JP2005136392A5 - - Google Patents
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- JP2005136392A5 JP2005136392A5 JP2004290571A JP2004290571A JP2005136392A5 JP 2005136392 A5 JP2005136392 A5 JP 2005136392A5 JP 2004290571 A JP2004290571 A JP 2004290571A JP 2004290571 A JP2004290571 A JP 2004290571A JP 2005136392 A5 JP2005136392 A5 JP 2005136392A5
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前記増幅回路は、トランジスタを有し、
前記トランジスタは結晶構造を有する半導体膜を有する薄膜トランジスタからなり、
前記光センサー素子は、第一の電極と、該第一の電極上に非晶質構造を有する半導体膜からなる光電変換層と、該光電変換層上に第二の電極とを有し、
前記第一の電極は、前記光電変換層の一部に重なり、前記薄膜トランジスタのソース電極またはドレイン電極と同じ材料で形成されていることを特徴とする半導体装置。 Possess the optical sensor device amplifier circuit,
The amplifier circuit includes a transistor,
The transistor comprises a thin film transistor having a semiconductor film having a crystal structure,
The photosensor element has a first electrode, a photoelectric conversion layer made of a semiconductor film having an amorphous structure on the first electrode, and a second electrode on the photoelectric conversion layer,
The semiconductor device is characterized in that the first electrode overlaps a part of the photoelectric conversion layer and is formed of the same material as a source electrode or a drain electrode of the thin film transistor .
前記増幅回路は、トランジスタを有し、
前記トランジスタは結晶構造を有する半導体膜を有する薄膜トランジスタからなり、
前記光センサー素子は、第一の電極と、該第一の電極上に結晶質半導体膜からなる光電変換層と、該光電変換層上に第二の電極とを有し、
前記第一の電極は、前記光電変換層の一部に重なり、前記薄膜トランジスタのソース電極またはドレイン電極と同じ材料で形成されていることを特徴とする半導体装置。 Possess the optical sensor device amplifier circuit,
The amplifier circuit includes a transistor,
The transistor comprises a thin film transistor having a semiconductor film having a crystal structure,
The photosensor element has a first electrode, a photoelectric conversion layer made of a crystalline semiconductor film on the first electrode, and a second electrode on the photoelectric conversion layer,
The semiconductor device is characterized in that the first electrode overlaps a part of the photoelectric conversion layer and is formed of the same material as a source electrode or a drain electrode of the thin film transistor .
前記増幅回路は、トランジスタを有し、The amplifier circuit includes a transistor,
前記トランジスタは結晶構造を有する半導体膜を有する薄膜トランジスタからなり、The transistor comprises a thin film transistor having a semiconductor film having a crystal structure,
前記光センサー素子は、第一の電極と、該第一の電極上に一部接し非晶質構造を有する半導体膜からなる光電変換層と、該光電変換層上に第二の電極とを有し、The photosensor element has a first electrode, a photoelectric conversion layer made of a semiconductor film partially in contact with the first electrode and having an amorphous structure, and a second electrode on the photoelectric conversion layer. And
前記第一の電極は、前記光電変換層の一部に重なり、前記薄膜トランジスタのソース電極またはドレイン電極と同じ材料で形成されていることを特徴とする半導体装置。The semiconductor device is characterized in that the first electrode overlaps a part of the photoelectric conversion layer and is formed of the same material as a source electrode or a drain electrode of the thin film transistor.
前記増幅回路は、トランジスタを有し、The amplifier circuit includes a transistor,
前記トランジスタは結晶構造を有する半導体膜を有する薄膜トランジスタからなり、The transistor comprises a thin film transistor having a semiconductor film having a crystal structure,
前記光センサー素子は、第一の電極と、該第一の電極上に一部接し結晶質半導体膜からなる光電変換層と、該光電変換層上に第二の電極とを有し、The photosensor element has a first electrode, a photoelectric conversion layer made of a crystalline semiconductor film partially in contact with the first electrode, and a second electrode on the photoelectric conversion layer,
前記第一の電極は、前記光電変換層の一部に重なり、前記薄膜トランジスタのソース電極またはドレイン電極と同じ材料で形成されていることを特徴とする半導体装置。The semiconductor device is characterized in that the first electrode overlaps a part of the photoelectric conversion layer and is formed of the same material as a source electrode or a drain electrode of the thin film transistor.
