JP2004536448A5 - - Google Patents
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- Publication number
- JP2004536448A5 JP2004536448A5 JP2002583702A JP2002583702A JP2004536448A5 JP 2004536448 A5 JP2004536448 A5 JP 2004536448A5 JP 2002583702 A JP2002583702 A JP 2002583702A JP 2002583702 A JP2002583702 A JP 2002583702A JP 2004536448 A5 JP2004536448 A5 JP 2004536448A5
- Authority
- JP
- Japan
- Prior art keywords
- perfluoroketone
- carbon atoms
- reactive gas
- contacting
- dielectric material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- IYRWEQXVUNLMAY-UHFFFAOYSA-N Carbonyl fluoride Chemical compound FC(F)=O IYRWEQXVUNLMAY-UHFFFAOYSA-N 0.000 claims 6
- 239000007789 gas Substances 0.000 claims 5
- 125000004432 carbon atoms Chemical group C* 0.000 claims 4
- 239000003989 dielectric material Substances 0.000 claims 3
- 239000007769 metal material Substances 0.000 claims 3
- 239000000463 material Substances 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- YUMDTEARLZOACP-UHFFFAOYSA-N 2,2,3,3,4,4,5,5,6,6-decafluorocyclohexan-1-one Chemical compound FC1(F)C(=O)C(F)(F)C(F)(F)C(F)(F)C1(F)F YUMDTEARLZOACP-UHFFFAOYSA-N 0.000 claims 1
- WIHCZQVQWBCKOA-UHFFFAOYSA-N 2,2,3,3,4,4,5,5-octafluorocyclopentan-1-one Chemical compound FC1(F)C(=O)C(F)(F)C(F)(F)C1(F)F WIHCZQVQWBCKOA-UHFFFAOYSA-N 0.000 claims 1
- 210000002381 Plasma Anatomy 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N oxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims 1
- 239000002210 silicon-based material Substances 0.000 claims 1
- 238000010792 warming Methods 0.000 claims 1
Claims (9)
- ４〜７個の炭素原子を有するペルフルオロケトンを含む反応性ガスに堆積物を接触させることを含む、蒸気反応器から堆積物を除去する方法。
- ４〜７個の炭素原子を有するペルフルオロケトンを含むガスに誘電体材料または金属材料を接触させることを含む、蒸気反応器中で誘電体材料または金属材料をエッチングする方法。
- 前記反応性ガスが酸素をさらに含む、請求項１又は２に記載の方法。
- 前記反応性ガスがプラズマである、請求項１又は２に記載の方法。
- 前記ペルフルオロケトンが５〜７個の炭素原子を有する、請求項１又は２に記載の方法。
- 前記ペルフルオロケトンが、ＣＦ3ＣＦ2Ｃ（Ｏ）ＣＦ2ＣＦ3、ＣＦ3Ｃ（Ｏ）ＣＦ（ＣＦ3）2、ＣＦ3ＣＦ2Ｃ（Ｏ）ＣＦ（ＣＦ3）2、ＣＦ3（ＣＦ2）2Ｃ（Ｏ）ＣＦ（ＣＦ3）2、（ＣＦ3）2ＣＦＣ（Ｏ）ＣＦ（ＣＦ3）2、ペルフルオロシクロペンタノン、ペルフルオロシクロヘキサノン、およびそれらの混合物からなる群より選択される、請求項１又は２に記載の方法。
- 前記誘電体材料または金属材料がシリコン系材料を含む、請求項２に記載の方法。
- 前記ペルフルオロケトンが約１０未満の地球温暖化係数を有する、請求項１又は２に記載の方法。
- ４〜７個の炭素原子を有するペルフルオロケトンを含む反応性ガスに材料を接触させることを含む、蒸気反応器中で材料をドーピングする方法。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/841,376 US6540930B2 (en) | 2001-04-24 | 2001-04-24 | Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases |
| PCT/US2002/007509 WO2002086192A1 (en) | 2001-04-24 | 2002-03-14 | Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004536448A JP2004536448A (ja) | 2004-12-02 |
| JP2004536448A5 true JP2004536448A5 (ja) | 2005-12-22 |
Family
ID=25284710
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002583702A Pending JP2004536448A (ja) | 2001-04-24 | 2002-03-14 | 蒸気反応器用のクリーニングガス、エッチングガス、およびドーピングガスとしてのペルフルオロケトンの使用 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6540930B2 (ja) |
| EP (1) | EP1383939B1 (ja) |
