JP2004536448A5 - - Google Patents
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- Publication number
- JP2004536448A5 JP2004536448A5 JP2002583702A JP2002583702A JP2004536448A5 JP 2004536448 A5 JP2004536448 A5 JP 2004536448A5 JP 2002583702 A JP2002583702 A JP 2002583702A JP 2002583702 A JP2002583702 A JP 2002583702A JP 2004536448 A5 JP2004536448 A5 JP 2004536448A5
- Authority
- JP
- Japan
- Prior art keywords
- perfluoroketone
- carbon atoms
- reactive gas
- contacting
- dielectric material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims 9
- IYRWEQXVUNLMAY-UHFFFAOYSA-N carbonyl fluoride Chemical compound FC(F)=O IYRWEQXVUNLMAY-UHFFFAOYSA-N 0.000 claims 6
- 239000007789 gas Substances 0.000 claims 5
- 125000004432 carbon atom Chemical group C* 0.000 claims 4
- 239000003989 dielectric material Substances 0.000 claims 3
- 239000007769 metal material Substances 0.000 claims 3
- 239000000463 material Substances 0.000 claims 2
- GRVMOMUDALILLH-UHFFFAOYSA-N 1,1,1,2,4,5,5,5-octafluoro-2,4-bis(trifluoromethyl)pentan-3-one Chemical compound FC(F)(F)C(F)(C(F)(F)F)C(=O)C(F)(C(F)(F)F)C(F)(F)F GRVMOMUDALILLH-UHFFFAOYSA-N 0.000 claims 1
- ABQIAHFCJGVSDJ-UHFFFAOYSA-N 1,1,1,3,4,4,4-heptafluoro-3-(trifluoromethyl)butan-2-one Chemical compound FC(F)(F)C(=O)C(F)(C(F)(F)F)C(F)(F)F ABQIAHFCJGVSDJ-UHFFFAOYSA-N 0.000 claims 1
- YUMDTEARLZOACP-UHFFFAOYSA-N 2,2,3,3,4,4,5,5,6,6-decafluorocyclohexan-1-one Chemical compound FC1(F)C(=O)C(F)(F)C(F)(F)C(F)(F)C1(F)F YUMDTEARLZOACP-UHFFFAOYSA-N 0.000 claims 1
- WIHCZQVQWBCKOA-UHFFFAOYSA-N 2,2,3,3,4,4,5,5-octafluorocyclopentan-1-one Chemical compound FC1(F)C(=O)C(F)(F)C(F)(F)C1(F)F WIHCZQVQWBCKOA-UHFFFAOYSA-N 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 239000002210 silicon-based material Substances 0.000 claims 1
- 238000010792 warming Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/841,376 US6540930B2 (en) | 2001-04-24 | 2001-04-24 | Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases |
| PCT/US2002/007509 WO2002086192A1 (en) | 2001-04-24 | 2002-03-14 | Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004536448A JP2004536448A (ja) | 2004-12-02 |
| JP2004536448A5 true JP2004536448A5 (https=) | 2005-12-22 |
Family
ID=25284710
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002583702A Pending JP2004536448A (ja) | 2001-04-24 | 2002-03-14 | 蒸気反応器用のクリーニングガス、エッチングガス、およびドーピングガスとしてのペルフルオロケトンの使用 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6540930B2 (https=) |
| EP (1) | EP1383939B1 (https=) |
| JP (1) | JP2004536448A (https=) |
| KR (1) | KR20030092096A (https=) |
| CN (1) | CN1276124C (https=) |
| AT (1) | ATE310838T1 (https=) |
| DE (1) | DE60207544T2 (https=) |
| WO (1) | WO2002086192A1 (https=) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6837250B2 (en) * | 2002-02-27 | 2005-01-04 | Air Products And Chemicals, Inc. | CVD chamber cleaning using mixed PFCs from capture/recycle |
| DE10255988A1 (de) * | 2002-11-30 | 2004-06-17 | Infineon Technologies Ag | Verfahren zum Reinigen einer Prozesskammer |
| TWI230094B (en) * | 2003-01-14 | 2005-04-01 | Desiccant Technology Corp | Method for exhaust treatment of perfluoro compounds |
| US20050011859A1 (en) * | 2003-07-15 | 2005-01-20 | Bing Ji | Unsaturated oxygenated fluorocarbons for selective aniostropic etch applications |
| US20060093756A1 (en) * | 2004-11-03 | 2006-05-04 | Nagarajan Rajagopalan | High-power dielectric seasoning for stable wafer-to-wafer thickness uniformity of dielectric CVD films |
| US8791254B2 (en) * | 2006-05-19 | 2014-07-29 | 3M Innovative Properties Company | Cyclic hydrofluoroether compounds and processes for their preparation and use |
| US8193397B2 (en) * | 2006-12-06 | 2012-06-05 | 3M Innovative Properties Company | Hydrofluoroether compounds and processes for their preparation and use |
| US20100263885A1 (en) * | 2009-04-21 | 2010-10-21 | 3M Innovative Properties Company | Protection systems and methods for electronic devices |
| BRPI0924862A2 (pt) | 2009-06-12 | 2016-08-23 | Abb Technology Ag | meio de isolação dielétrica |
| DE202009009305U1 (de) | 2009-06-17 | 2009-11-05 | Ormazabal Gmbh | Schalteinrichtung für Mittel-, Hoch- oder Höchstspannung mit einem Füllmedium |
