JP2007003539A5 - - Google Patents
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- JP2007003539A5 JP2007003539A5 JP2006238865A JP2006238865A JP2007003539A5 JP 2007003539 A5 JP2007003539 A5 JP 2007003539A5 JP 2006238865 A JP2006238865 A JP 2006238865A JP 2006238865 A JP2006238865 A JP 2006238865A JP 2007003539 A5 JP2007003539 A5 JP 2007003539A5
- Authority
- JP
- Japan
- Prior art keywords
- detector
- circuit pattern
- inspection apparatus
- pattern inspection
- defect detection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Claims (3)
被検査試料を保持する試料台と、
一次電子線を発生する電子銃と、
前記電子銃から発生した一次電子線を前記被検査試料に集束して照射する対物レンズと、
前記欠陥検出モードでの装置動作時に、前記一次電子線照射により前記被検査試料から発生する二次電子を検出する第１の検出器と、
前記レビューモードでの装置動作時に、前記一次電子線照射により前記被検査試料から発生する二次電子を検出し、かつ前記一次電子線の光軸を介して前記第１の検出器に対向配置された第２の検出器と、
前記発生する二次電子を前記第１の検出器または前記第２の検出器へ導くExB偏向器と、
前記欠陥検出モードでの動作時と前記レビューモードでの動作時とで、該ExB偏向器による前記二次電子の偏向方向を切り替える制御手段とを備えたことを特徴とする回路パターン検査装置。 A circuit pattern inspection apparatus using a scanning electron microscope capable of operating in a defect detection mode and a review mode capable of acquiring image information with higher resolution than the image information acquired in the defect detection mode,
A sample stage for holding a sample to be inspected;
An electron gun that generates a primary electron beam;
An objective lens that focuses and irradiates the specimen to be inspected with a primary electron beam generated from the electron gun;
A first detector for detecting secondary electrons generated from the sample to be inspected by irradiation of the primary electron beam during operation of the apparatus in the defect detection mode;
During operation of the apparatus in the review mode, secondary electrons generated from the sample to be inspected by the irradiation with the primary electron beam are detected, and are arranged opposite to the first detector via the optical axis of the primary electron beam. A second detector;
An ExB deflector for guiding the generated secondary electrons to the first detector or the second detector;
A circuit pattern inspection apparatus comprising: control means for switching a deflection direction of the secondary electrons by the ExB deflector during operation in the defect detection mode and during operation in the review mode .
前記ExB偏向器に電位および電流を供給する制御電源を備え、Provided with a control power supply for supplying potential and current to the ExB deflector,
前記二次電子の偏向方向の切換を、該制御電源からExB偏向器に供給する電位および電流の極性を逆にすることにより実行することを特徴とする回路パターン検査装置。2. A circuit pattern inspection apparatus according to claim 1, wherein switching of the deflection direction of the secondary electrons is performed by reversing the polarity of the potential and current supplied from the control power source to the ExB deflector.
前記第１の検出器または第２の検出器の出力信号を表示するモニタを有し、A monitor for displaying an output signal of the first detector or the second detector;
前記制御手段は、前記欠陥検出モードでの動作時と前記レビューモードでの動作時とで前記モニタで表示する前記出力信号を切り換えることを特徴とする回路パターン検査装置。The circuit pattern inspection apparatus, wherein the control means switches the output signal displayed on the monitor between the operation in the defect detection mode and the operation in the review mode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006238865A JP4382067B2 (en) | 2006-09-04 | 2006-09-04 | Circuit pattern inspection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006238865A JP4382067B2 (en) | 2006-09-04 | 2006-09-04 | Circuit pattern inspection device |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24725099A Division JP3869588B2 (en) | 1999-09-01 | 1999-09-01 | Circuit pattern inspection device |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007003539A JP2007003539A (en) | 2007-01-11 |
| JP2007003539A5 true JP2007003539A5 (en) | 2007-06-28 |
| JP4382067B2 JP4382067B2 (en) | 2009-12-09 |
Family
ID=37689285
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006238865A Expired - Fee Related JP4382067B2 (en) | 2006-09-04 | 2006-09-04 | Circuit pattern inspection device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4382067B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5039594B2 (en) * | 2008-02-08 | 2012-10-03 | 株式会社日立ハイテクノロジーズ | Review device, inspection area setting support system, and defect image acquisition method |
| JP5174498B2 (en) * | 2008-03-19 | 2013-04-03 | 株式会社日立ハイテクノロジーズ | Charged particle beam equipment |
| JP2013200182A (en) | 2012-03-23 | 2013-10-03 | Toshiba Corp | Defect inspection device and defect inspection method |
| JP6605080B2 (en) * | 2018-06-25 | 2019-11-13 | 株式会社ホロン | Ultrafast electron detector and scanning electron beam inspection apparatus incorporating the detector |
-
2006
- 2006-09-04 JP JP2006238865A patent/JP4382067B2/en not_active Expired - Fee Related
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