JP2004514510A5 - - Google Patents

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JP2004514510A5
JP2004514510A5 JP2002545773A JP2002545773A JP2004514510A5 JP 2004514510 A5 JP2004514510 A5 JP 2004514510A5 JP 2002545773 A JP2002545773 A JP 2002545773A JP 2002545773 A JP2002545773 A JP 2002545773A JP 2004514510 A5 JP2004514510 A5 JP 2004514510A5
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JP2002545773A
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JP4080332B2 (ja
JP2004514510A (ja
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JP2002545773A 2000-11-28 2001-11-27 熱処置システム Expired - Lifetime JP4080332B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/724,670 US6618620B1 (en) 2000-11-28 2000-11-28 Apparatus for controlling thermal dosing in an thermal treatment system
PCT/IL2001/001084 WO2002043804A1 (en) 2000-11-28 2001-11-27 Thermal treatment system

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JP2004514510A JP2004514510A (ja) 2004-05-20
JP2004514510A5 true JP2004514510A5 (ja) 2005-12-22
JP4080332B2 JP4080332B2 (ja) 2008-04-23

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JP2002545773A Expired - Lifetime JP4080332B2 (ja) 2000-11-28 2001-11-27 熱処置システム

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US (2) US6618620B1 (ja)
EP (1) EP1349612B1 (ja)
JP (1) JP4080332B2 (ja)
CN (1) CN1293926C (ja)
AU (1) AU2002218462A1 (ja)
WO (1) WO2002043804A1 (ja)

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