JP2005197748A - 金属ゲート電極およびシリサイド接点を備えたfetゲート構造 - Google Patents
金属ゲート電極およびシリサイド接点を備えたfetゲート構造 Download PDFInfo
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 167
- 239000002184 metal Substances 0.000 title claims abstract description 167
- 229910021332 silicide Inorganic materials 0.000 title claims abstract description 54
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 title claims abstract description 54
- 238000000034 method Methods 0.000 claims abstract description 86
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 52
- 239000010703 silicon Substances 0.000 claims abstract description 52
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 51
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 239000003989 dielectric material Substances 0.000 claims abstract description 18
- 239000004065 semiconductor Substances 0.000 claims abstract description 14
- 150000004767 nitrides Chemical class 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 13
- 229910044991 metal oxide Inorganic materials 0.000 claims description 6
- 150000004706 metal oxides Chemical class 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
- 229910052715 tantalum Inorganic materials 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 28
- 229920005591 polysilicon Polymers 0.000 description 24
- 229910021417 amorphous silicon Inorganic materials 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 4
- 238000000137 annealing Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000004151 rapid thermal annealing Methods 0.000 description 2
- 229910005881 NiSi 2 Inorganic materials 0.000 description 1
- 239000005380 borophosphosilicate glass Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- XUIMIQQOPSSXEZ-AKLPVKDBSA-N silicon-31 atom Chemical compound [31Si] XUIMIQQOPSSXEZ-AKLPVKDBSA-N 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
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Abstract
【解決手段】この構造は、ゲート領域とのシリサイド接点を含む。ダミー・ゲート構造および犠牲ゲート誘電体を除去して、基板の一部分を露出させ、その上にゲート誘電体を形成する。ゲート誘電体および誘電体材料を覆うように金属層を形成する。この金属層は、それが好都合なら、デバイス・ウェハを覆うブランケット金属層にすることもできる。次いで、金属層を覆うようにシリコン層を形成する。この層も、ブランケット層にすることができる。次いで、平坦化またはエッチバック・プロセスを行い、誘電体材料の上面を露出させ、金属層およびシリコン層の他の部分がゲート領域内に残って誘電体材料の上面と同一平面となる表面を有するようにする。次いで、ゲート領域の金属層と接触したシリサイド接点を形成する。
【選択図】図11
Description
11 ゲート領域
12 ゲート領域
13 窒化物
14 酸化物
15 犠牲酸化物層
20 トレンチ
25 ゲート誘電体
26 金属層
31 ブランケット・シリコン層
41 ブランケット金属層
51 シリサイド
Claims (20)
- 上面を有する誘電体材料と隣接したゲート構造を基板上に有する半導体デバイスを作製する方法であって、
前記デバイスのゲート領域の材料を除去して前記基板の一部分を露出させるステップと、
前記基板の露出部分上にゲート誘電体を形成するステップと、
前記ゲート誘電体および前記誘電体材料を覆う金属層を形成するステップと、
前記金属層を覆うシリコン層を形成するステップと、
前記金属層の第1の部分および前記シリコン層の第1の部分を除去して、前記誘電体材料の上面を露出させ、前記金属層の第2の部分および前記シリコン層の第2の部分が前記ゲート領域内に残って前記上面と同一平面となる表面を有するようにするステップと、
前記金属層の第2の部分と接触したシリサイド接点を前記ゲート領域中に形成するステップとを含む方法。 - 前記シリサイド接点を形成するステップが、
前記ゲート領域の上にシリサイド形成用金属の層を堆積させるステップと、
シリサイド化プロセスを実行して、前記シリコン層の第2の部分のシリコンおよび前記シリサイド形成用金属の層の金属を含む金属シリサイドを形成するステップと、
平坦化プロセスを実行して前記誘電体材料の上面を露出させるステップとをさらに含む、請求項1に記載の方法。 - 前記シリサイド形成用金属が、Ni、Co、Ta、WおよびMoから選択される、請求項1に記載の方法。
- 前記ゲート領域中の材料を除去するステップにおいて、側壁と前記基板の露出部分からなる底部とを有するトレンチを形成し、
前記金属層を形成するステップが、前記トレンチの側壁上に金属を形成するステップをさらに含み、
前記シリコン層を形成するステップが、前記トレンチを充填するステップを含む、請求項1に記載の方法。 - 前記半導体デバイスがウェハ上に作製され、前記金属層を形成するステップが、前記ウェハ上にブランケット金属層を形成するステップを含み、前記シリコン層を形成するステップが、前記ウェハ上にブランケット・シリコン層を形成するステップを含む、請求項1に記載の方法。