前記増幅回路は、トランジスタを有し、The amplifier circuit includes a transistor,
前記トランジスタは結晶構造を有する半導体膜を有する薄膜トランジスタからなり、The transistor comprises a thin film transistor having a semiconductor film having a crystal structure,
前記光センサー素子は、第一の電極と、該第一の電極を覆って形成された非晶質構造を有する半導体膜からなる光電変換層と、該光電変換層上に第二の電極とを有し、The photosensor element includes a first electrode, a photoelectric conversion layer made of a semiconductor film having an amorphous structure formed so as to cover the first electrode, and a second electrode on the photoelectric conversion layer. Have
前記第一の電極は、前記光電変換層の一部に重なり、前記薄膜トランジスタのソース電極またはドレイン電極と同じ材料で形成されていることを特徴とする半導体装置。The semiconductor device is characterized in that the first electrode overlaps a part of the photoelectric conversion layer and is formed of the same material as a source electrode or a drain electrode of the thin film transistor.
前記増幅回路は、トランジスタを有し、The amplifier circuit includes a transistor,
前記トランジスタは結晶構造を有する半導体膜を有する薄膜トランジスタからなり、The transistor comprises a thin film transistor having a semiconductor film having a crystal structure,
前記光センサー素子は、第一の電極と、該第一の電極を覆って形成された結晶質半導体膜からなる光電変換層と、該光電変換層上に第二の電極とを有し、The photosensor element has a first electrode, a photoelectric conversion layer made of a crystalline semiconductor film formed to cover the first electrode, and a second electrode on the photoelectric conversion layer,
前記第一の電極は、前記光電変換層の一部に重なり、前記薄膜トランジスタのソース電極またはドレイン電極と同じ材料で形成されていることを特徴とする半導体装置。The semiconductor device is characterized in that the first electrode overlaps a part of the photoelectric conversion layer and is formed of the same material as a source electrode or a drain electrode of the thin film transistor.
前記薄膜トランジスタは、nチャネル型の薄膜トランジスタであることを特徴とする半導体装置。The semiconductor device is an n-channel thin film transistor.
前記増幅回路は、トランジスタを有し、
前記トランジスタは結晶構造を有する半導体膜を有するnチャネル型の薄膜トランジスタからなり、
前記光センサー素子は、第一の電極と、該第一の電極上に一部接するp型の非晶質半導体層と、該p型の非晶質半導体層上に接する非晶質構造を有する半導体膜からなる光電変換層と、該非晶質構造を有する半導体膜からなる光電変換層上に接するn型の非晶質半導体層と、該n型の非晶質半導体層上に接する第二の電極とを有し、
前記第一の電極は、前記光電変換層の一部に重なり、前記薄膜トランジスタのソース電極またはドレイン電極と同じ材料で形成されていることを特徴とする半導体装置。 Possess the optical sensor device amplifier circuit,
The amplifier circuit includes a transistor,
The transistor includes an n-channel thin film transistor having a semiconductor film having a crystal structure,
The photosensor element has a first electrode, a p-type amorphous semiconductor layer partially in contact with the first electrode, and an amorphous structure in contact with the p-type amorphous semiconductor layer. A photoelectric conversion layer made of a semiconductor film, an n-type amorphous semiconductor layer in contact with the photoelectric conversion layer made of the semiconductor film having an amorphous structure, and a second contact in contact with the n-type amorphous semiconductor layer An electrode,
The semiconductor device is characterized in that the first electrode overlaps a part of the photoelectric conversion layer and is formed of the same material as a source electrode or a drain electrode of the thin film transistor .
