JP2000146781A5 - - Google Patents
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- JP2000146781A5 JP2000146781A5 JP1998327728A JP32772898A JP2000146781A5 JP 2000146781 A5 JP2000146781 A5 JP 2000146781A5 JP 1998327728 A JP1998327728 A JP 1998327728A JP 32772898 A JP32772898 A JP 32772898A JP 2000146781 A5 JP2000146781 A5 JP 2000146781A5
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- JP
- Japan
- Prior art keywords
- sample
- preparation apparatus
- stage
- vacuum
- sample preparation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000523 sample Substances 0.000 description 69
- 238000010884 ion-beam technique Methods 0.000 description 6
- 230000001678 irradiating Effects 0.000 description 3
- 230000003287 optical Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 239000011163 secondary particle Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Description
【特許請求の範囲】
【請求項１】
試料が載置される試料ステージを設置可能な真空試料室と、
前記試料にイオンビームを照射する照射光学系と、
前記試料に前記イオンビームを照射して前記試料から分離した試料片を摘出する移送手段とを有し、
前記試料ステージは前記移送手段によって摘出された前記試料片を載置する試料ホルダをさらに備え、
前記試料ステージは前記真空試料室内の真空を破らずに当該真空試料室から抜き挿し可能であることを特徴とする試料作製装置。
【請求項２】
真空試料室と、
試料にイオンビームを照射する照射光学系と、
前記真空試料室内に導入された前記試料を載置する試料ステージと、
前記試料にイオンビームを照射して前記試料より摘出された試料片を載せる試料ホルダと、
前記試料片を試料ホルダに載せるための移送手段と、
前記試料ホルダは前記試料ステージに固定され、
前記試料ステージは前記真空試料室内の真空を破ることなく別の観察装置または加工装置に導入可能であることを特徴とする試料作製装置。
【請求項３】
請求項１または２に記載の試料作製装置において、
前記移送手段はプローブと、当該プローブを駆動する駆動手段を少なくとも備えることを特徴とする試料作製装置。
【請求項４】
請求項１または２に記載の試料作製装置において、
前記試料に前記イオンビームを照射して発生した二次粒子を検出する検出器を備えることを特徴とする試料作製装置。
【請求項５】
請求項４に記載の試料作製装置において、
前記検出器からの信号を基に画像を表示する表示手段を備えることを特徴とする試料作製装置。
【請求項６】
請求項２に記載の試料作製装置において、
前記観察装置は透過型電子顕微鏡及び走査透過型電子顕微鏡を少なくとも含むことを特徴とする試料作製装置。
【請求項７】
請求項６に記載の試料作製装置において、
前記観察装置によって前記試料ステージに載置された試料または／及び試料片が観察可能であることを特徴とする試料作製装置。
【請求項８】
請求項６または７に記載の試料作製装置において、
前記観察装置によって観察された後、再び当該試料作製装置に前記試料ステージが導入可能であることを特徴とする試料作製装置。
【請求項９】
請求項１または２に記載の試料作製装置において、
前記試料ステージはサイドエントリー型ステージであることを特徴とする試料作製装置。
【請求項１０】
試料を載置する試料ステージと、
該試料ステージが設置される真空試料室と、
前記試料ステージに設けられ、前記試料から摘出された試料片を載せる試料ホルダと、
前記試料片を前記試料ホルダに載せるための移送手段と、
前記試料基板に対してイオンビームを照射する照射光学系とを有し、
前記試料ホルダは前記試料ステージに搭載され、当該試料ステージは前記真空試料室の真空を破ることなく取り出し可能であることを特徴とする試料作製装置。
[Claims]
[Claim 1]
A vacuum sample chamber where a sample stage on which the sample is placed can be installed, and
An irradiation optical system that irradiates the sample with an ion beam,
It has a transfer means for irradiating the sample with the ion beam and extracting a sample piece separated from the sample.
The sample stage further comprises a sample holder on which the sample piece extracted by the transfer means is placed.
A sample preparation apparatus characterized in that the sample stage can be inserted and removed from the vacuum sample chamber without breaking the vacuum in the vacuum sample chamber.
2.
Vacuum sample chamber and
An irradiation optical system that irradiates a sample with an ion beam,
A sample stage on which the sample introduced into the vacuum sample chamber is placed, and
A sample holder on which a sample piece extracted from the sample by irradiating the sample with an ion beam is placed.
A transfer means for placing the sample piece on the sample holder, and
The sample holder is fixed to the sample stage and
A sample preparation device, wherein the sample stage can be introduced into another observation device or processing device without breaking the vacuum in the vacuum sample chamber.
3.
In the sample preparation apparatus according to claim 1 or 2.
The transfer means is a sample preparation apparatus including at least a probe and a driving means for driving the probe.
4.
In the sample preparation apparatus according to claim 1 or 2.
A sample preparation apparatus comprising a detector for detecting secondary particles generated by irradiating the sample with the ion beam.
5.
In the sample preparation apparatus according to claim 4,
A sample preparation apparatus including a display means for displaying an image based on a signal from the detector.
6.
In the sample preparation apparatus according to claim 2,
The observation device is a sample preparation device including at least a transmission electron microscope and a scanning transmission electron microscope.
7.
