JP2005143283A - 電流制御回路 - Google Patents
電流制御回路 Download PDFInfo
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- JP2005143283A JP2005143283A JP2004233768A JP2004233768A JP2005143283A JP 2005143283 A JP2005143283 A JP 2005143283A JP 2004233768 A JP2004233768 A JP 2004233768A JP 2004233768 A JP2004233768 A JP 2004233768A JP 2005143283 A JP2005143283 A JP 2005143283A
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- 230000007704 transition Effects 0.000 claims abstract description 60
- 230000005684 electric field Effects 0.000 claims abstract description 8
- 239000012212 insulator Substances 0.000 claims description 73
- 229910052751 metal Inorganic materials 0.000 claims description 32
- 239000002184 metal Substances 0.000 claims description 32
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 claims description 2
- 229910001935 vanadium oxide Inorganic materials 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 230000005669 field effect Effects 0.000 description 4
- 229910021542 Vanadium(IV) oxide Inorganic materials 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical compound O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/821—Device geometry
- H10N70/823—Device geometry adapted for essentially horizontal current flow, e.g. bridge type devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/20—Multistable switching devices, e.g. memristors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/821—Device geometry
- H10N70/826—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/883—Oxides or nitrides
- H10N70/8833—Binary metal oxides, e.g. TaOx
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Thermistors And Varistors (AREA)
- Semiconductor Memories (AREA)
- Emergency Protection Circuit Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
【解決手段】 電源100と急激な金属絶縁体相転移型素子200と抵抗要素300とを具備する電流制御回路であって、急激な金属絶縁体相転移型素子200は、電源100に連結される第1電極及び第2電極を備え、第1電極及び第2電極間に電界が印加されることによって急激な金属絶縁体相転移特性を表す。抵抗要素300は、電源100と急激な金属絶縁体相転移型素子200間に連結されて急激な金属絶縁体相転移型素子200を貫通する大量の電流を制御する。これによれば、急激に発生する大量の電流により急激な金属絶縁体相転移型素子200が破綻される現象が防止でき、多様な応用分野に急激な金属絶縁体相転移型素子200を備えた電流制御回路が適用できる。
【選択図】 図2
Description
また、前記抵抗要素は、抵抗器であることが望ましい。この場合、前記抵抗器は、可変抵抗器であることが望ましい。
また、場合によって、前記抵抗要素は、抵抗器として使われうる平面形素子パターンでありうる。
なお、本発明の実施例は、様々な他の形態に変形でき、したがって、本発明の技術的範囲が後述される実施例に限定されると解釈されてはならない。
電源100により急激な金属絶縁体相転移型素子200の第1電極230及び第2電極240の両端に一定サイズの電界が印加されれば、急激な金属絶縁体相転移型素子200の絶縁体220は、急激な金属絶縁体相転移現象を経ながら、表面に電流移動経路(図3で点線の矢印で表示)を形成する。
図4に示した横軸は、第1電極230及び第2電極240間に印加される電圧Vであり、縦軸は、第1電極230及び第2電極240間を流れる電流密度Jである。
200 急激な金属絶縁体相転移型素子
220 絶縁体(絶縁体膜)
230 第1電極
240 第2電極
300 抵抗要素
Claims (8)
- 電源と、
該電源に連結される第1電極及び第2電極を備え、前記第1電極及び前記第2電極間に電界が印加されることによって急激な金属絶縁体相転移特性を有する急激な金属絶縁体相転移型素子と、
前記電源と前記急激な金属絶縁体相転移型素子間に連結されて前記急激な金属絶縁体相転移型素子を貫通する電流が制御できる抵抗要素と
を具備することを特徴とする電流制御回路。 - 前記抵抗要素は、前記急激な金属絶縁体相転移型素子と直列に連結されることを特徴とする請求項1に記載の電流制御回路。
- 前記抵抗要素は、抵抗器であることを特徴とする請求項1に記載の電流制御回路。
- 前記抵抗器は、可変抵抗器であることを特徴とする請求項3に記載の電流制御回路。
- 前記抵抗要素は、抵抗器として使われる平面形素子パターンであることを特徴とする請求項1に記載の電流制御回路。
- 前記抵抗要素は、抵抗器として使われる交流抵抗器であることを特徴とする請求項1に記載の電流制御回路。
- 前記急激な金属絶縁体相転移型素子は、前記第1電極及び前記第2電極間に急激な金属絶縁体相転移特性を有する絶縁体膜が配置される構造を備えていることを特徴とする請求項1に記載の電流制御回路。
- 前記絶縁体は、酸化バナジウムを含むことを特徴とする請求項6に記載の電流制御回路。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020030078333A KR100576704B1 (ko) | 2003-11-06 | 2003-11-06 | 급격한 금속-절연체 상전이형 소자를 포함하는 전류제어회로 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2005143283A true JP2005143283A (ja) | 2005-06-02 |
Family
ID=34431731
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004233768A Pending JP2005143283A (ja) | 2003-11-06 | 2004-08-10 | 電流制御回路 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6987290B2 (ja) |
EP (1) | EP1530244A3 (ja) |
JP (1) | JP2005143283A (ja) |
KR (1) | KR100576704B1 (ja) |
CN (1) | CN100337335C (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007024119A1 (en) * | 2005-08-26 | 2007-03-01 | Electronics And Telecommunications Research Institute | Electron emission device using abrupt metal-insulator transition and display including the same |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100609699B1 (ko) * | 2004-07-15 | 2006-08-08 | 한국전자통신연구원 | 급격한 금속-절연체 전이 반도체 물질을 이용한 2단자반도체 소자 및 그 제조 방법 |
JP4143615B2 (ja) * | 2005-03-03 | 2008-09-03 | エルピーダメモリ株式会社 | オンダイターミネーション回路 |
KR100714125B1 (ko) * | 2005-03-18 | 2007-05-02 | 한국전자통신연구원 | 급격한 mit 소자를 이용한 저전압 잡음 방지회로 및 그회로를 포함한 전기전자시스템 |
EP1911137A4 (en) * | 2005-07-29 | 2011-02-02 | Korea Electronics Telecomm | DEVICE WITH ABRUPTED METAL-ISOLATOR TRANSFER, CIRCUIT FOR REMOVING HIGH VOLTAGE NOISE WITH UNIT WITH METAL-ISOLATOR TRANSFER AND ELECTRICAL AND / OR ELECTRONIC SYSTEM WITH SWITCHING |
KR100701159B1 (ko) * | 2006-02-01 | 2007-03-28 | 한국전자통신연구원 | 병렬 전도층 구조를 갖는 금속-절연체 전이 소자 |
EP1979947B1 (en) * | 2006-02-01 | 2013-11-20 | Electronics and Telecommunications Research Institute | Abrupt metal-insulator transition device with parallel conducting layers |
KR100825738B1 (ko) * | 2006-03-28 | 2008-04-29 | 한국전자통신연구원 | 급격한 금속-절연체 전이를 이용한 전압조정 시스템 |
KR100825760B1 (ko) * | 2006-06-02 | 2008-04-29 | 한국전자통신연구원 | 급격한 mit 소자, 그 소자를 이용한 mit 센서 및 그mit 센서를 포함한 경보기 및 이차전지 폭발 방지 회로 |
KR100825762B1 (ko) * | 2006-08-07 | 2008-04-29 | 한국전자통신연구원 | 금속-절연체 전이(mit) 소자의 불연속 mit를연속적으로 측정하는 회로 및 그 회로를 이용한 mit센서 |
KR100864827B1 (ko) * | 2006-11-02 | 2008-10-23 | 한국전자통신연구원 | Mit 소자를 이용한 논리회로 |
KR100864833B1 (ko) * | 2006-11-23 | 2008-10-23 | 한국전자통신연구원 | 금속-절연체 전이(mit) 소자 기반의 발진 회로 및 그발진 회로 구동방법 |
CN100461485C (zh) * | 2007-01-17 | 2009-02-11 | 中国科学院上海微系统与信息技术研究所 | 基于硫系化合物相变材料的限流器及制作方法 |
KR100842296B1 (ko) | 2007-03-12 | 2008-06-30 | 한국전자통신연구원 | 금속-절연체 전이(mit) 소자 기반의 발진 회로 및 그발진 회로의 발진 주파수 조절방법 |
KR100859717B1 (ko) * | 2007-05-07 | 2008-09-23 | 한국전자통신연구원 | 3 단자 mit 스위치, 그 스위치를 이용한 스위칭 시스템,및 그 스위치의 mit 제어방법 |
KR100901699B1 (ko) * | 2007-07-11 | 2009-06-08 | 한국전자통신연구원 | 금속-절연체 상전이 메모리 셀 및 그의 제조 방법 |
KR20090049008A (ko) | 2007-11-12 | 2009-05-15 | 한국전자통신연구원 | 금속-절연체 전이(mit)소자를 이용한 트랜지스터발열제어 회로 및 그 발열제어 방법 |
US8076662B2 (en) * | 2008-11-26 | 2011-12-13 | President And Fellows Of Harvard College | Electric field induced phase transitions and dynamic tuning of the properties of oxide structures |
KR101109667B1 (ko) | 2008-12-22 | 2012-01-31 | 한국전자통신연구원 | 방열 성능이 향상된 전력 소자 패키지 |
US8362477B2 (en) | 2010-03-23 | 2013-01-29 | International Business Machines Corporation | High density memory device |
CN103117538B (zh) * | 2013-02-06 | 2015-04-08 | 中国科学院电工研究所 | 一种基于绝缘体-金属相变电阻的谐振型限流器 |
CN112736880A (zh) * | 2020-12-25 | 2021-04-30 | 国网浙江省电力有限公司金华供电公司 | 一种基于相变电阻的短路电流抑制装置 |
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DE2215878A1 (de) * | 1972-03-30 | 1973-12-06 | Siemens Ag | Magnetisch steuerbares festkoerperschaltelement |
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US6204139B1 (en) * | 1998-08-25 | 2001-03-20 | University Of Houston | Method for switching the properties of perovskite materials used in thin film resistors |
US6518609B1 (en) * | 2000-08-31 | 2003-02-11 | University Of Maryland | Niobium or vanadium substituted strontium titanate barrier intermediate a silicon underlayer and a functional metal oxide film |
KR100433623B1 (ko) | 2001-09-17 | 2004-05-31 | 한국전자통신연구원 | 급격한 금속-절연체 상전이를 이용한 전계 효과 트랜지스터 |
-
2003
- 2003-11-06 KR KR1020030078333A patent/KR100576704B1/ko not_active IP Right Cessation
-
2004
- 2004-06-10 US US10/866,274 patent/US6987290B2/en not_active Expired - Lifetime
- 2004-06-16 EP EP04253582A patent/EP1530244A3/en not_active Withdrawn
- 2004-06-28 CN CNB2004100620566A patent/CN100337335C/zh not_active Expired - Fee Related
- 2004-08-10 JP JP2004233768A patent/JP2005143283A/ja active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007024119A1 (en) * | 2005-08-26 | 2007-03-01 | Electronics And Telecommunications Research Institute | Electron emission device using abrupt metal-insulator transition and display including the same |
KR100809397B1 (ko) * | 2005-08-26 | 2008-03-05 | 한국전자통신연구원 | 급격한 금속-절연체 전이를 이용한 전자방출소자 및 이를포함하는 디스플레이 |
JP2009506495A (ja) * | 2005-08-26 | 2009-02-12 | エレクトロニクス アンド テレコミュニケーションズ リサーチ インスチチュート | 急激な金属−絶縁体転移を利用した電子放出素子及びこれを備えるディスプレイ |
US7911125B2 (en) | 2005-08-26 | 2011-03-22 | Electronics And Telecommunications Research Institute | Electron emission device using abrupt metal-insulator transition and display including the same |
Also Published As
Publication number | Publication date |
---|---|
CN1614786A (zh) | 2005-05-11 |
CN100337335C (zh) | 2007-09-12 |
EP1530244A2 (en) | 2005-05-11 |
EP1530244A3 (en) | 2007-05-16 |
KR100576704B1 (ko) | 2006-05-03 |
KR20050043431A (ko) | 2005-05-11 |
US6987290B2 (en) | 2006-01-17 |
US20050098836A1 (en) | 2005-05-12 |
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A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20070718 |
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A912 | Re-examination (zenchi) completed and case transferred to appeal board |
Free format text: JAPANESE INTERMEDIATE CODE: A912 Effective date: 20070810 |