JP2005221368A - 観察装置及びその観察方法 - Google Patents

観察装置及びその観察方法 Download PDF

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Publication number
JP2005221368A
JP2005221368A JP2004029320A JP2004029320A JP2005221368A JP 2005221368 A JP2005221368 A JP 2005221368A JP 2004029320 A JP2004029320 A JP 2004029320A JP 2004029320 A JP2004029320 A JP 2004029320A JP 2005221368 A JP2005221368 A JP 2005221368A
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JP
Japan
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image data
light
sample
confocal
silicon wafer
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JP2004029320A
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Japanese (ja)
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JP2005221368A5 (enExample
Inventor
Osamu Ono
修 大野
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Olympus Corp
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Olympus Corp
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Priority to JP2004029320A priority Critical patent/JP2005221368A/ja
Publication of JP2005221368A publication Critical patent/JP2005221368A/ja
Publication of JP2005221368A5 publication Critical patent/JP2005221368A5/ja
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  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2004029320A 2004-02-05 2004-02-05 観察装置及びその観察方法 Pending JP2005221368A (ja)

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JP2004029320A JP2005221368A (ja) 2004-02-05 2004-02-05 観察装置及びその観察方法

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JP2004029320A JP2005221368A (ja) 2004-02-05 2004-02-05 観察装置及びその観察方法

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JP2005221368A true JP2005221368A (ja) 2005-08-18
JP2005221368A5 JP2005221368A5 (enExample) 2007-03-15

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7343064B2 (en) 2006-03-07 2008-03-11 Tecdia Co., Ltd. Optical switch and optical add/drop multiplexer
WO2012081338A1 (ja) * 2010-12-13 2012-06-21 株式会社日立ハイテクノロジーズ 欠陥検査方法及びその装置
KR101178055B1 (ko) * 2009-08-14 2012-08-29 제주대학교 산학협력단 높이차 측정 장치 및 방법
CN103376259A (zh) * 2012-04-11 2013-10-30 百励科技股份有限公司 元件内部缺陷的检测装置及方法
JP2016090410A (ja) * 2014-11-06 2016-05-23 東レエンジニアリング株式会社 基板検査装置および方法
CN111247423A (zh) * 2017-10-20 2020-06-05 依视路国际公司 用于评估光学装置的外观缺陷的方法
CN112198168A (zh) * 2020-10-29 2021-01-08 罗建华 一种半导体检测装置及方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01221850A (ja) * 1988-02-29 1989-09-05 Shimadzu Corp 赤外線散乱顕微鏡
JPH05157701A (ja) * 1991-03-11 1993-06-25 Internatl Business Mach Corp <Ibm> 光学的内部検査援助装置及びその方法
JPH07294422A (ja) * 1994-04-27 1995-11-10 Mitsubishi Materials Corp 表面近傍結晶欠陥の検出方法およびその装置
JP2000088563A (ja) * 1998-09-08 2000-03-31 Hitachi Ltd 外観検査方法および外観検査装置
JP2005049294A (ja) * 2003-07-31 2005-02-24 Olympus Corp 対象物の観察方法及びその装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01221850A (ja) * 1988-02-29 1989-09-05 Shimadzu Corp 赤外線散乱顕微鏡
JPH05157701A (ja) * 1991-03-11 1993-06-25 Internatl Business Mach Corp <Ibm> 光学的内部検査援助装置及びその方法
JPH07294422A (ja) * 1994-04-27 1995-11-10 Mitsubishi Materials Corp 表面近傍結晶欠陥の検出方法およびその装置
JP2000088563A (ja) * 1998-09-08 2000-03-31 Hitachi Ltd 外観検査方法および外観検査装置
JP2005049294A (ja) * 2003-07-31 2005-02-24 Olympus Corp 対象物の観察方法及びその装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7343064B2 (en) 2006-03-07 2008-03-11 Tecdia Co., Ltd. Optical switch and optical add/drop multiplexer
KR101178055B1 (ko) * 2009-08-14 2012-08-29 제주대학교 산학협력단 높이차 측정 장치 및 방법
WO2012081338A1 (ja) * 2010-12-13 2012-06-21 株式会社日立ハイテクノロジーズ 欠陥検査方法及びその装置
US9239283B2 (en) 2010-12-13 2016-01-19 Hitachi High-Technologies Corporation Defect inspection method and device therefor
CN103376259A (zh) * 2012-04-11 2013-10-30 百励科技股份有限公司 元件内部缺陷的检测装置及方法
JP2016090410A (ja) * 2014-11-06 2016-05-23 東レエンジニアリング株式会社 基板検査装置および方法
CN111247423A (zh) * 2017-10-20 2020-06-05 依视路国际公司 用于评估光学装置的外观缺陷的方法
CN112198168A (zh) * 2020-10-29 2021-01-08 罗建华 一种半导体检测装置及方法

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