JP2005203383A5 - - Google Patents
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- JP2005203383A5 JP2005203383A5 JP2005107010A JP2005107010A JP2005203383A5 JP 2005203383 A5 JP2005203383 A5 JP 2005203383A5 JP 2005107010 A JP2005107010 A JP 2005107010A JP 2005107010 A JP2005107010 A JP 2005107010A JP 2005203383 A5 JP2005203383 A5 JP 2005203383A5
- Authority
- JP
- Japan
- Prior art keywords
- sample
- ion beam
- processing
- electron
- focused ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Claims (1)
イオン源，イオンビームを集束するレンズ，イオンビーム走査偏向器、を備える集束イオンビーム光学系と、
電子源，電子ビームを集束するレンズ，電子ビーム走査偏向器、を備える電子ビーム光学系と、
該試料からの二次粒子を検出する検出器と、
装置全体および試料加工観察評価の一連の処理を制御管理する操作制御部と、
該試料を載置する試料台と、を備える微小試料加工観察装置において、
集束イオンビームを用いて該試料から微小試料を分離する機能と、
該微小試料を摘出するためのプローブを具備し摘出された該微小試料を前記電子ビームまたは前記集束イオンビームで観察する機能を有し、
上記操作制御部において、上記集束イオンビームにより得られる二次電子像上で、観察断面の上辺となる部分と加工深さを設定することで、該設定値に基づいて上記試料台の駆動と上記イオンビームによる加工を自動的に行なう機能を有することを特徴とする微小試料加工観察装置。 A sample stage on which the sample is placed;
A focused ion beam optical system comprising an ion source, a lens for focusing the ion beam, and an ion beam scanning deflector;
An electron beam optical system comprising an electron source, a lens for focusing the electron beam, and an electron beam scanning deflector;
A detector for detecting secondary particles from the sample;
An operation control unit for controlling and managing the entire apparatus and a series of processing of sample processing observation evaluation;
In a sample processing and observation apparatus equipped with a sample stage on which the sample is placed,
A function of separating a micro sample from the sample using a focused ion beam;
Having a probe for extracting the minute sample and having the function of observing the extracted minute sample with the electron beam or the focused ion beam;
In the operation control unit, on the secondary electron image obtained by the focused ion beam, by setting a part to be the upper side of the observation cross section and a processing depth, the driving of the sample stage and the above-described An apparatus for processing and observing a micro sample characterized by having a function of automatically performing processing by an ion beam.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005107010A JP4507952B2 (en) | 2005-04-04 | 2005-04-04 | Microsample processing observation method and apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005107010A JP4507952B2 (en) | 2005-04-04 | 2005-04-04 | Microsample processing observation method and apparatus |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004317452A Division JP4259454B2 (en) | 2004-11-01 | 2004-11-01 | Micro-sample processing observation equipment |
Related Child Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007086320A Division JP5125174B2 (en) | 2007-03-29 | 2007-03-29 | Microsample processing observation method and apparatus |
| JP2007096987A Division JP5125184B2 (en) | 2007-04-03 | 2007-04-03 | Microsample processing observation method and apparatus |
| JP2008079492A Division JP4259604B2 (en) | 2008-03-26 | 2008-03-26 | Microsample processing observation method and apparatus |
| JP2008079493A Division JP4208031B2 (en) | 2008-03-26 | 2008-03-26 | Microsample processing observation method and apparatus |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005203383A JP2005203383A (en) | 2005-07-28 |
| JP2005203383A5 true JP2005203383A5 (en) | 2007-12-13 |
| JP4507952B2 JP4507952B2 (en) | 2010-07-21 |
Family
ID=34824943
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005107010A Expired - Lifetime JP4507952B2 (en) | 2005-04-04 | 2005-04-04 | Microsample processing observation method and apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4507952B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5125174B2 (en) * | 2007-03-29 | 2013-01-23 | 株式会社日立製作所 | Microsample processing observation method and apparatus |
| DE102020203580B4 (en) | 2020-03-20 | 2021-10-07 | Carl Zeiss Microscopy Gmbh | Method for changing the spatial orientation of a microsample in a microscope system, as well as computer program product |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0750153B2 (en) * | 1989-12-29 | 1995-05-31 | シャープ株式会社 | Semiconductor inspection apparatus and semiconductor inspection method |
| JP3060613B2 (en) * | 1991-07-12 | 2000-07-10 | 株式会社日立製作所 | Focused ion beam apparatus and cross-section processing method using focused ion beam |
| JP3613039B2 (en) * | 1998-12-02 | 2005-01-26 | 株式会社日立製作所 | Sample preparation equipment |
| JP3805547B2 (en) * | 1999-01-21 | 2006-08-02 | 株式会社日立製作所 | Sample preparation equipment |
-
2005
- 2005-04-04 JP JP2005107010A patent/JP4507952B2/en not_active Expired - Lifetime
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