JP2005501286A - オプティカルコート製品及びその製造方法 - Google Patents
オプティカルコート製品及びその製造方法 Download PDFInfo
- Publication number
- JP2005501286A JP2005501286A JP2003524053A JP2003524053A JP2005501286A JP 2005501286 A JP2005501286 A JP 2005501286A JP 2003524053 A JP2003524053 A JP 2003524053A JP 2003524053 A JP2003524053 A JP 2003524053A JP 2005501286 A JP2005501286 A JP 2005501286A
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- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 60
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000010410 layer Substances 0.000 claims abstract description 70
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 27
- 239000011247 coating layer Substances 0.000 claims abstract description 25
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 11
- 229920000515 polycarbonate Polymers 0.000 claims abstract description 10
- 239000004417 polycarbonate Substances 0.000 claims abstract description 10
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 9
- 229920000307 polymer substrate Polymers 0.000 claims abstract description 6
- 125000003118 aryl group Chemical group 0.000 claims abstract description 5
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims abstract description 4
- 239000004926 polymethyl methacrylate Substances 0.000 claims abstract description 4
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims abstract 3
- 239000000758 substrate Substances 0.000 claims description 42
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 28
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 24
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- 229910000077 silane Inorganic materials 0.000 claims description 8
- 230000003595 spectral effect Effects 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 6
- 229910052786 argon Inorganic materials 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 229960001730 nitrous oxide Drugs 0.000 claims description 4
- 229920005992 thermoplastic resin Polymers 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 claims description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052796 boron Inorganic materials 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 239000011574 phosphorus Substances 0.000 claims description 2
- 229920001187 thermosetting polymer Polymers 0.000 claims 2
- 239000004925 Acrylic resin Substances 0.000 claims 1
- 229920000178 Acrylic resin Polymers 0.000 claims 1
- 229920000877 Melamine resin Polymers 0.000 claims 1
- 239000003822 epoxy resin Substances 0.000 claims 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 claims 1
- 229920000647 polyepoxide Polymers 0.000 claims 1
- 229920000728 polyester Polymers 0.000 claims 1
- 229920001296 polysiloxane Polymers 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052710 silicon Inorganic materials 0.000 abstract description 5
- 239000010703 silicon Substances 0.000 abstract description 5
- 238000005984 hydrogenation reaction Methods 0.000 abstract 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 30
- 238000000576 coating method Methods 0.000 description 27
- 239000011248 coating agent Substances 0.000 description 25
- 239000007789 gas Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 7
- 210000002381 plasma Anatomy 0.000 description 4
- 239000002243 precursor Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001272 nitrous oxide Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000002849 thermal shift Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229920000402 bisphenol A polycarbonate polymer Polymers 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 150000002835 noble gases Chemical class 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 230000031070 response to heat Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31507—Of polycarbonate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laminated Bodies (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/939,274 US6572975B2 (en) | 2001-08-24 | 2001-08-24 | Optically coated article and method for its preparation |