In the sample preparation apparatus according to claim 6,
A sample preparation device characterized in that a sample and / or a sample piece placed on the sample stage can be observed by the observation device.
8.
In the sample preparation apparatus according to claim 6 or 7.
A sample preparation apparatus characterized in that the sample stage can be introduced into the sample preparation apparatus again after being observed by the observation apparatus.
9.
In the sample preparation apparatus according to claim 1 or 2.
The sample preparation apparatus, wherein the sample stage is a side entry type stage.
10.
A sample stage on which the sample is placed and
A vacuum sample chamber in which the sample stage is installed and
A sample holder provided on the sample stage and on which a sample piece extracted from the sample is placed,
A transfer means for placing the sample piece on the sample holder, and
It has an irradiation optical system that irradiates the sample substrate with an ion beam.
A sample preparation apparatus, wherein the sample holder is mounted on the sample stage, and the sample stage can be taken out without breaking the vacuum of the vacuum sample chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32772898A JP4185604B2 (en) | 1998-11-18 | 1998-11-18 | Sample analysis method, sample preparation method and apparatus therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32772898A JP4185604B2 (en) | 1998-11-18 | 1998-11-18 | Sample analysis method, sample preparation method and apparatus therefor |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000146781A JP2000146781A (en) | 2000-05-26 |
| JP2000146781A5 true JP2000146781A5 (en) | 2005-11-24 |
| JP4185604B2 JP4185604B2 (en) | 2008-11-26 |
Family
ID=18202332
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32772898A Expired - Lifetime JP4185604B2 (en) | 1998-11-18 | 1998-11-18 | Sample analysis method, sample preparation method and apparatus therefor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4185604B2 (en) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4616509B2 (en) * | 2001-05-11 | 2011-01-19 | 公三 藤本 | Positioning marker and positioning device |
| ATE532203T1 (en) * | 2004-08-27 | 2011-11-15 | Fei Co | LOCALIZED PLASMA TREATMENT |
| JP4851804B2 (en) * | 2006-02-13 | 2012-01-11 | 株式会社日立ハイテクノロジーズ | Focused ion beam processing observation apparatus, focused ion beam processing observation system, and processing observation method |
| JP4923716B2 (en) * | 2006-05-11 | 2012-04-25 | 株式会社日立製作所 | Sample analysis apparatus and sample analysis method |
| US8835880B2 (en) | 2006-10-31 | 2014-09-16 | Fei Company | Charged particle-beam processing using a cluster source |
| JP4937775B2 (en) * | 2007-01-26 | 2012-05-23 | アオイ電子株式会社 | Micro sample table, method for producing the same, micro sample table assembly, and sample holder |
| JP2009168560A (en) * | 2008-01-15 | 2009-07-30 | Canon Inc | Method of forming protective film and method of observing cross section of sample |
| WO2010014252A2 (en) * | 2008-08-01 | 2010-02-04 | Omniprobe, Inc. | Grid holder for stem analysis in a charged particle instrument |
| JP5281525B2 (en) * | 2009-09-11 | 2013-09-04 | 一般財団法人電力中央研究所 | Sample preparation method |
| WO2011055521A1 (en) * | 2009-11-06 | 2011-05-12 | 株式会社日立ハイテクノロジーズ | Charged particle microscope |
| JP2012112770A (en) * | 2010-11-24 | 2012-06-14 | Jeol Ltd | Sample holding method and sample holder |
| CN102944569A (en) * | 2012-12-07 | 2013-02-27 | 北京泰德制药股份有限公司 | Method for determining microstructure of lipid microsphere/lipid emulsion |
| JP6286146B2 (en) * | 2013-07-24 | 2018-02-28 | 株式会社日立ハイテクノロジーズ | Charged particle beam equipment |
| CN103645083B (en) * | 2013-11-22 | 2016-04-27 | 上海华力微电子有限公司 | The method that TEM sample is prepared again |
| CN103900868A (en) * | 2014-02-21 | 2014-07-02 | 上海华力微电子有限公司 | Preparation method of plane transmission electron microscope (TEM) sample |
| CN105928961B (en) * | 2016-06-13 | 2018-11-13 | 北京工业大学 | A kind of in-situ test sample stage and home position testing method |
| CN106373847B (en) * | 2016-08-30 | 2018-03-06 | 上海大学 | A kind of controllable micromotion platform in orientation and its orientation control method |
| DE102017212020B3 (en) * | 2017-07-13 | 2018-05-30 | Carl Zeiss Microscopy Gmbh | Method for in situ preparation and transfer of microscopic samples, computer program product and microscopic sample |
| JP7043057B2 (en) * | 2017-11-28 | 2022-03-29 | 株式会社日立ハイテクサイエンス | Cross-section processing observation method, charged particle beam device |
| CN110487823B (en) * | 2019-08-13 | 2021-11-09 | 西安工业大学 | Preparation method of powder particle transmission electron microscope sample |
| CN114354664A (en) * | 2022-01-10 | 2022-04-15 | 长江存储科技有限责任公司 | Method for preparing cross-sectional sample using FIB and method for observing cross-sectional sample |
-
1998
- 1998-11-18 JP JP32772898A patent/JP4185604B2/en not_active Expired - Lifetime
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