KR20050035179A - 실릴오가노머캅탄의 제조방법 - Google Patents
실릴오가노머캅탄의 제조방법 Download PDFInfo
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- KR20050035179A KR20050035179A KR1020047006884A KR20047006884A KR20050035179A KR 20050035179 A KR20050035179 A KR 20050035179A KR 1020047006884 A KR1020047006884 A KR 1020047006884A KR 20047006884 A KR20047006884 A KR 20047006884A KR 20050035179 A KR20050035179 A KR 20050035179A
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- Prior art keywords
- dioxa
- bis
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- tetrathia
- carbon atoms
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- 238000004519 manufacturing process Methods 0.000 title abstract description 7
- 239000003054 catalyst Substances 0.000 claims abstract description 36
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 22
- 230000000607 poisoning effect Effects 0.000 claims abstract description 20
- 231100000572 poisoning Toxicity 0.000 claims abstract description 18
- 239000001257 hydrogen Substances 0.000 claims abstract description 17
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 17
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 16
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims abstract description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 12
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 claims abstract description 10
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000000203 mixture Substances 0.000 claims abstract description 9
- 229910000037 hydrogen sulfide Inorganic materials 0.000 claims abstract description 8
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 6
- 229910052757 nitrogen Chemical group 0.000 claims abstract description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 5
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 5
- 125000003118 aryl group Chemical group 0.000 claims abstract description 5
- 125000004122 cyclic group Chemical group 0.000 claims abstract description 5
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 5
- 239000011593 sulfur Chemical group 0.000 claims abstract description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 4
- 238000007327 hydrogenolysis reaction Methods 0.000 claims abstract description 4
- 229910052751 metal Inorganic materials 0.000 claims abstract description 4
- 239000002184 metal Substances 0.000 claims abstract description 4
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 4
- 239000001301 oxygen Substances 0.000 claims abstract description 4
- 125000005842 heteroatom Chemical group 0.000 claims abstract description 3
- -1 methoxy, ethoxy, propoxy Chemical group 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 20
- 239000002253 acid Substances 0.000 claims description 12
- 239000003112 inhibitor Substances 0.000 claims description 12
- 238000006460 hydrolysis reaction Methods 0.000 claims description 8
- 230000003197 catalytic effect Effects 0.000 claims description 7
- 230000007062 hydrolysis Effects 0.000 claims description 7
- FBBATURSCRIBHN-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyldisulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSCCC[Si](OCC)(OCC)OCC FBBATURSCRIBHN-UHFFFAOYSA-N 0.000 claims description 7
- 125000005447 octyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 claims description 6
- KLFNHRIZTXWZHT-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltrisulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSCCC[Si](OCC)(OCC)OCC KLFNHRIZTXWZHT-UHFFFAOYSA-N 0.000 claims description 4
- LGWOBHOCFTZTCS-UHFFFAOYSA-N 5-[3-[3-(4,6,11-trioxa-1-aza-5-silabicyclo[3.3.3]undecan-5-yl)propyltetrasulfanyl]propyl]-4,6,11-trioxa-1-aza-5-silabicyclo[3.3.3]undecane Chemical compound O1CCN(CCO2)CCO[Si]12CCCSSSSCCC[Si]1(OCC2)OCCN2CCO1 LGWOBHOCFTZTCS-UHFFFAOYSA-N 0.000 claims description 3
