JPS63122166A - Solid-state image pickup device - Google Patents
Solid-state image pickup deviceInfo
- Publication number
- JPS63122166A JPS63122166A JP61268151A JP26815186A JPS63122166A JP S63122166 A JPS63122166 A JP S63122166A JP 61268151 A JP61268151 A JP 61268151A JP 26815186 A JP26815186 A JP 26815186A JP S63122166 A JPS63122166 A JP S63122166A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- electric
- solid
- conductive
- conductive layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011347 resin Substances 0.000 claims abstract description 7
- 229920005989 resin Polymers 0.000 claims abstract description 7
- 239000002184 metal Substances 0.000 claims abstract description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910001887 tin oxide Inorganic materials 0.000 claims abstract description 4
- 238000003384 imaging method Methods 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 5
- 238000002161 passivation Methods 0.000 claims description 2
- 239000011810 insulating material Substances 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract description 3
- 230000003287 optical effect Effects 0.000 abstract description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 210000004709 eyebrow Anatomy 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、スキャナ、ファクシミリ等の画偉読取に用い
られる固体撮像装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a solid-state imaging device used for image reading in scanners, facsimiles, and the like.
従来の絶縁性基板上に複数個の光電変換素子を形成して
成る固体撮像装置では、シールドの友めの層は設けられ
ておらず、図2に示す様に配線上の接地部204及び該
絶縁性基板を固定するための実装基板上の接地部226
等でシールドをしているに過ぎず1個々の素子に対して
の充分なシールド対策けなされていなかっ几。In a conventional solid-state imaging device in which a plurality of photoelectric conversion elements are formed on an insulating substrate, a shielding layer is not provided, and as shown in FIG. Grounding part 226 on the mounting board for fixing the insulating board
etc., but sufficient shielding measures are not taken into consideration for each individual element.
しかし、従来の技術では、基板b;絶縁体である究め、
各素子に対するシールドが不充分であり、外来の電磁波
等による影響を非常に受けやすかっ念。光電変換素子に
よる読λ取りの電流は微小な几め、それによる影響を受
けやす(、S/Nを向上させる稟が雛しかった。また素
子の保獲及び光学特性の改善のため、該パヅシペーシ曹
ン層上にモーールドをほどこすが、工容上モールドを均
一にほどこすのけ難しく、誘電率等のばらつきh;パッ
シベーション層等に比べて非常に大きい。そのため素子
及び配線等への浮遊容量のばらつきが生じやすく、固定
パターンノイズの発生する原因となる。However, in the conventional technology, the substrate b is an insulator,
The shielding for each element is insufficient, making it extremely susceptible to external electromagnetic waves. The current for reading λ by the photoelectric conversion element is very small and is easily affected by it. A mold is applied on the carbon layer, but it is difficult to apply the mold uniformly due to the manufacturing process, and the variation in dielectric constant h is much larger than that of a passivation layer.As a result, stray capacitance to elements and wiring, etc. This tends to cause variations in the pattern, which causes fixed pattern noise.
そこで、本発明はこの様な問題点を解決するためのもの
で、外来の電磁波による影響及びモールド剤の不均一に
よる浮遊容量のばらつきの影響なシールドすることによ
り、読取り信号のS/Nを向上させることを目的とする
。Therefore, the present invention is intended to solve these problems, and improves the S/N of the read signal by shielding the influence of external electromagnetic waves and the influence of variations in stray capacitance due to non-uniformity of molding agent. The purpose is to
C問題を解決するための手段〕
本発明の固体撮像装置は、パッジページ言ン層111及
び112上に金属、工To、酸化スズ及び導電性樹脂の
いずれかから成る導電層113を有することを特徴とす
る。Means for Solving Problem C] The solid-state imaging device of the present invention has a conductive layer 113 made of any one of metal, Tonium oxide, tin oxide, and conductive resin on the page word layers 111 and 112. Features.
第1図は本発明の実施例における絶縁性透明基板側から
光の入射する形式の固体撮像装置の断面図の一例である
。FIG. 1 is an example of a sectional view of a solid-state imaging device in which light is incident from the insulating transparent substrate side according to an embodiment of the present invention.
第1図において、101け絶縁性透明基板、102は多
結晶シリコン(poly −Bi )層、103#−t
ゲート絶縁膜、104けゲート電電で、102〜104
によりTPT(薄膜トランジスタ)を構成し、該TIF
Tにより、シフトレジスタ、アナログスイッチ等の駆動
回路が該絶縁性透明基板上に形成される。In FIG. 1, 101 is an insulating transparent substrate, 102 is a polycrystalline silicon (poly-Bi) layer, and 103#-t
Gate insulating film, 104 gate voltage, 102 to 104
constitutes a TPT (thin film transistor), and the TIF
Drive circuits such as shift registers and analog switches are formed on the insulating transparent substrate by T.
