektiven Synthese von Silylalkyldisulfiden |
US5663396A (en) | 1996-10-31 | 1997-09-02 | The Goodyear Tire & Rubber Company | Preparation of sulfur-containing organosilicon compounds |
DE19651849A1 (de) | 1996-12-13 | 1998-06-18 | Degussa | Verfahren zur Herstellung von Bis(silylorganyl)-polysulfanen |
DE19734295C1 (de) | 1997-08-08 | 1999-02-25 | Degussa | Verfahren zur Herstellung von Organosiliciumdisulfanen hoher Reinheit |
DE19750503A1 (de) * | 1997-11-14 | 1999-05-20 | Degussa | Verfahren zur Reduzierung der Sulfankettenlänge von Bis(silylorganyl)polysulfanen |
JP3498559B2 (ja) * | 1997-12-01 | 2004-02-16 | 信越化学工業株式会社 | 短鎖ポリスルフィドシラン混合物の製造方法 |
DE19848482C1 (de) | 1998-10-21 | 2000-06-08 | Degussa | Verfahren zur Herstellung von Organosiliciumdisulfanen |
DE19857223C5 (de) * | 1998-12-11 | 2010-02-04 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Propylsilanen |
DE19860439C1 (de) | 1998-12-28 | 2000-07-06 | Degussa | Verfahren zur Herstellung von Silylalkylthiolen |
DE19930495C1 (de) | 1999-07-01 | 2000-11-09 | Degussa | Verfahren zur Herstellung von polysulfidischen Silanverbindungen |
US6242652B1 (en) | 2000-03-03 | 2001-06-05 | Phillips Petroleum Company | Process for producing organic trisulfides |
US6433206B1 (en) * | 2001-11-05 | 2002-08-13 | Crompton Corporation | Process for preparing silylorganomercaptans |
-
2001
- 2001-11-05 US US10/012,286 patent/US6433206B1/en not_active Expired - Lifetime
-
2002
- 2002-10-11 BR BRPI0214066-7A patent/BR0214066B1/pt not_active IP Right Cessation
- 2002-10-11 DE DE60219193T patent/DE60219193T2/de not_active Expired - Lifetime
- 2002-10-11 KR KR1020047006884A patent/KR100940408B1/ko active IP Right Grant
- 2002-10-11 WO PCT/US2002/032608 patent/WO2003040153A1/en active IP Right Grant
- 2002-10-11 EP EP02769065A patent/EP1448570B1/en not_active Expired - Lifetime
- 2002-10-11 JP JP2003542198A patent/JP4632663B2/ja not_active Expired - Fee Related
- 2002-10-11 CN CNB028255143A patent/CN1280294C/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6058959A (ja) * | 1983-08-12 | 1985-04-05 | チバ−ガイギ−アクチエンゲゼルシヤフト | メルカプタン類の製造方法 |
JPH07304730A (ja) * | 1993-10-20 | 1995-11-21 | Elf Aquitaine Prod | 二硫化ジメチルからのメチルメルカプタンの合成 |
JP2000508321A (ja) * | 1996-04-10 | 2000-07-04 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | チオールへの有機チオシアネートおよび有機ジスルフィドの触媒水素化分解 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006312633A (ja) * | 2005-05-03 | 2006-11-16 | Degussa Ag | メルカプトオルガニル(アルコキシシラン)の製造方法 |
WO2007060934A1 (ja) * | 2005-11-25 | 2007-05-31 | Bridgestone Corporation | 有機珪素化合物及びそれを用いたゴム組成物 |
US7732517B2 (en) | 2005-11-25 | 2010-06-08 | Bridgestone Corporation | Organosilicon compounds and rubber compositions made by using the same |
JP5108528B2 (ja) * | 2005-11-25 | 2012-12-26 | 株式会社ブリヂストン | 有機珪素化合物及びそれを用いたゴム組成物 |
JP2009524715A (ja) * | 2006-01-28 | 2009-07-02 | エボニック デグサ ゲーエムベーハー | ゴム混合物 |
JP2008060117A (ja) * | 2006-08-29 | 2008-03-13 | Konica Minolta Holdings Inc | 有機薄膜トランジスタ及びその製造方法 |
JP2008184464A (ja) * | 2007-01-05 | 2008-08-14 | Dow Corning Toray Co Ltd | ビス[トリ(ヒドロキシポリアルキレンオキシ)シリルアルキル]ポリスルフィド、その製造方法、タイヤ用ゴム添加剤およびタイヤ用ゴム組成物 |
Also Published As
Publication number | Publication date |
---|---|
WO2003040153A1 (en) | 2003-05-15 |
EP1448570B1 (en) | 2007-03-28 |
DE60219193T2 (de) | 2007-08-23 |
JP4632663B2 (ja) | 2011-02-16 |
CN1280294C (zh) | 2006-10-18 |
CN1612883A (zh) | 2005-05-04 |
KR20050035179A (ko) | 2005-04-15 |
KR100940408B1 (ko) | 2010-02-02 |
BR0214066B1 (pt) | 2012-11-27 |
US6433206B1 (en) | 2002-08-13 |
DE60219193D1 (de) | 2007-05-10 |
BR0214066A (pt) | 2004-10-13 |
EP1448570A1 (en) | 2004-08-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4632663B2 (ja) | シリルオルガノメルカプタンの製造方法 | |
KR102201058B1 (ko) | 유기아미노실란 및 이를 제조하는 방법 | |
JP5150046B2 (ja) | メルカプトオルガニル(アルコキシシラン)の製造方法 | |
CN109647532B (zh) | 一种非烯烃配位的铂孤原子在硅氢加成反应中的应用 | |
JPS6084144A (ja) | ヒドロシリル化法、触媒およびその製造方法 | |
US6417381B1 (en) | Process for preparing bis(silylorgano)amines | |
JP5237533B2 (ja) | メルカプトオルガニル(アルコキシシラン)の製造方法 | |
JP5115729B2 (ja) | トリアルキルシリル基で保護されたアセト酢酸エステル基含有有機ケイ素化合物及びその製造方法 | |
US6242627B1 (en) | Process for preparing primary aminoorganosilanes | |
EP1278757B1 (en) | Preparation of secondary aminoisobutylalkoxysilanes | |
US9434751B2 (en) | Alkylalkoxysilane compounds containing ether group and dialkylamino group and process for preparing the compounds | |
CN100584850C (zh) | 用以制造硫醇基有机基(烷氧基硅烷)的方法 | |
EP0000614B1 (en) | Production of dichlorosilane derivatives | |
CN113399001A (zh) | 用于烯烃硅氢加成反应的催化剂及其制备方法与应用 | |
CN100584849C (zh) | 用以制造硫醇基有机基(烷氧基硅烷)的方法 | |
JPH1085605A (ja) | ヒドロシリル化触媒及びそれを用いたシランの製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20051004 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20071127 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20090126 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090203 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090507 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20091020 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100120 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100511 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20100726 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20100802 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20100908 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20100915 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101012 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20101102 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20101116 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4632663 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131126 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |