JP2004532897A5 - - Google Patents
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- JP2004532897A5 JP2004532897A5 JP2003508299A JP2003508299A JP2004532897A5 JP 2004532897 A5 JP2004532897 A5 JP 2004532897A5 JP 2003508299 A JP2003508299 A JP 2003508299A JP 2003508299 A JP2003508299 A JP 2003508299A JP 2004532897 A5 JP2004532897 A5 JP 2004532897A5
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- Japan
- Prior art keywords
- independently
- compound
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- amine
- substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 125000000217 alkyl group Chemical group 0.000 claims description 22
- 150000001875 compounds Chemical class 0.000 claims description 21
- 239000000203 mixture Substances 0.000 claims description 17
- -1 amine compound Chemical class 0.000 claims description 15
- 150000001412 amines Chemical class 0.000 claims description 13
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 12
- 239000000376 reactant Substances 0.000 claims description 12
- 125000003545 alkoxy group Chemical group 0.000 claims description 10
- 125000000732 arylene group Chemical group 0.000 claims description 10
- 239000001257 hydrogen Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 229910052760 oxygen Inorganic materials 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 125000002947 alkylene group Chemical group 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 5
- 125000002993 cycloalkylene group Chemical group 0.000 claims description 5
- 125000005842 heteroatom Chemical group 0.000 claims description 5
- 150000002431 hydrogen Chemical class 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 150000002118 epoxides Chemical class 0.000 claims description 4
- 239000004593 Epoxy Substances 0.000 claims 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 4
- 229910000077 silane Inorganic materials 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical group CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 claims 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- 239000012736 aqueous medium Substances 0.000 claims 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 claims 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 claims 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 claims 2
- LFKLPJRVSHJZPL-UHFFFAOYSA-N 1,2:7,8-diepoxyoctane Chemical group C1OC1CCCCC1CO1 LFKLPJRVSHJZPL-UHFFFAOYSA-N 0.000 claims 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 claims 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 claims 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 claims 1
- GPXCORHXFPYJEH-UHFFFAOYSA-N 3-[[3-aminopropyl(dimethyl)silyl]oxy-dimethylsilyl]propan-1-amine Chemical compound NCCC[Si](C)(C)O[Si](C)(C)CCCN GPXCORHXFPYJEH-UHFFFAOYSA-N 0.000 claims 1
- AHIPJALLQVEEQF-UHFFFAOYSA-N 4-(oxiran-2-ylmethoxy)-n,n-bis(oxiran-2-ylmethyl)aniline Chemical compound C1OC1COC(C=C1)=CC=C1N(CC1OC1)CC1CO1 AHIPJALLQVEEQF-UHFFFAOYSA-N 0.000 claims 1
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 claims 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 claims 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 1
- 239000005700 Putrescine Substances 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 150000004985 diamines Chemical class 0.000 claims 1
- NFCHYERDRQUCGJ-UHFFFAOYSA-N dimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[SiH](OC)CCCOCC1CO1 NFCHYERDRQUCGJ-UHFFFAOYSA-N 0.000 claims 1
- 125000003700 epoxy group Chemical group 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- FBNXYLDLGARYKQ-UHFFFAOYSA-N methoxy-dimethyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(C)CCCOCC1CO1 FBNXYLDLGARYKQ-UHFFFAOYSA-N 0.000 claims 1
- JAYXSROKFZAHRQ-UHFFFAOYSA-N n,n-bis(oxiran-2-ylmethyl)aniline Chemical compound C1OC1CN(C=1C=CC=CC=1)CC1CO1 JAYXSROKFZAHRQ-UHFFFAOYSA-N 0.000 claims 1
- FYZBRYMWONGDHC-UHFFFAOYSA-N n-ethyl-3-trimethoxysilylpropan-1-amine Chemical compound CCNCCC[Si](OC)(OC)OC FYZBRYMWONGDHC-UHFFFAOYSA-N 0.000 claims 1