| JP (1) | JP2004536448A (ja) |
| KR (1) | KR20030092096A (ja) |
| CN (1) | CN1276124C (ja) |
| AT (1) | ATE310838T1 (ja) |
| DE (1) | DE60207544T2 (ja) |
| WO (1) | WO2002086192A1 (ja) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6837250B2 (en) * | 2002-02-27 | 2005-01-04 | Air Products And Chemicals, Inc. | CVD chamber cleaning using mixed PFCs from capture/recycle |
| DE10255988A1 (de) * | 2002-11-30 | 2004-06-17 | Infineon Technologies Ag | Verfahren zum Reinigen einer Prozesskammer |
| TWI230094B (en) * | 2003-01-14 | 2005-04-01 | Desiccant Technology Corp | Method for exhaust treatment of perfluoro compounds |
| US20050011859A1 (en) * | 2003-07-15 | 2005-01-20 | Bing Ji | Unsaturated oxygenated fluorocarbons for selective aniostropic etch applications |
| US20060093756A1 (en) * | 2004-11-03 | 2006-05-04 | Nagarajan Rajagopalan | High-power dielectric seasoning for stable wafer-to-wafer thickness uniformity of dielectric CVD films |
| US8791254B2 (en) * | 2006-05-19 | 2014-07-29 | 3M Innovative Properties Company | Cyclic hydrofluoroether compounds and processes for their preparation and use |
| US8193397B2 (en) * | 2006-12-06 | 2012-06-05 | 3M Innovative Properties Company | Hydrofluoroether compounds and processes for their preparation and use |
| US20100263885A1 (en) * | 2009-04-21 | 2010-10-21 | 3M Innovative Properties Company | Protection systems and methods for electronic devices |
| MX2011013039A (es) | 2009-06-12 | 2012-02-21 | Abb Technology Ag | Medio de aislamiento dielectrico. |
| DE202009009305U1 (de) | 2009-06-17 | 2009-11-05 | Ormazabal Gmbh | Schalteinrichtung für Mittel-, Hoch- oder Höchstspannung mit einem Füllmedium |
| CN102741987B (zh) | 2010-02-01 | 2016-03-02 | 中央硝子株式会社 | 干蚀刻剂以及使用其的干蚀刻方法 |
| JP5434970B2 (ja) | 2010-07-12 | 2014-03-05 | セントラル硝子株式会社 | ドライエッチング剤 |
| RU2460717C2 (ru) * | 2010-12-06 | 2012-09-10 | Федеральное государственное унитарное предприятие "Российский научный центр "Прикладная химия" | Способ получения перфторэтилизопропилкетона в реакторе идеального вытеснения |
| EP2652752B1 (en) * | 2010-12-14 | 2015-09-30 | ABB Technology AG | Dielectric insulation medium |
| RU2553678C2 (ru) | 2010-12-14 | 2015-06-20 | Абб Рисерч Лтд | Диэлектрическая изоляционная среда |
| CA2821158A1 (en) * | 2010-12-16 | 2012-06-21 | Abb Technology Ag | Dielectric insulation medium |
| FR2975820B1 (fr) * | 2011-05-24 | 2013-07-05 | Schneider Electric Ind Sas | Melange de decafluoro-2-methylbutan-3-one et d'un gaz vecteur comme milieu d'isolation electrique et/ou d'extinction des arcs electriques en moyenne tension |
| JP2013030531A (ja) | 2011-07-27 | 2013-02-07 | Central Glass Co Ltd | ドライエッチング剤 |
| JP5953681B2 (ja) | 2011-09-09 | 2016-07-20 | イビデン株式会社 | プリント配線板の製造方法 |
| RU2494086C2 (ru) * | 2011-10-10 | 2013-09-27 | Российская Федерация, от имени которой выступает Министерство промышленности и торговли Российской Федерации (Минпромторг России) | Способ получения перфторэтилизопропилкетона |
