JP2004520591A5 - - Google Patents

Download PDF

Info

Publication number
JP2004520591A5
JP2004520591A5 JP2002564333A JP2002564333A JP2004520591A5 JP 2004520591 A5 JP2004520591 A5 JP 2004520591A5 JP 2002564333 A JP2002564333 A JP 2002564333A JP 2002564333 A JP2002564333 A JP 2002564333A JP 2004520591 A5 JP2004520591 A5 JP 2004520591A5
Authority
JP
Japan
Prior art keywords
pattern
position determining
light
detector
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002564333A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004520591A (ja
JP4119254B2 (ja
Filing date
Publication date
Priority claimed from GBGB0103582.3A external-priority patent/GB0103582D0/en
Application filed filed Critical
Publication of JP2004520591A publication Critical patent/JP2004520591A/ja
Publication of JP2004520591A5 publication Critical patent/JP2004520591A5/ja
Application granted granted Critical
Publication of JP4119254B2 publication Critical patent/JP4119254B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2002564333A 2001-02-14 2002-02-14 位置決定システム Expired - Fee Related JP4119254B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0103582.3A GB0103582D0 (en) 2001-02-14 2001-02-14 Position determination system
PCT/GB2002/000638 WO2002065061A1 (en) 2001-02-14 2002-02-14 Position determination system

Publications (3)

Publication Number Publication Date
JP2004520591A JP2004520591A (ja) 2004-07-08
JP2004520591A5 true JP2004520591A5 (enExample) 2005-12-22
JP4119254B2 JP4119254B2 (ja) 2008-07-16

Family

ID=9908684

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002564333A Expired - Fee Related JP4119254B2 (ja) 2001-02-14 2002-02-14 位置決定システム

Country Status (7)

Country Link
US (1) US7141780B2 (enExample)
EP (1) EP1360461B1 (enExample)
JP (1) JP4119254B2 (enExample)
AT (1) ATE395578T1 (enExample)
DE (1) DE60226576D1 (enExample)
GB (1) GB0103582D0 (enExample)
WO (1) WO2002065061A1 (enExample)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10309679B4 (de) * 2003-02-27 2014-05-22 Dr. Johannes Heidenhain Gmbh Abtasteinheit zum Abtasten einer Maßverkörperung
GB0316921D0 (en) 2003-07-19 2003-08-27 Renishaw Plc Reader for a scale marking
DE102004011911A1 (de) * 2004-03-11 2005-11-10 Sick Ag Sendeelement für Lichtschranken, Lichtgitter und dergleichen
GB0413710D0 (en) * 2004-06-21 2004-07-21 Renishaw Plc Scale reading apparatus
DE102005006247A1 (de) * 2005-02-11 2006-08-17 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
JP4869628B2 (ja) * 2005-05-26 2012-02-08 オリンパス株式会社 光学式エンコーダ
GB0522651D0 (en) 2005-11-07 2005-12-14 Renishaw Plc Scale and readhead system
GB0523273D0 (en) 2005-11-16 2005-12-21 Renishaw Plc Scale and readhead apparatus and method
GB0601174D0 (en) 2006-01-20 2006-03-01 Renishaw Plc Multiple readhead apparatus
GB0608812D0 (en) 2006-05-04 2006-06-14 Renishaw Plc Rotary encoder apparatus
EP1862774B1 (fr) * 2006-05-31 2015-07-29 Delphi Technologies, Inc. Optical multiturn rotational encoder
KR101107904B1 (ko) * 2006-08-21 2012-01-25 지에스아이 그룹 코포레이션 회전식 광학적 위치 인코더, 서보 모터 어셈블리, 서보-제어 검류계 및 레이저 시스템
JP2008292352A (ja) 2007-05-25 2008-12-04 Mitsutoyo Corp 反射型エンコーダ
DE112009002101T5 (de) 2008-08-28 2012-01-12 Faro Technologies, Inc. Mit einem Index versehender optischer Encoder, Verfahren zum Indexieren eines optischen Encoders und Verfahren zum dynamischen Einstellen von Verstärkung und Offset in einem optischen Encoder
JP5562076B2 (ja) * 2010-03-10 2014-07-30 キヤノン株式会社 光学式エンコーダおよび変位計測装置
DE102011082570A1 (de) * 2011-09-13 2013-03-14 Dr. Johannes Heidenhain Gmbh Rotatorische Positionsmesseinrichtung
WO2015049173A1 (en) 2013-10-01 2015-04-09 Renishaw Plc Reference mark detector arrangement
JP2016532096A (ja) 2013-10-01 2016-10-13 レニショウ パブリック リミテッド カンパニーRenishaw Public Limited Company 位置測定エンコーダ
GB2554230A (en) 2015-04-22 2018-03-28 Faro Tech Inc Indexed optical encoder
US20170189123A1 (en) * 2016-01-06 2017-07-06 Biosense Webster (Israel) Ltd. Optical Registration of Rotary Sinuplasty Cutter
JP6744066B2 (ja) 2016-03-25 2020-08-19 株式会社ミツトヨ 光電式エンコーダ
EP3623769A1 (en) 2018-09-12 2020-03-18 Renishaw PLC Measurement device
JP7391527B2 (ja) * 2019-04-03 2023-12-05 株式会社ミツトヨ 光電式エンコーダ
JP7475973B2 (ja) 2020-06-08 2024-04-30 キヤノン株式会社 光学式エンコーダ及び制御装置
WO2024134155A1 (en) 2022-12-20 2024-06-27 Renishaw Plc Encoder apparatus
EP4390328A1 (en) 2022-12-21 2024-06-26 Renishaw plc Encoder apparatus

