JP2005213547A - 樹脂表面に付着した金属析出触媒の除去液および除去方法ならびにこれを用いたプリント配線板の製造方法 - Google Patents
樹脂表面に付着した金属析出触媒の除去液および除去方法ならびにこれを用いたプリント配線板の製造方法 Download PDFInfo
- Publication number
- JP2005213547A JP2005213547A JP2004019520A JP2004019520A JP2005213547A JP 2005213547 A JP2005213547 A JP 2005213547A JP 2004019520 A JP2004019520 A JP 2004019520A JP 2004019520 A JP2004019520 A JP 2004019520A JP 2005213547 A JP2005213547 A JP 2005213547A
- Authority
- JP
- Japan
- Prior art keywords
- catalyst
- resin surface
- wiring board
- metal deposition
- deposition catalyst
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003054 catalyst Substances 0.000 title claims abstract description 78
- 239000011347 resin Substances 0.000 title claims abstract description 53
- 229920005989 resin Polymers 0.000 title claims abstract description 53
- 239000007788 liquid Substances 0.000 title claims abstract description 38
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 18
- 239000002184 metal Substances 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 title claims abstract description 17
- 238000001556 precipitation Methods 0.000 title abstract description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 58
- 229910052802 copper Inorganic materials 0.000 claims abstract description 56
- 239000010949 copper Substances 0.000 claims abstract description 56
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 12
- 229920006317 cationic polymer Polymers 0.000 claims abstract description 10
- 238000007747 plating Methods 0.000 claims description 46
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical group [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 28
- 238000001465 metallisation Methods 0.000 claims description 18
- 229910052763 palladium Inorganic materials 0.000 claims description 14
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 12
- 230000002265 prevention Effects 0.000 claims description 11
- 238000005530 etching Methods 0.000 claims description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 4
- 229920002873 Polyethylenimine Polymers 0.000 claims description 4
- 229920002006 poly(N-vinylimidazole) polymer Polymers 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 229910001504 inorganic chloride Inorganic materials 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims 1
- -1 chlorine ions Chemical class 0.000 abstract description 14
- 239000000460 chlorine Substances 0.000 abstract description 8
- 229910052801 chlorine Inorganic materials 0.000 abstract description 8
- 230000007774 longterm Effects 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 36
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 239000000126 substance Substances 0.000 description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- 230000000694 effects Effects 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 8
- 229910052717 sulfur Inorganic materials 0.000 description 8
- 238000005406 washing Methods 0.000 description 8
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 7
- 239000011593 sulfur Substances 0.000 description 7
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000009413 insulation Methods 0.000 description 4
- 235000002639 sodium chloride Nutrition 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000011162 core material Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 3