前記増幅回路は、トランジスタを有し、
前記トランジスタは結晶構造を有する半導体膜を有するnチャネル型の薄膜トランジスタからなり、
前記光センサー素子は、第一の電極と、該第一の電極上に一部接するp型の結晶質半導体層と、該p型の結晶質半導体層上に接する非晶質構造を有する半導体膜からなる光電変換層と、該非晶質構造を有する半導体膜からなる光電変換層上に接するn型の結晶質半導体層と、該n型の結晶質半導体層上に接する第二の電極とを有し、
前記第一の電極は、前記光電変換層の一部に重なり、前記薄膜トランジスタのソース電極またはドレイン電極と同じ材料で形成されていることを特徴とする半導体装置。 Possess the optical sensor device amplifier circuit,
The amplifier circuit includes a transistor,
The transistor includes an n-channel thin film transistor having a semiconductor film having a crystal structure,
The photosensor element includes a first electrode, a p-type crystalline semiconductor layer partially in contact with the first electrode, and a semiconductor film having an amorphous structure in contact with the p-type crystalline semiconductor layer A photoelectric conversion layer comprising: an n-type crystalline semiconductor layer in contact with the photoelectric conversion layer comprising a semiconductor film having an amorphous structure; and a second electrode in contact with the n-type crystalline semiconductor layer. And
The semiconductor device is characterized in that the first electrode overlaps a part of the photoelectric conversion layer and is formed of the same material as a source electrode or a drain electrode of the thin film transistor .
前記増幅回路は、トランジスタを有し、
前記トランジスタは結晶構造を有する半導体膜を有するnチャネル型の薄膜トランジスタからなり、
前記光センサー素子は、第一の電極と、該第一の電極上に一部接するp型の非晶質半導体層と、該p型の非晶質半導体層上に接する非晶質構造を有する半導体膜からなる光電変換層と、該非晶質構造を有する半導体膜からなる光電変換層上に接するn型の結晶質半導体層と、該n型の結晶質半導体層上に接する第二の電極とを有し、
前記第一の電極は、前記光電変換層の一部に重なり、前記薄膜トランジスタのソース電極またはドレイン電極と同じ材料で形成されていることを特徴とする半導体装置。 Possess the optical sensor device amplifier circuit,
The amplifier circuit includes a transistor,
The transistor includes an n-channel thin film transistor having a semiconductor film having a crystal structure,
The photosensor element has a first electrode, a p-type amorphous semiconductor layer partially in contact with the first electrode, and an amorphous structure in contact with the p-type amorphous semiconductor layer. A photoelectric conversion layer made of a semiconductor film, an n-type crystalline semiconductor layer in contact with the photoelectric conversion layer made of a semiconductor film having an amorphous structure, and a second electrode in contact with the n-type crystalline semiconductor layer Have
The semiconductor device is characterized in that the first electrode overlaps a part of the photoelectric conversion layer and is formed of the same material as a source electrode or a drain electrode of the thin film transistor .
前記増幅回路は、トランジスタを有し、
前記トランジスタは結晶構造を有する半導体膜を有するnチャネル型の薄膜トランジスタからなり、
前記光センサー素子は、第一の電極と、該第一の電極上に一部接するp型の結晶質半導体層と、該p型の結晶質半導体層上に接する非晶質構造を有する半導体膜からなる光電変換層と、該非晶質構造を有する半導体膜からなる光電変換層上に接するn型の非晶質半導体層と、該n型の非晶質半導体層上に接する第二の電極とを有し、
前記第一の電極は、前記光電変換層の一部に重なり、前記薄膜トランジスタのソース電極またはドレイン電極と同じ材料で形成されていることを特徴とする半導体装置。 Possess the optical sensor device amplifier circuit,
The amplifier circuit includes a transistor,
The transistor includes an n-channel thin film transistor having a semiconductor film having a crystal structure,
The photosensor element includes a first electrode, a p-type crystalline semiconductor layer partially in contact with the first electrode, and a semiconductor film having an amorphous structure in contact with the p-type crystalline semiconductor layer A n-type amorphous semiconductor layer in contact with the photoelectric conversion layer comprising the semiconductor film having the amorphous structure, and a second electrode in contact with the n-type amorphous semiconductor layer. Have
The semiconductor device is characterized in that the first electrode overlaps a part of the photoelectric conversion layer and is formed of the same material as a source electrode or a drain electrode of the thin film transistor .