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 claims description 3
- JTTSZDBCLAKKAY-UHFFFAOYSA-N trimethoxy-[3-(3-trimethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CO[Si](OC)(OC)CCCSSSSCCC[Si](OC)(OC)OC JTTSZDBCLAKKAY-UHFFFAOYSA-N 0.000 claims description 3
- KPJOTRNNFIYMTC-UHFFFAOYSA-N 3-[3-[diethoxy(methyl)silyl]propyldisulfanyl]propyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)CCCSSCCC[Si](C)(OCC)OCC KPJOTRNNFIYMTC-UHFFFAOYSA-N 0.000 claims description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- GSYVJAOBRKCNOT-UHFFFAOYSA-N diethoxymethyl-[3-[3-(diethoxymethylsilyl)propyltetrasulfanyl]propyl]silane Chemical compound CCOC(OCC)[SiH2]CCCSSSSCCC[SiH2]C(OCC)OCC GSYVJAOBRKCNOT-UHFFFAOYSA-N 0.000 claims description 2
- 150000002430 hydrocarbons Chemical group 0.000 claims description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 230000035484 reaction time Effects 0.000 claims description 2
- 229910000077 silane Inorganic materials 0.000 claims description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 2
- QSOPZTKRLXFTRB-UHFFFAOYSA-N tri(propan-2-yloxy)-[3-[3-tri(propan-2-yloxy)silylpropyltrisulfanyl]propyl]silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCSSSCCC[Si](OC(C)C)(OC(C)C)OC(C)C QSOPZTKRLXFTRB-UHFFFAOYSA-N 0.000 claims description 2
- ATYIZISYPACGCO-UHFFFAOYSA-N tributoxy-[3-(3-tributoxysilylpropyldisulfanyl)propyl]silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)CCCSSCCC[Si](OCCCC)(OCCCC)OCCCC ATYIZISYPACGCO-UHFFFAOYSA-N 0.000 claims description 2
- CPNIBYDNWRDAAY-UHFFFAOYSA-N tricyclohexyloxysilane Chemical compound C1CCC(CC1)O[SiH](OC1CCCCC1)OC1CCCCC1 CPNIBYDNWRDAAY-UHFFFAOYSA-N 0.000 claims description 2
- VYDCWGNJFDJQTP-UHFFFAOYSA-N tricyclopentyloxysilane Chemical compound C1(CCCC1)O[SiH](OC1CCCC1)OC1CCCC1 VYDCWGNJFDJQTP-UHFFFAOYSA-N 0.000 claims description 2
- NQRACKNXKKOCJY-UHFFFAOYSA-N trimethoxy-[3-(3-trimethoxysilylpropyldisulfanyl)propyl]silane Chemical compound CO[Si](OC)(OC)CCCSSCCC[Si](OC)(OC)OC NQRACKNXKKOCJY-UHFFFAOYSA-N 0.000 claims description 2
- KOFGNZOFJYBHIN-UHFFFAOYSA-N trimethoxy-[3-(3-trimethoxysilylpropyltrisulfanyl)propyl]silane Chemical compound CO[Si](OC)(OC)CCCSSSCCC[Si](OC)(OC)OC KOFGNZOFJYBHIN-UHFFFAOYSA-N 0.000 claims description 2
- VSNLWWLPEJKFEI-UHFFFAOYSA-N trimethoxy-[3-(4-trimethoxysilylbutan-2-yldisulfanyl)butyl]silane Chemical compound CO[Si](OC)(OC)CCC(C)SSC(C)CC[Si](OC)(OC)OC VSNLWWLPEJKFEI-UHFFFAOYSA-N 0.000 claims description 2
- FRVDURBMKJLZAE-UHFFFAOYSA-N trimethoxy-[4-(3-trimethoxysilylbutyldisulfanyl)butan-2-yl]silane Chemical compound CO[Si](OC)(OC)C(C)CCSSCCC(C)[Si](OC)(OC)OC FRVDURBMKJLZAE-UHFFFAOYSA-N 0.000 claims description 2
- MLNBSNXMUJZTFC-UHFFFAOYSA-N tris(6-methylheptoxy)silane Chemical compound C(CCCCC(C)C)O[SiH](OCCCCCC(C)C)OCCCCCC(C)C MLNBSNXMUJZTFC-UHFFFAOYSA-N 0.000 claims description 2
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 claims 2
- CAKMVZCJNRJMJQ-UHFFFAOYSA-N OCCC[SiH2]CCCSSCCC[SiH2]CCCC Chemical compound OCCC[SiH2]CCCSSCCC[SiH2]CCCC CAKMVZCJNRJMJQ-UHFFFAOYSA-N 0.000 claims 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
- 230000002401 inhibitory effect Effects 0.000 abstract description 4
- 125000001183 hydrocarbyl group Chemical group 0.000 abstract description 3
- 229910052710 silicon Inorganic materials 0.000 abstract description 3
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 11
- 150000004763 sulfides Chemical class 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 150000002019 disulfides Chemical class 0.000 description 5