| PCT/US2002/025378 WO2003019244A1 (en) | 2001-08-24 | 2002-08-07 | Optically coated article and method for its preparation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005501286A true JP2005501286A (ja) | 2005-01-13 |
| JP2005501286A5 JP2005501286A5 (enExample) | 2006-01-05 |
Family
ID=25472867
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003524053A Pending JP2005501286A (ja) | 2001-08-24 | 2002-08-07 | オプティカルコート製品及びその製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6572975B2 (enExample) |
| EP (1) | EP1421414A1 (enExample) |
| JP (1) | JP2005501286A (enExample) |
| WO (1) | WO2003019244A1 (enExample) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007079349A (ja) * | 2005-09-16 | 2007-03-29 | Toray Ind Inc | 光学フィルタ |
| KR101587643B1 (ko) * | 2014-10-14 | 2016-01-25 | 광운대학교 산학협력단 | 비훈색성 투과형 컬러필터 및 그 제조방법 |
| KR20170117533A (ko) * | 2015-02-18 | 2017-10-23 | 마테리온 코포레이션 | 개선된 투과를 갖는 근적외선 광학 간섭 필터 |
| JP2018504635A (ja) * | 2015-01-23 | 2018-02-15 | マテリオン コーポレイション | 改良された透過率を有する近赤外線光学干渉フィルタ |
| JP2020071375A (ja) * | 2018-10-31 | 2020-05-07 | 日本電気硝子株式会社 | バンドパスフィルタ及びその製造方法 |
| KR20200096892A (ko) * | 2016-11-30 | 2020-08-14 | 비아비 솔루션즈 아이엔씨. | 실리콘-게르마늄계 광학 필터 |
| JP2022500706A (ja) * | 2018-07-18 | 2022-01-04 | 福州高意光学有限公司Fuzhou Photop Optics Co., Ltd | 広角アプリケーション高反射ミラー |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7045558B2 (en) * | 2003-08-29 | 2006-05-16 | General Electric Company | Method of making a high refractive index optical management coating and the coating |
| JP2008016799A (ja) * | 2006-06-06 | 2008-01-24 | Mitsubishi Electric Corp | 半導体レーザ装置 |
| DE102009004251B3 (de) * | 2009-01-07 | 2010-07-01 | Ovd Kinegram Ag | Sicherheitselement sowie Verfahren zur Herstellung eines Sicherheitselements |
| KR101569406B1 (ko) * | 2009-08-19 | 2015-11-17 | 주성엔지니어링(주) | 유기 발광 소자 및 이의 제조 방법 |
| KR20110061422A (ko) * | 2009-12-01 | 2011-06-09 | 엘지이노텍 주식회사 | 정전용량 터치 패널 |
| TWI855290B (zh) * | 2012-07-16 | 2024-09-11 | 美商唯亞威方案公司 | 光學濾波器及感測器系統 |
| US9835952B2 (en) | 2013-03-14 | 2017-12-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Systems and methods for a narrow band high transmittance interference filter |
| DE102016002597A1 (de) * | 2016-03-04 | 2017-09-07 | Optics Balzers Ag | Breitbandentspiegelung für den NlR-Bereich |
| US10644048B2 (en) | 2017-02-01 | 2020-05-05 | Omnivision Technologies, Inc. | Anti-reflective coating with high refractive index material at air interface |
| CN108333661B (zh) * | 2018-03-13 | 2024-01-02 | 湖北五方光电股份有限公司 | 基于硼掺杂氢化硅的低角度偏移滤光片及其制备方法 |
| CN110824599B (zh) | 2018-08-14 | 2021-09-03 | 白金科技股份有限公司 | 一种红外带通滤波器 |
| US11650361B2 (en) * | 2018-12-27 | 2023-05-16 | Viavi Solutions Inc. | Optical filter |
| KR20210132176A (ko) * | 2019-03-05 | 2021-11-03 | 퀀텀-에스아이 인코포레이티드 | 통합 디바이스를 위한 광학 흡수 필터 |
| CN110109208B (zh) * | 2019-06-05 | 2024-05-31 | 信阳舜宇光学有限公司 | 近红外带通滤光片及光学传感系统 |
| CN112114394B (zh) * | 2019-06-21 | 2023-03-31 | 福州高意光学有限公司 | 具有温度补偿效应的滤光片和传感器系统 |
| WO2021092425A1 (en) * | 2019-11-08 | 2021-05-14 | Viavi Solutions Inc. | Optical coating and an apparatus including the optical coating |
| CN111175873A (zh) * | 2019-12-27 | 2020-05-19 | 光驰科技(上海)有限公司 | 一种近红外滤光片 |
| CN112114402A (zh) * | 2020-10-12 | 2020-12-22 | 东莞市微科光电科技有限公司 | 一种cwdm滤光片 |