| EP2511948A4 (en) | 2010-02-01 | 2014-07-02 | Central Glass Co Ltd | DRYING AGENT AND DRYING PROCESS WITH THIS |
| JP5434970B2 (ja) | 2010-07-12 | 2014-03-05 | セントラル硝子株式会社 | ドライエッチング剤 |
| RU2460717C2 (ru) * | 2010-12-06 | 2012-09-10 | Федеральное государственное унитарное предприятие "Российский научный центр "Прикладная химия" | Способ получения перфторэтилизопропилкетона в реакторе идеального вытеснения |
| DK2652752T3 (en) * | 2010-12-14 | 2016-01-11 | Abb Technology Ag | Dielectric INSULATION MEDIUM |
| KR20130128433A (ko) | 2010-12-14 | 2013-11-26 | 에이비비 리써치 리미티드 | 유전성 절연 매질 |
| RU2567754C2 (ru) * | 2010-12-16 | 2015-11-10 | Абб Текнолоджи Аг | Диэлектрическая изолирующая среда |
| FR2975820B1 (fr) * | 2011-05-24 | 2013-07-05 | Schneider Electric Ind Sas | Melange de decafluoro-2-methylbutan-3-one et d'un gaz vecteur comme milieu d'isolation electrique et/ou d'extinction des arcs electriques en moyenne tension |
| JP2013030531A (ja) | 2011-07-27 | 2013-02-07 | Central Glass Co Ltd | ドライエッチング剤 |
| JP5953681B2 (ja) * | 2011-09-09 | 2016-07-20 | イビデン株式会社 | プリント配線板の製造方法 |
| RU2494086C2 (ru) * | 2011-10-10 | 2013-09-27 | Российская Федерация, от имени которой выступает Министерство промышленности и торговли Российской Федерации (Минпромторг России) | Способ получения перфторэтилизопропилкетона |
| WO2013087700A1 (en) | 2011-12-13 | 2013-06-20 | Abb Technology Ag | Sealed and gas insulated high voltage converter environment for offshore platforms |
| CN114752386A (zh) * | 2013-03-28 | 2022-07-15 | 得凯莫斯公司弗罗里达有限公司 | 氢氟烯烃蚀刻气体混合物 |
| TWI642809B (zh) * | 2013-09-09 | 2018-12-01 | 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 | 用蝕刻氣體蝕刻半導體結構的方法 |
| JP2017022327A (ja) * | 2015-07-15 | 2017-01-26 | 東京エレクトロン株式会社 | 自然酸化膜除去方法及び自然酸化膜除去装置 |
| EP3421105A4 (en) | 2016-02-26 | 2019-10-30 | Sinochem Lantian Co., Ltd. | COMPOSITION WITH FLUOROUS KETONE |
| CN106542981B (zh) * | 2016-09-23 | 2022-05-20 | 天津市长芦化工新材料有限公司 | 全氟九碳酮的制备方法 |
| CN106554262B (zh) * | 2016-09-23 | 2022-05-20 | 天津市长芦化工新材料有限公司 | 全氟九碳酮及其应用 |
| KR102303686B1 (ko) | 2017-02-28 | 2021-09-17 | 샌트랄 글래스 컴퍼니 리미티드 | 드라이 에칭제, 드라이 에칭 방법 및 반도체 장치의 제조방법 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2521594C2 (de) | 1975-05-15 | 1984-03-15 | Hoechst Ag, 6230 Frankfurt | Verfahren zur Herstellung perfluorierter Ketone |
| JPH082893B2 (ja) | 1991-04-16 | 1996-01-17 | 信越化学工業株式会社 | パーフルオロ環状ケトン及びその製造法 |
| JPH06163476A (ja) | 1992-11-18 | 1994-06-10 | Sony Corp | ドライエッチング方法 |
| US5466877A (en) | 1994-03-15 | 1995-11-14 | Minnesota Mining And Manufacturing Company | Process for converting perfluorinated esters to perfluorinated acyl fluorides and/or ketones |
| US5925611A (en) * | 1995-01-20 | 1999-07-20 | Minnesota Mining And Manufacturing Company | Cleaning process and composition |
| JP2904723B2 (ja) | 1995-04-21 | 1999-06-14 | セントラル硝子株式会社 | クリーニングガス |
| JPH1027781A (ja) | 1996-07-10 | 1998-01-27 | Daikin Ind Ltd | エッチングガスおよびクリーニングガス |
| JP3141325B2 (ja) | 1999-01-14 | 2001-03-05 | 工業技術院長 | 溶剤およびそれを用いる物品表面の清浄化方法 |
| ES2230125T5 (es) | 1999-07-20 | 2016-10-04 | 3M Innovative Properties Company | Uso de cetonas fluoradas en composiciones extintoras de incendios |
| US6394107B1 (en) * | 2001-04-24 | 2002-05-28 | 3M Innovative Properties Company | Use of fluorinated ketones as wet cleaning agents for vapor reactors and vapor reactor components |
-
2001
- 2001-04-24 US US09/841,376 patent/US6540930B2/en not_active Expired - Fee Related
-
2002
- 2002-03-14 WO PCT/US2002/007509 patent/WO2002086192A1/en not_active Ceased
- 2002-03-14 AT AT02717614T patent/ATE310838T1/de not_active IP Right Cessation
- 2002-03-14 KR KR10-2003-7013840A patent/KR20030092096A/ko not_active Ceased
- 2002-03-14 JP JP2002583702A patent/JP2004536448A/ja active Pending
- 2002-03-14 CN CNB028087828A patent/CN1276124C/zh not_active Expired - Fee Related
- 2002-03-14 EP EP02717614A patent/EP1383939B1/en not_active Expired - Lifetime
- 2002-03-14 DE DE60207544T patent/DE60207544T2/de not_active Expired - Fee Related
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