- DVYVMJLSUSGYMH-UHFFFAOYSA-N n-methyl-3-trimethoxysilylpropan-1-amine Chemical compound CNCCC[Si](OC)(OC)OC DVYVMJLSUSGYMH-UHFFFAOYSA-N 0.000 claims 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 claims 1
- 229920001187 thermosetting polymer Polymers 0.000 claims 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 claims 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical group CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/896,082 US6506921B1 (en) | 2001-06-29 | 2001-06-29 | Amine compounds and curable compositions derived therefrom |
| PCT/US2002/018433 WO2003002057A2 (en) | 2001-06-29 | 2002-06-11 | Amine compounds and curable compositions derived therefrom |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004532897A JP2004532897A (ja) | 2004-10-28 |
| JP2004532897A5 true JP2004532897A5 (cg-RX-API-DMAC7.html) | 2006-01-05 |
| JP4297782B2 JP4297782B2 (ja) | 2009-07-15 |
Family
ID=25405596
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003508299A Expired - Fee Related JP4297782B2 (ja) | 2001-06-29 | 2002-06-11 | アミン化合物およびそれに由来する硬化性組成物 |
Country Status (14)
| Country | Link |
|---|---|
| US (2) | US6506921B1 (cg-RX-API-DMAC7.html) |
| EP (1) | EP1420744A4 (cg-RX-API-DMAC7.html) |
| JP (1) | JP4297782B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR20040026673A (cg-RX-API-DMAC7.html) |
| CN (1) | CN1301257C (cg-RX-API-DMAC7.html) |
| AU (1) | AU2002312448B2 (cg-RX-API-DMAC7.html) |
| BR (1) | BR0210747A (cg-RX-API-DMAC7.html) |
| CA (1) | CA2451706A1 (cg-RX-API-DMAC7.html) |
| IL (1) | IL159599A0 (cg-RX-API-DMAC7.html) |
| MX (1) | MXPA03011840A (cg-RX-API-DMAC7.html) |
| MY (1) | MY130315A (cg-RX-API-DMAC7.html) |
| RU (1) | RU2296129C2 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI248939B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2003002057A2 (cg-RX-API-DMAC7.html) |
Families Citing this family (53)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US6506921B1 (en) * | 2001-06-29 | 2003-01-14 | Virginia Tech Intellectual Properties, Inc. | Amine compounds and curable compositions derived therefrom |
| AU2003233738A1 (en) * | 2002-06-05 | 2003-12-22 | University Technologies International Inc. | Oxygen reduction catalyst |
| US7622541B2 (en) * | 2003-01-17 | 2009-11-24 | The United States Of America As Represented By The Secretary Of The Navy | Polyurethane coating |
| US7615604B2 (en) * | 2003-01-17 | 2009-11-10 | The United States Of America As Represented By The Secretary Of The Navy | Diols formed by ring-opening of epoxies |
| GB0304194D0 (en) * | 2003-02-25 | 2003-03-26 | Astrazeneca Ab | Chemical compounds |
| GB0307918D0 (en) * | 2003-04-05 | 2003-05-14 | Astrazeneca Ab | Therapeutic use |
| KR100516161B1 (ko) * | 2003-05-01 | 2005-09-23 | 엘에스전선 주식회사 | 실란 화합물, 그 제조방법 및 이를 사용한 유기 다이 붙임접착제와 무기물 사이의 결합방법 |
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| US10441605B2 (en) | 2016-02-09 | 2019-10-15 | Albireo Ab | Oral cholestyramine formulation and use thereof |
| US10441604B2 (en) | 2016-02-09 | 2019-10-15 | Albireo Ab | Cholestyramine pellets and methods for preparation thereof |
| US10786529B2 (en) | 2016-02-09 | 2020-09-29 | Albireo Ab | Oral cholestyramine formulation and use thereof |
| JP6614014B2 (ja) * | 2016-04-26 | 2019-12-04 | 信越化学工業株式会社 | 含窒素オルガノキシシラン化合物およびその製造方法 |
| CN106862039B (zh) * | 2017-01-18 | 2020-05-22 | 华南理工大学 | 一种耐久性的亲水-超疏水双极自洁复合膜及其制备方法 |
| CA3071285A1 (en) | 2017-08-09 | 2019-02-14 | Albireo Ab | Cholestyramine granules, oral cholestyramine formulations and use thereof |
| DE202018006246U1 (de) * | 2017-09-19 | 2019-10-30 | The Sherwin-Williams Company | 1K-Beschichtung mit hoher Härte und hoher Schlagfestigkeit |
| TW202015699A (zh) | 2018-06-05 | 2020-05-01 | 瑞典商艾爾比瑞歐公司 | 苯并噻(二)氮呯(benzothia(di)azepine)化合物及其作為膽汁酸調節劑之用途 |
| US10793534B2 (en) | 2018-06-05 | 2020-10-06 | Albireo Ab | Benzothia(di)azepine compounds and their use as bile acid modulators |
| FI3810581T3 (fi) | 2018-06-20 | 2025-02-28 | Albireo Ab | Odeviksibaatin kiteiset modifikaatiot |