| US12372701B2 (en) * | 2023-03-21 | 2025-07-29 | Vactronics Technologies Inc. | Narrow bandpass filtering element |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4166919A (en) * | 1978-09-25 | 1979-09-04 | Rca Corporation | Amorphous silicon solar cell allowing infrared transmission |
| JPS59145588A (ja) * | 1983-02-09 | 1984-08-21 | Hitachi Ltd | 半導体レ−ザ装置 |
| JPS61190919A (ja) * | 1984-08-29 | 1986-08-25 | エクソン リサ−チ アンド エンジニアリング カンパニ− | 多層材料 |
| US4859553A (en) * | 1987-05-04 | 1989-08-22 | Xerox Corporation | Imaging members with plasma deposited silicon oxides |
| US4827870A (en) | 1987-10-05 | 1989-05-09 | Honeywell Inc. | Apparatus for applying multilayer optical interference coating on complex curved substrates |
| US5009920A (en) | 1990-03-30 | 1991-04-23 | Honeywell Inc. | Method for applying optical interference coating |
| US5245468A (en) * | 1990-12-14 | 1993-09-14 | Ford Motor Company | Anti-reflective transparent coating |
| FR2673633B1 (fr) * | 1991-03-06 | 1993-06-11 | Air Liquide | Revetement multicouche pour substrat polycarbonate. |
| US5694240A (en) * | 1994-06-24 | 1997-12-02 | Bausch & Lomb Incorporated | Multilayer anti-reflective and ultraviolet blocking coating for sunglasses |
| US6157503A (en) * | 1998-11-10 | 2000-12-05 | Thermo Vision Corporation | High performance optical filters suitable for intense ultraviolet irradiance applications |
| US6164777A (en) * | 1998-12-16 | 2000-12-26 | Bausch & Lomb Incorporated | Color-imparting contact lenses with interference coating and method for making the same |
| US6215802B1 (en) * | 1999-05-27 | 2001-04-10 | Blue Sky Research | Thermally stable air-gap etalon for dense wavelength-division multiplexing applications |
-
2001
- 2001-08-24 US US09/939,274 patent/US6572975B2/en not_active Expired - Fee Related
-
2002
- 2002-08-07 WO PCT/US2002/025378 patent/WO2003019244A1/en not_active Ceased
- 2002-08-07 JP JP2003524053A patent/JP2005501286A/ja active Pending
- 2002-08-07 EP EP20020768483 patent/EP1421414A1/en not_active Withdrawn
Cited By (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007079349A (ja) * | 2005-09-16 | 2007-03-29 | Toray Ind Inc | 光学フィルタ |
| KR101587643B1 (ko) * | 2014-10-14 | 2016-01-25 | 광운대학교 산학협력단 | 비훈색성 투과형 컬러필터 및 그 제조방법 |
| JP7075444B2 (ja) | 2015-01-23 | 2022-05-25 | マテリオン コーポレイション | 改良された透過率を有する近赤外線光学干渉フィルタ |
| JP2020149071A (ja) * | 2015-01-23 | 2020-09-17 | マテリオン コーポレイション | 改良された透過率を有する近赤外線光学干渉フィルタ |
| JP2018504635A (ja) * | 2015-01-23 | 2018-02-15 | マテリオン コーポレイション | 改良された透過率を有する近赤外線光学干渉フィルタ |
| US11372144B2 (en) | 2015-02-18 | 2022-06-28 | Materion Corporation | Near infrared optical interference filters with improved transmission |
| JP2018506076A (ja) * | 2015-02-18 | 2018-03-01 | マテリオン コーポレイション | 改良された透過率を有する近赤外線光学干渉フィルタ |
| KR20230140612A (ko) * | 2015-02-18 | 2023-10-06 | 마테리온 코포레이션 | 개선된 투과를 갖는 근적외선 광학 간섭 필터 |
| US12422605B2 (en) | 2015-02-18 | 2025-09-23 | Materion Corporation | Near infrared optical interference filters with improved transmission |
| KR102583883B1 (ko) * | 2015-02-18 | 2023-09-27 | 마테리온 코포레이션 | 개선된 투과를 갖는 근적외선 광학 간섭 필터 |
| KR20170117533A (ko) * | 2015-02-18 | 2017-10-23 | 마테리온 코포레이션 | 개선된 투과를 갖는 근적외선 광학 간섭 필터 |
| KR102700673B1 (ko) * | 2015-02-18 | 2024-08-30 | 마테리온 코포레이션 | 개선된 투과를 갖는 근적외선 광학 간섭 필터 |
| US11041982B2 (en) | 2016-11-30 | 2021-06-22 | Viavi Solutions Inc. | Silicon-germanium based optical filter |
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| WO2020090615A1 (ja) * | 2018-10-31 | 2020-05-07 | 日本電気硝子株式会社 | バンドパスフィルタ及びその製造方法 |
| JP2020071375A (ja) * | 2018-10-31 | 2020-05-07 | 日本電気硝子株式会社 | バンドパスフィルタ及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20030039847A1 (en) | 2003-02-27 |
| US6572975B2 (en) | 2003-06-03 |
| WO2003019244A1 (en) | 2003-03-06 |
| EP1421414A1 (en) | 2004-05-26 |
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