- 上面を有する誘電体材料と隣接したゲート構造を基板上に有する半導体デバイスを作製する方法であって、
前記デバイスのゲート領域の第1の部分の材料を除去して前記基板の第1の部分を露出させるステップと、
前記基板の露出した第1の部分の上に第1のゲート誘電体を形成するステップと、
第1のゲート誘電体を覆う第1の金属層を形成するステップと、
第1の金属層を覆う第1のシリコン層を形成するステップと、
第1の金属層の第1の部分および第1のシリコン層の第1の部分を除去して、前記誘電体材料の上面を露出させ、第1の金属層の第2の部分および第1のシリコン層の第2の部分がゲート領域内に残って前記上面と同一平面となる表面を有するようにするステップと、
前記ゲート領域の第2の部分の材料を除去して、前記基板の第2の部分を露出させ、第1の金属層の隣接部分を露出させるステップと、
前記基板の露出した第2の部分の上に第2のゲート誘電体を形成するステップと、
第1の金属層の前記露出した隣接部分の上に酸化物層を形成するステップと、
第2のゲート誘電体を覆う第2の金属層を形成するステップと、
第2の金属層を覆う第2のシリコン層を形成するステップと、
第2の金属層の第1の部分および第2のシリコン層の第1の部分を除去して、前記誘電体材料の上面を露出させ、第2の金属層の第2の部分および第2のシリコン層の第2の部分が前記ゲート領域内に残って前記上面と同一平面となる表面を有するようにするステップと、
第1の金属層の第2の部分および第2の金属層の第2の部分と接触したシリサイド接点を前記ゲート領域中に形成するステップとを含む方法。 - 前記シリサイド接点を形成するステップが、
前記ゲート領域の第1の部分および前記ゲート領域の第2の部分を覆う第3のシリコン層を形成するステップ、
第3のシリコン層の上にシリサイド形成用金属の層を堆積させるステップ、
シリサイド化プロセスを実行して、第1のシリコン層の第2の部分のシリコン、第2のシリコン層の第2の部分のシリコン、および第3のシリコン層のシリコンと、前記シリサイド形成用金属の層の金属とを含む金属シリサイドを形成するステップ、ならびに
平坦化プロセスを実行して、前記誘電体材料の上面を露出させるステップをさらに含む、請求項6に記載の方法。 - 前記シリサイド形成用金属が、Ni、Co、Ta、WおよびMoから選択される、請求項6に記載の方法。
- 前記ゲート領域中の材料を除去するステップにおいて、側壁と前記基板の露出した第1の部分からなる底部とを有する第1のトレンチを形成し、
前記第1の金属層を形成するステップが、第1のトレンチの側壁上に金属を形成するステップをさらに含み、
前記第1のシリコン層を形成するステップが、第1のトレンチを充填するステップを含み、
前記ゲート領域の第2の部分の材料を除去するステップにおいて、側壁と前記基板の露出した第2の部分からなる底部とを有する第2のトレンチを形成し、
前記第2の金属層を形成するステップが、第2のトレンチの側壁上に金属を形成するステップをさらに含み、
前記第2のシリコン層を形成するステップが、第2のトレンチを充填するステップを含む、請求項6に記載の方法。 - 前記半導体デバイスがウェハ上に作製され、前記第1の金属層を形成するステップが、前記ウェハ上に第1のブランケット金属層を形成するステップを含み、前記第1のシリコン層を形成するステップが、前記ウェハ上に第2のブランケット・シリコン層を形成するステップを含み、前記第2の金属層を形成するステップが、前記ウェハ上に第2のブランケット金属層を形成するステップを含み、前記第2のシリコン層を形成するステップが、前記ウェハ上に第2のブランケット・シリコン層を形成するステップを含む、請求項6に記載の方法。
- 前記シリサイド接点を形成するステップの前に、金属および金属酸化物を除去して、前記第1の金属層の第2の部分、前記酸化物層、および前記第2の金属層の第2の部分を前記上面よりも窪ませるステップをさらに含む、請求項6に記載の方法。
- 前記シリサイド接点を形成するステップの前に、金属および金属酸化物を除去して、前記第1の金属層の第2の部分、前記酸化物層、および前記第2の金属層の第2の部分を前記上面よりも窪ませることにより、前記ゲート領域に凹部を形成するステップをさらに含む方法であって、前記第3のシリコン層を形成するステップが、前記凹部を充填するステップをさらに含む、請求項7に記載の方法。
- 前記シリサイド接点を形成するステップにおいて、前記シリサイドで前記凹部を充填する、請求項12に記載の方法。
- 前記シリサイド接点を形成するステップの後に、前記ゲート領域を覆う窒化物層を形成するステップをさらに含む、請求項6に記載の方法。
- 前記シリサイド接点を前記上面よりも窪ませることにより、前記ゲート領域に凹部を形成する方法であって、
前記ゲート領域を覆い、かつ前記凹部を充填する窒化物層を形成するステップと、
平坦化処理を実行して前記上面を露出させ、前記窒化物層の一部分が前記凹部内に残って前記上面と同一平面となる表面を有するようにするステップとをさらに含む、請求項6に記載の方法。 - 上面を有する誘電体材料と隣接するゲート構造を基板上に有する半導体デバイスであって、
ゲート領域中の前記基板の一部分を覆い、これと接触するゲート誘電体と、
前記ゲート誘電体と接触する金属層と、
下側面が前記金属層と接触し、上側面が前記上面と同一平面であるシリサイド接点とを含む半導体デバイス。 - 前記ゲート領域が底部および側壁を有するトレンチとして特徴付けられ、前記ゲート誘電体が前記トレンチの底部を覆い、前記金属層が前記トレンチの側壁と接触しており、前記シリサイド接点が前記トレンチを充填する、請求項16に記載の半導体デバイス。
- 前記金属層が第1の金属層および第2の金属層を含み、前記第1の金属層と前記第2の金属層の間に金属酸化物層をさらに含む、請求項16に記載の半導体デバイス。
- 前記シリサイド接点を覆う窒化物層をさらに含む、請求項16に記載の半導体デバイス。
- 前記シリサイド接点が、
前記上面よりも窪んだ上側面を有するシリサイド部分と、
前記シリサイド部分を覆う、前記上面と同一平面となる上側面を有する窒化物キャップ部分と含み、
前記窒化物キャップ部分が前記ゲート領域に対してセルフアラインする、請求項16に記載の半導体デバイス。
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US7056794B2 (en) | 2006-06-06 |
JP4391950B2 (ja) | 2009-12-24 |
US20050153530A1 (en) | 2005-07-14 |
KR100613068B1 (ko) | 2006-08-16 |
CN1638049A (zh) | 2005-07-13 |
KR20050073541A (ko) | 2005-07-14 |
CN100490079C (zh) | 2009-05-20 |
TW200525750A (en) | 2005-08-01 |
TWI329361B (en) | 2010-08-21 |
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