JP2005105400A5 - - Google Patents

Download PDF

Info

Publication number
JP2005105400A5
JP2005105400A5 JP2003344387A JP2003344387A JP2005105400A5 JP 2005105400 A5 JP2005105400 A5 JP 2005105400A5 JP 2003344387 A JP2003344387 A JP 2003344387A JP 2003344387 A JP2003344387 A JP 2003344387A JP 2005105400 A5 JP2005105400 A5 JP 2005105400A5
Authority
JP
Japan
Prior art keywords
target
plasma
film
forming apparatus
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003344387A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005105400A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2003344387A priority Critical patent/JP2005105400A/ja
Priority claimed from JP2003344387A external-priority patent/JP2005105400A/ja
Priority to US10/953,931 priority patent/US20050072669A1/en
Publication of JP2005105400A publication Critical patent/JP2005105400A/ja
Publication of JP2005105400A5 publication Critical patent/JP2005105400A5/ja
Pending legal-status Critical Current

Links

JP2003344387A 2003-10-02 2003-10-02 成膜装置、成膜方法、光学素子、及び光学系 Pending JP2005105400A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003344387A JP2005105400A (ja) 2003-10-02 2003-10-02 成膜装置、成膜方法、光学素子、及び光学系
US10/953,931 US20050072669A1 (en) 2003-10-02 2004-09-29 Deposition apparatus, deposition method, optical element, and optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003344387A JP2005105400A (ja) 2003-10-02 2003-10-02 成膜装置、成膜方法、光学素子、及び光学系

Publications (2)

Publication Number Publication Date
JP2005105400A JP2005105400A (ja) 2005-04-21
JP2005105400A5 true JP2005105400A5 (enExample) 2006-11-16

Family

ID=34386309

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003344387A Pending JP2005105400A (ja) 2003-10-02 2003-10-02 成膜装置、成膜方法、光学素子、及び光学系

Country Status (2)

Country Link
US (1) US20050072669A1 (enExample)
JP (1) JP2005105400A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101593544B1 (ko) * 2008-12-15 2016-02-15 가부시키가이샤 알박 스퍼터링 장치 및 스퍼터링 방법
JP5777278B2 (ja) * 2009-12-01 2015-09-09 キヤノン株式会社 光学素子の製造方法
JP6953197B2 (ja) * 2017-06-22 2021-10-27 キヤノン株式会社 フッ化膜を有する光学素子の製造方法およびフッ化膜の製造方法
CN113846304B (zh) * 2021-11-26 2022-02-11 北京航空航天大学 靶头、磁控溅射靶枪及磁控溅射系统

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5334302A (en) * 1991-11-15 1994-08-02 Tokyo Electron Limited Magnetron sputtering apparatus and sputtering gun for use in the same
US5736019A (en) * 1996-03-07 1998-04-07 Bernick; Mark A. Sputtering cathode
EP0860514B1 (en) * 1997-02-19 2004-11-03 Canon Kabushiki Kaisha Reactive sputtering apparatus and process for forming thin film using same
US6179973B1 (en) * 1999-01-05 2001-01-30 Novellus Systems, Inc. Apparatus and method for controlling plasma uniformity across a substrate
US6296747B1 (en) * 2000-06-22 2001-10-02 Applied Materials, Inc. Baffled perforated shield in a plasma sputtering reactor
US20040000478A1 (en) * 2002-06-26 2004-01-01 Guenzer Charles S. Rotating hollow cathode magnetron

Similar Documents

Publication Publication Date Title
US11845216B2 (en) 3D printed electronics using directional plasma jet
Li et al. Highly ordered arrays of particle‐in‐bowl plasmonic nanostructures for surface‐enhanced Raman scattering
US11685112B2 (en) 3D printing method and apparatus
CN104364416B (zh) 过滤阴极电弧沉积设备和方法
Bohlmark et al. Guiding the deposition flux in an ionized magnetron discharge
JP3159949B2 (ja) 陰極アーク放電を用いた薄膜蒸着装置
Choukourov et al. Advances and challenges in the field of plasma polymer nanoparticles
JP2009024230A5 (enExample)
JP5669328B2 (ja) 成膜方法
JP2009516072A5 (enExample)
RU2422555C1 (ru) Способ электровзрывного нанесения металлических покрытий на контактные поверхности
Wang et al. Effect of electrode configurations on the characteristics of the ring–ring typed atmospheric pressure plasma jet and its modification on polymer film
WO2013010509A1 (zh) 一种少液滴电弧靶及带少液滴电弧靶的等离子涂层系统
JP2005105400A5 (enExample)
JP2013049885A (ja) 炭素薄膜成膜方法
Xin et al. Control of vacuum arc source cathode spots contraction motion by changing electromagnetic field
JP2003013229A5 (enExample)
JP2008526019A5 (enExample)
Savaloni et al. Fabrication, characterization and some applications of graded chiral zigzag shaped nano-sculptured silver thin films
JP2008546182A5 (enExample)
CN104271793A (zh) 高表面积涂层
Suslov et al. Fabrication of monodispersed silver nanoparticles and their collective sharp plasmonic response
JP2006241521A5 (enExample)
JP2006241520A5 (enExample)
JP2001164379A (ja) 表面処理方法及び接合方法