JP2005124396A - 部材の製造方法 - Google Patents
部材の製造方法 Download PDFInfo
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- JP2005124396A JP2005124396A JP2004325558A JP2004325558A JP2005124396A JP 2005124396 A JP2005124396 A JP 2005124396A JP 2004325558 A JP2004325558 A JP 2004325558A JP 2004325558 A JP2004325558 A JP 2004325558A JP 2005124396 A JP2005124396 A JP 2005124396A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32018—Glow discharge
- H01J37/32027—DC powered
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32018—Glow discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32018—Glow discharge
- H01J37/32045—Circuits specially adapted for controlling the glow discharge
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M7/00—Conversion of ac power input into dc power output; Conversion of dc power input into ac power output
- H02M7/42—Conversion of dc power input into ac power output without possibility of reversal
- H02M7/44—Conversion of dc power input into ac power output without possibility of reversal by static converters
- H02M7/48—Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
- H02M7/53—Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal
- H02M7/537—Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters
- H02M7/5387—Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters in a bridge configuration
- H02M7/53871—Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters in a bridge configuration with automatic control of output voltage or current
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Power Engineering (AREA)
- Plasma Technology (AREA)
- Inverter Devices (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Drying Of Semiconductors (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
【解決手段】プラズマをバイポーラパルスで駆動する際に、制御された直流電流を電子半導体の電力スイッチから成るブリッジ回路でバイポーラ切換することによりパルスを形成する。
【選択図】図7
Description
エッチング(洗浄)
硬化
被膜形成
注入
加熱(硬化なし)
スパッタリング
に応じて前述の1)〜3)の選択が行える。プラズマを電気量ua(t),ia(t),Pa(t)によって直接制御する上述の方式によれば、パルス時間面積(+),(−)を制御することによりμs〜sの範囲で非常に正確に制御することができる。例えばプロセス計算機で制御するプラズマ強度=関数(x,y,z,t,u(+),u(−),i(+),i(−),θ,Upot,...)は基板の加工あるいは非常に複雑なプロセスの処理に関連する。適切な検知、例えば温度分布θまたは電位分布Upotも付加的な制御量として一緒に使用できる。このことは図8に示してある。
PVD技術
CVD技術
プラズマCVD
プラズマ窒化
陰極スパッタリング
表面洗浄(プラズマエッチング)
プラズマ技術処理(被膜形成、洗浄)
イオン注入
などである。
2,3 整流回路の出力側
4 ブリッジ回路
5,5a 出力端
6 電流検出部
I,I’,II,II’ 分岐部(スイッチ部)
L インダクタンス
DL フリーホイールダイオード
8 シャント
8−1,8−2 電流センサ
9,10 電流検出回路
11 監視回路
12,13 制御信号処理回路
14 マイクロプロセッサ
15 インタフェース
16 電源
17 モジュールドライバ
18 マイクロプロセッサ制御部
19 演算増幅器
20 電力スイッチの出力駆動部
21 プロセス計算機
Claims (9)
- 電気的にパルス駆動されるガス放電プラズマを用いて部材表面(A,B;SU)を真空系内で処理する
部材の製造方法において、
プラズマをバイポーラパルスで駆動する際に、制御された直流電流を電子半導体の電力スイッチから成るブリッジ回路(4)でバイポーラ切換することによりパルスを形成する
ことを特徴とする部材の製造方法。 - プラズマをガス放電プラズマとして駆動し、例えばPVDおよび/またはCVDにより、部材表面の被覆および/または変成および/または活性化を行う、請求項1記載の方法。
- 部材表面をプラズマ支援プロセスすなわちPVD、CVD、プラズマCVD、プラズマ窒化、陰極スパッタリング、表面洗浄、プラズマ技術処理またはイオン注入により処理する、請求項2記載の方法。
- バイポーラパルスの正および/または負のパルス時間面積を制御することによりプラズマの電子流およびイオン流を制御または調節する、請求項1から3までのいずれか1項記載の方法。
- プラズマ放電のアーク感度が低減されるようにパルス時間面積を制御または調節する、請求項4記載の方法。