- GUUVPOWQJOLRAS-UHFFFAOYSA-N Diphenyl disulfide Chemical compound C=1C=CC=CC=1SSC1=CC=CC=C1 GUUVPOWQJOLRAS-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- 239000005909 Kieselgur Substances 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- WAIPAZQMEIHHTJ-UHFFFAOYSA-N [Cr].[Co] Chemical compound [Cr].[Co] WAIPAZQMEIHHTJ-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000004817 gas chromatography Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical class CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- WQOXQRCZOLPYPM-UHFFFAOYSA-N dimethyl disulfide Chemical compound CSSC WQOXQRCZOLPYPM-UHFFFAOYSA-N 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 2
- 229920001021 polysulfide Polymers 0.000 description 2
- 239000005077 polysulfide Substances 0.000 description 2
- 150000008117 polysulfides Polymers 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 239000010703 silicon Chemical group 0.000 description 2
- 238000005486 sulfidation Methods 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- CLWYDJZGUMXBGD-UHFFFAOYSA-N COC(CCSSCCC(OC)([SiH3])[SiH3])([SiH3])[SiH3] Chemical compound COC(CCSSCCC(OC)([SiH3])[SiH3])([SiH3])[SiH3] CLWYDJZGUMXBGD-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- IDIDJDIHTAOVLG-VKHMYHEASA-N S-methylcysteine Chemical compound CSC[C@H](N)C(O)=O IDIDJDIHTAOVLG-VKHMYHEASA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- JDBFWRXHZFUGPS-UHFFFAOYSA-N butyl-[3-[3-[butyl(dimethoxy)silyl]propyltrisulfanyl]propyl]-dimethoxysilane Chemical compound CCCC[Si](OC)(OC)CCCSSSCCC[Si](OC)(OC)CCCC JDBFWRXHZFUGPS-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- 125000004977 cycloheptylene group Chemical group 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- 229960003067 cystine Drugs 0.000 description 1
- 238000006477 desulfuration reaction Methods 0.000 description 1
- 230000023556 desulfurization Effects 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010505 homolytic fission reaction Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 125000000654 isopropylidene group Chemical group C(C)(C)=* 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229960001913 mecysteine Drugs 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- JOKPITBUODAHEN-UHFFFAOYSA-N sulfanylideneplatinum Chemical compound [Pt]=S JOKPITBUODAHEN-UHFFFAOYSA-N 0.000 description 1
- 239000003053 toxin Substances 0.000 description 1
- 231100000765 toxin Toxicity 0.000 description 1
- 108700012359 toxins Proteins 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- SGDIJHNYXVZJPF-UHFFFAOYSA-N triethoxy-[2-methyl-3-[(2-methyl-3-triethoxysilylpropyl)disulfanyl]propyl]silane Chemical compound CCO[Si](OCC)(OCC)CC(C)CSSCC(C)C[Si](OCC)(OCC)OCC SGDIJHNYXVZJPF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
Claims (10)
- 가수소분해 조건하에서, 촉매 효과량의 VIII족 금속 촉매, 및 물(머캅탄 생성물이 하나 이상의 가수분해가능한 실란기를 함유하는 경우에는 제외), 1 내지 6개의 탄소원자를 갖는 알칸올, 황화수소 및 이들의 혼합물로 이루어진 군으로부터 선택되는 촉매 피독(poisoning) 억제량의 촉매 피독 억제제의 존재하에, 하기 화학식 I의 설파이드를 수소와 반응시켜 하기 화학식 II의 오가노머캅탄 생성물을 제공함을 포함하는 오가노머캅탄의 제조방법:화학식 I화학식 II(R1)3-Si-R2-SH상기 식에서,각 R1은 6개 이하의 탄소원자를 갖는 동일하거나 상이한 알킬기, 10개 이하의 탄소원자를 갖는 아릴기 또는 6개 이하의 탄소원자를 갖는 알콕시기이거나, 또는 R1 둘 이상과 이들이 결합된 규소원자는 12개 이하의 구성원을 갖고 에틸렌성 불포화를 함유하지 않으며 산소, 황 및 질소로 이루어진 군으로부터 선택되는 하나 이상의 헤테로원자를 선택적으로 함유하는 고리 시스템을 형성하고,각 R2는 에틸렌성 불포화를 함유하지 않고 20개 이하의 탄소원자를 갖는 동일하거나 상이한 2가 탄화수소 기이며,m은 0 내지 8이다.
- 제 1 항에 있어서,하나 이상의 R1이 메틸, 에틸, 프로필 및 부틸로 이루어진 군으로부터 선택되는 알킬기이고,각각의 R2가 12개 이하의 탄소원자를 갖는 동일하거나 상이한 2가 알킬렌 라디칼인 방법.
- 제 1 항에 있어서,하나 이상의 R1이 페닐기이고,각각의 R2가 12개 이하의 탄소원자를 갖는 동일하거나 상이한 2가 알킬렌 라디칼인 방법.
- 제 1 항에 있어서,하나 이상의 R1이 메톡시, 에톡시, 프로폭시 또는 부톡시로 이루어진 군으로부터 선택되는 알콕시기이고,각각의 R2가 12개 이하의 탄소원자를 갖는 동일하거나 상이한 2가 알킬렌 라디칼인 방법.
