JP2005353978A - シリル化処理装置およびシリル化処理方法 - Google Patents

シリル化処理装置およびシリル化処理方法 Download PDF

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Publication number
JP2005353978A
JP2005353978A JP2004175422A JP2004175422A JP2005353978A JP 2005353978 A JP2005353978 A JP 2005353978A JP 2004175422 A JP2004175422 A JP 2004175422A JP 2004175422 A JP2004175422 A JP 2004175422A JP 2005353978 A JP2005353978 A JP 2005353978A
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chamber
silylation
wafer
gas
silylating agent
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JP2005353978A5 (fr
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Satoru Shimura
悟 志村
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004175422A 2004-06-14 2004-06-14 シリル化処理装置およびシリル化処理方法 Pending JP2005353978A (ja)

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JP2004175422A JP2005353978A (ja) 2004-06-14 2004-06-14 シリル化処理装置およびシリル化処理方法

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JP2004175422A JP2005353978A (ja) 2004-06-14 2004-06-14 シリル化処理装置およびシリル化処理方法

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JP2009052981A Division JP2009188411A (ja) 2009-03-06 2009-03-06 シリル化処理方法、シリル化処理装置およびエッチング処理システム

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JP2005353978A true JP2005353978A (ja) 2005-12-22
JP2005353978A5 JP2005353978A5 (fr) 2006-08-10

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009016653A (ja) * 2007-07-06 2009-01-22 Tokyo Electron Ltd 基板の処理方法及びコンピュータ読み取り可能な記憶媒体
JP2011135002A (ja) * 2009-12-25 2011-07-07 Tokyo Electron Ltd 基板処理方法、その基板処理方法を実行させるためのプログラムを記録した記録媒体及び基板処理装置
KR101543694B1 (ko) * 2014-04-30 2015-08-11 세메스 주식회사 기판 처리 장치 및 방법
WO2019181605A1 (fr) * 2018-03-23 2019-09-26 東京エレクトロン株式会社 Dispositif de traitement thermique et procédé de traitement thermique

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009016653A (ja) * 2007-07-06 2009-01-22 Tokyo Electron Ltd 基板の処理方法及びコンピュータ読み取り可能な記憶媒体
JP2011135002A (ja) * 2009-12-25 2011-07-07 Tokyo Electron Ltd 基板処理方法、その基板処理方法を実行させるためのプログラムを記録した記録媒体及び基板処理装置
KR101543694B1 (ko) * 2014-04-30 2015-08-11 세메스 주식회사 기판 처리 장치 및 방법
WO2019181605A1 (fr) * 2018-03-23 2019-09-26 東京エレクトロン株式会社 Dispositif de traitement thermique et procédé de traitement thermique
CN111954923A (zh) * 2018-03-23 2020-11-17 东京毅力科创株式会社 加热处理装置和加热处理方法
JPWO2019181605A1 (ja) * 2018-03-23 2021-03-11 東京エレクトロン株式会社 加熱処理装置及び加熱処理方法
TWI784143B (zh) * 2018-03-23 2022-11-21 日商東京威力科創股份有限公司 加熱處理裝置及加熱處理方法

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