JP2004523122A5 - - Google Patents
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- Publication number
- JP2004523122A5 JP2004523122A5 JP2002570361A JP2002570361A JP2004523122A5 JP 2004523122 A5 JP2004523122 A5 JP 2004523122A5 JP 2002570361 A JP2002570361 A JP 2002570361A JP 2002570361 A JP2002570361 A JP 2002570361A JP 2004523122 A5 JP2004523122 A5 JP 2004523122A5
- Authority
- JP
- Japan
- Prior art keywords
- laser beam
- laser
- fluoride
- optical
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims 18
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims 15
- 238000000034 method Methods 0.000 claims 8
- 239000013078 crystal Substances 0.000 claims 7
- 238000000137 annealing Methods 0.000 claims 6
- 239000007789 gas Substances 0.000 claims 6
- VZPPHXVFMVZRTE-UHFFFAOYSA-N [Kr]F Chemical compound [Kr]F VZPPHXVFMVZRTE-UHFFFAOYSA-N 0.000 claims 2
- ISQINHMJILFLAQ-UHFFFAOYSA-N argon hydrofluoride Chemical compound F.[Ar] ISQINHMJILFLAQ-UHFFFAOYSA-N 0.000 claims 2
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 claims 2
- 229910001632 barium fluoride Inorganic materials 0.000 claims 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims 2
- 229910001634 calcium fluoride Inorganic materials 0.000 claims 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US27281401P | 2001-03-02 | 2001-03-02 | |
| PCT/US2002/005932 WO2002071558A1 (en) | 2001-03-02 | 2002-02-25 | High repetition rate uv excimer laser |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004523122A JP2004523122A (ja) | 2004-07-29 |
| JP2004523122A5 true JP2004523122A5 (enExample) | 2005-12-22 |
| JP3857236B2 JP3857236B2 (ja) | 2006-12-13 |
Family
ID=23041411
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002570361A Expired - Fee Related JP3857236B2 (ja) | 2001-03-02 | 2002-02-25 | 高繰返しレートｕｖエキシマーレーザ |
| JP2002572450A Pending JP2004534381A (ja) | 2001-03-02 | 2002-03-01 | 高繰返しレートエキシマーレーザ結晶光学素子及び＜２００ｎｍＵＶ透過フッ化物光学結晶の作成方法 |
| JP2002570358A Pending JP2004523913A (ja) | 2001-03-02 | 2002-03-01 | 高繰返しレートエキシマーレーザシステム |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002572450A Pending JP2004534381A (ja) | 2001-03-02 | 2002-03-01 | 高繰返しレートエキシマーレーザ結晶光学素子及び＜２００ｎｍＵＶ透過フッ化物光学結晶の作成方法 |
| JP2002570358A Pending JP2004523913A (ja) | 2001-03-02 | 2002-03-01 | 高繰返しレートエキシマーレーザシステム |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US20020122450A1 (enExample) |
| EP (3) | EP1371119A4 (enExample) |
| JP (3) | JP3857236B2 (enExample) |
| KR (2) | KR20030081482A (enExample) |
| CN (2) | CN1507682A (enExample) |
| AU (2) | AU2002258427A1 (enExample) |
| TW (1) | TW569510B (enExample) |
| WO (3) | WO2002071558A1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6904073B2 (en) * | 2001-01-29 | 2005-06-07 | Cymer, Inc. | High power deep ultraviolet laser with long life optics |
| US6801562B2 (en) * | 2001-03-02 | 2004-10-05 | Corning Incorporated | High repetition rate excimer laser system |
| WO2003069739A1 (en) * | 2002-02-13 | 2003-08-21 | Corning Incorporated | High repetition rate excimer laser system |
| JP2003347627A (ja) * | 2002-05-29 | 2003-12-05 | Gigaphoton Inc | 紫外線レーザ装置 |
| US20060222034A1 (en) * | 2005-03-31 | 2006-10-05 | Cymer, Inc. | 6 Khz and above gas discharge laser system |
| EP2085824A1 (en) * | 2005-09-14 | 2009-08-05 | Carl Zeiss SMT AG | Optical system of a microlithographic exposure system |
| JP5352321B2 (ja) * | 2009-04-06 | 2013-11-27 | ギガフォトン株式会社 | 露光用ガスレーザ装置 |
| KR101810062B1 (ko) | 2011-10-14 | 2017-12-19 | 삼성디스플레이 주식회사 | 레이저 결정화 장치 및 레이저 결정화 방법 |
| US11763013B2 (en) | 2015-08-07 | 2023-09-19 | Workshare, Ltd. | Transaction document management system and method |
| CN106181073A (zh) * | 2016-08-25 | 2016-12-07 | 张美华 | 一种镭射激光钻孔机 |
