JP2005203383A5 - - Google Patents

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Publication number
JP2005203383A5
JP2005203383A5 JP2005107010A JP2005107010A JP2005203383A5 JP 2005203383 A5 JP2005203383 A5 JP 2005203383A5 JP 2005107010 A JP2005107010 A JP 2005107010A JP 2005107010 A JP2005107010 A JP 2005107010A JP 2005203383 A5 JP2005203383 A5 JP 2005203383A5
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JP
Japan
Prior art keywords
sample
ion beam
processing
electron
focused ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005107010A
Other languages
English (en)
Japanese (ja)
Other versions
JP4507952B2 (ja
JP2005203383A (ja
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Publication date
Application filed filed Critical
Priority to JP2005107010A priority Critical patent/JP4507952B2/ja
Priority claimed from JP2005107010A external-priority patent/JP4507952B2/ja
Publication of JP2005203383A publication Critical patent/JP2005203383A/ja
Publication of JP2005203383A5 publication Critical patent/JP2005203383A5/ja
Application granted granted Critical
Publication of JP4507952B2 publication Critical patent/JP4507952B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2005107010A 2005-04-04 2005-04-04 微小試料加工観察方法及び装置 Expired - Lifetime JP4507952B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005107010A JP4507952B2 (ja) 2005-04-04 2005-04-04 微小試料加工観察方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005107010A JP4507952B2 (ja) 2005-04-04 2005-04-04 微小試料加工観察方法及び装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2004317452A Division JP4259454B2 (ja) 2004-11-01 2004-11-01 微小試料加工観察装置

Related Child Applications (4)

Application Number Title Priority Date Filing Date
JP2007086320A Division JP5125174B2 (ja) 2007-03-29 2007-03-29 微小試料加工観察方法及び装置
JP2007096987A Division JP5125184B2 (ja) 2007-04-03 2007-04-03 微小試料加工観察方法及び装置
JP2008079492A Division JP4259604B2 (ja) 2008-03-26 2008-03-26 微小試料加工観察方法及び装置
JP2008079493A Division JP4208031B2 (ja) 2008-03-26 2008-03-26 微小試料加工観察方法及び装置

Publications (3)

Publication Number Publication Date
JP2005203383A JP2005203383A (ja) 2005-07-28
JP2005203383A5 true JP2005203383A5 (zh) 2007-12-13
JP4507952B2 JP4507952B2 (ja) 2010-07-21

Family

ID=34824943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005107010A Expired - Lifetime JP4507952B2 (ja) 2005-04-04 2005-04-04 微小試料加工観察方法及び装置

Country Status (1)

Country Link
JP (1) JP4507952B2 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5125174B2 (ja) * 2007-03-29 2013-01-23 株式会社日立製作所 微小試料加工観察方法及び装置
DE102020203580B4 (de) 2020-03-20 2021-10-07 Carl Zeiss Microscopy Gmbh Verfahren zum Ändern der Raum-Orientierung einer Mikroprobe in einem Mikroskop-System, sowie Computerprogrammprodukt

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0750153B2 (ja) * 1989-12-29 1995-05-31 シャープ株式会社 半導体検査装置及び半導体検査方法
JP3060613B2 (ja) * 1991-07-12 2000-07-10 株式会社日立製作所 集束イオンビーム装置、及び集束イオンビームを用いた断面加工方法
JP3613039B2 (ja) * 1998-12-02 2005-01-26 株式会社日立製作所 試料作製装置
JP3805547B2 (ja) * 1999-01-21 2006-08-02 株式会社日立製作所 試料作製装置

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