- 제 1 항에 있어서,화학식 I의 설파이드가 비스[3-(트리에톡시실릴)프로필] 디설파이드, 비스[3-(트리메톡시실릴)프로필] 디설파이드, 4,13-디에톡시-4,13-디메틸-3,14-디옥사-8,9-디티아-4,13-디실라헥사데칸, 4,4,13,13-테트라에톡시-3,14-디옥사-8,9-디티아-4,13-디실라헥사데칸, 8,11-디메틸-5,5,14,14-테트라프로폭시-4,15-디옥사-9,10-디티아-5,14-디실라옥타데칸, 3,3,12,12-테트라메톡시-6,9-디메틸-2,13-디옥사-7,8-디티아-3,12-디실라테트라데칸, 3,3,12,12-테트라메톡시-4,11-디메틸-2,13-디옥사-7,8-디티아-3,12-디실라테트라데칸, 6,13-디메틸-5,5,14,14-테트라프로폭시-4,15-디옥사-9,10-디티아-5,14-디실라옥타데칸, 비스[3-(트리부톡시실릴)프로필] 디설파이드 및 5,14-디에틸-3,16-디메틸-5,14-비스(1-메틸프로폭시)-4,15-디옥사-9,10-디티아-5,14-디실라옥타데칸으로 이루어진 군으로부터 선택되는 디실릴알킬디설파이드인 방법.
- 제 1 항에 있어서,화학식 I의 설파이드가 비스[3-(트리에톡시실릴)프로필] 트리설파이드, 비스[3-(트리메톡시실릴)프로필] 트리설파이드, 비스[3-(트리이소프로폭시실릴)프로필] 트리설파이드, 3,13-디부틸-3,13-디메톡시-2,14-디옥사-7,8,9-트리티아-3,13-디실라펜타데칸, 3-(트리부톡시실릴)프로필 3-(트리메톡시실릴)프로필 트리설파이드, (트리티오디-3,1-프로판디일)비스[트리스(사이클로펜틸옥시)]-실란 및 5,21-디에틸-8,8,18,18-테트라키스[(2-에틸헥실)옥시]-7,19-디옥사-12,13,14-트리티아-8,18-디실라펜타코산으로 이루어진 군으로부터 선택되는 디실릴알킬트리설파이드인 방법.
- 제 1 항에 있어서,화학식 I의 설파이드가 비스[3-(트리메톡시실릴)프로필] 테트라설파이드, (테트라티오디-3,1-프로판디일)비스[트리스(이소옥틸옥시)]-실란, 비스[3-(트리에톡시실릴)프로필] 테트라설파이드, 4,4-디에톡시-15,15-비스(에톡시메톡시)-3,16,18-트리옥사-8,9,10,11-테트라티아-4,15-디실라아이코산, 6,6,17,17-테트라키스(에톡시메톡시)-3,5,18,20-테트라옥사-10,11,12,13-테트라티아-6,17-디실라도코산, 1,1'-(테트라티오디-3,1-프로판디일)비스-2,8,9-트리옥사-5-아자-1-실라비사이클로[3.3.3]운데칸, 비스[3-(디에톡시메틸실릴)프로필] 테트라설파이드, 2,17-디메틸-4,4,15,15-테트라키스(1-메틸에톡시)-3,16-디옥사-8,9,10,11-테트라티아-4,15-디실라옥타데칸, 4,4,15,15-테트라에톡시-7,12-디메틸-3,16-디옥사-8,9,10,11-테트라티아-4,15-디실라옥타데칸, 5,16,16-트리에톡시-5-메톡시-4,17-디옥사-9,10,11,12-테트라티아-5,16-디실라헨아이코산, 6,6,17,17-테트라부톡시-5,18-디옥사-10,11,12,13-테트라티아-6,17-디실라도코산, 3,3,14,14-테트라메톡시-5,12-디메틸-2,15-디옥사-7,8,9,10-테트라티아-3,14-디실라헥사데칸, 3,14-비스(1,1-디메틸에틸)-3,14-디메톡시-2,15-디옥사-7,8,9,10-테트라티아-3,14-디실라헥사데칸, 디실라트리아콘탄, 10,10,21,21-테트라키스(옥틸옥시)-9,22-디옥사-14,15,16,17-테트라티아-10,21-디실라트리아콘탄, 10,21-디에톡시-10,21-비스(옥틸옥시)-9,22-디옥사-14,15,16,17-테트라티아-10,21-디실라트리아콘탄, 10,10,21-트리에톡시-21-(옥틸옥시)-9,22-디옥사-14,15,16,17-테트라티아-10,21-디실라트리아콘탄, 테트라티오디-(3,1-프로판디일)비스[트리스(사이클로헥실옥시)]-실란, 3,14-디메톡시-3,14-디페닐-2,15-디옥사-7,8,9,10-테트라티아-3,14-디실라헥사데칸, 6,17-디에톡시-6,17-디페닐-5,18-디옥사-10,11,12,13-테트라티아-6,17-디실라도코산, 14-에톡시-3,3-디메톡시-14-페닐-2,15-디옥사-7,8,9,10-테트라티아-3,14-디실라노나데칸 및 3,3,14,14-테트라메톡시-6,11-디페닐-2,15-디옥사-7,8,9,10-테트라티아-3,14-디실라헥사데칸으로 이루어진 군으로부터 선택되는 디실릴알킬테트라설파이드인 방법.