| CN108183383B (zh) * | 2018-01-22 | 2020-03-17 | 中国科学院合肥物质科学研究院 | 一种应用于白癜风治疗的准分子激光器 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59227183A (ja) * | 1983-06-07 | 1984-12-20 | Hamamatsu Photonics Kk | 希ガス・ハロゲン・エキシマレ−ザ装置 |
| JPH01115897A (ja) * | 1987-10-30 | 1989-05-09 | Nippon Mining Co Ltd | フッ化マグネシウム単結晶の製造方法 |
| US5134518A (en) * | 1990-07-11 | 1992-07-28 | Bausch & Lomb Incorporated | Missile windows |
| US5272710A (en) * | 1992-09-08 | 1993-12-21 | Hughes Aircraft Company | Stress-free mounting and protection of liquid-cooled solid-state laser media |
| RU2041298C1 (ru) | 1993-08-17 | 1995-08-09 | Акционерное общество "Инкром" | Способ выращивания кристаллов из паровой фазы |
| JP3071694B2 (ja) * | 1996-07-30 | 2000-07-31 | 日本電気株式会社 | 狭帯域エキシマレーザ装置 |
| JPH10324571A (ja) * | 1997-05-23 | 1998-12-08 | Riken Corp | 二珪化モリブデン系セラミックス発熱体及びその製造方法 |
| US6137821A (en) * | 1997-06-04 | 2000-10-24 | Cymer, Inc. | Durable etalon based output coupler |
| JP3969865B2 (ja) * | 1997-10-24 | 2007-09-05 | キヤノン株式会社 | フッ化物結晶の製造方法 |
| US6238479B1 (en) * | 1997-10-24 | 2001-05-29 | Canon Kabushiki Kaisha | Raw material for manufacturing fluoride crystal, refining method of the same, fluoride crystal, manufacturing method of the same, and optical part |
| JP3657800B2 (ja) * | 1998-02-20 | 2005-06-08 | 株式会社リケン | 二珪化モリブデン系複合セラミックス発熱体及びその製造方法 |
| US6345065B1 (en) * | 1998-06-04 | 2002-02-05 | Lambda Physik Ag | F2-laser with line selection |
| US6163559A (en) * | 1998-06-22 | 2000-12-19 | Cymer, Inc. | Beam expander for ultraviolet lasers |
| JP2000034193A (ja) * | 1998-07-16 | 2000-02-02 | Nikon Corp | フッ化物単結晶の熱処理方法及び製造方法 |
| US6567450B2 (en) * | 1999-12-10 | 2003-05-20 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
| JP2000124534A (ja) * | 1998-10-12 | 2000-04-28 | Komatsu Ltd | ＡｒＦエキシマレーザ装置及びその狭帯域化モジュール |
| JP3631063B2 (ja) * | 1998-10-21 | 2005-03-23 | キヤノン株式会社 | フッ化物の精製方法及びフッ化物結晶の製造方法 |
| US6242136B1 (en) * | 1999-02-12 | 2001-06-05 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| US6587202B2 (en) * | 2000-01-28 | 2003-07-01 | Lambda Physik Ag | Optical materials testing method |
| US6330256B1 (en) * | 2000-02-01 | 2001-12-11 | Raytheon Company | Method and apparatus for non-dispersive face-cooling of multi-crystal nonlinear optical devices |
-
2002
- 2002-02-25 EP EP02725020A patent/EP1371119A4/en not_active Withdrawn
- 2002-02-25 JP JP2002570361A patent/JP3857236B2/ja not_active Expired - Fee Related
- 2002-02-25 CN CNA028081544A patent/CN1507682A/zh active Pending
- 2002-02-25 KR KR10-2003-7011492A patent/KR20030081482A/ko not_active Abandoned
- 2002-02-25 WO PCT/US2002/005932 patent/WO2002071558A1/en not_active Ceased
- 2002-03-01 EP EP02728371A patent/EP1449013A4/en not_active Withdrawn
- 2002-03-01 WO PCT/US2002/006235 patent/WO2002071555A2/en not_active Ceased
- 2002-03-01 CN CNB028090675A patent/CN1299406C/zh not_active Expired - Fee Related
- 2002-03-01 EP EP02728380A patent/EP1371117B1/en not_active Expired - Lifetime
- 2002-03-01 JP JP2002572450A patent/JP2004534381A/ja active Pending
- 2002-03-01 JP JP2002570358A patent/JP2004523913A/ja active Pending
- 2002-03-01 AU AU2002258427A patent/AU2002258427A1/en not_active Abandoned
- 2002-03-01 US US10/087,265 patent/US20020122450A1/en not_active Abandoned
- 2002-03-01 KR KR1020037011494A patent/KR100870330B1/ko not_active Expired - Fee Related
- 2002-03-01 AU AU2002258435A patent/AU2002258435A1/en not_active Abandoned
- 2002-03-01 WO PCT/US2002/006124 patent/WO2002073244A2/en not_active Ceased
- 2002-03-11 TW TW091104777A patent/TW569510B/zh active
-
2003
- 2003-06-10 US US10/459,012 patent/US6768762B2/en not_active Expired - Fee Related
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