JP2004523113A - 非対称導波路電界吸収型変調レーザ - Google Patents
非対称導波路電界吸収型変調レーザ Download PDFInfo
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- JP2004523113A JP2004523113A JP2002558622A JP2002558622A JP2004523113A JP 2004523113 A JP2004523113 A JP 2004523113A JP 2002558622 A JP2002558622 A JP 2002558622A JP 2002558622 A JP2002558622 A JP 2002558622A JP 2004523113 A JP2004523113 A JP 2004523113A
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0265—Intensity modulators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1028—Coupling to elements in the cavity, e.g. coupling to waveguides adjacent the active region, e.g. forward coupled [DFC] structures
- H01S5/1032—Coupling to elements comprising an optical axis that is not aligned with the optical axis of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1053—Comprising an active region having a varying composition or cross-section in a specific direction
- H01S5/1064—Comprising an active region having a varying composition or cross-section in a specific direction varying width along the optical axis
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/125—Distributed Bragg reflector [DBR] lasers
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
- Optical Integrated Circuits (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Lasers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US26286301P | 2001-01-19 | 2001-01-19 | |
| US09/891,639 US6483863B2 (en) | 2001-01-19 | 2001-06-26 | Asymmetric waveguide electroabsorption-modulated laser |
| PCT/US2002/001348 WO2002058251A2 (en) | 2001-01-19 | 2002-01-18 | Asymmetric waveguide electroabsorption-modulated laser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004523113A true JP2004523113A (ja) | 2004-07-29 |
| JP2004523113A5 JP2004523113A5 (enExample) | 2005-12-22 |
Family
ID=26949512
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002558622A Pending JP2004523113A (ja) | 2001-01-19 | 2002-01-18 | 非対称導波路電界吸収型変調レーザ |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6483863B2 (enExample) |
| EP (1) | EP1368870B1 (enExample) |
| JP (1) | JP2004523113A (enExample) |
| KR (1) | KR20030093199A (enExample) |
| CN (1) | CN1547791A (enExample) |
| AT (1) | ATE330346T1 (enExample) |
| AU (1) | AU2002245278A1 (enExample) |
| CA (1) | CA2435330A1 (enExample) |
| DE (1) | DE60212344T2 (enExample) |
| WO (1) | WO2002058251A2 (enExample) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012517030A (ja) * | 2009-03-31 | 2012-07-26 | インテル コーポレイション | 狭小表面波形格子 |
| JP2015122352A (ja) * | 2013-12-20 | 2015-07-02 | 三菱電機株式会社 | 波長可変光源、波長可変光源モジュール、および光集積素子 |
| JP2015184528A (ja) * | 2014-03-25 | 2015-10-22 | 日本電気株式会社 | 光集積回路とその製造方法 |
| US11262605B2 (en) * | 2017-08-31 | 2022-03-01 | Lightwave Logic Inc. | Active region-less polymer modulator integrated on a common PIC platform and method |
| CN114966963A (zh) * | 2021-02-26 | 2022-08-30 | 效能光子私人有限责任公司 | 光电系统及其磷化铟基单片光子集成电路 |
| JP2023121105A (ja) * | 2022-02-18 | 2023-08-30 | ネクサス・フォトニクス・インコーポレイテッド | 誘電体導波路に対する光結合を改善したgaas集積能動デバイス |
| JP2024059884A (ja) * | 2020-07-01 | 2024-05-01 | オーロラ・オペレイションズ・インコーポレイティッド | 半導体レーザーおよび光増幅器フォトニックパッケージ |
| JP7724159B2 (ja) | 2019-05-28 | 2025-08-15 | シエナ コーポレーション | モノリシック集積利得素子 |
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| US6381380B1 (en) * | 1998-06-24 | 2002-04-30 | The Trustees Of Princeton University | Twin waveguide based design for photonic integrated circuits |
| US6795622B2 (en) * | 1998-06-24 | 2004-09-21 | The Trustess Of Princeton University | Photonic integrated circuits |
| EP1381893A4 (en) * | 2001-04-27 | 2005-07-20 | Sarnoff Corp | PHOTONIC INTEGRATED CIRCUIT (IPC) AND METHODS FOR PRODUCING THE SAME |