- 제 1 항에 있어서,가수소분해 조건이 300psig 내지 600psig의 수소압, 160℃ 내지 190℃의 온도 및 2시간 내지 5시간의 반응시간을 포함하는 방법.
- 제 1 항에 있어서,촉매가 화학식 I의 설파이드의 1 내지 10중량%로 존재하는 방법.
- 제 1 항에 있어서,촉매 피독 억제제가 화학식 I의 설파이드의 5 내지 50중량%의 양으로 존재하는 방법.
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US10/012,286 US6433206B1 (en) | 2001-11-05 | 2001-11-05 | Process for preparing silylorganomercaptans |
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EP (1) | EP1448570B1 (ko) |
JP (1) | JP4632663B2 (ko) |
KR (1) | KR100940408B1 (ko) |
CN (1) | CN1280294C (ko) |
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KR101281245B1 (ko) * | 2005-05-03 | 2013-07-26 | 에보니크 데구사 게엠베하 | 메르캅토오가닐(알콕시실란)의 제조방법 |
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US6433206B1 (en) * | 2001-11-05 | 2002-08-13 | Crompton Corporation | Process for preparing silylorganomercaptans |
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DE102005020534B4 (de) * | 2004-09-07 | 2006-07-06 | Degussa Ag | Verfahren zur Herstellung von Mercaptoorganyl(alkoxysilanen) |
DE102005020536A1 (de) * | 2004-09-07 | 2006-03-23 | Degussa Ag | Verfahren zur Herstellung von Mercaptoorganyl(alkoxysilan) |
DE102005038791A1 (de) * | 2005-08-17 | 2007-02-22 | Degussa Ag | Organosiliciumverbindungen, ihre Herstellung und ihre Verwendung |
JP5108528B2 (ja) * | 2005-11-25 | 2012-12-26 | 株式会社ブリヂストン | 有機珪素化合物及びそれを用いたゴム組成物 |
DE102005060122A1 (de) * | 2005-12-16 | 2007-06-21 | Degussa Gmbh | Verfahren zur Herstellung von (Mercaptoorganyl)alkylpolyethersilanen |
DE102006004062A1 (de) | 2006-01-28 | 2007-08-09 | Degussa Gmbh | Kautschukmischungen |
DE102006027235A1 (de) * | 2006-06-09 | 2008-01-17 | Evonik Degussa Gmbh | Kautschukmischungen |
JP2008060117A (ja) * | 2006-08-29 | 2008-03-13 | Konica Minolta Holdings Inc | 有機薄膜トランジスタ及びその製造方法 |
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DE102008054967A1 (de) | 2008-12-19 | 2010-06-24 | Evonik Degussa Gmbh | Silatranhaltige Partikel |
CN106914146B (zh) * | 2017-03-14 | 2019-05-28 | 常州大学 | 一种巯基化改性tries分离膜及其制备方法和用途 |
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DE102017221269A1 (de) * | 2017-11-28 | 2019-05-29 | Evonik Degussa Gmbh | Silanmischungen und Verfahren zu deren Herstellung |
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KR101281245B1 (ko) * | 2005-05-03 | 2013-07-26 | 에보니크 데구사 게엠베하 | 메르캅토오가닐(알콕시실란)의 제조방법 |
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EP1448570A1 (en) | 2004-08-25 |
CN1612883A (zh) | 2005-05-04 |
KR100940408B1 (ko) | 2010-02-02 |
BR0214066A (pt) | 2004-10-13 |
BR0214066B1 (pt) | 2012-11-27 |
EP1448570B1 (en) | 2007-03-28 |
JP4632663B2 (ja) | 2011-02-16 |
WO2003040153A1 (en) | 2003-05-15 |
US6433206B1 (en) | 2002-08-13 |
DE60219193T2 (de) | 2007-08-23 |
JP2005510520A (ja) | 2005-04-21 |
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