JP2005017669A - 液晶表示装置とその製造方法 - Google Patents

液晶表示装置とその製造方法 Download PDF

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Publication number
JP2005017669A
JP2005017669A JP2003182106A JP2003182106A JP2005017669A JP 2005017669 A JP2005017669 A JP 2005017669A JP 2003182106 A JP2003182106 A JP 2003182106A JP 2003182106 A JP2003182106 A JP 2003182106A JP 2005017669 A JP2005017669 A JP 2005017669A
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JP
Japan
Prior art keywords
layer
electrode
scanning line
signal line
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003182106A
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English (en)
Japanese (ja)
Inventor
Kiyohiro Kawasaki
清弘 川崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Quanta Display Japan Inc
Quanta Display Inc
Original Assignee
Quanta Display Japan Inc
Quanta Display Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Quanta Display Japan Inc, Quanta Display Inc filed Critical Quanta Display Japan Inc
Priority to JP2003182106A priority Critical patent/JP2005017669A/ja
Priority to TW093109964A priority patent/TW200510886A/zh
Publication of JP2005017669A publication Critical patent/JP2005017669A/ja
Pending legal-status Critical Current

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JP2003182106A 2003-06-26 2003-06-26 液晶表示装置とその製造方法 Pending JP2005017669A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003182106A JP2005017669A (ja) 2003-06-26 2003-06-26 液晶表示装置とその製造方法
TW093109964A TW200510886A (en) 2003-06-26 2004-04-09 Liquid crystal display and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003182106A JP2005017669A (ja) 2003-06-26 2003-06-26 液晶表示装置とその製造方法

Publications (1)

Publication Number Publication Date
JP2005017669A true JP2005017669A (ja) 2005-01-20

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ID=34182580

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003182106A Pending JP2005017669A (ja) 2003-06-26 2003-06-26 液晶表示装置とその製造方法

Country Status (2)

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JP (1) JP2005017669A (zh)
TW (1) TW200510886A (zh)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006267877A (ja) * 2005-03-25 2006-10-05 Quanta Display Japan Inc 液晶表示装置とその製造方法
WO2007040194A1 (ja) 2005-10-05 2007-04-12 Idemitsu Kosan Co., Ltd. Ｔｆｔ基板及びｔｆｔ基板の製造方法
WO2007088722A1 (ja) 2006-01-31 2007-08-09 Idemitsu Kosan Co., Ltd. Ｔｆｔ基板及び反射型ｔｆｔ基板並びにそれらの製造方法
WO2007091405A1 (ja) 2006-02-09 2007-08-16 Idemitsu Kosan Co., Ltd. 反射型ｔｆｔ基板及び反射型ｔｆｔ基板の製造方法
WO2012074000A1 (ja) * 2010-12-01 2012-06-07 シャープ株式会社 表示装置の製造方法
US8263977B2 (en) 2005-12-02 2012-09-11 Idemitsu Kosan Co., Ltd. TFT substrate and TFT substrate manufacturing method
US8481351B2 (en) 2008-12-19 2013-07-09 Sharp Kabushiki Kaisha Active matrix substrate manufacturing method and liquid crystal display device manufacturing method
US8748879B2 (en) 2007-05-08 2014-06-10 Idemitsu Kosan Co., Ltd. Semiconductor device, thin film transistor and a method for producing the same

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006267877A (ja) * 2005-03-25 2006-10-05 Quanta Display Japan Inc 液晶表示装置とその製造方法
WO2007040194A1 (ja) 2005-10-05 2007-04-12 Idemitsu Kosan Co., Ltd. Ｔｆｔ基板及びｔｆｔ基板の製造方法
US7982215B2 (en) 2005-10-05 2011-07-19 Idemitsu Kosan Co., Ltd. TFT substrate and method for manufacturing TFT substrate
US8030195B2 (en) 2005-10-05 2011-10-04 Idemitsu Kosan Co., Ltd. TFT substrate and method for manufacturing TFT substrate
US8263977B2 (en) 2005-12-02 2012-09-11 Idemitsu Kosan Co., Ltd. TFT substrate and TFT substrate manufacturing method
US8778722B2 (en) 2005-12-02 2014-07-15 Idemitsu Kosan Co., Ltd. TFT substrate and method for producing TFT substrate
WO2007088722A1 (ja) 2006-01-31 2007-08-09 Idemitsu Kosan Co., Ltd. Ｔｆｔ基板及び反射型ｔｆｔ基板並びにそれらの製造方法
WO2007091405A1 (ja) 2006-02-09 2007-08-16 Idemitsu Kosan Co., Ltd. 反射型ｔｆｔ基板及び反射型ｔｆｔ基板の製造方法
US8748879B2 (en) 2007-05-08 2014-06-10 Idemitsu Kosan Co., Ltd. Semiconductor device, thin film transistor and a method for producing the same
US8481351B2 (en) 2008-12-19 2013-07-09 Sharp Kabushiki Kaisha Active matrix substrate manufacturing method and liquid crystal display device manufacturing method
WO2012074000A1 (ja) * 2010-12-01 2012-06-07 シャープ株式会社 表示装置の製造方法

Also Published As

Publication number Publication date
TW200510886A (en) 2005-03-16
TWI304145B (zh) 2008-12-11

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