| US6600847B2 (en) * | 2001-11-05 | 2003-07-29 | Quantum Photonics, Inc | Semiconductor optical device with improved efficiency and output beam characteristics |
| US7035305B2 (en) * | 2002-05-10 | 2006-04-25 | Bookham Technology, Plc | Monolithically integrated high power laser optical device |
| US6956983B2 (en) * | 2002-05-31 | 2005-10-18 | Intel Corporation | Epitaxial growth for waveguide tapering |
| US6989284B2 (en) * | 2002-05-31 | 2006-01-24 | Intel Corporation | Fabrication of a waveguide taper through ion implantation |
| US6975798B2 (en) * | 2002-07-05 | 2005-12-13 | Xponent Photonics Inc | Waveguides assembled for transverse-transfer of optical power |
| US7330619B2 (en) * | 2003-04-29 | 2008-02-12 | Hoya Corporation Usa | Laser and photodetector coupled by planar waveguides |
| US7283701B2 (en) * | 2003-08-01 | 2007-10-16 | Optium Corporation | Optical fiber transmission system with increased effective modal bandwidth transmission |
| US7233709B2 (en) * | 2003-11-04 | 2007-06-19 | Avago Technologies Fiber Ip (Singapore) Ltd. Pte. | Electro-absorption modulator |
| US20050105853A1 (en) * | 2003-11-13 | 2005-05-19 | Ansheng Liu | Method and apparatus for dual tapering an optical waveguide |
| US7373048B2 (en) * | 2004-02-18 | 2008-05-13 | Trustees Of Princeton University | Polarization insensitive semiconductor optical amplifier |
| US7230963B2 (en) * | 2004-04-14 | 2007-06-12 | The Trustees Of Princeton University | Monolithic wavelength stabilized asymmetric laser |
| EP1740992B1 (en) * | 2004-04-15 | 2018-10-10 | Infinera Corporation | Coolerless and floating wavelength grid photonic integrated circuits (pics) for wdm transmission networks |
| EP1735884B1 (en) * | 2004-04-15 | 2010-11-10 | Binoptics Corporation | Multi-level integrated photonic devices |
| US7425726B2 (en) * | 2004-05-19 | 2008-09-16 | Avago Technologies Fiber Ip Pte Ltd. | Electroabsorption modulators and methods of making the same |
| KR100737348B1 (ko) * | 2004-12-14 | 2007-07-09 | 한국전자통신연구원 | 전계흡수형 광 변조기 및 그 제조방법 |
| US7164838B2 (en) | 2005-02-15 | 2007-01-16 | Xponent Photonics Inc | Multiple-core planar optical waveguides and methods of fabrication and use thereof |
| TWI269083B (en) * | 2005-08-22 | 2006-12-21 | Univ Nat Central | Step-shaped optical waveguide structure |
| US20070070309A1 (en) * | 2005-09-28 | 2007-03-29 | Miklos Stern | Color image projection arrangement and method employing electro-absorption modulated green laser system |
| US7333689B2 (en) * | 2005-09-30 | 2008-02-19 | The Trustees Of Princeton University | Photonic integrated devices having reduced absorption loss |
| US7343061B2 (en) | 2005-11-15 | 2008-03-11 | The Trustees Of Princeton University | Integrated photonic amplifier and detector |
| US7826693B2 (en) | 2006-10-26 | 2010-11-02 | The Trustees Of Princeton University | Monolithically integrated reconfigurable optical add-drop multiplexer |
| US8472766B2 (en) * | 2009-08-14 | 2013-06-25 | Massachusetts Institute Of Technology | Waveguide coupler having continuous three-dimensional tapering |
| JP2012151210A (ja) * | 2011-01-18 | 2012-08-09 | Sony Corp | 半導体レーザ素子 |
| JP5742344B2 (ja) | 2011-03-20 | 2015-07-01 | 富士通株式会社 | 受光素子、光受信器及び光受信モジュール |
| US8625942B2 (en) * | 2011-03-30 | 2014-01-07 | Intel Corporation | Efficient silicon-on-insulator grating coupler |
| EP2544319B1 (en) * | 2011-07-08 | 2015-03-25 | Alcatel Lucent | Laser source for photonic integrated devices |
| CN102611000B (zh) * | 2012-03-23 | 2013-09-25 | 中国科学院长春光学精密机械与物理研究所 | 高效率非对称光场分布垂直腔面发射半导体激光器 |
| CN104204880A (zh) * | 2012-03-30 | 2014-12-10 | 富士通株式会社 | 光元件、光发送元件、光接收元件、混合波导激光器、光发送装置 |
| KR20130128651A (ko) * | 2012-05-17 | 2013-11-27 | 한국전자통신연구원 | 전계흡수형 변조기 레이저 |