- 部材で所定の電圧ポテンシャル値または所定の温度が得られるようにパルス時間面積を制御または調節する、請求項4記載の方法。
- パルス周波数の値を0〜50kHzの範囲内で調整する、請求項1から6までのいずれか1項記載の方法。
- バイポーラパルスの切換の際の休止時間は5μs以上である、請求項1から7までのいずれか1項記載の方法。
- グロー放電の通常動作におけるプラズマのアークまたは短絡の発生を電子的に検出し、過電流が生じた場合には、該当するアクティブなほうの電力スイッチを短時間だけ遮断する、請求項1から8までのいずれか1項記載の方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE9109503U DE9109503U1 (de) | 1991-07-31 | 1991-07-31 | Schaltungsanordnung für ein Stromversorgungsgerät für Geräte und Anlagen der Plasma- und Oberflächentechnik |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20268392A Division JP3639605B2 (ja) | 1991-07-31 | 1992-07-29 | プラズマおよび表面技術装置に対する電源用の回路装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005124396A true JP2005124396A (ja) | 2005-05-12 |
JP3777384B2 JP3777384B2 (ja) | 2006-05-24 |
Family
ID=6869865
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20268392A Expired - Fee Related JP3639605B2 (ja) | 1991-07-31 | 1992-07-29 | プラズマおよび表面技術装置に対する電源用の回路装置 |
JP2004325558A Expired - Lifetime JP3777384B2 (ja) | 1991-07-31 | 2004-11-09 | 部材の製造方法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20268392A Expired - Fee Related JP3639605B2 (ja) | 1991-07-31 | 1992-07-29 | プラズマおよび表面技術装置に対する電源用の回路装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US5303139A (ja) |
EP (1) | EP0534068B1 (ja) |
JP (2) | JP3639605B2 (ja) |
AT (1) | ATE135857T1 (ja) |
DE (2) | DE9109503U1 (ja) |
ES (1) | ES2088050T3 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007194110A (ja) * | 2006-01-20 | 2007-08-02 | Ngk Insulators Ltd | 放電プラズマ発生方法 |
CN103917034A (zh) * | 2014-03-17 | 2014-07-09 | 上海空间推进研究所 | 一种空心阴极点火电路 |
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- 1992-06-30 ES ES92111046T patent/ES2088050T3/es not_active Expired - Lifetime
- 1992-06-30 DE DE59205745T patent/DE59205745D1/de not_active Expired - Lifetime
- 1992-06-30 AT AT92111046T patent/ATE135857T1/de not_active IP Right Cessation
- 1992-07-29 JP JP20268392A patent/JP3639605B2/ja not_active Expired - Fee Related
- 1992-07-30 US US07/922,159 patent/US5303139A/en not_active Expired - Lifetime
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Cited By (4)
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JP2007194110A (ja) * | 2006-01-20 | 2007-08-02 | Ngk Insulators Ltd | 放電プラズマ発生方法 |
US7750574B2 (en) | 2006-01-20 | 2010-07-06 | Ngk Insulators, Ltd. | Method of generating discharge plasma |
JP4578412B2 (ja) * | 2006-01-20 | 2010-11-10 | 日本碍子株式会社 | 放電プラズマ発生方法 |
CN103917034A (zh) * | 2014-03-17 | 2014-07-09 | 上海空间推进研究所 | 一种空心阴极点火电路 |
Also Published As
Publication number | Publication date |
---|---|
US5303139A (en) | 1994-04-12 |
JP3777384B2 (ja) | 2006-05-24 |
EP0534068A3 (en) | 1993-06-30 |
EP0534068A2 (de) | 1993-03-31 |
JPH06113561A (ja) | 1994-04-22 |
DE9109503U1 (de) | 1991-10-17 |
EP0534068B1 (de) | 1996-03-20 |
ATE135857T1 (de) | 1996-04-15 |
ES2088050T3 (es) | 1996-08-01 |
DE59205745D1 (de) | 1996-04-25 |
JP3639605B2 (ja) | 2005-04-20 |
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