| US11801226B2 (en) | 2018-06-20 | 2023-10-31 | Albireo Ab | Pharmaceutical formulation of odevixibat |
| CN108822748B (zh) * | 2018-07-13 | 2021-09-10 | 杭州之江新材料有限公司 | 一种高粘接力活化剂、其制备方法和应用 |
| US10722457B2 (en) | 2018-08-09 | 2020-07-28 | Albireo Ab | Oral cholestyramine formulation and use thereof |
| US11549878B2 (en) | 2018-08-09 | 2023-01-10 | Albireo Ab | In vitro method for determining the adsorbing capacity of an insoluble adsorbant |
| US11007142B2 (en) | 2018-08-09 | 2021-05-18 | Albireo Ab | Oral cholestyramine formulation and use thereof |
| US10975045B2 (en) | 2019-02-06 | 2021-04-13 | Aibireo AB | Benzothiazepine compounds and their use as bile acid modulators |
| ES2937153T3 (es) | 2019-02-06 | 2023-03-24 | Albireo Ab | Compuestos de benzotiadiazepinas y su uso como moduladores de ácidos biliares |
| US10941127B2 (en) | 2019-02-06 | 2021-03-09 | Albireo Ab | Benzothiadiazepine compounds and their use as bile acid modulators |
| CN109897539A (zh) * | 2019-03-20 | 2019-06-18 | 深圳市航天新材科技有限公司 | 一种柔性高透明高硬度涂液组合物及其制备方法 |
| US11014898B1 (en) | 2020-12-04 | 2021-05-25 | Albireo Ab | Benzothiazepine compounds and their use as bile acid modulators |
| ES2973355T3 (es) | 2019-12-04 | 2024-06-19 | Albireo Ab | Compuestos de benzotia(di)azepina y su uso como moduladores del ácido biliar |
| KR20220109450A (ko) | 2019-12-04 | 2022-08-04 | 알비레오 에이비 | 벤조티아(디)아제핀 화합물 및 담즙산 조절제로서의 이의 용도 |
| CN114761018B (zh) | 2019-12-04 | 2025-12-02 | 阿尔比里奥公司 | 苯并硫杂二氮杂环庚三烯化合物及其作为胆汁酸调节剂的用途 |
| CA3158276A1 (en) | 2019-12-04 | 2021-06-10 | Per-Goran Gillberg | Benzothia(di)azepine compounds and their use as bile acid modulators |
| CA3186857A1 (en) | 2020-08-03 | 2022-02-10 | Per-Goran Gillberg | Benzothia(di)azepine compounds and their use as bile acid modulators |
| JP2023549226A (ja) | 2020-11-12 | 2023-11-22 | アルビレオ エービー | 進行性家族性肝内胆汁うっ滞症（ｐｆｉｃ）を処置するためのオデビキシバット |
| CN116583504A (zh) | 2020-12-04 | 2023-08-11 | 阿尔比里奥公司 | 苯并硫杂(二)氮杂环庚三烯化合物及其作为胆汁酸调节剂的用途 |
| US20220348789A1 (en) * | 2021-04-22 | 2022-11-03 | Rohm and Haas Electronics Materials CMP Holdings, Inc. | Surface modified silanized colloidal silica particles |
| US20220348790A1 (en) * | 2021-04-22 | 2022-11-03 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing composition and method |
| TW202313579A (zh) | 2021-06-03 | 2023-04-01 | 瑞典商艾爾比瑞歐公司 | 苯并噻(二)氮呯(benzothia(di)azepine)化合物及其作為膽酸調節劑之用途 |
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| JP3245130B2 (ja) * | 1999-06-28 | 2002-01-07 | 株式会社未来技術研究所 | 位置検出システム |
| JP2001131243A (ja) * | 1999-11-04 | 2001-05-15 | Shin Etsu Chem Co Ltd | 液状放射線硬化型樹脂組成物、光ファイバ用被覆材及び光ファイバ |
| US6506921B1 (en) * | 2001-06-29 | 2003-01-14 | Virginia Tech Intellectual Properties, Inc. | Amine compounds and curable compositions derived therefrom |
-
2001
- 2001-06-29 US US09/896,082 patent/US6506921B1/en not_active Expired - Fee Related
-
2002
- 2002-06-11 WO PCT/US2002/018433 patent/WO2003002057A2/en not_active Ceased
- 2002-06-11 KR KR10-2003-7017151A patent/KR20040026673A/ko not_active Ceased
- 2002-06-11 EP EP02739822A patent/EP1420744A4/en not_active Withdrawn
- 2002-06-11 CA CA 2451706 patent/CA2451706A1/en not_active Abandoned
- 2002-06-11 MX MXPA03011840A patent/MXPA03011840A/es active IP Right Grant
- 2002-06-11 CN CNB028145755A patent/CN1301257C/zh not_active Expired - Fee Related
- 2002-06-11 RU RU2004102505A patent/RU2296129C2/ru not_active IP Right Cessation
- 2002-06-11 AU AU2002312448A patent/AU2002312448B2/en not_active Ceased
- 2002-06-11 IL IL15959902A patent/IL159599A0/xx not_active IP Right Cessation
- 2002-06-11 JP JP2003508299A patent/JP4297782B2/ja not_active Expired - Fee Related
- 2002-06-11 BR BR0210747A patent/BR0210747A/pt not_active Application Discontinuation
- 2002-06-26 MY MYPI20022407A patent/MY130315A/en unknown
- 2002-06-27 TW TW91114173A patent/TWI248939B/zh not_active IP Right Cessation
- 2002-11-19 US US10/299,411 patent/US7132557B2/en not_active Expired - Fee Related
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