| US20140185980A1 (en) * | 2012-12-31 | 2014-07-03 | Futurewei Technologies, Inc. | Silicon-On-Insulator Platform for Integration of Tunable Laser Arrays |
| US9306372B2 (en) * | 2013-03-14 | 2016-04-05 | Emcore Corporation | Method of fabricating and operating an optical modulator |
| US9059801B1 (en) | 2013-03-14 | 2015-06-16 | Emcore Corporation | Optical modulator |
| US9306672B2 (en) * | 2013-03-14 | 2016-04-05 | Encore Corporation | Method of fabricating and operating an optical modulator |
| CN104242052B (zh) * | 2013-06-18 | 2018-01-19 | 中国科学院苏州纳米技术与纳米仿生研究所 | 环形腔器件及其制作方法 |
| EP2816679B1 (fr) * | 2013-06-21 | 2022-09-21 | Alcatel Lucent | Dispositif d'émission laser à modulateur de lumière intégré |
| EP3180643A1 (en) * | 2014-08-15 | 2017-06-21 | Corning Optical Communications LLC | Methods for coupling of waveguides with dissimilar mode field diameters, and related apparatuses, components, and systems |
| US9564733B2 (en) * | 2014-09-15 | 2017-02-07 | Emcore Corporation | Method of fabricating and operating an optical modulator |
| EP3051638A1 (en) * | 2015-01-27 | 2016-08-03 | Huawei Technologies Co., Ltd. | Tunable laser and method of tuning a laser |
| WO2016206046A1 (zh) * | 2015-06-25 | 2016-12-29 | 华为技术有限公司 | 快速可调谐的可变栅格激光器 |
| CN107046229A (zh) * | 2016-02-05 | 2017-08-15 | 南京威宁锐克信息技术有限公司 | 一种激光器阵列的制作方法及激光器阵列 |
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| FR3061961B1 (fr) * | 2017-01-19 | 2019-04-19 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Dispositif photonique comportant un laser optiquement connecte a un guide d'onde silicium et procede de fabrication d'un tel dispositif photonique |
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| CN110687694A (zh) * | 2018-07-04 | 2020-01-14 | 上海新微技术研发中心有限公司 | 电吸收调制器及半导体器件 |
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| US10845550B1 (en) * | 2019-10-18 | 2020-11-24 | The Boeing Company | Input coupler for chip-scale laser receiver device |
| US11231549B2 (en) * | 2019-11-14 | 2022-01-25 | Honeywell International Inc. | Integrated active/passive visible/UV modulator |
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Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5140149A (en) | 1989-03-10 | 1992-08-18 | Canon Kabushiki Kaisha | Optical apparatus using wavelength selective photocoupler |
| US5039189A (en) | 1990-04-06 | 1991-08-13 | Lockheed Missiles & Space Company, Inc. | Optical signal distribution network and method of converting independent optical/electrical signals |
| US5208878A (en) | 1990-11-28 | 1993-05-04 | Siemens Aktiengesellschaft | Monolithically integrated laser-diode-waveguide combination |
| EP0552390B1 (de) | 1992-01-20 | 1995-09-27 | Siemens Aktiengesellschaft | Abstimmbare Laserdiode |
| US5355386A (en) | 1992-11-17 | 1994-10-11 | Gte Laboratories Incorporated | Monolithically integrated semiconductor structure and method of fabricating such structure |
| JP2765793B2 (ja) | 1993-03-16 | 1998-06-18 | シャープ株式会社 | モード分離素子および光磁気ディスク用ピックアップ |
| JP2606079B2 (ja) | 1993-06-25 | 1997-04-30 | 日本電気株式会社 | 光半導体素子 |
| US5663824A (en) | 1993-11-02 | 1997-09-02 | Lucent Technologies Inc. | Optical modulators as monolithically integrated optical isolators |
| EP0664587B1 (de) | 1994-01-19 | 1997-06-25 | Siemens Aktiengesellschaft | Abstimmbare Laserdiode |
| US5844929A (en) | 1994-02-24 | 1998-12-01 | British Telecommunications Public Limited Company | Optical device with composite passive and tapered active waveguide regions |
| JPH07326820A (ja) | 1994-05-30 | 1995-12-12 | Mitsubishi Electric Corp | 波長可変半導体レーザ装置 |
| US5574742A (en) * | 1994-05-31 | 1996-11-12 | Lucent Technologies Inc. | Tapered beam expander waveguide integrated with a diode laser |
