JP2005171364A - 導電性金属膜の形成方法 - Google Patents
導電性金属膜の形成方法 Download PDFInfo
- Publication number
- JP2005171364A JP2005171364A JP2003416422A JP2003416422A JP2005171364A JP 2005171364 A JP2005171364 A JP 2005171364A JP 2003416422 A JP2003416422 A JP 2003416422A JP 2003416422 A JP2003416422 A JP 2003416422A JP 2005171364 A JP2005171364 A JP 2005171364A
- Authority
- JP
- Japan
- Prior art keywords
- gold plating
- thin film
- forming
- film
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- Chemically Coating (AREA)
- Physical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003416422A JP2005171364A (ja) | 2003-12-15 | 2003-12-15 | 導電性金属膜の形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003416422A JP2005171364A (ja) | 2003-12-15 | 2003-12-15 | 導電性金属膜の形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005171364A true JP2005171364A (ja) | 2005-06-30 |
| JP2005171364A5 JP2005171364A5 (enExample) | 2006-12-28 |
Family
ID=34735623
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003416422A Pending JP2005171364A (ja) | 2003-12-15 | 2003-12-15 | 導電性金属膜の形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005171364A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012214858A (ja) * | 2011-04-01 | 2012-11-08 | Nikon Corp | パターン形成方法 |
-
2003
- 2003-12-15 JP JP2003416422A patent/JP2005171364A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012214858A (ja) * | 2011-04-01 | 2012-11-08 | Nikon Corp | パターン形成方法 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20061110 |
|
| A621 | Written request for application examination |
Effective date: 20061110 Free format text: JAPANESE INTERMEDIATE CODE: A621 |
|
| A977 | Report on retrieval |
Effective date: 20080826 Free format text: JAPANESE INTERMEDIATE CODE: A971007 |
|
| A131 | Notification of reasons for refusal |
Effective date: 20090902 Free format text: JAPANESE INTERMEDIATE CODE: A131 |
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| A02 | Decision of refusal |
Effective date: 20100105 Free format text: JAPANESE INTERMEDIATE CODE: A02 |