| WO2013087700A1 (en) | 2011-12-13 | 2013-06-20 | Abb Technology Ag | Sealed and gas insulated high voltage converter environment for offshore platforms |
| US20160284523A1 (en) * | 2013-03-28 | 2016-09-29 | The Chemours Company Fc, Llc | Hydrofluoroolefin Etching Gas Mixtures |
| TWI612182B (zh) | 2013-09-09 | 2018-01-21 | 液態空氣喬治斯克勞帝方法研究開發股份有限公司 | 用蝕刻氣體蝕刻半導體結構的方法 |
| JP2017022327A (ja) * | 2015-07-15 | 2017-01-26 | 東京エレクトロン株式会社 | 自然酸化膜除去方法及び自然酸化膜除去装置 |
| EP3421105A4 (en) * | 2016-02-26 | 2019-10-30 | Sinochem Lantian Co., Ltd. | COMPOSITION COMPRISING A KETONE CONTAINING FLUORINE |
| CN106542981B (zh) * | 2016-09-23 | 2022-05-20 | 天津市长芦化工新材料有限公司 | 全氟九碳酮的制备方法 |
| CN106554262B (zh) * | 2016-09-23 | 2022-05-20 | 天津市长芦化工新材料有限公司 | 全氟九碳酮及其应用 |
| WO2018159368A1 (ja) | 2017-02-28 | 2018-09-07 | セントラル硝子株式会社 | ドライエッチング剤、ドライエッチング方法及び半導体装置の製造方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2521594C2 (de) | 1975-05-15 | 1984-03-15 | Hoechst Ag, 6230 Frankfurt | Verfahren zur Herstellung perfluorierter Ketone |
| JPH082893B2 (ja) | 1991-04-16 | 1996-01-17 | 信越化学工業株式会社 | パーフルオロ環状ケトン及びその製造法 |
| JPH06163476A (ja) | 1992-11-18 | 1994-06-10 | Sony Corp | ドライエッチング方法 |
| US5466877A (en) | 1994-03-15 | 1995-11-14 | Minnesota Mining And Manufacturing Company | Process for converting perfluorinated esters to perfluorinated acyl fluorides and/or ketones |
| US5925611A (en) * | 1995-01-20 | 1999-07-20 | Minnesota Mining And Manufacturing Company | Cleaning process and composition |
| JP2904723B2 (ja) | 1995-04-21 | 1999-06-14 | セントラル硝子株式会社 | クリーニングガス |
| JPH1027781A (ja) | 1996-07-10 | 1998-01-27 | Daikin Ind Ltd | エッチングガスおよびクリーニングガス |
| JP3141325B2 (ja) | 1999-01-14 | 2001-03-05 | 工業技術院長 | 溶剤およびそれを用いる物品表面の清浄化方法 |
| ES2230125T5 (es) | 1999-07-20 | 2016-10-04 | 3M Innovative Properties Company | Uso de cetonas fluoradas en composiciones extintoras de incendios |
| US6394107B1 (en) * | 2001-04-24 | 2002-05-28 | 3M Innovative Properties Company | Use of fluorinated ketones as wet cleaning agents for vapor reactors and vapor reactor components |
-
2001
- 2001-04-24 US US09/841,376 patent/US6540930B2/en not_active Expired - Fee Related
-
2002
- 2002-03-14 KR KR10-2003-7013840A patent/KR20030092096A/ko not_active Application Discontinuation
- 2002-03-14 CN CNB028087828A patent/CN1276124C/zh not_active Expired - Fee Related
- 2002-03-14 WO PCT/US2002/007509 patent/WO2002086192A1/en active IP Right Grant
- 2002-03-14 DE DE60207544T patent/DE60207544T2/de not_active Expired - Fee Related
- 2002-03-14 AT AT02717614T patent/ATE310838T1/de not_active IP Right Cessation
- 2002-03-14 JP JP2002583702A patent/JP2004536448A/ja active Pending
- 2002-03-14 EP EP02717614A patent/EP1383939B1/en not_active Expired - Lifetime
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