| US5623363A (en) | 1995-02-27 | 1997-04-22 | Lucent Technologies Inc. | Semiconductor light source having a spectrally broad, high power optical output |
| US5721750A (en) | 1995-04-13 | 1998-02-24 | Korea Advanced Institute Of Science And Technology | Laser diode for optoelectronic integrated circuit and a process for preparing the same |
| US6198863B1 (en) | 1995-10-06 | 2001-03-06 | British Telecommunications Public Limited Company | Optical filters |
| DE19613701A1 (de) | 1996-03-29 | 1997-10-02 | Hertz Inst Heinrich | Integriert optischer Feldweitentransformator |
| US5859866A (en) | 1997-02-07 | 1999-01-12 | The Trustees Of Princeton University | Photonic integration using a twin waveguide structure |
| US5852687A (en) | 1997-07-09 | 1998-12-22 | Trw Inc. | Integrated optical time delay unit |
| US6381380B1 (en) | 1998-06-24 | 2002-04-30 | The Trustees Of Princeton University | Twin waveguide based design for photonic integrated circuits |
| US6167073A (en) | 1998-07-23 | 2000-12-26 | Wisconsin Alumni Research Foundation | High power laterally antiguided semiconductor light source with reduced transverse optical confinement |
-
2001
- 2001-06-26 US US09/891,639 patent/US6483863B2/en not_active Expired - Lifetime
-
2002
- 2002-01-18 AT AT02713427T patent/ATE330346T1/de not_active IP Right Cessation
- 2002-01-18 CA CA002435330A patent/CA2435330A1/en not_active Abandoned
- 2002-01-18 DE DE60212344T patent/DE60212344T2/de not_active Expired - Fee Related
- 2002-01-18 AU AU2002245278A patent/AU2002245278A1/en not_active Abandoned
- 2002-01-18 WO PCT/US2002/001348 patent/WO2002058251A2/en not_active Ceased
- 2002-01-18 KR KR10-2003-7009612A patent/KR20030093199A/ko not_active Ceased
- 2002-01-18 JP JP2002558622A patent/JP2004523113A/ja active Pending
- 2002-01-18 CN CNA028059972A patent/CN1547791A/zh active Pending
- 2002-01-18 EP EP02713427A patent/EP1368870B1/en not_active Expired - Lifetime
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012517030A (ja) * | 2009-03-31 | 2012-07-26 | インテル コーポレイション | 狭小表面波形格子 |
| JP2015122352A (ja) * | 2013-12-20 | 2015-07-02 | 三菱電機株式会社 | 波長可変光源、波長可変光源モジュール、および光集積素子 |
| JP2015184528A (ja) * | 2014-03-25 | 2015-10-22 | 日本電気株式会社 | 光集積回路とその製造方法 |
| US11262605B2 (en) * | 2017-08-31 | 2022-03-01 | Lightwave Logic Inc. | Active region-less polymer modulator integrated on a common PIC platform and method |
| JP7724159B2 (ja) | 2019-05-28 | 2025-08-15 | シエナ コーポレーション | モノリシック集積利得素子 |
| JP7705500B2 (ja) | 2020-07-01 | 2025-07-09 | オーロラ・オペレイションズ・インコーポレイティッド | Lidar装置、自律走行車両制御システム、および自律走行車両 |
| JP2024059884A (ja) * | 2020-07-01 | 2024-05-01 | オーロラ・オペレイションズ・インコーポレイティッド | 半導体レーザーおよび光増幅器フォトニックパッケージ |
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| US11874495B2 (en) | 2021-02-26 | 2024-01-16 | Effect Photonics B.V. | Monolithic photonic integrated circuit and opto-electronic system comprising the same |
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| CN114966963A (zh) * | 2021-02-26 | 2022-08-30 | 效能光子私人有限责任公司 | 光电系统及其磷化铟基单片光子集成电路 |
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| JP2023121105A (ja) * | 2022-02-18 | 2023-08-30 | ネクサス・フォトニクス・インコーポレイテッド | 誘電体導波路に対する光結合を改善したgaas集積能動デバイス |
Also Published As
| Publication number | Publication date |
|---|---|
| DE60212344D1 (de) | 2006-07-27 |
| EP1368870B1 (en) | 2006-06-14 |
| CN1547791A (zh) | 2004-11-17 |
| AU2002245278A1 (en) | 2002-07-30 |
| WO2002058251A3 (en) | 2002-10-10 |
| EP1368870A2 (en) | 2003-12-10 |
| DE60212344T2 (de) | 2007-05-10 |
| ATE330346T1 (de) | 2006-07-15 |
| KR20030093199A (ko) | 2003-12-06 |
| US6483863B2 (en) | 2002-11-19 |
| CA2435330A1 (en) | 2002-07-25 |
| US20020097941A1 (en) | 2002-07-25 |
| EP1368870A4 (en) | 2005-10-05 |
| WO2002058251A2 (en) | 2002-07-25 |
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