JP2004531620A - 基材のマーキング - Google Patents

基材のマーキング Download PDF

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Publication number
JP2004531620A
JP2004531620A JP2003506370A JP2003506370A JP2004531620A JP 2004531620 A JP2004531620 A JP 2004531620A JP 2003506370 A JP2003506370 A JP 2003506370A JP 2003506370 A JP2003506370 A JP 2003506370A JP 2004531620 A JP2004531620 A JP 2004531620A
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JP
Japan
Prior art keywords
composition
substituted
unsubstituted
article
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003506370A
Other languages
English (en)
Japanese (ja)
Inventor
ジェイ．ジュニア ラーソン、リチャード
ピー． シーカード、マイケル
シー．ジュニア ウーデンバーグ、リチャード
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Markem Imaje Corp
Original Assignee
Markem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Markem Corp filed Critical Markem Corp
Publication of JP2004531620A publication Critical patent/JP2004531620A/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/267—Marking of plastic artifacts, e.g. with laser
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/05—Alcohols; Metal alcoholates
    • C08K5/053—Polyhydroxylic alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477—Six-membered rings
    • C08K5/3492—Triazines
    • C08K5/34922—Melamine; Derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane
JP2003506370A 2001-05-15 2002-05-15 基材のマーキング Pending JP2004531620A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/855,916 US6835457B2 (en) 2001-05-15 2001-05-15 Marking substrates
PCT/US2002/015509 WO2002102908A2 (en) 2001-05-15 2002-05-15 Marking substrates

Publications (1)

Publication Number Publication Date
JP2004531620A true JP2004531620A (ja) 2004-10-14

Family

ID=25322424

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003506370A Pending JP2004531620A (ja) 2001-05-15 2002-05-15 基材のマーキング

Country Status (4)

Country Link
US (2) US6835457B2 (US06835457-20041228-M00002.png)
EP (2) EP1392786A2 (US06835457-20041228-M00002.png)
JP (1) JP2004531620A (US06835457-20041228-M00002.png)
WO (1) WO2002102908A2 (US06835457-20041228-M00002.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015518073A (ja) * 2012-04-13 2015-06-25 コーニング インコーポレイテッド マーキング用コーティング

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CN100346989C (zh) * 2002-03-01 2007-11-07 马凯姆公司 一种标记基底的方法
WO2005027039A2 (en) * 2003-09-08 2005-03-24 Laser Projection Technologies, Inc. 3d projection with image recording
WO2008021540A2 (en) * 2006-08-17 2008-02-21 The Regents Of The University Of California Customized lithographic particles
US20100025199A1 (en) * 2007-03-08 2010-02-04 Forbo Siegling Gmbh Method for applying a marking to a conveyor belt
JP5863266B2 (ja) * 2011-04-12 2016-02-16 メルクパフォーマンスマテリアルズＩｐ合同会社 シロキサン樹脂含有塗布組成物
US8753443B1 (en) 2013-01-02 2014-06-17 Jones-Blair Company Universal tint paste having high solids
JP7350720B2 (ja) 2017-09-11 2023-09-26 トレレボリ シーリング ソリューションズ ジャーマニー ゲー・エム・ベー・ハー シール検出システム及び方法

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015518073A (ja) * 2012-04-13 2015-06-25 コーニング インコーポレイテッド マーキング用コーティング

Also Published As

Publication number Publication date
EP1392786A2 (en) 2004-03-03
WO2002102908A2 (en) 2002-12-27
EP2161317A1 (en) 2010-03-10
US20030087109A1 (en) 2003-05-08
US6835424B2 (en) 2004-12-28
US6835457B2 (en) 2004-12-28
US20030203122A1 (en) 2003-10-30
WO2002102908A3 (en) 2003-05-15

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