- 235000019345 sodium thiosulphate Nutrition 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 150000003573 thiols Chemical class 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- 150000005215 alkyl ethers Chemical group 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- ZNNZYHKDIALBAK-UHFFFAOYSA-M potassium thiocyanate Chemical compound [K+].[S-]C#N ZNNZYHKDIALBAK-UHFFFAOYSA-M 0.000 description 2
- 229940116357 potassium thiocyanate Drugs 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 150000003567 thiocyanates Chemical class 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 150000003585 thioureas Chemical class 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- OXFSTTJBVAAALW-UHFFFAOYSA-N 1,3-dihydroimidazole-2-thione Chemical compound SC1=NC=CN1 OXFSTTJBVAAALW-UHFFFAOYSA-N 0.000 description 1
- WGJCBBASTRWVJL-UHFFFAOYSA-N 1,3-thiazolidine-2-thione Chemical compound SC1=NCCS1 WGJCBBASTRWVJL-UHFFFAOYSA-N 0.000 description 1
- AFBBKYQYNPNMAT-UHFFFAOYSA-N 1h-1,2,4-triazol-1-ium-3-thiolate Chemical compound SC=1N=CNN=1 AFBBKYQYNPNMAT-UHFFFAOYSA-N 0.000 description 1
- YYYOQURZQWIILK-UHFFFAOYSA-N 2-[(2-aminophenyl)disulfanyl]aniline Chemical compound NC1=CC=CC=C1SSC1=CC=CC=C1N YYYOQURZQWIILK-UHFFFAOYSA-N 0.000 description 1
- FLFWJIBUZQARMD-UHFFFAOYSA-N 2-mercapto-1,3-benzoxazole Chemical compound C1=CC=C2OC(S)=NC2=C1 FLFWJIBUZQARMD-UHFFFAOYSA-N 0.000 description 1
- GEHMBYLTCISYNY-UHFFFAOYSA-N Ammonium sulfamate Chemical compound [NH4+].NS([O-])(=O)=O GEHMBYLTCISYNY-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- FLVIGYVXZHLUHP-UHFFFAOYSA-N N,N'-diethylthiourea Chemical compound CCNC(=S)NCC FLVIGYVXZHLUHP-UHFFFAOYSA-N 0.000 description 1
- FULZLIGZKMKICU-UHFFFAOYSA-N N-phenylthiourea Chemical compound NC(=S)NC1=CC=CC=C1 FULZLIGZKMKICU-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- MNOILHPDHOHILI-UHFFFAOYSA-N Tetramethylthiourea Chemical compound CN(C)C(=S)N(C)C MNOILHPDHOHILI-UHFFFAOYSA-N 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001447 alkali salts Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- SOIFLUNRINLCBN-UHFFFAOYSA-N ammonium thiocyanate Chemical compound [NH4+].[S-]C#N SOIFLUNRINLCBN-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- RLDQYSHDFVSAPL-UHFFFAOYSA-L calcium;dithiocyanate Chemical group [Ca+2].[S-]C#N.[S-]C#N RLDQYSHDFVSAPL-UHFFFAOYSA-L 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 235000011167 hydrochloric acid Nutrition 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N hydrogen thiocyanate Natural products SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 150000005440 nitrobenzoic acid derivatives Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- BTAAXEFROUUDIL-UHFFFAOYSA-M potassium;sulfamate Chemical compound [K+].NS([O-])(=O)=O BTAAXEFROUUDIL-UHFFFAOYSA-M 0.000 description 1
- WHMDPDGBKYUEMW-UHFFFAOYSA-N pyridine-2-thiol Chemical compound SC1=CC=CC=N1 WHMDPDGBKYUEMW-UHFFFAOYSA-N 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- VGTPCRGMBIAPIM-UHFFFAOYSA-M sodium thiocyanate Chemical compound [Na+].[S-]C#N VGTPCRGMBIAPIM-UHFFFAOYSA-M 0.000 description 1
- QDWYPRSFEZRKDK-UHFFFAOYSA-M sodium;sulfamate Chemical compound [Na+].NS([O-])(=O)=O QDWYPRSFEZRKDK-UHFFFAOYSA-M 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid group Chemical class S(N)(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- YUKQRDCYNOVPGJ-UHFFFAOYSA-N thioacetamide Chemical compound CC(N)=S YUKQRDCYNOVPGJ-UHFFFAOYSA-N 0.000 description 1
- DLFVBJFMPXGRIB-UHFFFAOYSA-N thioacetamide Natural products CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 1