前記光電変換層に入射される光は、前記光電変換層の前記第一の電極側から入射されることを特徴とする半導体装置。The light incident on the photoelectric conversion layer is incident from the first electrode side of the photoelectric conversion layer.
前記第一の電極は、金属膜からなることを特徴とする半導体装置。The semiconductor device, wherein the first electrode is made of a metal film.
前記第二の電極は、金属膜からなることを特徴とする半導体装置。The semiconductor device, wherein the second electrode is made of a metal film.
前記第二の電極は、Ti膜からなることを特徴とする半導体装置。The semiconductor device, wherein the second electrode is made of a Ti film.
前記光センサー素子および前記増幅回路は、プラスチック基板上に接着層を介して設けられていることを特徴とする半導体装置。 In any one of Claims 1 thru | or 15 ,
The optical sensor element and the amplifier circuit are provided on a plastic substrate via an adhesive layer.
外部端子は2端子であることを特徴とする半導体装置。 In any one of Claims 1 thru | or 16 ,
External terminals and wherein a is 2 pin.
前記増幅回路は、カレントミラー回路を有することを特徴とする半導体装置。The amplifier circuit includes a current mirror circuit.
前記増幅回路は、少なくとも第1の薄膜トランジスタ及び第2の薄膜トランジスタを有し、The amplifier circuit includes at least a first thin film transistor and a second thin film transistor,
前記第1の薄膜トランジスタのソースまたはドレインの一方は、前記光センサー素子の第一の電極または第二の電極の一方の電極と電気的に接続され、One of the source and the drain of the first thin film transistor is electrically connected to one of the first electrode and the second electrode of the photosensor element,
前記第1の薄膜トランジスタのソースまたはドレインの他方は、第1の端子電極に電気的に接続され、The other of the source and the drain of the first thin film transistor is electrically connected to the first terminal electrode;
前記第1の薄膜トランジスタのゲート電極は、前記第1の薄膜トランジスタのソースまたはドレインの一方、及び前記第2の薄膜トランジスタのゲート電極と電気的に接続され、A gate electrode of the first thin film transistor is electrically connected to one of a source and a drain of the first thin film transistor and a gate electrode of the second thin film transistor;
前記第2の薄膜トランジスタのソースまたはドレインの一方は、前記第1の端子電極と電気的に接続され、One of a source and a drain of the second thin film transistor is electrically connected to the first terminal electrode;
前記第2の薄膜トランジスタのソースまたはドレインの他方は、第2の端子電極と電気的に接続され、The other of the source and the drain of the second thin film transistor is electrically connected to the second terminal electrode;
前記光センサー素子の第一の電極または第二の電極の他方の電極は前記第2の端子電極と電気的に接続されていることを特徴とする半導体装置。A semiconductor device, wherein the first electrode of the photosensor element or the other electrode of the second electrode is electrically connected to the second terminal electrode.
A video camera, a digital camera, a goggle-type display, a projector, a television, a navigation system, an audio playback device, a personal computer, a game machine, an image playback device, or portable information having the semiconductor device according to any one of claims 1 to 19. Terminal.
Priority Applications (1)
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JP2004290571A JP4827396B2 (en) | 2003-10-06 | 2004-10-01 | Method for manufacturing semiconductor device |
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JP2003347646 | 2003-10-06 | ||
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JP2004290571A JP4827396B2 (en) | 2003-10-06 | 2004-10-01 | Method for manufacturing semiconductor device |
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JP2005136392A JP2005136392A (en) | 2005-05-26 |
JP2005136392A5 true JP2005136392A5 (en) | 2006-03-02 |
JP4827396B2 JP4827396B2 (en) | 2011-11-30 |
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