105は眉間絶縁膜、106は充電変換素子の下部透明
電極、107け光導電層で非晶質半導体を素子材として
いる。、108は上部型1及び駆動回路の配線部であり
、同一材料で形成されている。111及び112けバヅ
シペーシッン層であり、111け無機系絶縁材より成る
第−層、112け有機系絶縁材より成る第二層である。105 is an insulating film between the eyebrows, 106 is a lower transparent electrode of a charge conversion element, and 107 is a photoconductive layer made of an amorphous semiconductor. , 108 are wiring parts for the upper mold 1 and the drive circuit, and are made of the same material. They are 111 and 112 dimensional spacing layers, a 111 th layer is made of an inorganic insulating material, and a 112 th layer is a second layer made of an organic insulating material.
113はシールドのための導電層であり、配線上の接地
部109と、導電性樹脂121を介して結ばれている。Reference numeral 113 denotes a conductive layer for shielding, which is connected to the ground portion 109 on the wiring via a conductive resin 121.
114け素子の僅護及び光学特性改善のためのモールド
層である。This is a mold layer for protecting the 114 elements and improving optical characteristics.
配線上の接地部分と導電層の接続は、導電層が金属であ
ればワイヤポンドで可能であるが、工TO1酸化スズ、
導電性樹脂の場合は、不可能である几め、この様な方法
をとる。特に素子面側から光の入射する形式の固体撮像
装置に適用するにあたっては、導電層としてITOもし
くは酸化スズを用いる必要があり、その場合でもこの方
法は有用である。If the conductive layer is metal, the grounding part on the wiring and the conductive layer can be connected with a wire pond, but
In the case of conductive resin, such a method is used, which is impossible. Particularly when applied to a solid-state imaging device in which light enters from the element surface side, it is necessary to use ITO or tin oxide as the conductive layer, and this method is useful even in that case.
以上述べた様に本発明によれば、パダシペーシヲン層1
11及び112上に設は几導電11113により外来の
電磁波による影響及びモールド剤の不均一による浮遊容
量のばらつきの影響をシールドすることKより、読取り
信号のS/Nを向上させる効果^;ある。As described above, according to the present invention, the padding layer 1
11 and 112 has the effect of improving the S/N of the read signal by shielding the influence of external electromagnetic waves and the influence of variations in stray capacitance due to non-uniformity of the molding agent by the conductive conductor 11113.
第1図は本発明の実施例における固体撮像装置のn面図
の一例でさる。
第2図は、従来の固体撮像装置の断面図の一例である。
101 、102・・・・・・絶縁性透明基板106、
’206・・・・・・下部電極107 、207・・・
・・・光導電層108 、208・・・・・・上部電極
及び配線109 、209・・・・・・配線上の接地部
111 、211・・・・・・パッジベージ1ン層g−
層112 、212・・・・・・パッジページ1フ層第
二層114 、214・・・・・・モールド層113・
・・・・・導電層
121・・・・・・導電性樹脂
226・・・・・・実装基板上接地部
以 上FIG. 1 shows an example of an n-plane view of a solid-state imaging device according to an embodiment of the present invention. FIG. 2 is an example of a cross-sectional view of a conventional solid-state imaging device. 101, 102... Insulating transparent substrate 106,
'206...Lower electrode 107, 207...
...Photoconductive layer 108, 208...Top electrode and wiring 109, 209...Grounding portion 111, 211 on wiring
Layers 112, 212...Padge page 1st layer 2nd layer 114, 214...Mold layer 113...
... Conductive layer 121 ... Conductive resin 226 ... Ground section on mounting board or above
Claims (1)
体撮像装置において、該光電変換素子上のパッシベーシ
ョン層111及び112上に、金属、ITO、酸化スズ
及び導電性樹脂のいずれかからなる導電層113を有す
ることを特徴とする固体撮像装置。In a solid-state imaging device comprising a plurality of photoelectric conversion elements formed on an insulating substrate, passivation layers 111 and 112 on the photoelectric conversion elements are made of metal, ITO, tin oxide, or conductive resin. A solid-state imaging device characterized by having a conductive layer 113.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61268151A JPS63122166A (en) | 1986-11-11 | 1986-11-11 | Solid-state image pickup device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61268151A JPS63122166A (en) | 1986-11-11 | 1986-11-11 | Solid-state image pickup device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63122166A true JPS63122166A (en) | 1988-05-26 |
Family
ID=17454601
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61268151A Pending JPS63122166A (en) | 1986-11-11 | 1986-11-11 | Solid-state image pickup device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63122166A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06169077A (en) * | 1992-11-30 | 1994-06-14 | Nec Corp | Contact-type image sensor and its manufacture |
JPH07176713A (en) * | 1993-12-20 | 1995-07-14 | Nec Corp | Contact-type image sensor |
JP2005136392A (en) * | 2003-10-06 | 2005-05-26 | Semiconductor Energy Lab Co Ltd | Semiconductor device and its manufacturing method |
-
1986
- 1986-11-11 JP JP61268151A patent/JPS63122166A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06169077A (en) * | 1992-11-30 | 1994-06-14 | Nec Corp | Contact-type image sensor and its manufacture |
JPH07176713A (en) * | 1993-12-20 | 1995-07-14 | Nec Corp | Contact-type image sensor |
JP2005136392A (en) * | 2003-10-06 | 2005-05-26 | Semiconductor Energy Lab Co Ltd | Semiconductor device and its manufacturing method |
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