- UVZICZIVKIMRNE-UHFFFAOYSA-N thiodiacetic acid Chemical compound OC(=O)CSCC(O)=O UVZICZIVKIMRNE-UHFFFAOYSA-N 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical compound CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 1
- 229960002447 thiram Drugs 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Landscapes
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
【解決手段】 硝酸、塩素イオンおよびカチオン性ポリマーを含有することを特徴とする樹脂表面に付着した金属析出触媒除去液および金属析出触媒の除去方法ならびにこれを用いたプリント配線板の製造方法。
【選択図】 なし
Description
触媒除去液の調製(1):
表1に示す各成分を混合し、更に所定濃度となるまでの量の水を加えて各触媒除去液を調製した。
比較触媒除去液の調製:
表2に示す成分を混合し、更に所定濃度となるまでの量の水を加えて各比較触媒除去液を調製した。
触媒除去試験(1):
10cm×5cmに切断した銅張積層板(コア材:MCL−E67、日立化成工業(株)製)を使用し、以下のように触媒除去試験を行った。まず、上記銅張積層板上の銅箔を硫酸200mL/L、過酸化水素150mL/Lの水溶液により剥離し、この樹脂基材に、下記の無電解銅めっき工程により、無電解銅めっきを施した。
脱脂(PB−119S)50℃、5分
↓
水洗
↓
ソフトエッチ(PB−228)30℃、2分
↓
水洗
↓
プリディップ(塩酸)30℃、1分
↓
触媒付与(PB−318)30℃、5分
↓
水洗
↓
アクセラレーター(PB−445)30℃、5分
↓
水洗
↓
無電解銅めっき(PB−503)30℃、15分
(塩酸以外の薬品は何れも荏原ユージライト(株)製)
触媒除去液の調製(2):
表4に示す各成分を混合し、更に所定濃度となるまでの量の水を加えて各触媒除去液を調製した。
触媒除去試験(2):
銅張積層板(コア材:日立化成製、MCL−E67)上の銅箔を200mL/L、過酸化水素150mL/Lの水溶液により剥離した樹脂基材を用い、これをセミアディティブ法により処理し、ライン/スペース(L/S)=50/50、75/75、100/100(μm)の3種類の銅配線パターンを有する試験片3を作成した。
酸性脱脂(PB−242D)、45℃、5分
↓
水洗
↓
ソフトエッチ(PB−228)、30℃、1分
↓
水洗
↓
スマット除去(硫酸)、30℃、1分
↓
水洗
↓
触媒付与(PB−300)、30℃、3分
↓
水洗
↓
無電解ニッケルめっき(エニパックAC−DX)、85℃、20分
(硫酸以外の薬品は何れも荏原ユージライト(株)製)
(評 価) (状 態)
◎ : ほとんど析出がない
○ : 部分的に析出がある(短絡はなし)
× : 析出が多い(短絡がある)
×× : 全面的に析出がある
以 上
Claims (8)
- 硝酸、塩素イオンおよびカチオン性ポリマーを含有することを特徴とする樹脂表面に付着した金属析出触媒の除去液。
- カチオン性ポリマーが、ポリエチレンイミン、ポリビニルイミダゾールまたはポリアミンスルホンから選ばれるポリマーである請求項第1項記載の金属析出触媒の除去液。
- 塩素イオンの供給源が、塩酸または無機塩化物である請求項第1項または第2項記載の金属析出触媒の除去液。
- 金属析出触媒が、パラジウム触媒である請求項第1項ないし第3項の何れかの項記載の金属析出触媒の除去液。
- 触媒が付着した樹脂表面に、請求項第1項ないし第4項の何れかの項記載の金属析出触媒の除去液を作用させることを特徴とする樹脂表面に付着した金属析出触媒の除去方法。
- 触媒が付着した樹脂表面に、請求項第1項ないし第4項の何れかの項記載の金属析出触媒の除去液を作用させた後、更にブリッジ防止液を作用させることを特徴とする樹脂表面に付着した金属析出触媒の除去方法。
- 配線基板の樹脂表面に金属析出触媒を付与後、無電解銅めっきを行い、その後電気銅めっきを行い、次いで不要な銅皮膜をエッチングすることにより回路パターンを形成し、その回路上に無電解金属めっきを行うプリント配線板の製造方法において、前記エッチングと無電解金属めっき工程の間に、配線基板の樹脂表面に請求項第1項ないし第4項の何れかの項記載の金属析出触媒除去液を作用させることを特徴とするプリント配線板の製造方法。
- 配線基板の樹脂表面に金属析出触媒を付与後、無電解銅めっきを行い、その後電気銅めっきを行い、次いで不要な銅皮膜をエッチングすることにより回路パターンを形成し、その回路上に無電解金属めっきを行うプリント配線板の製造方法において、前記エッチングと無電解金属めっき工程の間に、配線基板の樹脂表面に請求項第1項ないし第4項の何れかの項記載の金属析出触媒除去液を作用させた後、更にブリッジ防止液を作用させることを特徴とするプリント配線板の製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004019520A JP4113846B2 (ja) | 2004-01-28 | 2004-01-28 | 樹脂表面に付着した金属析出触媒の除去液および除去方法ならびにこれを用いたプリント配線板の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004019520A JP4113846B2 (ja) | 2004-01-28 | 2004-01-28 | 樹脂表面に付着した金属析出触媒の除去液および除去方法ならびにこれを用いたプリント配線板の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005213547A true JP2005213547A (ja) | 2005-08-11 |
JP4113846B2 JP4113846B2 (ja) | 2008-07-09 |
Family
ID=34903707
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004019520A Expired - Lifetime JP4113846B2 (ja) | 2004-01-28 | 2004-01-28 | 樹脂表面に付着した金属析出触媒の除去液および除去方法ならびにこれを用いたプリント配線板の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4113846B2 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008205289A (ja) * | 2007-02-21 | 2008-09-04 | Fujitsu Ltd | 回路基板の製造方法 |
WO2011099597A1 (ja) * | 2010-02-15 | 2011-08-18 | 荏原ユージライト株式会社 | プリント配線板の製造方法 |
WO2012073816A1 (ja) * | 2010-12-03 | 2012-06-07 | 荏原ユージライト株式会社 | エッチング液の維持管理方法およびそのためのシステム |
JP2013096012A (ja) * | 2011-11-01 | 2013-05-20 | Samsung Electro-Mechanics Co Ltd | プリント回路基板の製造方法 |
JP2018513267A (ja) * | 2015-02-23 | 2018-05-24 | マクダーミッド エンソン インコーポレイテッド | プラスチックにめっきするプロセスにおいてクロムフリーエッチングを使用する際のラックのための阻害剤組成物 |
-
2004
- 2004-01-28 JP JP2004019520A patent/JP4113846B2/ja not_active Expired - Lifetime
