JP2005332803A5 - - Google Patents

Download PDF

Info

Publication number
JP2005332803A5
JP2005332803A5 JP2005057445A JP2005057445A JP2005332803A5 JP 2005332803 A5 JP2005332803 A5 JP 2005332803A5 JP 2005057445 A JP2005057445 A JP 2005057445A JP 2005057445 A JP2005057445 A JP 2005057445A JP 2005332803 A5 JP2005332803 A5 JP 2005332803A5
Authority
JP
Japan
Prior art keywords
passivation layer
forming
upper electrode
organic electronic
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005057445A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005332803A (ja
JP4393402B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005057445A priority Critical patent/JP4393402B2/ja
Priority claimed from JP2005057445A external-priority patent/JP4393402B2/ja
Priority to US11/105,498 priority patent/US7632704B2/en
Publication of JP2005332803A publication Critical patent/JP2005332803A/ja
Publication of JP2005332803A5 publication Critical patent/JP2005332803A5/ja
Application granted granted Critical
Publication of JP4393402B2 publication Critical patent/JP4393402B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2005057445A 2004-04-22 2005-03-02 有機電子素子の製造方法および製造装置 Expired - Fee Related JP4393402B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005057445A JP4393402B2 (ja) 2004-04-22 2005-03-02 有機電子素子の製造方法および製造装置
US11/105,498 US7632704B2 (en) 2004-04-22 2005-04-14 Manufacturing method for organic electronic element and manufacturing apparatus therefor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004126561 2004-04-22
JP2005057445A JP4393402B2 (ja) 2004-04-22 2005-03-02 有機電子素子の製造方法および製造装置

Publications (3)

Publication Number Publication Date
JP2005332803A JP2005332803A (ja) 2005-12-02
JP2005332803A5 true JP2005332803A5 (enExample) 2007-02-01
JP4393402B2 JP4393402B2 (ja) 2010-01-06

Family

ID=35137001

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005057445A Expired - Fee Related JP4393402B2 (ja) 2004-04-22 2005-03-02 有機電子素子の製造方法および製造装置

Country Status (2)

Country Link
US (1) US7632704B2 (enExample)
JP (1) JP4393402B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100065174A (ko) * 2007-10-02 2010-06-15 가부시키가이샤 알박 유기 ｅｌ 소자, 유기 ｅｌ 소자 제조 방법
FR2947097B1 (fr) * 2009-06-23 2011-11-25 Riber Sa Appareil de fabrication de galettes de semi-conducteur et appareil de depot par evaporation de materiaux par jet moleculaire
KR101990555B1 (ko) * 2012-12-24 2019-06-19 삼성디스플레이 주식회사 박막봉지 제조장치 및 박막봉지 제조방법
KR20200002242A (ko) * 2018-06-29 2020-01-08 캐논 톡키 가부시키가이샤 성막 장치, 유기 디바이스의 제조 장치, 및 유기 디바이스의 제조 방법
DE102019128753A1 (de) * 2019-10-24 2021-04-29 Apeva Se Verfahren zum Abscheiden organischer Schichtstrukturen, insbesondere OLEDs