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1933254C3 (de) 1969-07-01 1979-08-16 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Inkrementales Längen- oder Winkelmeßsystem
GB1302762A (enExample) 1970-02-06 1973-01-10
DE3562948D1 (en) 1984-04-21 1988-06-30 Heidenhain Gmbh Dr Johannes Position-measuring device
GB8432574D0 (en) 1984-12-22 1985-02-06 Renishaw Plc Opto-electronic scale-reading apparatus
DE3526206A1 (de) 1985-07-23 1987-02-05 Heidenhain Gmbh Dr Johannes Wegmesseinrichtung
IN168444B (enExample) * 1986-08-15 1991-04-06 Mitutoyo Mfg Co Ltd
JPS6474414A (en) * 1987-09-16 1989-03-20 Mitutoyo Corp Optical displacement detector
US5073710A (en) * 1989-09-21 1991-12-17 Copal Company Limited Optical displacement detector including a displacement member's surface having a diffractive pattern and a holographic lens pattern
EP0543513B2 (en) 1991-11-06 2007-10-24 Renishaw Transducer Systems Limited Opto-electronic scale-reading apparatus
DE19726935B4 (de) 1997-06-25 2014-06-12 Dr. Johannes Heidenhain Gmbh Optische Positionsmeßeinrichtung
AT410485B (de) * 1997-07-30 2003-05-26 Rsf Elektronik Gmbh Positionsmesseinrichtung
DE19754595B4 (de) * 1997-12-10 2011-06-01 Dr. Johannes Heidenhain Gmbh Lichtelektrische Positionsmeßeinrichtung
JP3506613B2 (ja) * 1998-09-21 2004-03-15 株式会社ミツトヨ 原点検出方式
US6175109B1 (en) 1998-12-16 2001-01-16 Renco Encoders, Inc. Encoder for providing incremental and absolute position data
DE19859669A1 (de) * 1998-12-23 2000-06-29 Heidenhain Gmbh Dr Johannes Integrierter optoelektronischer Sensor und Verfahren zu dessen Herstellung

Similar Documents

Publication Publication Date Title
JP2004520591A5 (enExample)
DE60036510D1 (de) EUV-lithographische Projektionsvorrichtung mit einem optischen Element mit Deckschicht
TW200500799A (en) Resist lower layer film and method for forming a pattern
DE60118669D1 (de) Lithographischer Projektionsapparat
TW200540572A (en) Apparatus for providing a pattern of polarization
JPH11150063A5 (enExample)
TW200615282A (en) Polymer, resist protective coating material, and patterning process
ATE395578T1 (de) Positionsbestimmungssystem
DE50112921D1 (de) Projektionsbelichtungsanlage mit reflektivem Retikel
ATE339754T1 (de) Musikinstrumentenständer
TW200528927A (en) Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
TW200510945A (en) Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer program
ATE306088T1 (de) Euv optische vorrichtung mit verstärkter mechanischer stabilität und lithographische maske mit dieser vorrichtung
KR910008486A (ko) 노광마스크
JP2005057222A5 (enExample)
HUP0300702A2 (en) Device for evaluating authenticity features that have a diffraction structure
WO2006041544A3 (en) Solid immersion lens lithography
TW200519530A (en) Multiple exposure method for forming patterned photoresist layer
JPH10154198A5 (enExample)
JP2005347544A5 (enExample)
DE602005021106D1 (de) Alternierende Phasenmaske
JP2005191503A5 (enExample)
ATE417296T1 (de) Kamera mit mitteln zum halten einer linse in zwei verschiedenen positionen
TW200707126A (en) Method for measuring projection head focus position and exposing method
TW200722919A (en) Pattern-forming material, pattern-forming device, and pattern-forming method