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008205289A (ja) * | 2007-02-21 | 2008-09-04 | Fujitsu Ltd | 回路基板の製造方法 |
WO2011099597A1 (ja) * | 2010-02-15 | 2011-08-18 | 荏原ユージライト株式会社 | プリント配線板の製造方法 |
JPWO2011099597A1 (ja) * | 2010-02-15 | 2013-06-17 | 株式会社Jcu | プリント配線板の製造方法 |
WO2012073816A1 (ja) * | 2010-12-03 | 2012-06-07 | 荏原ユージライト株式会社 | エッチング液の維持管理方法およびそのためのシステム |
JP2013096012A (ja) * | 2011-11-01 | 2013-05-20 | Samsung Electro-Mechanics Co Ltd | プリント回路基板の製造方法 |
JP2018513267A (ja) * | 2015-02-23 | 2018-05-24 | マクダーミッド エンソン インコーポレイテッド | プラスチックにめっきするプロセスにおいてクロムフリーエッチングを使用する際のラックのための阻害剤組成物 |
Also Published As
Publication number | Publication date |
---|---|
JP4113846B2 (ja) | 2008-07-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6746621B2 (en) | Micro-etching composition for copper or copper alloy, micro-etching method, and method for manufacturing printed circuit board | |
CN106029946B (zh) | 用于无电镀的预处理方法 | |
JPH05263258A (ja) | 置換すずめっき用錯化剤 | |
JP2000282265A (ja) | 銅または銅合金のマイクロエッチング剤およびそれを用いる表面処理法 | |
JP2909743B2 (ja) | 銅または銅合金の化学研磨方法 | |
JP2004040082A (ja) | プリント配線板の製造 | |
JPS61278597A (ja) | 過マンガン酸ナトリウムのアルカリ性水性溶液及び樹脂回路基板の処理方法 | |
US6830627B1 (en) | Copper cleaning compositions, processes and products derived therefrom | |
EP3297772B1 (en) | Method for electrolessly plating a metal on a copper or copper alloy | |
JP2008106354A (ja) | 金属除去液及びこれを用いた金属除去方法 | |
JP3286744B2 (ja) | 非導電性材料表面に電気めっき層を直接形成する方法 | |
US6156218A (en) | Method of pretreatment for electroless nickel plating | |
TW200304507A (en) | Method of stripping silver from a printed circuit board | |
JP4113846B2 (ja) | 樹脂表面に付着した金属析出触媒の除去液および除去方法ならびにこれを用いたプリント配線板の製造方法 | |
WO2007130282A2 (en) | A method and composition for selectively stripping nickel from a substrate | |
TWI496952B (zh) | 用於直接金屬噴敷之低蝕刻方法 | |
KR101298766B1 (ko) | 니켈, 크롬, 니켈-크롬 합금의 에칭 용액 조성물 및 이를 이용한 에칭 방법 | |
JP4351079B2 (ja) | 無電解金属めっきのブリッジ防止液およびこれを用いたプリント配線板の製造方法 | |
US7063800B2 (en) | Methods of cleaning copper surfaces in the manufacture of printed circuit boards | |
WO2011099597A1 (ja) | プリント配線板の製造方法 | |
JP4395148B2 (ja) | レジスト剥離剤 | |
JP2010013516A (ja) | 接着層形成液 | |
DE10034022C2 (de) | Saure Behandlungsflüssigkeit und deren Verwendung sowie Verfahren zum Behandeln von Kupferoberflächen | |
JP2018076560A (ja) | 無電解銅めっきおよび無電解銅めっきの析出に用いられた触媒の除去液およびその用途 | |
TW201715080A (zh) | 在蝕刻前作爲用於塑膠的預處理物之有機鹽溶液 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050914 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20070615 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070626 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070821 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20070821 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20070821 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20080401 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20080414 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4113846 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110418 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120418 Year of fee payment: 4 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120418 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130418 Year of fee payment: 5 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130418 Year of fee payment: 5 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130418 Year of fee payment: 5 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140418 Year of fee payment: 6 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term |