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3115134B2 (ja) * 1992-11-27 2000-12-04 松下電器産業株式会社 薄膜処理装置および薄膜処理方法
JP3577117B2 (ja) * 1994-10-07 2004-10-13 Ｔｄｋ株式会社 有機エレクトロルミネセンス素子の製法
JPH08111285A (ja) 1994-10-07 1996-04-30 Tdk Corp 有機エレクトロルミネセンス素子の製造方法及びその装置
JP3524711B2 (ja) * 1997-03-18 2004-05-10 三洋電機株式会社 有機エレクトロルミネッセンス素子及びその製造方法
JPH1161386A (ja) * 1997-08-22 1999-03-05 Fuji Electric Co Ltd 有機薄膜発光素子の成膜装置
JP3031356B1 (ja) * 1998-10-05 2000-04-10 日本電気株式会社 有機ｅｌパネル及びその製造方法
US6736985B1 (en) * 1999-05-05 2004-05-18 Agere Systems Inc. High-resolution method for patterning a substrate with micro-printing
US6641933B1 (en) * 1999-09-24 2003-11-04 Semiconductor Energy Laboratory Co., Ltd. Light-emitting EL display device
TW471011B (en) * 1999-10-13 2002-01-01 Semiconductor Energy Lab Thin film forming apparatus
JP3783099B2 (ja) 2000-05-16 2006-06-07 株式会社豊田中央研究所 有機電界発光素子
JP4704605B2 (ja) * 2001-05-23 2011-06-15 淳二 城戸 連続蒸着装置、蒸着装置及び蒸着方法
US7323635B2 (en) * 2001-06-15 2008-01-29 University Of Massachusetts Photovoltaic cell
JP4614588B2 (ja) * 2001-06-29 2011-01-19 三洋電機株式会社 エレクトロルミネッセンス表示装置の製造方法
US6815723B2 (en) * 2001-12-28 2004-11-09 Semiconductor Energy Laboratory Co., Ltd. Light emitting device, method of manufacturing the same, and manufacturing apparatus therefor
JP2003208978A (ja) * 2002-01-11 2003-07-25 Seiko Epson Corp 有機ｅｌ装置の製造方法及びその装置、電気光学装置、並びに電子機器
US20030146692A1 (en) * 2002-01-11 2003-08-07 Seiko Epson Corporation Organic EL device and manufacturing method therefor, electrooptic apparatus, and electronic apparatus
US7378124B2 (en) * 2002-03-01 2008-05-27 John James Daniels Organic and inorganic light active devices and methods for making the same
JP4651916B2 (ja) * 2002-03-07 2011-03-16 株式会社半導体エネルギー研究所 発光装置の作製方法
EP1354638A3 (en) * 2002-04-15 2004-11-03 Fuji Photo Film Co., Ltd. Method and apparatus for manufacturing pattern members using webs on which coating films have been formed
US6943066B2 (en) * 2002-06-05 2005-09-13 Advantech Global, Ltd Active matrix backplane for controlling controlled elements and method of manufacture thereof
JP2004047179A (ja) * 2002-07-09 2004-02-12 Dainippon Printing Co Ltd 帯電防止有機ｅｌ素子およびその製造方法
JP5072184B2 (ja) * 2002-12-12 2012-11-14 株式会社半導体エネルギー研究所 成膜方法
US7183146B2 (en) * 2003-01-17 2007-02-27 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device
US6878207B2 (en) * 2003-02-19 2005-04-12 Energy Conversion Devices, Inc. Gas gate for isolating regions of differing gaseous pressure
US6888172B2 (en) * 2003-04-11 2005-05-03 Eastman Kodak Company Apparatus and method for encapsulating an OLED formed on a flexible substrate
US7081888B2 (en) * 2003-04-24 2006-07-25 Eastman Kodak Company Flexible resistive touch screen
JP4179041B2 (ja) * 2003-04-30 2008-11-12 株式会社島津製作所 有機ｅｌ用保護膜の成膜装置、製造方法および有機ｅｌ素子
US6875320B2 (en) * 2003-05-05 2005-04-05 Eastman Kodak Company Highly transparent top electrode for OLED device
US7153180B2 (en) * 2003-11-13 2006-12-26 Eastman Kodak Company Continuous manufacture of flat panel light emitting devices

Similar Documents

Publication Publication Date Title
JP2005524109A5 (enExample)
JP2006187857A5 (enExample)
TW200507069A (en) Method of manufacturing electronic device, integrated circuit and optoelectronic device and electronic apparatus
TW200802680A (en) Substrate support structure, heat treatment apparatus using same, first sheet-like object for use in the substrate support structure, method of manufacturing the substrate support structure, heat treatment apparatus, and substrate sucking method
JP2010219210A5 (ja) 半導体装置
JP2015072764A5 (enExample)
JP2009194322A5 (enExample)
TW200618227A (en) Structure of embedding chip in substrate and method for fabricating the same
JP2011066340A5 (enExample)
JP2004179232A5 (enExample)
JP2010153467A5 (enExample)
SG132619A1 (en) Method for packaging a semiconductor device
JP2008172266A5 (enExample)
JP2006189853A5 (enExample)
TW200625535A (en) Method for manufacturing semiconductor device, and semiconductor device and electronic device
TW200629618A (en) Electronic devices and processes for forming electronic devices
JP2005332803A5 (enExample)
ATE376256T1 (de) Schaltung mit einem kondensator und mindestens einem halbleiterbauelement und entwurfsverfahren dafür
TW200612502A (en) Method and apparatus for mounting semiconductor chips
TW200943496A (en) Support substrate structure for supporting electronic component thereon and manufacturing method thereof
JP2009004648A5 (enExample)
JP2003188198A5 (enExample)
TW200746456A (en) Nitride-based semiconductor device and production method thereof
JP2011256409A5 (enExample)
TW200619854A (en) Patterning process, film-forming process, electroluminescence device manufacturing process, electroluminescence device, and electroluminescence display apparatus